KR20050001918A - Susceptor and Method of Manufacturing Susceptor - Google Patents

Abstract

PURPOSE: A susceptor and a method for manufacturing the same are provided to continuously use without a breakdown when the temperature rises or falls and to manufacture a low cost. CONSTITUTION: An upper end(212) of a susceptor shaft(210) is combined with the bottom center of the susceptor body(200) and then sealed through a welding process(216). Inserting grooves(222) are symmetrically formed at a region adjacent to the center of bottom surface(200a) of the susceptor body and a region adjacent to the peripheral region, respectively. A heater(220) is received to the inserting grooves. A cover(224) made of aluminum material is additionally mounted to lower ends of the inserting grooves.

Description

Susceptor and Method of Manufacturing Susceptor

The present invention relates to a susceptor and a method of manufacturing the same, and more particularly, to a susceptor installed in a process chamber for a liquid crystal display and a heater embedded therein, and a method of manufacturing the same.

The liquid crystal display device refers to a non-light emitting device in which a liquid crystal is injected between an array substrate and a color filter substrate to obtain an image effect by using the characteristics thereof. The array substrate and the color filter substrate are manufactured through several times of deposition, patterning and etching processes of a thin film on a transparent substrate made of a material such as glass, and the reaction and source material are introduced into the process chamber into the gas phase and deposited. In order to proceed with the process, the substrate is seated in the process chamber, and a susceptor in which a heater is embedded is installed so as to be heated to a temperature suitable for deposition.

The structure of the susceptor installed in the process chamber for a liquid crystal display device is as follows.

1 is a cross-sectional view schematically showing a susceptor installed in a process chamber for manufacturing a conventional liquid crystal display device, the susceptor body and the bottom surface of the susceptor 50 is installed horizontally so that the substrate can be seated on the upper surface It is composed of a susceptor shaft 52 connected in a vertical direction downward at 50a and supporting the susceptor body 50. The susceptor shaft 52 may be connected to a driving unit (not shown) connected to an external motor or the like to move up and down, and thus the susceptor body 50 may be loaded or unloaded onto a top surface of the susceptor body 50. ) In the vertical direction. The susceptor shaft 52 is bonded to the susceptor body 50 and then welded 56 to be vacuum sealed.

At this time, the heater 60 is inserted into the bottom surface of the susceptor body 50 to extend to the susceptor shaft 52 connected through the central portion of the susceptor body and then connected to an external power source (not shown). Connected to the line 68, this is a diagram showing the configuration of the heater inserted into the susceptor body 50 to extend to the susceptor shaft 52 cut along the line AA 'and BB' of FIG. It will be described in more detail with reference to 2a and 2b.

That is, the buried groove 68 is formed at the bottom of the susceptor body 50 so that the heater 60 is embedded therein. The heater 60 is generally composed of two independent layers, the first insulating core 61, the first metal sheath 62, The second insulating core 63 and the second metal sheath 64 are formed. After the heater is accommodated in the buried groove 68, the cover 66 made of aluminum closes the buried groove 68 to the bottom surface, and finally, the inner space of the buried groove 68 is opened to the outside through the welding process 67. Isolate completely to maintain vacuum.

In particular, the heater inserted into the buried groove 68 of the susceptor body 50 should heat the entire region of the susceptor body 50 to a uniform temperature, as shown in Figure 2b susceptor body 50 The inner heater 60a inserted into the buried groove formed in the central region to heat the central region of the outer heater 60b inserted into the buried groove installed along the peripheral portion to heat the peripheral region of the susceptor body 50. ) Is substantially symmetrical. The heater 60 symmetrically inserted in the susceptor body 50 is converged to the through hole 54 formed at the center of the susceptor body 50 and then through the outer periphery 54a of the through hole. It extends into a susceptor shaft 52 in the form of a tube that is connected to the susceptor body 50. An end of the heater 60 extending into the susceptor shaft 52 may be connected to a line 68 connected to an external power source to heat the susceptor to an appropriate temperature when the substrate is seated.

