KR20030003516A - Turning unit For Wafer - Google Patents

Turning unit For Wafer Download PDF

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Publication number
KR20030003516A
KR20030003516A KR1020010039410A KR20010039410A KR20030003516A KR 20030003516 A KR20030003516 A KR 20030003516A KR 1020010039410 A KR1020010039410 A KR 1020010039410A KR 20010039410 A KR20010039410 A KR 20010039410A KR 20030003516 A KR20030003516 A KR 20030003516A
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KR
South Korea
Prior art keywords
shaft
substrate
base plate
shower
roller
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KR1020010039410A
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Korean (ko)
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KR100438667B1 (en
Inventor
황우석
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주식회사 케이씨텍
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Priority to KR10-2001-0039410A priority Critical patent/KR100438667B1/en
Publication of KR20030003516A publication Critical patent/KR20030003516A/en
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Publication of KR100438667B1 publication Critical patent/KR100438667B1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting substrates others than wafers, e.g. chips

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE: An apparatus for changing a direction of a substrate having a shower function is provided to perform a shower function by installing a shower portion at an upper side of a processing bath. CONSTITUTION: A substrate direction change apparatus is installed at an intersection part between transfer conveyers. A processing bath is connected with the transfer conveyer. A center portion of a bottom plate(41) of the processing bath is projected to an upper side by an incline plane(43) and a stone plate(42). A drain pipe(44) is installed at a bottom plate(41) of the processing bath. A base plate(11) is installed at a rotary shaft(31) of an index driver(30) by using a support plate(32). A couple of support portions(12) are installed on the base plate(11). A couple of driving rollers(17) is inserted into a driving shaft(16). A driving motor(15) is connected with one side of the driving shaft(16). A driving helical gear(18) is installed at the other side of the driving shaft(16). A transfer shaft is installed at both sides of the driving shaft(16). Each transfer roller is installed at each transfer shaft. A matching helical gear is fixed to each transfer shaft. A helical gear screw(20) is installed at lower sides of the driving helical gear(18) and the matching helical gear. A variable guide is installed at each power side of the driving roller(17) and the transfer roller. A width change cylinder(22) is fixed on a lower side of the base plate(11) by using a bracket. An operating bracket is moved in a straight line by a guide portion(24).

Description

샤워기능이 구비된 기판 방향전환장치{Turning unit For Wafer}Substrate redirection device with shower function {Turning unit For Wafer}

본 발명은 반도체 웨이퍼와 같은 기판, 포토마스크, 액정디스플레이와 같은 유리기판, 광 디스크용 기판(이하 "기판"이라 칭함)등을 세정시킨 후에 세정된 기판을 이송시킬 때에 비 건조상태를 유지시키면서 모서리에서 방향을 전환시켜주도록 하는데 사용되어지는 샤워기능이 구비된 기판방향전환장치에 관한 것이다.According to the present invention, after cleaning a substrate such as a semiconductor wafer, a photomask, a glass substrate such as a liquid crystal display, a substrate for an optical disk (hereinafter referred to as a "substrate"), and the like, the edges of the substrate are maintained while being kept dry. It relates to a substrate redirection device with a shower function that is used to change the direction in the.

이를 좀 더 상세히 설명하면, 통상의 유입 측의 이송컨베이어에 의해 이송되어지는 기판을 베이스플레이트에 설치되 별도로 작동되어지는 방향전환컨베이어에 유입시켜 주고, 베이스플레이트를 인덱스테이블에 의해 직각으로 방향을 전환시켜 준 후에 베이스플레이트의 방향전환컨베이어를 역으로 작동시켜 유입 측의 컨베이어와 직각으로 구비된 배출 측의 컨베이어로 전이 배출시켜 줄 수 있도록 하되, 상기와 같이 유입된 기판을 방향 전환시켜 배출시킬 때에 상측에서 샤워액을 분사시켜 기판이 건조되지 않은 상태를 지속적으로 유지되면서 이송되어지도록 된 샤워기능이 구비된 기판방향전환장치를 제공하려는 것이다.To explain this in more detail, the substrate to be conveyed by the conveying conveyor on the ordinary inlet side is installed on the base plate and flowed into a separately operated turning conveyor, and the base plate is turned at right angles by the index table. After turning the direction shifting conveyor of the base plate reversely, it can be discharged to the discharge side conveyor provided at right angles with the conveyor on the inlet side. In order to provide a substrate turning apparatus having a shower function to be transported while maintaining a state that the substrate is not dried by spraying the shower in the.

통상의 이송컨베이어(롤러컨베이어)를 이용하여 기판을 이송시키는 과정에서 종래에는 기판을 모서리부분에서 방향 전환시켜주고자 할 때에 통상의 이송컨베이어를 직각상태로 연결하여 사용하였었다. 즉, 일측의 이송컨베이어의 말단에 별도의 이송컨베이어를 직각으로 교차되게 설치하여, 일측의 이송컨베이어에 의해 기판을 이송시키고, 이송되어지는 기판이 타측의 이송컨베이어로 전이되어 있으며, 다른 이송컨베이어로 전이된 기판은 그 이송컨베이어에 의해 소정의 장소로 이송시켜 주었었다.In the process of transferring a substrate using a conventional conveying conveyor (roller conveyor), when the conventional substrate is to be turned at the corner portion, the conventional conveying conveyor was used at a right angle. That is, by installing a separate transfer conveyor at the end of the transfer conveyor on one side to cross at a right angle, transfer the substrate by the transfer conveyor on one side, the substrate to be transferred is transferred to the transfer conveyor on the other side, to another transfer conveyor The transferred substrate was transferred to a predetermined place by the transfer conveyor.

