KR20050040274A - 플라즈마 발생용 안테나 및 이를 갖는 플라즈마 처리장치 - Google Patents

플라즈마 발생용 안테나 및 이를 갖는 플라즈마 처리장치 Download PDF

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Publication number
KR20050040274A
KR20050040274A KR1020030075436A KR20030075436A KR20050040274A KR 20050040274 A KR20050040274 A KR 20050040274A KR 1020030075436 A KR1020030075436 A KR 1020030075436A KR 20030075436 A KR20030075436 A KR 20030075436A KR 20050040274 A KR20050040274 A KR 20050040274A
Authority
KR
South Korea
Prior art keywords
concentric
antenna
pattern forming
branches
concentric pattern
Prior art date
Application number
KR1020030075436A
Other languages
English (en)
Korean (ko)
Inventor
김우석
채승기
감도영
이광명
원제형
신재광
오재준
전상진
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR1020030075436A priority Critical patent/KR20050040274A/ko
Priority to JP2004297560A priority patent/JP2005135907A/ja
Priority to TW093131951A priority patent/TW200527982A/zh
Priority to CNA2004100104755A priority patent/CN1638599A/zh
Publication of KR20050040274A publication Critical patent/KR20050040274A/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020030075436A 2003-10-28 2003-10-28 플라즈마 발생용 안테나 및 이를 갖는 플라즈마 처리장치 KR20050040274A (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020030075436A KR20050040274A (ko) 2003-10-28 2003-10-28 플라즈마 발생용 안테나 및 이를 갖는 플라즈마 처리장치
JP2004297560A JP2005135907A (ja) 2003-10-28 2004-10-12 プラズマ発生用アンテナおよびこれを有するプラズマ処理装置
TW093131951A TW200527982A (en) 2003-10-28 2004-10-21 Antenna for use in producing plasma and plasma processing apparatus comprising the same
CNA2004100104755A CN1638599A (zh) 2003-10-28 2004-10-28 用于产生等离子体的天线和包括其的等离子体处理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020030075436A KR20050040274A (ko) 2003-10-28 2003-10-28 플라즈마 발생용 안테나 및 이를 갖는 플라즈마 처리장치

Publications (1)

Publication Number Publication Date
KR20050040274A true KR20050040274A (ko) 2005-05-03

Family

ID=34651246

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020030075436A KR20050040274A (ko) 2003-10-28 2003-10-28 플라즈마 발생용 안테나 및 이를 갖는 플라즈마 처리장치

Country Status (4)

Country Link
JP (1) JP2005135907A (ja)
KR (1) KR20050040274A (ja)
CN (1) CN1638599A (ja)
TW (1) TW200527982A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100824974B1 (ko) * 2006-08-17 2008-04-28 (주)아이씨디 플라즈마 처리장치의 안테나
KR101020119B1 (ko) * 2008-06-13 2011-03-08 네스트 주식회사 플라즈마 소스
WO2012047034A2 (ko) * 2010-10-06 2012-04-12 주식회사 유진테크 반원 형상의 안테나를 구비하는 기판 처리 장치
US20130186337A1 (en) * 2010-10-06 2013-07-25 Eugene Technology Co., Ltd. Substrate processing device for supplying reaction gas through symmetry-type inlet and outlet

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100388559C (zh) * 2005-12-29 2008-05-14 上海交通大学 自重构等离子体天线
KR100777635B1 (ko) * 2006-01-17 2007-11-21 (주)아이씨디 평판 타입 고밀도 ｉｃｐ 안테나
JP5277473B2 (ja) * 2006-11-28 2013-08-28 サムコ株式会社 プラズマ処理装置
WO2008099896A1 (ja) * 2007-02-16 2008-08-21 Foi Corporation 誘導コイル、プラズマ発生装置およびプラズマ発生方法
JP5301812B2 (ja) * 2007-11-14 2013-09-25 東京エレクトロン株式会社 プラズマ処理装置
TWI417000B (zh) * 2009-09-23 2013-11-21 Advanced System Technology Co Ltd 應用於感應耦合電漿產生裝置之多線圈結構
JP5554047B2 (ja) * 2009-10-27 2014-07-23 東京エレクトロン株式会社 プラズマ処理装置
JP5597071B2 (ja) * 2010-09-06 2014-10-01 東京エレクトロン株式会社 アンテナユニットおよび誘導結合プラズマ処理装置
JP5723130B2 (ja) * 2010-09-28 2015-05-27 東京エレクトロン株式会社 プラズマ処理装置
JP5851682B2 (ja) * 2010-09-28 2016-02-03 東京エレクトロン株式会社 プラズマ処理装置
CN103094038B (zh) 2011-10-27 2017-01-11 松下知识产权经营株式会社 等离子体处理装置以及等离子体处理方法
JP7225058B2 (ja) 2019-08-19 2023-02-20 株式会社東芝 高周波アンテナ及びプラズマ処理装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100824974B1 (ko) * 2006-08-17 2008-04-28 (주)아이씨디 플라즈마 처리장치의 안테나
KR101020119B1 (ko) * 2008-06-13 2011-03-08 네스트 주식회사 플라즈마 소스
WO2012047034A2 (ko) * 2010-10-06 2012-04-12 주식회사 유진테크 반원 형상의 안테나를 구비하는 기판 처리 장치
WO2012047034A3 (ko) * 2010-10-06 2012-06-21 주식회사 유진테크 반원 형상의 안테나를 구비하는 기판 처리 장치
US20130180453A1 (en) * 2010-10-06 2013-07-18 Eugene Technology Co., Ltd. Substrate processing device equipped with semicircle shaped antenna
US20130186337A1 (en) * 2010-10-06 2013-07-25 Eugene Technology Co., Ltd. Substrate processing device for supplying reaction gas through symmetry-type inlet and outlet
US9416451B2 (en) 2010-10-06 2016-08-16 Eugene Technology Co., Ltd. Substrate processing device equipped with semicircle shaped antenna

Also Published As

Publication number Publication date
TW200527982A (en) 2005-08-16
JP2005135907A (ja) 2005-05-26
CN1638599A (zh) 2005-07-13

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