However, since the heater 60 line extending into the susceptor shaft 52 passes through the lower end of the susceptor shaft 52 in the tubular form and is connected to an external power source, power is supplied to the inside of the susceptor shaft 52. It should be at atmospheric pressure. On the contrary, unless the buried groove 68 for accommodating the heater 60 at the bottom of the susceptor body 50 is sealed in a vacuum state by the aluminum cover 66 and the welding treatment 67, the inside of the process chamber is The welding treatment 67 must be very delicate because it cannot be maintained in vacuum. In this case, since the oxide film is formed at the time of welding in the atmospheric pressure state, the vacuum state cannot be maintained by general welding, and electron beam welding or brazing methods which proceed in the vacuum process chamber are generally used.

However, the above method requires the use of a vacuum process chamber, so if the size of the susceptor installed inside the process chamber is increased, it is not only difficult to manufacture, but also expensive, which increases the manufacturing cost. In addition, if the temperature of the susceptor increases and decreases repeatedly due to the operation of the heater, cracks are generated at the welding site, which makes it difficult to use the susceptor, which causes problems in productivity. have.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to provide a susceptor manufacturing method that can be easily manufactured at low cost and a susceptor manufactured as such.

Another object of the present invention is to provide a method for producing a susceptor which can be used continuously without being damaged even by the rise and fall of temperature, and a susceptor manufactured as such.

1 is a cross-sectional view schematically showing a susceptor installed in a process chamber for a conventional liquid crystal display device;

2A and 2B are cut and cross-sectional views respectively showing cross-sections of susceptors cut along A-A 'and B-B' of FIG. 1 to illustrate a state in which a heater inserted into the susceptor is embedded;

3 is a cross-sectional view schematically showing a process chamber for a liquid crystal display according to the present invention;

4 is a cross-sectional view schematically showing a susceptor according to the present invention;

5 is an enlarged cross-sectional view of portion A of FIG. 4.

<Brief description of symbols for the main parts of the drawings>

110: process chamber 120: upper lead

130 chamber body 140 gas injection unit

170: driving unit 200: susceptor body

210: susceptor shaft 212: susceptor shaft top

214: lower susceptor shaft 220: heater

232, 236: O-ring 234, 238: plate

250: line

For the above purpose, the present invention is formed on the bottom surface of the susceptor body and accommodates the heater to the inside of the buried groove is sealed with a cover, the heater through the through hole formed in the center of the susceptor body to the susceptor shaft In the method of manufacturing a susceptor to extend, the method of manufacturing a susceptor characterized in that the heater extending to the susceptor shaft through the lower end of the susceptor shaft, and then connected to a line connected to an external power source. to provide.

At this time, since the sealing member is installed at the lower end of the susceptor shaft, the inner region of the susceptor shaft can be completely separated from the outer region.

In addition, the present invention is a susceptor including a susceptor body formed with a buried groove and a through-hole sealed by a cover, and a susceptor shaft connected to the susceptor body, the housing is accommodated in the susceptor body through the buried groove And a heater extending along the inner surface of the susceptor shaft through the through hole and penetrating the lower end of the susceptor shaft, wherein a sealing member is coupled to the lower end of the susceptor shaft. Can be.

In this regard, in the present invention, the susceptor body on which the substrate is substantially seated, the susceptor shaft coupled to the bottom of the susceptor body, and the heater embedded therein will be referred to as a susceptor.

DETAILED DESCRIPTION Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. Like reference numerals will be used to designate like elements only.

3 is a cross-sectional view schematically showing a thin film deposition apparatus for a liquid crystal display according to the present invention, wherein a process chamber 110 in which a substantial thin film deposition reaction is performed is divided into an upper lead 120 and a chamber body 130.

A gas dispersing unit 140 including a backing plate and a shower head is formed across the upper end of the process chamber in the upper lid 120. The source gas supplied from an external gas storage unit (not shown) is a gas. After flowing into the gas dispersing unit 140 via the line 180, the gas is sprayed onto the upper surface of the substrate S through a plurality of through holes (not shown) installed in the gas dispersing unit 140. In particular, in the PECVD apparatus, the gas dispersing unit 140 functions as an upper electrode connected to an external RF power source (not shown) to activate a source gas injected onto a substrate in a plasma state.