그러나, 이와 같은 종래의 방향을 전환시켜주는 방법은 일측의 이송컨베이어에서 타측의 이송컨베이어로 전이될 때에 타측의 이송컨베이어와 충돌하여 기판이 손상되는 현상이 발생하게 되고 그로 인하여 품질을 떨어뜨리게 되며, 방향을 전환 시켜 줄 때에 샤워를 실시할 수 없도록 되어 있으므로 젖어있는 기판이 건조되어 기판의 표면에 워터마크가 발생하거나 다른 파티클(PARTICLE)이 부착하여 기판의 품질을 떨어뜨리게 되는 문제도 발생하였다. 또한, 기판이 방향전환 될 때에 기판의 진행방향이 종래와 일치하지 않고 바뀌어지거나 비스듬하게 이송되어 차후에 이를 바로 잡아주어야 하는 폐단도 있었고, 종류와 크기가 다른 기판을 용이하게 방향 전환시켜 이송시킬 수 없는 문제가 있었다.However, such a method of changing the conventional direction is a phenomenon that the substrate is damaged by colliding with the transfer conveyor of the other side when the transfer conveyor from one side of the transfer conveyor to the other side of the conveying conveyor occurs, thereby reducing the quality, Since the shower cannot be performed when the direction is changed, the wet substrate is dried and watermarks are generated on the surface of the substrate, or other particles (PARTICLE) adhere to the quality of the substrate. In addition, when the substrate is changed direction, the traveling direction of the substrate does not coincide with the conventional one, and there is a closed end to be corrected later, and it is not possible to easily change the direction and transfer the substrate of different types and sizes. There was a problem.

본 발명은 상기와 같은 문제를 해소할 수 있도록 된 샤워기능이 구비된 기판방향전환장치를 제공하려는 것이다.The present invention is to provide a substrate direction switching device having a shower function that can solve the above problems.

본 발명은 이송컨베이어가 서로 교차되는 모서리에 처리조를 설치하되 처리조의 상측부에는 샤워파이프를 설치하여 샤워액을 하측으로 분사시켜 줄 수 있도록 하고, 처리조의 중앙 하측에 인덱스드라이버를 설치하되 처리조 밑판의 상측으로 노출되는 회전축에 베이스플레이트를 고정시켜 베이스플레이트를 인덱스드라이버에 의해 90도 각도씩 반복적으로 회전 및 복귀시킬 수 있도록 하며, 베이스플레이트에는 이송컨베이어장치를 설치하여 일 측의 컨베이어로부터 공급되는 기판을 유입시켜 타 측의 이송컨베이어로 배출시켜 줄 수 있도록 된 샤워기능이 구비된 기판방향전환장치를 제공하려는 것이다.The present invention is to install the treatment tank at the corner of the transfer conveyor intersecting each other but to install the shower pipe in the upper portion of the treatment tank to spray the shower fluid to the lower side, install the index driver in the lower center of the treatment tank but The base plate is fixed to the rotating shaft exposed to the upper side of the base plate so that the base plate can be repeatedly rotated and returned by the index driver at an angle of 90 degrees. The base plate is provided with a conveying conveyor device to be supplied from the conveyor on one side. It is to provide a substrate redirection device having a shower function that can be introduced into the substrate to be discharged to the transfer conveyor of the other side.

본 발명의 다른 목적은 인덱스드라이버의 베이스플레이트에 설치된 이송컨베이어에 유입되고 배출되는 기판에 샤워를 실시하여 줌으로써 기판이 건조되는 방지하는 것을 방지할 수 있도록 된 샤워기능이 구비된 기판방향전환장치를 제공하는데 있다.Another object of the present invention is to provide a substrate turning device having a shower function to prevent the substrate from drying out by showering the substrate flowing into and out of the transport conveyor installed in the base plate of the index driver It is.

본 발명의 또 다른 목적은 기판이 공급(유입)되는 방향을 그대로 유지시키면서 배출시킬 수 있도록 하여 기판의 방향을 바로 잡아야 하는 폐단을 해소할 수 있도록 하고, 베이스플레이트에 설치되는 이송컨베이어가 공급컨베이어와 배출컨베이어의 연장선상에 위치토록 하여 기판이 유입되고 배출될 때에 손상되는 것을 방지할 수 있도록 된 샤워기능이 구비된 기판방향전환장치를 제공하는데 있다.Another object of the present invention is to be able to discharge while maintaining the direction in which the substrate is supplied (inlet) to eliminate the end to correct the direction of the substrate, the transfer conveyor is installed on the base plate and the supply conveyor It is to provide a substrate redirection device having a shower function to be positioned on the extension of the discharge conveyor to prevent damage when the substrate is introduced and discharged.

본 발명의 또 다른 목적은 처리조의 중간부분을 돌판으로 돌출시켜 샤워파이프를 통해 분사되는 샤워 액이 외측으로 집결되어지도록 하면서 외부로 누설되는 것을 방지할 수 있도록 하고, 처리조돌판의 상측으로 노출되는 회전축의 외측에는 밀폐기능을 구비하여 샤워액이 인덱스드라이버로 누설되는 것을 방지할 수 있도록 된 샤워기능이 구비된 기판방향전환장치를 제공하는데 있다.Still another object of the present invention is to project the middle portion of the treatment tank to the stone plate to prevent the leakage of the shower fluid sprayed through the shower pipe to the outside while being collected to the outside, exposed to the upper side of the treatment stone plate The outer side of the rotating shaft has a sealing function to provide a substrate turning device with a shower function to prevent the shower fluid from leaking to the index driver.

