KR20030097081A - Equipment for supplying recovery chemical in semiconductor product device - Google Patents
Equipment for supplying recovery chemical in semiconductor product device Download PDFInfo
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- KR20030097081A KR20030097081A KR1020020034238A KR20020034238A KR20030097081A KR 20030097081 A KR20030097081 A KR 20030097081A KR 1020020034238 A KR1020020034238 A KR 1020020034238A KR 20020034238 A KR20020034238 A KR 20020034238A KR 20030097081 A KR20030097081 A KR 20030097081A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
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Abstract
Description
본 발명은 반도체 제조설비의 재활용 화학약품 공급장치에 관한 것으로, 특히 수명이 완료된 화학약품용액을 정화시켜 재활용할 수 있도록 공급하는 반도체 제조설비의 재활용 화학약품 공급장치에 관한 것이다.The present invention relates to a recycling chemical supply apparatus of a semiconductor manufacturing facility, and more particularly, to a recycling chemical supply apparatus of a semiconductor manufacturing facility for supplying to be purified and recycled the chemical solution of the end of life.
일반적으로 반도체 제조공정 내에서 웨이퍼는 사진, 이온확산, 식각, 화학기상증착 및 금속증착 등의 공정을 반복하여 거친 후 반도체장치인 칩으로 제작된다.In general, in a semiconductor manufacturing process, a wafer is repeatedly fabricated through photographic, ion diffusion, etching, chemical vapor deposition, and metal deposition, and then manufactured into a semiconductor device chip.
반도체장치는 이러한 여러 가지 공정 중에 식각공정을 비롯해 웨이퍼를 일정한 화학약품에 담궈 웨이퍼의 표면에 부착된 일정성분을 제거하는 공정들이 있으며, 이러한 공정은 웨트 스테이션(WET-STATION)장비에서 이루어지게 된다. 이 웨트 스테이션장비는 수개의 반도체 제조 공정용 배쓰로 구성되는 것이 보통이다.Among various processes, semiconductor devices include etching processes and processes to remove certain components attached to the surface of the wafer by immersing the wafer in a certain chemical, and such a process is performed in wet station equipment. This wet station equipment typically consists of several semiconductor manufacturing process baths.
이러한 웨트스테이션은 복수의 웨이퍼가 탑재된 웨이퍼 캐리어를 작업위치로 이송하기 위한 로더와 식각 또는 세정이 이루어지는 용액조 및 웨이퍼를 건조시키는 스핀건조기 및 작업이 완료된 웨이퍼 캐리어를 이송시키는 언로더를 구비하고 있다. 특히 용액조는 그 작업의 성격에 따라 화학조와 세정조 및 최종 세정조를 구비하고 있다.The wet station includes a loader for transporting a wafer carrier on which a plurality of wafers are mounted to a work position, a solution bath for etching or cleaning, a spin dryer for drying the wafer, and an unloader for transporting the finished wafer carrier. . In particular, the solution tank is equipped with a chemical tank, a washing tank, and a final washing tank according to the nature of the work.
한편 용액조의 화학약품은 일정시간 이상의 공정을 진행하게 되면 화학약품은 제 기능을 발휘하지 못하기 때문에 주기적으로 용액조의 화학약품을 교체해 주어야한다. 통상적으로 반도체 제조장비에서는 수명이 다한 확학약품을 용액조에서 배출하기 위한 시스템을 구비하고 있다.On the other hand, if the chemicals in the solution tank is processed for a certain time, the chemicals in the solution tank do not function properly, so the chemicals in the solution tank should be replaced periodically. In general, semiconductor manufacturing equipment is equipped with a system for discharging the expiration of expired chemicals from the solution tank.
도 1은 종래의 화학약품 배출시스템의 구조도이다.1 is a structural diagram of a conventional chemical discharge system.
도 1을 참조하면, 스탠바이탱크(1)는 화학약품유입관(10)을 통해 유입되는 화학약품을 담수하고 일정온도로 히팅한다. 웨트스테이션배쓰(2)는 상기 스탠바이탱크(1)로부터 파이프라인(15)을 통해 공급되는 화학약품을 설정된 온도로 가열하여 식각공정이나 세정공정을 진행한다. 보조탱크(12)는 상기 웨트스테이션배쓰(2)로부터 오버플로우되는 화학약품을 담수하고 그 담수된 화학약품을 순환시키기 위해 배출구를 통해 배출한다. 상기 보조탱크(12)에 담겨진 화학약품은 하부에 설치된 배출관(16)을 통해 서큘레이션펌프(9)와 서큘레이션필터(8)를 통해 인라인히터(7)에서 가열되어 웨트스테이션배쓰(2)로 순환된다. 그리고 웨트스테이션배쓰(2)에 담겨진 화학약품은 배출관(17)을 통해 흡출기(5)로 인가된다. 흡출기(5)는 두 개의 인입구와 하나의 배출구를 가지고 있다. 흡출기(5)는 두 개의 인입구 중 하는 배출관(17)으로부터 화학 용액이 공급되고, 다른 하나의 인입구는 다른 배관을 통해 시수(CITY WATER)(11)가 공급되며, 이 두용액이 합쳐져 배출된다. 상기 흡출기(5)의 배출구와 연결된 배관은 버퍼탱크(6)으로 연결된다. 버퍼탱크(6)는 흡출기(5)와 연결된 배관 외에도 시수가 공급되는 배관과 서큘레이터필터(8)에 연결되어 내부의 용액을 배출하기 위한 배관이 연결되어 있다.Referring to Figure 1, the standby tank (1) is fresh water and the chemical flowing through the chemical inlet pipe 10 and heated to a certain temperature. The wet station bath 2 heats the chemical supplied from the standby tank 1 through the pipeline 15 to a predetermined temperature to perform an etching process or a cleaning process. The auxiliary tank 12 drains the chemicals overflowing from the wet station bath 2 and discharges through the outlet to circulate the fresh chemicals. The chemical contained in the auxiliary tank 12 is heated in the inline heater 7 through the circulation pump 9 and the circulation filter 8 through the discharge pipe 16 installed in the lower portion to the wet station bath 2. Circulated. And the chemical contained in the wet station bath (2) is applied to the aspirator (5) through the discharge pipe (17). The aspirator 5 has two inlets and one outlet. The aspirator 5 is supplied with a chemical solution from the discharge pipe 17 of the two inlets, and the other inlet is supplied with the city water 11 through another pipe, and the two solutions are combined and discharged. . The pipe connected to the outlet of the drawer (5) is connected to the buffer tank (6). The buffer tank 6 is connected to the pipe to which the water is supplied and to the circulator filter 8 in addition to the pipe connected to the aspirator 5 to connect the pipe for discharging the solution therein.
웨트스테이션배쓰(2)에서 식각공정이나 세정공정이 진행된 후 고온의 화학약품용액은 배출관(17)을 통해 흡출기(5)로 배출되어 흡출기(5)에서 시수(CITY WATER)와 희석됨에 의해 냉각된다. 흡출기(5)의 배출구를 통하여 배출되는 화학약품용액은 버퍼탱크(6)에 담수되며, 상기 버퍼탱크(6)에 담수된 화학약품용액은 액시드 드레인라인(13)을 통해 배출된다. 여기서 설명하지 않은 제1 및 제2 드레인밸브(3, 4)는 상기 배출관(17)을 통해 배출되는 화학약품용액을 흡출기(5)로 배출을 단속하기 위한 밸브이다.After the etching process or the cleaning process is performed in the wet station bath (2), the high temperature chemical solution is discharged through the discharge pipe (17) to the aspirator (5), and is diluted with CITY WATER in the aspirator (5). Is cooled. The chemical solution discharged through the outlet of the aspirator (5) is fresh water in the buffer tank (6), the chemical solution fresh water in the buffer tank (6) is discharged through the acid drain line (13). The first and second drain valves 3 and 4, which are not described herein, are valves for controlling the discharge of the chemical solution discharged through the discharge pipe 17 to the aspirator 5.
상기와 같은 종래의 도 1은 종래의 화학약품 배출시스템는 화학약품용액이 제한된 수명시간이 경과되면 제1 및 제2 드레인밸브(3, 4)를 개방시켜 웨트스테이션배쓰(2)에 담겨져 있는 화학약품용액을 흡출기(50)를 통해 버퍼탱크(6)로 배출하여 주기적으로 화학약품용액을 방출 시 생산성이 떨어지고 환경오염에 영향을 주는 문제가 있다.As shown in FIG. 1, the conventional chemical discharging system of the conventional chemical solution is opened in the wet station bath 2 by opening the first and second drain valves 3 and 4 when the chemical solution has a limited life time. By discharging the solution to the buffer tank (6) through the aspirator (50) there is a problem in that the productivity is lowered when the chemical solution is periodically released and affects environmental pollution.
따라서 본 발명의 목적은 상기와 같은 문제를 해결하기 위해 제한된 수명시간이 경과된 화학약품 용액을 재활용할 수 있도록 복원하는 반도체 제조장비의 화학약품 재활용공급장치를 제공함에 있다.Accordingly, an object of the present invention is to provide a chemical recycling supply device for semiconductor manufacturing equipment for restoring a chemical solution that has passed a limited life time to solve the above problems.
본 발명의 다른 목적은 공정진행 시 사용되는 화학약품용액을 재활용하여 생산성을 향상시킬 수 있으며, 환경오염을 줄일 수 있는 반도체 제조장비의 화학약품 재활용 공급장치를 제공함에 있다.Another object of the present invention to improve the productivity by recycling the chemical solution used in the process, and to provide a chemical recycling supply apparatus for semiconductor manufacturing equipment that can reduce environmental pollution.
도 1은 종래의 화학약품 배출시스템의 구조도1 is a structural diagram of a conventional chemical discharge system
도 2는 본 발명의 실시 예에 따른 반도체 제조장비의 화학약품 재활용 공급장치의 구성도2 is a block diagram of a chemical recycling supply apparatus of the semiconductor manufacturing equipment according to an embodiment of the present invention
* 도면의 주요부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings
1: 스탠바이 2: 웨트스테이션배쓰1: standby 2: wet station bath
3,4: 드레인밸브 5: 흡출기3, 4: drain valve 5: aspirator
6: 버퍼탱크 7: 인라인히터6: buffer tank 7: in-line heater
8: 서귤레이션필터 9: 서큐레이션펌프8: Regulation filter 9: Circulation pump
10: 화학약품유입관 11: 시수10: Chemical Inflow Hall 11: Sisu
12: 보조탱크 13: 액시드레인12: auxiliary tank 13: axide
14, 16, 17: 배출관 20: 필터14, 16, 17: discharge pipe 20: filter
22: 리커버리배쓰 24: 리액션배쓰22: Recovery Bath 24: Reaction Bath
26: 공급스탠바이배쓰 28: 펌프26: supply stand-by bath 28: pump
상기 목적을 달성하기 위한 본 발명의 반도체 제조설비의 재활용 화학약품공급장치는, 상기 웨트스테이션배쓰로 순환 공급되는 화학약품용액을 필터링하여 불순물을 제거하는 필터와, 상기 필터로부터 불순이 제거된 화학약품용액을 담수하는 리커버리배쓰와, 상기 리커버리배쓰로부터 담수된 화학약품용액을 받아 히터가열방식으로 화학약품용액을 H2O로 반응하도록 하여 스팀배기라인으로 스팀을 배기시켜 화학약품용액을 정화하는 리액션배쓰와, 상기 리액션배쓰로부터 정화된 화학약품용액을 공급되는 쿨링워터에 냉각을 시키는 공급스탠바이배쓰와, 상기 공급스탠바이배쓰로부터 냉각된 재활용 화학약품용액을 펌핑하여 화학약품유입관을 통해 공급하는 펌프로 구성함을 특징으로 한다.Recycling chemical supply apparatus of the semiconductor manufacturing equipment of the present invention for achieving the above object, a filter for removing impurities by filtering the chemical solution circulated to the wet station bath, and chemicals from which impurities are removed from the filter A recovery bath for freshening the solution, a reaction bath for receiving the fresh chemical solution from the recovery bath, and reacting the chemical solution with H 2 O by a heater heating method to exhaust steam to a steam exhaust line to purify the chemical solution; A supply stand-by bath for cooling the cooling water supplied with the chemical solution purified from the reaction bath, and a pump for pumping the recycled chemical solution cooled from the supply stand-by bath to supply the chemical through the chemical inlet pipe. It features.
이하 본 발명에 따른 바람직한 실시 예를 첨부한 도면을 참조하여 상세히 설명한다. 그리고 본 발명을 설명함에 있어서, 관련된 공지 기능 혹은 구성에 대한 구체적인 설명이 본 발명의 요지를 불필요하게 흐릴 수 있다고 판단되는 경우 그 상세한 설명을 생략한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the following description of the present invention, if it is determined that a detailed description of a related known function or configuration may unnecessarily obscure the subject matter of the present invention, the detailed description thereof will be omitted.