Meanwhile, a susceptor body 200 spaced a predetermined distance from the gas dispersing unit 140 is installed inside the chamber body 200, and the substrate S is seated on the upper surface thereof. At the center lower end of the susceptor body 200, the susceptor shaft 210 is coupled while penetrating the lower end of the chamber 132 to support the susceptor body 200. As described below, a heater is embedded in the inner surface of the susceptor body 200 to heat the substrate placed on the upper surface of the susceptor to a predetermined temperature so that the source gas may be deposited on the upper surface of the substrate. In this case, when the source gas supplied is excited by plasma treatment, the susceptor body 200 is electrically grounded. That is, the susceptor body 200 functions as a lower electrode corresponding to the gas dispersing unit 140 which functions as the upper electrode while supplying heat of an appropriate temperature to the substrate placed on the upper surface.

The susceptor shaft 210 moves up and down according to the loading / unloading of the substrate to the upper surface of the susceptor body 200 to interlock the susceptor body 200 coupled to the upper end in the vertical direction. The driving unit 170 is installed on the outer periphery of the susceptor body 210 for the lifting and lowering movement and is connected to a driving means (not shown) such as a motor. In other words, the susceptor shaft 210 serves as a shaft for transmitting power transmitted from the outside through the driving unit 170 in addition to supporting the susceptor body 200 to be elevated while maintaining the horizontal.

In addition, the bellows 172 is formed to protrude from the outer periphery 210 of the susceptor shaft between the chamber lower end 132 and the driving unit 170 installed at the lower periphery of the susceptor shaft 210. External impurities are prevented from entering the reaction region inside the process chamber 110 through the lower end 132 of the chamber. Although not shown, the chamber is closed by the O-ring between the lower end of the chamber 132 and the bellows 172 to completely seal the inside of the process chamber from an external region.

On the other hand, the exhaust port 190 is installed around the bottom of the process chamber so that the process gas remaining in the process chamber 110 before and after the deposition process is discharged to the outside.

Referring to FIG. 4 illustrating a coupling state of a susceptor installed in the process chamber 110 and a heater inserted therein according to the present invention, the upper end 212 of the susceptor shaft is formed of the susceptor body 200. After joining with the bottom center, it is sealed through the welding process 216. In each of the region adjacent to the center of the susceptor body bottom surface 200a and the region adjacent to the periphery, buried grooves 222 are formed symmetrically with each other to accommodate the heater 220 therein. When the heater 200 is inserted into the embedding groove 222, the cover 224 made of aluminum is embedded in the bottom surface of the embedding groove 222 from a lower end thereof. In particular, in the present invention, in order to maintain the empty space of the buried groove 222 in a vacuum, it is not necessary to separately weld to the bottom side of the cover 224 of the aluminum material, which will be described later.

The heater 220 accommodated in the buried groove 222 symmetrically formed on the bottom surface of the susceptor body 200 converges to a through hole (not shown) formed in the center of the susceptor body 200, thereby It is coupled to the susceptor body 200 through the outer periphery and extends to the susceptor shaft 210 having a tubular shape inside. In particular, in the present invention, the heater 220 extending into the susceptor shaft 210 is extended to the outside of the susceptor shaft 210 without being connected to a line connected to an external power source therein. In other words, the heater 220 that extends into the susceptor shaft 210 that is hollow inside continues to extend along the inner side of the susceptor shaft 210 installed in the vertical direction, so that the lower end 214 of the susceptor shaft is extended. And is connected to the line outside of the susceptor shaft under atmospheric pressure.

As a result, the inner region of the susceptor shaft 210 connected to the susceptor body 200 in a tubular shape does not need to be in an atmospheric pressure state for connection with a line, so that a buried groove formed in the bottom surface of the susceptor body 200 ( 222 may be in a vacuum state. That is, the inner grooves of the buried groove 222 and the susceptor shaft 210 communicate with each other through a through hole (not shown) formed at the center of the susceptor body 200. In order to completely enclose the buried groove 222 in which the cover 224 made of aluminum is completely sealed with the external space, it is not necessary to use an electron beam welding or brazing method in the process chamber in which the vacuum state is maintained. In other words, since the inner region of the susceptor shaft 210 is also in a vacuum state, instead of welding the bottom of the susceptor body 200 in which the buried grooves 222 are formed outside the process chamber, the buried grooves 222 of the buried grooves 222 are simply formed on the bottom of the susceptor shaft 210. Even if the cover 224 is closed to close the open portion, the region inside the buried groove 222 may maintain a vacuum state.