본 발명의 또 다른 목적은 베이스플레이트의 상측에 설치되는 이송컨베이어에서 이송롤러의 간격을 가변 시킬 수 있도록 하여 기판의 종류에 따라 조정하여 용이하게 작동시킬 수 있도록 된 샤워기능이 구비된 기판방향전환장치를 제공하는데 있다.Still another object of the present invention is to change the distance between the feed rollers in the conveying conveyor installed on the upper side of the base plate, the substrate turning device equipped with a shower function that can be easily operated by adjusting according to the type of substrate To provide.

본 발명의 상기한 목적은,The above object of the present invention,

기판(3)을 교차되게 설치된 이송컨베이어(1)·(2)에 의해 방향 전환시켜 이송시킬 수있도록 된 것에 있어서,In which the substrate 3 can be transferred by changing direction by the transfer conveyors 1 and 2 provided alternately,

이송컨베이어(1)와 이송컨베이어(2)가 서로 교차되는 모서리에 처리조(40)를 설치한 것과,The treatment tank 40 is installed at the corner where the conveying conveyor 1 and the conveying conveyor 2 cross each other,

처리조(40)의 상측 부에 샤워 액을 하측으로 분사시켜 줄 수 있도록 샤워 액 분사장치를 설치한 것과,A shower liquid spraying device is installed in the upper portion of the treatment tank 40 so as to spray the shower liquid downward;

처리조(40)의 중앙 하측에 인덱스드라이버(30)를 밀폐되게 설치하되 처리조밑판(41)의 상측으로 노출되는 회전축(31)에 베이스플레이트(11)를 장착시켜 베이스플레이트(11)를 인덱스드라이버(30)에 의해 90도 각도씩 반복적으로 회전 및 복귀시킬 수 있도록 한 것과,The base plate 11 is indexed by mounting the base plate 11 on the rotating shaft 31 exposed to the upper side of the bottom plate 41 while the index driver 30 is hermetically installed below the center of the processing tank 40. It is possible to repeatedly rotate and return by 90 degrees by the driver 30,

베이스플레이트(11)에는 이송컨베이어장치를 설치하여 일 측의 이송컨베이어(1)로부터 공급되는 기판(3)을 유입시켜 타측의 이송컨베이어(2)로 배출시켜 줄 수 있도록 한 것과,The base plate 11 is provided with a conveying conveyor device so that the substrate (3) supplied from the conveying conveyor 1 of one side can be introduced to be discharged to the conveying conveyor (2) of the other side,

베이스플레이트(11)의 이송컨베이어장치에는 기판(3)의 유입과 배출을 센싱할 수 있도록 센싱기능을 구비한 것이 포함되는 것을 특징으로 하는 기판방향전환장치(10)에 의해 달성된다.The conveying conveyor device of the base plate 11 is achieved by the substrate turning device 10, characterized in that it includes a sensing function to sense the inflow and discharge of the substrate (3).

도 1a 및 도 1b는 본 발명에 따른 샤워기능이 구비된 기판 방향전환장치를 보인 평면도 및 정면도.1A and 1B are a plan view and a front view showing a substrate redirection device having a shower function according to the present invention.

도 2는 본 발명에 따른 샤워기능이 구비된 기판 방향전환장치에서 방향전환 작동장치의 설치상태를 보인 확대도.Figure 2 is an enlarged view showing the installation state of the redirection actuator in the substrate redirection device with a shower function according to the present invention.

도 3은 본 발명에 따른 샤워기능이 구비된 기판 방향전환장치에서 폭가변장 치를 발췌하여 보인 확대도.Figure 3 is an enlarged view showing an extract of the variable width in the substrate redirection device with a shower function according to the present invention.

* 도면의 주요부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings

1.2. 이송컨베이어 10. 기판방향전환장치 11. 베이스플레이트1.2. Conveyor 10. Substrate Direction Switching Unit 11. Base Plate

12. 지지대 13. 이송샤프트 14. 이송롤러12. Support 13. Feed shaft 14. Feed roller

15. 기동모터 16. 기동샤프트 17. 기동롤러15. Starting motor 16. Starting shaft 17. Starting roller

18. 기동헬리컬기어 20. 구동력 21. 연동헬리컬기어18. Mobile Helical Gear 20. Driving Force 21. Interlocking Helical Gear

22. 폭가변실린더 24. LM가이드 25. 정렬포스트22. Variable width cylinder 24. LM guide 25. Alignment post

26. 가변가이드 30. 인덱스드라이버 31. 회전축26. Variable guide 30. Index driver 31. Shaft

33. 자바라립씰 35. 립씰 36. 외측커버33. Bellow lip seal 35. Lip seal 36. Outer cover

37. 내측커버 40. 처리조 41. 처리조밑판37. Inner Cover 40. Treatment Tank 41. Treatment Tank Bottom Plate

42. 처리조돌판 43. 경사면 44. 드레인배수관42. Treatment bath 43. Slope 44. Drain drainage pipe

50. 샤워파이프50. Shower Pipe

본 발명의 상기한 목적과 특징은 첨부도면에 의거한 다음의 상세한 설명에의해 더욱 명확하게 이해 할 수 있을 것이다.The above objects and features of the present invention will be more clearly understood by the following detailed description based on the accompanying drawings.

첨부도면 도 1a 내지 도3은 본 발명에 다른 기판방향전환장치(10)의 구체적인 실현 예를 보인 것으로써, 도 1a 및 도 1b는 본 발명의 평면도 및 정면도이고, 도 2은 인덱스드라이버의 밀폐상태를 보인 확대도이고, 도 3은 베이스플레이트에 설치된 이송컨베이어에서 이송롤러의 간격(폭)을 조정하여주는 간격조정장치를 발췌하여 보인 확대도이다.Figures 1a to 3 show a specific embodiment of the substrate redirection device 10 according to the present invention, Figures 1a and 1b is a plan view and a front view of the present invention, Figure 2 is a sealed state of the index driver Figure 3 is an enlarged view, Figure 3 is an enlarged view showing an extract of the interval adjusting device for adjusting the interval (width) of the conveying roller in the conveying conveyor installed in the base plate.

본 발명에 따른 기판방향전환장치(10)는 도 1a에 도시된 바와 같이 기판(3)을 공급시켜주는 이송컨베이어(1)와 공급되는 기판(3)을 차기공정으로 이송시켜주는 이송컨베이어(2)의 교차부분 즉, 서로 만나는 모서리에 설치된다.Substrate redirection device 10 according to the present invention is a conveying conveyor (1) for supplying the substrate (3) as shown in Figure 1a and a conveying conveyor (2) for transporting the supplied substrate 3 to the next process ) Is installed at the intersection of each other.

상기 이송컨베이어(1)와 연통되는 측면을 개방형으로 된 처리조(40)를 구체적으로 도시하지는 아니하였으나 지지수단(장치)으로 고정시키되, 처리조밑판(41)의 중앙부는 경사면(43)과 처리조돌판(42)에 의해 상측으로 돌출되게 형성하였다. 상기 처리조(40)의 내부 중앙에는 샤워액을 하측으로 분사시켜 줄 수 있도록 샤워파이프(50)를 설치하고 공급관(구체적으로 도시하지 아니함)을 연결하여 사워액을 공급할 수 있도록 하였으며, 처리조밑판(41)의 일 측에는 집수되는 샤워액을 배출시킬 수 있도록 드레인배수관(44)을 설치하였다.Although not specifically illustrated the treatment tank 40 of the open side to communicate with the conveying conveyor (1), but the fixing means by the support means (apparatus), the central portion of the treatment tank base plate 41 and the inclined surface 43 and the treatment It formed so that it might protrude upward by the coarsening plate 42. In the inner center of the treatment tank 40, a shower pipe 50 was installed to spray the shower solution downward, and a supply pipe (not specifically shown) was connected to supply sour liquid. One side of the (41) was provided with a drain drain pipe (44) to discharge the collected shower fluid.

처리조(40)의 하측 즉, 처리조돌판(42)의 하측에 인덱스드라이버(30)를 그의 회전축(31)이 처리조돌판(42)의 상측으로 노출되면서 밀폐상태를 유지하도록 설치하였고, 인덱스드라이버(30)의 회전축(31)에는 지지판(32)을 이용하여 장방형으로 된 베이스플레이트(11)를 장착하였다.The index driver 30 was installed at the lower side of the processing tank 40, that is, at the lower side of the processing bath plate 42 so that its rotating shaft 31 was exposed to the upper side of the processing bath plate 42 to maintain a closed state. A rectangular base plate 11 was attached to the rotary shaft 31 of the driver 30 by using the support plate 32.

상기 베이스플레이트(11)에는 한 쌍의 지지대(12)를 길이방향으로 이격시켜 나란하게 설치하였다. 이들 사이의 중앙부에는 한 쌍의 기동롤러(17)가 끼워진 기동샤프트(16)를 회전 가능하게 설치하되 일측 지지대(12)의 외측으로 노출되는 기동샤프트(16)에 기동모터(15)를 연결하여 기동샤프트(16)를 정역으로 회전시켜 줄 수 있도록 하였고, 타측 지지대(12)의 외측으로 노출되는 기동샤프트(16)에는 기동헬리컬기어(18)을 장착하였다.The base plate 11 was installed side by side with a pair of supports 12 spaced apart in the longitudinal direction. In the center part between them, a starter shaft 16 in which a pair of starter rollers 17 are fitted is rotatably installed, and the starter motor 15 is connected to the starter shaft 16 exposed to the outside of one support 12. The starting shaft 16 can be rotated forward and backward, and the starting shaft 16 exposed to the outside of the other support 12 is equipped with a moving helical gear 18.

상기 기동샤프트(16)의 양측으로 이송샤프트(13)를 등 회전 가능하게 등 간격으로 설치하여 각 이송샤프트(13)에는 지지대(12)의 내측에서 한 쌍씩의 이송롤러(14)를 등간격으로 유지시켜 설치하고, 일측 지지대(12)의 외측으로 노출되는 각 이송샤프트(13)에는 연동헬리컬기어(21)를 고정하였으며, 기동헬리컬기어(18)와 연동헬리컬기어(21)의 하측에는 헬리컬기어스크류(20)를 서로 치합되어 회전 가능하게 설치하였다.The feed shafts 13 are provided at equal intervals on both sides of the starting shaft 16 so as to be equally rotatable, and each feed shaft 13 has a pair of feed rollers 14 at the inner side of the support 12 at equal intervals. The interlocking helical gear 21 is fixed to each of the transfer shafts 13 exposed to the outside of the one side support 12, and the helical gear below the starting helical gear 18 and the interlocking helical gear 21. The screws 20 were engaged with each other and rotatably installed.

상기, 기동샤프트(16)와 이송샤프트(13)의 양측에 끼워진 기동롤러(17)와 이송롤러(14)의 하측에 가변가이드(26)를 구비하여 서로 일체형으로 연결하고, 각 가변가이드(26)에는 베이스플레이트(11)의 하측에 폭가변실린더(22)를 브라켓(27)으로 고정시켰으며, 폭가변실린더(22)의 로드(22-1)에 작동브라켓(23)을 고정시키고 정렬포스트(25)에 의해 가변가이드(26)와 연결하여 가변가이드(26)와 함께 기동롤러(17)와 이송롤러(14)를 일괄적으로 작동(이동)시킬 수 있도록 하였으며, 베이스플레이트(11)의 일 측에는 진자센서(S1)를 설치하여 기판(3)의 유입과 배출을 단속할 수 있도록 하였다.In addition, a variable guide 26 is provided at the lower side of the starting roller 17 and the feeding roller 14 fitted to both sides of the starting shaft 16 and the conveying shaft 13 so as to be integrally connected to each other, and to each variable guide 26. ), The variable width cylinder 22 is fixed to the lower side of the base plate 11 with the bracket 27, and the operation bracket 23 is fixed to the rod 22-1 of the variable width cylinder 22, and the alignment post is fixed. (25) connected to the variable guide 26 so that the start roller 17 and the transfer roller 14 together with the variable guide 26 can be operated (moved) collectively, and the base plate 11 On one side was installed pendulum sensor (S1) to control the inflow and discharge of the substrate (3).

특히, 작동브라켓(23)은 통상의 가이드레일(24-1)과 가이드블럭(24-2)으로 된 가이드수단(24)에 의해 직선으로 이동시킬 수 있도록 하였다.In particular, the operating bracket 23 is to be moved in a straight line by the guide means 24 made of a conventional guide rail 24-1 and guide block 24-2.

또, 처리조돌판(41)의 상측으로 돌출되는 회전축(31)에는 립씰(35)이 내장된 자바라립실(33)을 삽입시키고 립씰플레이트(34)를 처리조돌판(41)에 고정시켜 일차적으로 밀폐상태로 유지시키고, 처리조돌판(41)의 립씰플레이트(34)와 베이스플레이트(11)의 지지판(32)에는 내측커버(37)와 외측커버(36)를 서로 중첩되게 설치하여 이차 밀폐기능을 유지하도록 하였다.In addition, the bellows (35) with the lip seal 35 is inserted into the rotary shaft 31 protruding upward of the treatment jaw plate 41, and the lip seal plate 34 is fixed to the treatment jaw plate 41. It is kept in a sealed state, and the inner cover 37 and the outer cover 36 are overlapped with each other on the lip seal plate 34 of the treatment jaw plate 41 and the support plate 32 of the base plate 11 to perform a secondary sealing function. To maintain.

이하, 작동관계를 설명한다.The operation relationship will be described below.

본 발명에 다른 기판방향전환장치(10)를 작동시키기 위해서는 공급되는 기판(3)의 크기에 따라 기동롤러(17) 및 이송롤러(14)의 간격을 조정해 주어야한다.In order to operate the substrate turning apparatus 10 according to the present invention, the distance between the starting roller 17 and the feeding roller 14 should be adjusted according to the size of the substrate 3 supplied.

도 1a에 도시된 상태는 기판(3)의 폭이 넓은 경우에 사용되고, 기판(3)의 폭이 좁은 경우에는 기동롤러(17) 및 이송롤러(14)의 간격들을 좁혀주어야 한다. 기동롤러(17) 및 이송롤러(14)의 간격을 좁혀주고자 할 때에는 폭가변실린더(22)를 작동시키게 되면 그의 로드(22-1)에 의해 가변가이드(26)가 내측으로 이동하면서 기동롤러(17) 및 이송롤러(14)를 내측으로 이동시켜 주게 되므로 기동롤러(17) 및 이송롤러(14)의 간격들은 좁아지게 되고, 반면에 기동롤러(17) 및 이송롤러(14)의 간격을 넓혀주고자 할 때에는 상기와 같은 상태에서 폭가변실린더(22)를 역으로 작동시키게 되면 인출되어 있던 로드가 수납되면서 가변가이드(26)를 외측으로 이동시켜주므로 기동롤러(17) 및 이송롤러(14)의 간격들은 좁아지게 된다.The state shown in FIG. 1A is used when the width of the substrate 3 is wide, and when the width of the substrate 3 is narrow, the intervals between the starting roller 17 and the transfer roller 14 should be narrowed. When narrowing the distance between the starting roller 17 and the conveying roller 14, when the variable width cylinder 22 is operated, the variable guide 26 is moved inward by the rod 22-1, and the starting roller (17) and the transfer roller 14 is moved to the inside, so the gap between the starting roller 17 and the feeding roller 14 becomes narrow, while the distance between the starting roller 17 and the feeding roller 14 is reduced. When the width variable cylinder 22 is operated in the reverse state in the above state, the movable guide 17 and the transfer roller 14 are moved since the variable guide 26 is moved outward while the drawn rod is accommodated. Spacing becomes narrower.

상기와 같이 기동롤러(17) 및 이송롤러(14)의 간격들을 조정하여준 후에 본 발명에 다른 기판방향전환장치(10)를 작동시켜준다.After adjusting the intervals of the starting roller 17 and the conveying roller 14 as described above to operate the substrate turning apparatus 10 according to the present invention.

이송컨베이어(1)에 의해 이송되는 기판(3)이 베이스플레이트(11)로 유입되어지기 시작하면 샤워파이프(50)를 통해서는 샤워액이 분사되어지고, 기동모터(15)도 작동하기 시작한다. 기동모터(15)가 작동하면 기동샤프트(16)가 회전하면서 기동헬리컬기어(18)를 회전시키게 되고, 기동헬리컬기어(18)가 회전하게 되면 치합되어 있는 구동축(20)이 회전하게 되며, 구동축(20)이 회전하게 되면 치합되어 있는 연동헬리컬기어(21)가 회전하게 되고, 헬리컬기어(21)가 회전하게 되면 이송샤프트(13)들이 회전하게 된다.When the substrate 3 transferred by the transfer conveyor 1 starts to flow into the base plate 11, the shower liquid is injected through the shower pipe 50, and the starting motor 15 also starts to operate. . When the starting motor 15 operates, the starting shaft 16 rotates to rotate the starting helical gear 18. When the starting helical gear 18 rotates, the driving shaft 20 engaged therein rotates. When the 20 rotates, the interlocking helical gear 21 that is engaged rotates, and when the helical gear 21 rotates, the transfer shafts 13 rotate.

이송샤프트(13)와 함께 이송롤러(14)들이 회전하게 되면 유입되는 기판(3)은 내측으로 이동하게 되고, 내측으로 이동되는 기판(3)을 진자센서(S1)가 센싱하게 되면 기동모터(15)의 작동이 정지되고, 기동모터(15)의 작동이 정지하게 되면 이송샤프트(13)들의 작동도 정지된다.When the transfer rollers 14 together with the transfer shaft 13 rotate, the incoming substrate 3 moves inward, and when the pendulum sensor S1 senses the substrate 3 moved inward, the starting motor ( When the operation of 15) is stopped and the operation of the starting motor 15 is stopped, the operation of the transfer shafts 13 is also stopped.

이와 같이 기판(3)이 유입된 상태에서 인덱스드라이버(30)를 작동시키게 되면 회전축(31)이 회전되면서 구체적으로 도시하지는 아니하였으나 베이스플레이트(11)와 함께 그의 위에 설치되어 있는 이송컨베이어도 함께 90도 만큼 회전시켜 입구 측을 이송컨베이어(2)측으로 일치시켜 준다.When the index driver 30 is operated in the state in which the substrate 3 is introduced as described above, although the rotating shaft 31 is rotated, the conveying conveyor installed above the base plate 11 together with the base plate 11 is not shown. Rotate by degree to match the inlet side to the conveying conveyor (2) side.

이와 같이 베이스플레이트(11)의 입구와 이송컨베이어(2)가 일치된 상태에서 기동모터(15)가 역으로 작동하게 되면, 기동샤프트(16)와 함께 기동헬리컬기어(18)가 역으로 회전하게 되고, 기동헬리컬기어(18)가 역으로 작동하게 되면 구동축(20)와 함께 연동웜휠(21) 및 이송롤러(14)가 역으로 작동되면서 유입되어 있는 기판(3)을 이송컨베이어(2)측으로 전이시켜주며, 전이가 완료되면 진자센서(S1)가 이를 감지하여 기동모터(15)의 작동을 정지시켜 베이스플레이트(11)에 설치된 이송컨베이어의 작동을 정지시켜 줌과 동시에 샤워파이프(50)로 공급되는 샤워액의 공급도 중지시켜 샤워액의 분사를 정지시켜준다.In this way, when the starter motor 15 operates in reverse with the inlet of the base plate 11 and the transfer conveyor 2 coinciding, the starter helical gear 18 rotates in reverse together with the starter shaft 16. When the helical gear 18 is operated in reverse, the interlocking worm wheel 21 and the transfer roller 14 are operated in reverse together with the drive shaft 20 to move the substrate 3 into the transfer conveyor 2. When the transfer is completed, the pendulum sensor S1 detects this and stops the operation of the starting motor 15 to stop the operation of the conveying conveyor installed in the base plate 11 and at the same time to the shower pipe 50. The supply of the shower solution is also stopped to stop the spraying of the shower solution.

이와 같이 베이스플레이트(11)에 설치된 이송컨베이어의 작동을 정지시키고 동시에 샤워파이프(50)로 공급되는 샤워액의 공급도 중지되어진 후에 인덱스드라이버(30)가 역으로 작동하여 베이스플레이트(11)와 함께 그에 설치된 이송컨베이어를 원 상태로 복귀시켜준다.As such, after stopping the operation of the conveying conveyor installed in the base plate 11 and at the same time the supply of the shower liquid supplied to the shower pipe 50 is also stopped, the index driver 30 is operated in reverse to work with the base plate 11. Return the conveying conveyor installed in it to its original state.

본 발명은 상기와 같은 과정을 반복적으로 실시하면서 이송되어오는 기판(3)의 방향을 전환시켜 준 후에 다른 컨베이어로 배출시켜 주게 된다.In the present invention, while repeatedly performing the above-described process, the direction of the substrate 3 to be transferred is changed and then discharged to another conveyor.

