KR20040048959A - 유기 물질용 안정화제로서의 나프틸트리아진 - Google Patents
유기 물질용 안정화제로서의 나프틸트리아진 Download PDFInfo
- Publication number
- KR20040048959A KR20040048959A KR10-2004-7005678A KR20047005678A KR20040048959A KR 20040048959 A KR20040048959 A KR 20040048959A KR 20047005678 A KR20047005678 A KR 20047005678A KR 20040048959 A KR20040048959 A KR 20040048959A
- Authority
- KR
- South Korea
- Prior art keywords
- alkyl
- phenyl
- formula
- alkenyl
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
- C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
- C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Cosmetics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Anti-Oxidant Or Stabilizer Compositions (AREA)
- Plural Heterocyclic Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1919/01 | 2001-10-18 | ||
| CH19192001 | 2001-10-18 | ||
| PCT/EP2002/011347 WO2003035734A1 (en) | 2001-10-18 | 2002-10-10 | Naphthyltriazines as stabilizers for organic material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20040048959A true KR20040048959A (ko) | 2004-06-10 |
Family
ID=4566785
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR10-2004-7005678A Ceased KR20040048959A (ko) | 2001-10-18 | 2002-10-10 | 유기 물질용 안정화제로서의 나프틸트리아진 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US20050038245A1 (enExample) |
| EP (1) | EP1463774B1 (enExample) |
| JP (1) | JP4563678B2 (enExample) |
| KR (1) | KR20040048959A (enExample) |
| CN (1) | CN1298775C (enExample) |
| WO (1) | WO2003035734A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1308084A1 (en) * | 2002-10-02 | 2003-05-07 | Ciba SC Holding AG | Synergistic UV absorber combination |
| US7122299B2 (en) * | 2002-11-06 | 2006-10-17 | Fuji Photo Film Co., Ltd. | Silver halide photographic light-sensitive material |
| ATE381590T1 (de) * | 2003-05-26 | 2008-01-15 | Ciba Sc Holding Ag | Hochverträglicher und nicht migrierender polymerer uv-absorber |
| CN1795182A (zh) * | 2003-05-27 | 2006-06-28 | 西巴特殊化学品控股有限公司 | 氨基芳基-1,3,5-三嗪及其作为紫外吸收剂的应用 |
| CN102292397B (zh) | 2009-01-19 | 2014-12-10 | 巴斯夫欧洲公司 | 有机黑色颜料及其制备 |
| JP5756877B2 (ja) * | 2014-06-27 | 2015-07-29 | 三菱樹脂アグリドリーム株式会社 | 農業用フィルム |
| US10479882B2 (en) | 2017-09-14 | 2019-11-19 | Teknor Apex Company | Rotational moldable composition comprising polyethylene, and a blend of a pigment and a polyethylene copolymer |
| US12289992B2 (en) | 2018-10-05 | 2025-04-29 | Samsung Display Co., Ltd. | Display apparatus and light absorber included in display apparatus |
| CN112805844B (zh) * | 2018-10-05 | 2025-06-10 | 三星显示有限公司 | 显示设备和包括在该显示设备中的光吸收剂 |
| JP7673384B2 (ja) * | 2020-11-13 | 2025-05-09 | artience株式会社 | 樹脂組成物、および成形体 |
| KR20220121794A (ko) * | 2019-12-24 | 2022-09-01 | 토요잉크Sc홀딩스주식회사 | 수지 조성물, 및 성형체 |
| JP7147827B2 (ja) * | 2019-12-24 | 2022-10-05 | 東洋インキScホールディングス株式会社 | 紫外線吸収剤、組成物、成形体および積層体 |
| CN113299178B (zh) * | 2021-04-26 | 2022-08-26 | 允昌特种印刷(深圳)有限公司 | 点光源识读激光加密纸质防伪标识及其制备方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1551095A (en) | 1925-08-25 | of basel | ||
| US3118887A (en) | 1961-03-06 | 1964-01-21 | American Cyanamid Co | O-hydroxy substituted tris aryl-s-triazines |