도 2는 본 발명의 실시 예에 따른 반도체 제조장비의 화학약품 재활용 공급장치의 구성도이다.2 is a block diagram of a chemical recycling supply apparatus of a semiconductor manufacturing apparatus according to an embodiment of the present invention.
화학약품유입관(10)을 통해 유입되는 화학약품을 담수하고 일정온도로 히팅하는 스탠바이탱크(1)와, 상기 스탠바이탱크(1)로부터 파이프라인(15)을 통해 공급되는 화학약품을 설정된 온도로 가열하여 식각공정이나 세정공정을 진행하는 웨트스테이션배쓰(2)와, 상기 웨트스테이션배쓰(2)로부터 오버플로우되는 화학약품을 담수하고 그 담수된 화학약품을 순환시키기 위해 배출구를 통해 배출하는 보조탱크(12)와, 상기 보조탱크(12)의 하부에 설치된 배출관(16)을 상기보조탱크(12)에 담겨진 화학약품을 배출하도록 펌핑하는 서큘레이션펌프(9)와, 상기 서큘레이션펌프(9)를 통해 펌핑되는 화학약품용액을 필터링하여 불순물을 제거하는 서큘레이션필터(8)와, 상기 서큘레이션필터(8)로부터 불순물이 제거된 화학약품용액을 설정된 온도로 가열하는 인라인히터(7)와, 상기 인라인히터(7)로부터 가열된 화학약품용액을 필터링하여 불순물을 제거하는 필터(20)와, 상기 필터(20)로부터 불순이 제거된 화학약품용액을 담수하는 리커버리배쓰(22)와, 상기 리커버리배쓰(22)로부터 담수된 화학약품용액을 받아 히터가열방식으로 화학약품용액을 H2O로 반응하도록 하여 스팀배기라인(30)으로 스팀을 배기시켜 화학약품용액을 정화하는 리액션배쓰(24)와, 상기 리액션배쓰(24)로부터 정화된 화학약품용액을 공급되는 쿨링워터에 냉각을 시키는 공급스탠바이배쓰(26)와, 상기 공급스탠바이배쓰(26)로부터 냉각된 재활용 화학약품용액을 펌핑하여 화학약품유입관(10)을 통해 스탠바이배쓰(1)로 공급하는 펌프(28)로 구성되어 있다.Standby tank (1) for desalination of chemicals flowing through the chemical inlet pipe (10) and heating to a predetermined temperature, and chemicals supplied from the standby tank (1) through the pipeline (15) to a set temperature Wet station bath (2) which is heated and performs etching process or cleaning process, and auxiliary tank which drains chemicals overflowing from the wet station bath (2) and discharges them through the outlet to circulate the fresh water chemicals. (12), a circulation pump (9) for pumping the discharge pipe (16) installed in the lower portion of the auxiliary tank 12 to discharge the chemical contained in the auxiliary tank (12), and the circulation pump (9) Circulation filter (8) for removing impurities by filtering the chemical solution pumped through, and in-line heating the chemical solution from which impurities are removed from the circulation filter (8) to a set temperature (7), a filter 20 for removing impurities by filtering the chemical solution heated from the inline heater 7, and a recovery bath 22 for freshening the chemical solution from which impurities are removed from the filter 20. And a reaction bath that receives the fresh chemical solution from the recovery bath 22 and reacts the chemical solution with H 2 O in a heater heating method to exhaust steam to the steam exhaust line 30 to purify the chemical solution. 24), a supply stand-by bath 26 for cooling the cooling water supplied with the chemical solution purified from the reaction bath 24, and a recycled chemical solution cooled from the supply stand-by bath 26 by pumping It consists of a pump 28 which supplies to the standby bath (1) through the chemical inlet pipe (10).
상술한 도 2를 참조하여 본 발명의 바람직한 실시 예의 화학약품을 재활용하여 공급하는 동작을 상세히 설명한다.Referring to Figure 2 described above will be described in detail the operation of recycling the chemical supply of the preferred embodiment of the present invention.
