KR20030038760A - 코팅된 재료의 어레이 생성 시스템 및 코팅된 재료의어레이 생성 방법 - Google Patents
코팅된 재료의 어레이 생성 시스템 및 코팅된 재료의어레이 생성 방법 Download PDFInfo
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- KR20030038760A KR20030038760A KR10-2003-7004133A KR20037004133A KR20030038760A KR 20030038760 A KR20030038760 A KR 20030038760A KR 20037004133 A KR20037004133 A KR 20037004133A KR 20030038760 A KR20030038760 A KR 20030038760A
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- C40B40/00—Libraries per se, e.g. arrays, mixtures
- C40B40/04—Libraries containing only organic compounds
- C40B40/14—Libraries containing macromolecular compounds and not covered by groups C40B40/06 - C40B40/12
-
- C—CHEMISTRY; METALLURGY
- C40—COMBINATORIAL TECHNOLOGY
- C40B—COMBINATORIAL CHEMISTRY; LIBRARIES, e.g. CHEMICAL LIBRARIES
- C40B40/00—Libraries per se, e.g. arrays, mixtures
- C40B40/18—Libraries containing only inorganic compounds or inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C40—COMBINATORIAL TECHNOLOGY
- C40B—COMBINATORIAL CHEMISTRY; LIBRARIES, e.g. CHEMICAL LIBRARIES
- C40B60/00—Apparatus specially adapted for use in combinatorial chemistry or with libraries
- C40B60/14—Apparatus specially adapted for use in combinatorial chemistry or with libraries for creating libraries
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Nanotechnology (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Physical Vapour Deposition (AREA)
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
- Spray Control Apparatus (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US66832300A | 2000-09-22 | 2000-09-22 | |
| US09/668,323 | 2000-09-22 | ||
| PCT/US2001/019159 WO2002024321A1 (fr) | 2000-09-22 | 2001-06-14 | Systemes et procedes de revetements combinatoires |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20030038760A true KR20030038760A (ko) | 2003-05-16 |
Family
ID=24681881
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR10-2003-7004133A KR20030038760A (ko) | 2000-09-22 | 2001-06-14 | 코팅된 재료의 어레이 생성 시스템 및 코팅된 재료의어레이 생성 방법 |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP1328341A1 (fr) |
| JP (1) | JP2004508927A (fr) |
| KR (1) | KR20030038760A (fr) |
| CN (1) | CN1461234A (fr) |
| AU (1) | AU2001266929A1 (fr) |
| BR (1) | BR0114076A (fr) |
| CA (1) | CA2421520A1 (fr) |
| MX (1) | MXPA03002455A (fr) |
| RU (1) | RU2270881C2 (fr) |
| WO (1) | WO2002024321A1 (fr) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7491677B2 (en) * | 1999-01-15 | 2009-02-17 | Basf Catalysts Llc | Combinatorial synthesis |
| US8944002B2 (en) | 2004-01-14 | 2015-02-03 | Honda Motor Co., Ltd. | High throughput physical vapor deposition system for material combinatorial studies |
| US7857946B2 (en) | 2007-04-26 | 2010-12-28 | Canon Anelva Corporation | Sputtering film forming method, electronic device manufacturing method, and sputtering system |
| EP2002886A1 (fr) * | 2007-05-08 | 2008-12-17 | HTE Aktiengesellschaft The High Throughput Experimentation Company | Plateforme de revêtement et procédé pour la préparation de revêtements minces |
| US8907445B2 (en) | 2011-01-19 | 2014-12-09 | Sharp Kabushiki Kaisha | Substrate to which film is formed, organic EL display device, and vapor deposition method |
| JP6077906B2 (ja) * | 2013-03-28 | 2017-02-08 | 株式会社アツミテック | スパッタリング装置 |
| GB2529608B (en) * | 2014-06-10 | 2018-07-18 | Monitor Coatings Ltd | A method of coating a sheet of steel |
| CN105618020A (zh) * | 2014-10-28 | 2016-06-01 | 睿泽企业股份有限公司 | 光催化剂基材的制作方法及制作设备 |
| US10644239B2 (en) | 2014-11-17 | 2020-05-05 | Emagin Corporation | High precision, high resolution collimating shadow mask and method for fabricating a micro-display |
| CN104762590B (zh) * | 2015-03-20 | 2017-05-10 | 京东方科技集团股份有限公司 | 蒸镀掩膜板 |
| US10072328B2 (en) | 2016-05-24 | 2018-09-11 | Emagin Corporation | High-precision shadow-mask-deposition system and method therefor |
| US10386731B2 (en) * | 2016-05-24 | 2019-08-20 | Emagin Corporation | Shadow-mask-deposition system and method therefor |
| TWI633197B (zh) * | 2016-05-24 | 2018-08-21 | 美商伊麥傑公司 | 高精準度蔽蔭遮罩沉積系統及其方法 |
| RU2669259C2 (ru) * | 2016-12-09 | 2018-10-09 | Федеральное государственное автономное образовательное учреждение высшего образования "Уральский федеральный университет имени первого Президента России Б.Н. Ельцина" | Устройство для получения пленок |
| JP7134095B2 (ja) * | 2017-05-17 | 2022-09-09 | イマジン・コーポレイション | 高精度シャドーマスク堆積システム及びその方法 |
| WO2019070665A1 (fr) * | 2017-10-04 | 2019-04-11 | Ih Ip Holdings Limited | Motifs de dépôt dans la fabrication de réactifs |
| CN113275149B (zh) * | 2021-06-01 | 2022-01-18 | 丰县通亚电子科技有限公司 | 环保型电动车喷漆装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6045671A (en) * | 1994-10-18 | 2000-04-04 | Symyx Technologies, Inc. | Systems and methods for the combinatorial synthesis of novel materials |
| US6364956B1 (en) * | 1999-01-26 | 2002-04-02 | Symyx Technologies, Inc. | Programmable flux gradient apparatus for co-deposition of materials onto a substrate |
| US6911129B1 (en) * | 2000-05-08 | 2005-06-28 | Intematix Corporation | Combinatorial synthesis of material chips |
-
2001
- 2001-06-14 MX MXPA03002455A patent/MXPA03002455A/es unknown
- 2001-06-14 AU AU2001266929A patent/AU2001266929A1/en not_active Abandoned
- 2001-06-14 WO PCT/US2001/019159 patent/WO2002024321A1/fr active Application Filing
- 2001-06-14 CN CN01815959A patent/CN1461234A/zh active Pending
- 2001-06-14 JP JP2002528383A patent/JP2004508927A/ja not_active Withdrawn
- 2001-06-14 EP EP01944524A patent/EP1328341A1/fr not_active Withdrawn
- 2001-06-14 BR BR0114076-0A patent/BR0114076A/pt not_active IP Right Cessation
- 2001-06-14 KR KR10-2003-7004133A patent/KR20030038760A/ko not_active Application Discontinuation
- 2001-06-14 CA CA002421520A patent/CA2421520A1/fr not_active Abandoned
- 2001-06-14 RU RU2003111467/02A patent/RU2270881C2/ru not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CA2421520A1 (fr) | 2002-03-28 |
| WO2002024321A1 (fr) | 2002-03-28 |
| AU2001266929A1 (en) | 2002-04-02 |
| RU2270881C2 (ru) | 2006-02-27 |
| BR0114076A (pt) | 2003-07-29 |
| JP2004508927A (ja) | 2004-03-25 |
| CN1461234A (zh) | 2003-12-10 |
| MXPA03002455A (es) | 2003-06-19 |
| EP1328341A1 (fr) | 2003-07-23 |
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| Date | Code | Title | Description |
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| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E601 | Decision to refuse application |