이상에서와 같이 본 발명은 베이스플레이트에 설치되는 이송컨베이어가 공급컨베이어와 배출컨베이어의 연장선상에 위치토록 하여 기판이 유입되고 배출될 때에 손상되는 것을 방지할 수 있도록 하면서 인덱스드라이버의 베이스플레이트에 설치된 이송컨베이어에 유입되고 배출되는 기판에 샤워를 실시하여 줌으로써 기판이 건조되는 것을 방지할 수 있도록 하면서 방향을 전환시켜 배출시켜 줄 수 있고, 기판이 공급(유입)되는 방향을 그대로 유지시키면서 배출시킬 수 있도록 하여 기판의 방향을 바로 잡아야 하는 폐단을 해소할 수 있으며, 처리조의 중간부분을 돌판으로 돌출시켜 샤워파이프를 통해 분사되는 샤워 액이 외측으로 집결되어지도록 하고 처리조돌판의 상측으로 노출되는 회전축의 외측에는 밀폐기능을 구비하여 샤워액이 인덱스드라이버로 누설되는 것을 방지할 수 있으며, 베이스플레이트의 상측에 설치되는 이송컨베이어에서 이송롤러의 간격을 가변 시킬 수 있도록 하여 기판의 종류에 따라 조정하여 용이하게 작동시킬 수 있게 된다.As described above, the present invention allows the transfer conveyor installed on the base plate to be positioned on the extension line of the supply conveyor and the discharge conveyor, thereby preventing the substrate from being damaged when the substrate is introduced and discharged, while being transferred to the base plate of the index driver. By showering the substrate flowing into and out of the conveyor, the substrate can be discharged by changing the direction while preventing the substrate from drying, and by discharging while maintaining the direction in which the substrate is supplied (inflow). The closed end to correct the direction of the substrate can be solved, and the middle part of the treatment tank is protruded to the stone plate so that the shower liquid sprayed through the shower pipe is collected to the outside and the outer side of the rotating shaft exposed to the upper side of the treatment stone plate. It is sealed and shower fluid is indexed Leakage to the driver can be prevented, and the distance between the feed rollers can be varied in the feed conveyor installed on the upper side of the base plate, so that it can be easily operated by adjusting according to the type of substrate.

Claims (6)