스탠바이탱크(1)는 화학약품유입관(10)을 통해 유입되는 화학약품을 담수하고 일정온도로 히팅한다. 웨트스테이션배쓰(2)는 상기 스탠바이탱크(1)로부터 파이프라인(15)을 통해 공급되는 화학약품을 설정된 온도로 가열하여 식각공정이나 세정공정을 진행한다. 보조탱크(12)는 상기 웨트스테이션배쓰(2)로부터 오버플로우되는 화학약품을 담수하고 그 담수된 화학약품을 순환시키기 위해 배출구를 통해 배출한다. 상기 보조탱크(12)에 담겨진 화학약품은 보조탱크(12)의 하부에 설치된배출관(16)을 통해 서큘레이션펌프(9)와 서큘레이션필터(8)를 통해 인라인히터(7)에서 가열되어 웨트스테이션배쓰(2)로 순환된다.Standby tank (1) is a fresh water flowing through the chemical inlet pipe 10 and heated to a certain temperature. The wet station bath 2 heats the chemical supplied from the standby tank 1 through the pipeline 15 to a predetermined temperature to perform an etching process or a cleaning process. The auxiliary tank 12 drains the chemicals overflowing from the wet station bath 2 and discharges through the outlet to circulate the fresh chemicals. The chemical contained in the auxiliary tank 12 is heated in the inline heater 7 through the circulation pump 9 and the circulation filter 8 through the discharge pipe 16 installed in the lower portion of the auxiliary tank 12 and wetted. Circulated to the station bath (2).
이렇게 화학약품용액이 순환되어 공정이 진행된 후 제한된 수명시간이 경과되면 인라인히터(7)를 통해 가열된 화학약품용액은 필터(20)를 통해 불순물이 필터링된 후 리커버리배쓰(22)로 공급되어 담수된다. 상기 리커버리배쓰(22)에 담수된 화학약품용액은 리액션배쓰(24)로 공급되며, 리액션배쓰(24)에서는 히터가열방식으로 화학약품용액을 H2O로 반응하도록 하여 스팀배기라인(30)으로 스팀을 배기시키면 화학약품용액이 정화된다. 상기 리액션배쓰(24)에서 정화된 화학약품용액은 공급스탠바이배쓰(26)로 인가되며, 공급스탠바이배쓰(26)에서는 공급되는 쿨링워터에 정화된 화학약품용액을 냉각시킨다. 상기 공급스탠바이배쓰(26)의 외부에는 쿨링워터를 담고있는 쿨링부가 감싸도록 형성하며, 상기 쿨링부터에는 쿨링워터 입력라인과 쿨링워터 출력라인이 구비되어 있다. 상기 공급스탠바이배쓰(26)에서 냉각된 재활용 화학약품용액은 펌프(28)에 의해 펌핑되어 화학약품유입관(10)을 통해 스탠바이배쓰(1)로 공급된다. 이렇게 하여 수명이 완료된 화학약품용액을 정화시켜 재활용함으로써, 주기적으로 화학약품 용액을 방출시키지 않아도 되므로 생산성을 향상시킬 수 있고, 또한 환경오염을 줄일 수 있다.When the chemical solution is circulated and the process progresses and the limited life time elapses, the chemical solution heated through the inline heater 7 is filtered through the filter 20 and then supplied to the recovery bath 22 to provide fresh water. do. The chemical solution desalted in the recovery bath 22 is supplied to the reaction bath 24, and in the reaction bath 24, the chemical solution is reacted with H 2 O by a heater heating method to steam to the steam exhaust line 30. Exhaust purifies the chemical solution. The chemical solution purified by the reaction bath 24 is applied to the supply stand-by bath 26, and the supply stand-by bath 26 cools the purified chemical solution to the cooling water supplied. The outside of the supply stand-by bath 26 is formed to surround the cooling portion containing the cooling water, and the cooling water input line and the cooling water output line are provided from the cooling. The recycled chemical solution cooled in the supply standby bath 26 is pumped by the pump 28 and supplied to the standby bath 1 through the chemical inlet pipe 10. In this way, by purifying and recycling the chemical solution that has reached the end of its life, it is not necessary to release the chemical solution periodically, thereby improving productivity and reducing environmental pollution.
상술한 바와 같이 본 발명은 수명이 완료된 화학약품용액을 정화시켜 재활용하여 주기적으로 화학약품 용액을 방출시키지 않아도 되므로 생산성을 향상시킬 수있고, 또한 환경오염을 줄일 수 있다.As described above, the present invention does not need to periodically release the chemical solution by purifying and recycling the finished chemical solution, thereby improving productivity and reducing environmental pollution.
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