| BE639330A (enExample) * | 1962-10-30 | |||
| NL130993C (enExample) * | 1963-02-07 | |||
| CH476748A (de) * | 1966-02-01 | 1969-08-15 | Ciba Geigy | Verfahren zur Herstellung von Di-(hydroxynaphthyl)-triazinen |
| US3551095A (en) * | 1968-01-02 | 1970-12-29 | Nat Lead Co | Production of iron-free carbonated hydrous zirconia |
| CH533853A (de) * | 1970-03-23 | 1973-02-15 | Ciba Geigy Ag | Verwendung von 2'-Hydroxyphenyl-1,3,5-triazinen als Stabilisierungsmittel gegen Ultraviolettstrahlung in photographischem Material |
| AU5907399A (en) * | 1998-09-04 | 2000-03-27 | Ciba Specialty Chemicals Holding Inc. | Process for making 2,4-dihydroxyphenyl and 2-hydroxy-4-alkoxyphenyl substituted triazine compounds |
| TWI259182B (en) * | 1998-11-17 | 2006-08-01 | Cytec Tech Corp | Process for preparing triazines using a combination of Lewis acids with reaction promoters |
-
2002
- 2002-10-10 CN CNB028205901A patent/CN1298775C/zh not_active Expired - Fee Related
- 2002-10-10 WO PCT/EP2002/011347 patent/WO2003035734A1/en not_active Ceased
- 2002-10-10 US US10/492,721 patent/US20050038245A1/en not_active Abandoned
- 2002-10-10 KR KR10-2004-7005678A patent/KR20040048959A/ko not_active Ceased
- 2002-10-10 JP JP2003538246A patent/JP4563678B2/ja not_active Expired - Fee Related
- 2002-10-10 EP EP02801886.9A patent/EP1463774B1/en not_active Expired - Lifetime
-
2005
- 2005-04-04 US US11/098,640 patent/US7087753B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP4563678B2 (ja) | 2010-10-13 |
| US7087753B2 (en) | 2006-08-08 |
| EP1463774A1 (en) | 2004-10-06 |
| WO2003035734A1 (en) | 2003-05-01 |
| EP1463774B1 (en) | 2013-07-31 |
| CN1298775C (zh) | 2007-02-07 |
| CN1571814A (zh) | 2005-01-26 |
| JP2005506384A (ja) | 2005-03-03 |
| US20050038245A1 (en) | 2005-02-17 |
| US20050169859A1 (en) | 2005-08-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100525173B1 (ko) | 히드록시페닐트리아진 | |
| CA2221473C (en) | Hydroxyphenyltriazines | |
| KR100363981B1 (ko) | 잠재적광안정화제 | |
| JP4114176B2 (ja) | 光安定剤としてのビフェニル基で置換されたトリアジン | |
| US6468958B2 (en) | Biphenyl-substituted triazines | |
| KR100457006B1 (ko) | 안정화제혼합물 | |
| KR100448332B1 (ko) | 히드록시페닐트리아진조성물 | |
| AU2002321111B2 (en) | Highly compatible hydroxyphenyltriazine UV-absorbers | |
| JP5497077B2 (ja) | トリスレゾリシニルトリアジン | |
| ES2258035T3 (es) | Mezcla estabilizante. | |
| KR20040048959A (ko) | 유기 물질용 안정화제로서의 나프틸트리아진 | |
| KR20010053123A (ko) | 장애 페놀을 함유하는 트리스아릴-1,3,5-트리아진 자외선흡수제 | |
| US6297377B1 (en) | Benzocycle-substituted triazine and pyrimidine ultraviolet light absorbers | |
| KR20010053056A (ko) | 벤조사이클-치환 트리아진 및 피리미딘 자외선 흡수제 | |
| MXPA99004239A (en) | Trisresorciniltriazi |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20040416 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20071009 Comment text: Request for Examination of Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20090226 Patent event code: PE09021S01D |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20090506 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20090226 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |