KR20040066195A - 화학적 기계적 평탄화 동안 웨이퍼에 하방향 힘을인가하기 위한 방법 및 장치 - Google Patents

화학적 기계적 평탄화 동안 웨이퍼에 하방향 힘을인가하기 위한 방법 및 장치 Download PDF

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Publication number
KR20040066195A
KR20040066195A KR10-2004-7010047A KR20047010047A KR20040066195A KR 20040066195 A KR20040066195 A KR 20040066195A KR 20047010047 A KR20047010047 A KR 20047010047A KR 20040066195 A KR20040066195 A KR 20040066195A
Authority
KR
South Korea
Prior art keywords
spindle
load cell
force
bladder
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR10-2004-7010047A
Other languages
English (en)
Korean (ko)
Inventor
안쏘니드라렐라
수엔팜
앤드류시우
투안에이구엔
토니루옹
Original Assignee
램 리서치 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 램 리서치 코포레이션 filed Critical 램 리서치 코포레이션
Publication of KR20040066195A publication Critical patent/KR20040066195A/ko
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • H10P52/00—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
KR10-2004-7010047A 2001-12-27 2002-12-20 화학적 기계적 평탄화 동안 웨이퍼에 하방향 힘을인가하기 위한 방법 및 장치 Abandoned KR20040066195A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/033,671 2001-12-27
US10/033,671 US6712670B2 (en) 2001-12-27 2001-12-27 Method and apparatus for applying downward force on wafer during CMP
PCT/US2002/040942 WO2003057404A2 (en) 2001-12-27 2002-12-20 Method and apparatus for applying downward force on wafer during cmp

Publications (1)

Publication Number Publication Date
KR20040066195A true KR20040066195A (ko) 2004-07-23

Family

ID=21871758

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2004-7010047A Abandoned KR20040066195A (ko) 2001-12-27 2002-12-20 화학적 기계적 평탄화 동안 웨이퍼에 하방향 힘을인가하기 위한 방법 및 장치

Country Status (8)

Country Link
US (2) US6712670B2 (enExample)
EP (1) EP1467839A4 (enExample)
JP (1) JP2005514780A (enExample)
KR (1) KR20040066195A (enExample)
CN (1) CN1607994A (enExample)
AU (1) AU2002358257A1 (enExample)
TW (1) TWI226083B (enExample)
WO (1) WO2003057404A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2869604B1 (fr) * 2004-04-28 2006-06-23 Saint Gobain Activation d'une surface de verre
EP1628202A1 (de) * 2004-08-19 2006-02-22 Ubs Ag Daten-Ausgabe-System und Daten-Ausgabe-Verfahren mit Daten-Ausgabe-Überwachung
KR100796466B1 (ko) * 2006-08-31 2008-01-21 인하대학교 산학협력단 반도체 웨이퍼 폴리싱 장치의 유동헤드장치
JP5365243B2 (ja) * 2009-02-19 2013-12-11 凸版印刷株式会社 ベルト搬送研磨機
FR2980386B1 (fr) * 2011-09-27 2014-09-12 Visioptimum Internat Dispositif de polissage de lentilles optiques
JP5973883B2 (ja) * 2012-11-15 2016-08-23 株式会社荏原製作所 基板保持装置および研磨装置
US9662761B2 (en) * 2013-12-02 2017-05-30 Ebara Corporation Polishing apparatus
US10350722B2 (en) 2016-02-05 2019-07-16 Toshiba Kikai Kabushiki Kaisha Polishing apparatus
US10363647B2 (en) 2016-02-05 2019-07-30 Toshiba Kikai Kabushiki Kaisha Grinding tool
JP7638815B2 (ja) * 2021-07-21 2025-03-04 株式会社荏原製作所 ブレークイン処理装置、およびブレークイン処理方法
CN117381656B (zh) * 2023-11-27 2025-08-26 北京晶亦精微科技股份有限公司 一种晶圆加载状态检测装置及抛光装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5498199A (en) * 1992-06-15 1996-03-12 Speedfam Corporation Wafer polishing method and apparatus
US5795215A (en) * 1995-06-09 1998-08-18 Applied Materials, Inc. Method and apparatus for using a retaining ring to control the edge effect
GB9512262D0 (en) * 1995-06-16 1995-08-16 Bingham Richard G Tool for computer-controlled machine for optical polishing and figuring
US5653622A (en) * 1995-07-25 1997-08-05 Vlsi Technology, Inc. Chemical mechanical polishing system and method for optimization and control of film removal uniformity
DE29513946U1 (de) * 1995-08-30 1997-01-09 Weber, Georg, 96317 Kronach Vorrichtung zum Andrücken eines umlaufenden Schleifbandes
US5762536A (en) * 1996-04-26 1998-06-09 Lam Research Corporation Sensors for a linear polisher
JPH1071560A (ja) * 1996-08-27 1998-03-17 Speedfam Co Ltd ウエハ加圧装置
US5738568A (en) * 1996-10-04 1998-04-14 International Business Machines Corporation Flexible tilted wafer carrier
JP3763975B2 (ja) * 1998-07-21 2006-04-05 株式会社荏原製作所 トップリング制御装置及びポリッシング装置
US6352466B1 (en) * 1998-08-31 2002-03-05 Micron Technology, Inc. Method and apparatus for wireless transfer of chemical-mechanical planarization measurements
US6241593B1 (en) * 1999-07-09 2001-06-05 Applied Materials, Inc. Carrier head with pressurizable bladder
US6439978B1 (en) * 2000-09-07 2002-08-27 Oliver Design, Inc. Substrate polishing system using roll-to-roll fixed abrasive

Also Published As

Publication number Publication date
EP1467839A4 (en) 2008-06-18
AU2002358257A8 (en) 2003-07-24
TW200305211A (en) 2003-10-16
US20030139115A1 (en) 2003-07-24
JP2005514780A (ja) 2005-05-19
EP1467839A2 (en) 2004-10-20
AU2002358257A1 (en) 2003-07-24
US6712670B2 (en) 2004-03-30
US20040161939A1 (en) 2004-08-19
CN1607994A (zh) 2005-04-20
TWI226083B (en) 2005-01-01
WO2003057404A3 (en) 2003-12-04
WO2003057404A2 (en) 2003-07-17

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Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

PC1902 Submission of document of abandonment before decision of registration

St.27 status event code: N-1-6-B10-B11-nap-PC1902

SUBM Surrender of laid-open application requested
P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000