In this regard, in the present invention, it is preferable to install a sealing member to the lower end 214 of the susceptor shaft so as to completely seal the inner region of the susceptor shaft 210. The sealing member may fill the space between the plates 234 and 238 across the bottom 214 of the susceptor shaft at the bottom, and the space between the plates and the space between the plate and the susceptor shaft bottom 214. -Rings 232 and 236.

FIG. 5 is an enlarged cross-sectional view of part A of FIG. 4 and is provided in a plurality of layers installed across the lower end of the susceptor shaft 214 to close the inner region of the susceptor shaft 210 from the outer region under atmospheric pressure. Plates 234 and 238 in the form are provided below the susceptor shaft bottom 214. In particular, an upper O-ring 232 is interposed between the upper plate 234 and the lower end of the susceptor shaft 214 of the plate, and a lower O− in the space between the upper plate 234 and the lower plate 238. An intervening ring 236 is configured to completely seal the inner region of the susceptor shaft 210 from the outer region, and the plates 234, 238 may be made of ceramic.

At this time, the upper O-ring 232 is in close contact with the upper surface of the upper plate 234 in a state in which a portion is inserted into the insertion groove 216 formed on both sides of the susceptor shaft bottom 214. The lower O-ring 236 is in close contact with the lower surface 214 of the susceptor shaft and the outer surface of the heater 220 passing through the plates 234 and 238. A large number may be inserted into a space between the 234 and the lower plate 238.

In addition, the fixing means penetrating the susceptor shaft lower end 214 from the bottom of the lower plate 238 so that the sealing member installed on the susceptor shaft lower end 214 can be coupled to the susceptor shaft 210. 239 is installed. The fixing means 239 may be, for example, a bolt or a screw.

Through such a configuration, the buried groove 222 formed in the inner region of the susceptor shaft 210 and the susceptor body 200 communicated with the susceptor shaft 210 according to the present invention can be completely blocked from the outer region to maintain a vacuum state. .

In the above description of the preferred embodiment of the present invention, various modifications and changes are possible, and the fact that such modifications and changes belong to the scope of the present invention without departing from the spirit of the present invention to those skilled in the art Obvious facts will become apparent from the appended claims.

Since the inner region of the susceptor according to the present invention, that is, the embedding groove of the susceptor body into which the heater is inserted, and the inner region of the susceptor shaft communicating with it are blocked from the outer region to maintain a vacuum state, the welding is performed in the vacuum process chamber. There is no need to deal with this, which greatly reduces the cost of susceptor manufacturing.

That is, since the heater embedded in the susceptor is not welded, which may cause cracks as the heater is heated or cooled by the operation of an external power source, the vacuum may not be maintained due to breakage of the welded portion. Productivity problems can be eliminated beforehand.

Claims (4)

In the manufacturing method of the susceptor for receiving the heater into the buried groove is formed in the bottom surface of the susceptor body, the cover is closed, and extending the heater to the susceptor shaft through a through hole formed in the center of the susceptor body , After passing through the lower end of the susceptor shaft, the heater extending to the susceptor shaft, characterized in that connected to the line connected to the external power source Method of manufacturing susceptor. The method of claim 1, The manufacturing method of the susceptor, characterized in that the sealing member is installed on the lower end of the susceptor shaft. In a susceptor comprising a susceptor body is formed with a buried groove and a through hole sealed by a cover, and a susceptor shaft connected to the susceptor body, A heater received in the susceptor body through the buried groove and extending along the inner surface of the susceptor shaft through the through hole to penetrate the lower end of the susceptor shaft; Susceptor comprising a. The method of claim 3, wherein The susceptor further comprises a sealing member coupled to the lower end of the susceptor shaft.