기판(3)을 교차되게 설치된 이송컨베이어(1)·(2)에 의해 방향 전환시켜 이송시킬 수 있도록 된 것에 있어서,In which the substrate 3 can be transferred by changing direction by the transfer conveyors 1 and 2 provided alternately, 이송컨베이어(1)와 이송컨베이어(2)가 서로 교차되는 모서리에 처리조(40)를 설치한 것과,The treatment tank 40 is installed at the corner where the conveying conveyor 1 and the conveying conveyor 2 cross each other, 처리조(40)의 상측 부에 샤워 액을 하측으로 분사시켜 줄 수 있도록 샤워 액 분사장치를 설치한 것과,A shower liquid spraying device is installed in the upper portion of the treatment tank 40 so as to spray the shower liquid downward; 처리조(40)의 중앙 하측에 인덱스드라이버(30)를 밀폐되게 설치하되 처리조밑판(41)의 상측으로 노출되는 회전축(31)에 베이스플레이트(11)를 장착시켜 베이스플레이트(11)를 인덱스드라이버(30)에 의해 90도 각도씩 반복적으로 회전 및 복귀시킬 수 있도록 한 것과,The base plate 11 is indexed by mounting the base plate 11 on the rotating shaft 31 exposed to the upper side of the bottom plate 41 while the index driver 30 is hermetically installed below the center of the processing tank 40. It is possible to repeatedly rotate and return by 90 degrees by the driver 30, 베이스플레이트(11)에는 이송컨베이어장치를 설치하여 일 측의 이송컨베이어(1)로부터 공급되는 기판(3)을 유입시켜 타측의 이송컨베이어(2)로 배출시켜 줄 수 있도록 한 것과,The base plate 11 is provided with a conveying conveyor device so that the substrate (3) supplied from the conveying conveyor 1 of one side can be introduced to be discharged to the conveying conveyor (2) of the other side, 베이스플레이트(11)의 이송컨베이어장치에는 기판(3)의 유입과 배출을 센싱할 수 있도록 센싱기능을 구비한 것이 포함되는 것을 특징으로 하는 샤워기능이 구비된 기판 방향전환장치.The substrate conveying apparatus of the base plate (11) is a substrate turning device with a shower function, characterized in that it includes a sensing function to sense the inflow and outflow of the substrate (3). 제 1항에 있어서, 처리조(40)의 상측 부에 샤워 액을 하측으로 분사시켜 주는 샤워 액 분사장치는 처리조(40)의 내부 상측부에 샤워파이프(50)를 설치하여서 된 것을 특징으로 하는 샤워기능이 구비된 기판 방향전환장치.The shower liquid injector for injecting the shower liquid downward in the upper portion of the treatment tank 40 is characterized in that the shower pipe 50 is provided in the upper portion of the inner portion of the treatment tank 40. Substrate redirection device having a shower function. 제 1항에 있어서, 베이스플레이트(11)에 설치되는 이송컨베이어장치는,The conveying conveyor apparatus of claim 1, wherein the conveying conveyor apparatus is installed on the base plate (11). 베이스플레이트(11)에는 한 쌍의 지지대(12)를 길이방향으로 이격시켜 나란하게 설치하여 이들 사이의 중앙부에는 한 쌍의 기동롤러(17)가 끼워진 기동샤프트(16)를 회전 가능하게 설치하되 일측 지지대(12)의 외측으로 노출되는 기동샤프트(16)에 기동모터(15)를 연결하여 기동샤프트(16)를 정역으로 회전시켜 줄 수 있도록 하고, 타측 지지대(12)의 외측으로 노출되는 기동샤프트(16)에는 기동헬리컬기어(18)를 장착한 것과,The base plate 11 is installed side by side with a pair of supports 12 in the longitudinal direction side by side installed in the center between the pair of the starting shaft (16) fitted with a pair of the starting roller 17 rotatably, but one side The starter shaft 15 is connected to the starter shaft 16 exposed to the outside of the support 12 so that the starter shaft 16 can be rotated forward and backward, and the starter shaft exposed to the outside of the other support 12. (16) is equipped with a mobile helical gear (18), 상기 기동샤프트(16)의 양측으로 이송샤프트(13)를 등 회전 가능하게 등 간격으로 설치하여 각 이송샤프트(13)에는 지지대(12)의 내측에서 한 쌍씩의 이송롤러(14)를 등간격으로 유지시켜 설치하고, 일측 지지대(12)의 외측으로 노출되는 각 이송샤프트(13)에는 연동헬리컬기어(21)를 고정하였으며, 기동헬리컬기어(18)와 연동헬리컬기어(21)의 하측에는 구동축(20)을 서로 치합되어 회전 가능하게 설치한 것과,The feed shafts 13 are provided at equal intervals on both sides of the starting shaft 16 so as to be equally rotatable, and each feed shaft 13 has a pair of feed rollers 14 at the inner side of the support 12 at equal intervals. The interlocking helical gear 21 is fixed to each of the transfer shafts 13 exposed to the outside of the one side support 12, and the driving shaft (below) of the starting helical gear 18 and the interlocking helical gear 21 is installed. 20) is rotatably fitted with each other, 기동샤프트(16)와 이송샤프트(13)의 양측에 끼워진 기동롤러(17)와 이송롤러(14)는 가변장치에 의해 그 폭을 조종할 수 있도록 한 것이 포함되는 것을 특징으로 하는 샤워기능이 구비된 기판 방향전환장치.The starting roller 17 and the conveying roller 14 fitted to both sides of the starting shaft 16 and the conveying shaft 13 are provided with a shower function, characterized in that the width thereof can be controlled by a variable device. Substrate redirection device. 제 3항에 있어서, 기동샤프트(16)와 이송샤프트(13)의 양측에 끼워진 기동롤러(17)와 이송롤러(14)의 폭을 조정하여주는 가변장치는, 기동샤프트(16)와 이송샤프트(13)의 양측에 끼워진 기동롤러(17)와 이송롤러(14)의 하측에 가변가이드(26)를 구비하여 서로 일체형으로 연결하고, 각 가변가이드(26)에는 베이스플레이트(11)의 하측에 폭가변실린더(22)를 고정시키며, 폭가변실린더(22)의 로드에 작동브라켓(23)을 고정시키고 정렬포스트(25)에 의해 가변가이드(26)와 연결하여 가변가이드(26)와 함께 기동롤러(17)와 이송롤러(14)를 일괄적으로 작동(이동)시킬 수 있도록 된 것을 특징으로 하는 샤워기능이 구비된 기판 방향전환장치.The variable speed adjusting device for adjusting the widths of the starting roller 17 and the feeding roller 14 fitted to both sides of the starting shaft 16 and the conveying shaft 13 includes: the starting shaft 16 and the conveying shaft. A variable guide 26 is provided below the starting roller 17 and the transfer roller 14 fitted to both sides of the 13 so as to be integrally connected to each other, and to each variable guide 26 below the base plate 11. The variable width cylinder 22 is fixed, and the operation bracket 23 is fixed to the rod of the variable width cylinder 22 and connected to the variable guide 26 by the alignment post 25 to be started together with the variable guide 26. Substrate redirection device having a shower function, characterized in that the roller 17 and the transfer roller 14 can be operated (moved) collectively. 제 1항에 있어서, 인덱스드라이버(30)의 밀폐구조는 처리조돌판(41)의 상측으로 돌출되는 회전축(31)에는 립씰(35)이 내장된 자바라립실(36)을 삽입시키고 립씰플레이트(34)를 처리조돌판(41)에 고정시켜서 된 것을 특징으로 하는 샤워기능이 구비된 기판 방향전환장치.According to claim 1, The sealing structure of the index driver 30 is inserted into the bellows of the lip seal 35 is inserted into the rotary shaft 31 protruding to the upper side of the roughening plate 41 and the lip seal plate 34 ) Is a substrate turning device with a shower function, characterized in that the fixed to the roughening plate 41. 제 1항에 있어서, 인덱스드라이버(30)의 밀폐구조는 처리조돌판(41)의 립씰플레이트(34)와 베이스플레이트(11)의 지지판(32)에는 내측커버(37)와 외측커버(36)를 서로 중첩되게 설치하여 밀폐기능을 유지하도록 된 것을 특징으로 하는 샤워기능이 구비된 기판 방향전환장치.The sealing structure of the index driver (30) is an inner cover (37) and an outer cover (36) on the lip seal plate (34) of the treatment jaw plate (41) and the support plate (32) of the base plate (11). Substrate redirection device provided with a shower function, characterized in that the overlapping each other to maintain the sealing function.
KR10-2001-0039410A 2001-07-03 2001-07-03 Turning unit For Wafer KR100438667B1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101032851B1 (en) * 2007-03-09 2011-05-06 어플라이드 머티어리얼스, 인코포레이티드 Methods and apparatus for monitoring the rotation of a substrate during cleaning

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101032851B1 (en) * 2007-03-09 2011-05-06 어플라이드 머티어리얼스, 인코포레이티드 Methods and apparatus for monitoring the rotation of a substrate during cleaning

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