KR20030076225A - 규소 함유 아세탈 보호된 중합체 및 이의 포토레지스트조성물 - Google Patents

규소 함유 아세탈 보호된 중합체 및 이의 포토레지스트조성물 Download PDF

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Publication number
KR20030076225A
KR20030076225A KR1020027016483A KR20027016483A KR20030076225A KR 20030076225 A KR20030076225 A KR 20030076225A KR 1020027016483 A KR1020027016483 A KR 1020027016483A KR 20027016483 A KR20027016483 A KR 20027016483A KR 20030076225 A KR20030076225 A KR 20030076225A
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KR
South Korea
Prior art keywords
polymer
hydroxystyrene
silicon
formula
acetal
Prior art date
Application number
KR1020027016483A
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English (en)
Korean (ko)
Inventor
앤드류 죠셉 블라케니
샌제이 말릭
스테파니 디록커
존 페리
제퍼리 아이젤
Original Assignee
아치 스페셜티 케미칼즈, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 아치 스페셜티 케미칼즈, 인코포레이티드 filed Critical 아치 스페셜티 케미칼즈, 인코포레이티드
Publication of KR20030076225A publication Critical patent/KR20030076225A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42—Block-or graft-polymers containing polysiloxane sequences
    • C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020027016483A 2001-04-04 2002-04-04 규소 함유 아세탈 보호된 중합체 및 이의 포토레지스트조성물 KR20030076225A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US28129501P 2001-04-04 2001-04-04
US60/281,295 2001-04-04

Publications (1)

Publication Number Publication Date
KR20030076225A true KR20030076225A (ko) 2003-09-26

Family

ID=23076695

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020027016483A KR20030076225A (ko) 2001-04-04 2002-04-04 규소 함유 아세탈 보호된 중합체 및 이의 포토레지스트조성물

Country Status (5)

Country Link
US (1) US6783917B2 (US06783917-20040831-C00026.png)
EP (1) EP1299773A4 (US06783917-20040831-C00026.png)
JP (1) JP2004519734A (US06783917-20040831-C00026.png)
KR (1) KR20030076225A (US06783917-20040831-C00026.png)
WO (1) WO2002082184A1 (US06783917-20040831-C00026.png)

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KR20150092397A (ko) * 2014-02-03 2015-08-13 삼성디스플레이 주식회사 블록 공중합체 및 이를 사용한 패턴 형성 방법

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150092397A (ko) * 2014-02-03 2015-08-13 삼성디스플레이 주식회사 블록 공중합체 및 이를 사용한 패턴 형성 방법

Also Published As

Publication number Publication date
US6783917B2 (en) 2004-08-31
EP1299773A1 (en) 2003-04-09
EP1299773A4 (en) 2006-06-21
US20030065101A1 (en) 2003-04-03
WO2002082184A1 (en) 2002-10-17
JP2004519734A (ja) 2004-07-02

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