KR19990055606A - Epoxy Resin Compositions for Semiconductor Device Sealing - Google Patents

Epoxy Resin Compositions for Semiconductor Device Sealing Download PDF

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KR19990055606A
KR19990055606A KR1019970075561A KR19970075561A KR19990055606A KR 19990055606 A KR19990055606 A KR 19990055606A KR 1019970075561 A KR1019970075561 A KR 1019970075561A KR 19970075561 A KR19970075561 A KR 19970075561A KR 19990055606 A KR19990055606 A KR 19990055606A
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epoxy resin
weight
titanium oxide
resin composition
black titanium
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KR1019970075561A
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KR100347316B1 (en
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이승주
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유현식
제일모직 주식회사
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • H01L23/10Containers; Seals characterised by the material or arrangement of seals between parts, e.g. between cap and base of the container or between leads and walls of the container

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

본 발명은 에폭시 수지, 경화제, 경화촉진제, 충진제, 난연제, 착색제 및 첨가제로 이루어지는 에폭시 수지 조성물에 있어서, 착색제로서 블랙티타늄옥사이드 0.2 내지 0.3중량% 또는 블랙티타늄 옥사이드와 카본블랙을 1/2 내지 2/1의 비율로 혼합한 혼합물을 0.3 내지 0.4중량% 사용하는 것을 특징으로 하는 반도체 소자 밀봉용 에폭시 수지 조성물에 관한 것으로, 에폭시 수지의 종류나 패키지 종류에 상관없이 레이저 마킹후 표기 문자의 선명도면에서 매우 우수한 효과를 나타낸다.The present invention relates to an epoxy resin composition comprising an epoxy resin, a curing agent, a curing accelerator, a filler, a flame retardant, a coloring agent, and an additive, wherein 0.2 to 0.3 wt% of black titanium oxide or 1/2 to 2 / of black titanium oxide and carbon black are used as colorants. The present invention relates to an epoxy resin composition for sealing a semiconductor device, characterized by using 0.3 to 0.4% by weight of a mixture mixed at a ratio of 1. In terms of sharpness of written characters after laser marking, regardless of the type or package type of the epoxy resin. Excellent effect.

Description

반도체 소자 밀봉용 에폭시 수지 조성물Epoxy Resin Compositions for Semiconductor Device Sealing

본 발명은 레이저 마킹(Laser Markability)성이 향상된 반도체 소자 밀봉용 에폭시 수지 조성물에 관한 것으로, 보다 상세하게는 착색제로서 블랙티타늄옥사이드(Black titanium oxide)단독 혹은 블랙티타늄 옥사이드와 카본블랙을 혼합하여 사용함으로써 레이저 마킹후 문자의 선명도를 향상시킬 수 있는 반도체 소자 밀봉용 에폭시 수지 조성물에 관한 것이다.The present invention relates to an epoxy resin composition for semiconductor device encapsulation with improved laser markability, and more particularly, by using black titanium oxide alone or by mixing black titanium oxide and carbon black as a colorant. It is related with the epoxy resin composition for semiconductor element sealing which can improve the sharpness of a character after laser marking.

일반적으로 반도체 조립 공정의 마지막 순서로서 대부분의 패키지 표면에 각종 문자나 그림 등을 표기하는 마킹(Marking)공정이 있는데, 이 공정은 마킹방식에 따라 잉크마킹과 레이저 마킹방식으로 나눌 수 있다. 종래에는 주로 잉크 마킹 방식을 사용하였으나 반도체 생산성이나 품질 향상의 문제로 인하여 최근에는 대부분이 레이저 마킹으로 전환하여 생산하고 있다. 레이저 마킹 방식은 잉크마킹 방식과는 달리 표기후 문자가 지워지거나 반도체 패키지 표면에서 이탈될 우려가 없으며, 표기후에 경화과정을 거치지 않아도 되는등 생산성과 품질향상을 도모할 수 있는 장점들을 가지고 있다. 그러나, 이와 같은 마킹공정은 반도체 패키지용 에폭시 수지 조성물의 종류에 따라 레이저 마킹후의 선명도가 큰 차이를 나타내는 문제점을 가지고 있어 이에 대한 해결책이 요구되고 있다.In general, as a final step of the semiconductor assembly process, there is a marking process for marking various characters or pictures on most package surfaces, which can be divided into ink marking and laser marking according to the marking method. In the past, the ink marking method was mainly used, but most of them are converted to laser marking in recent years due to problems of semiconductor productivity or quality improvement. Unlike the ink marking method, the laser marking method does not have to be erased or escaped from the surface of the semiconductor package after marking, and has the advantage of improving productivity and quality such as not having to undergo a curing process after marking. However, such a marking process has a problem that the sharpness after laser marking shows a large difference according to the kind of epoxy resin composition for semiconductor packages, and a solution for this is required.

일본국특개소 63-15446에는 갈색 착색 실리카를 사용하여 레이저 마킹 특성의 향상을 시도하였으나 효과가 부족하였고, 일본국 특개소 62-209841과 일본국특개평 6-88011에서는 착색제인 카본블랙의 함량을 변화시키는 방법을 사용하였으나 근본적인 효과를 얻지는 못하였다.In Japanese Patent Laid-Open No. 63-15446, brown colored silica was used to improve the laser marking characteristics, but the effect was insufficient. Japanese Patent Laid-Open No. 62-209841 and Japanese Patent Laid-Open No. 6-88011 changed the carbon black content. The method was used but no fundamental effect was obtained.

일본국 특개평 7-161878 및 일본국 특개평 7-238210에서는 시안계 염료와 산화 방지제 등을 사용하는 방법을 제안하고 있으나, 레이저 마킹 특성을 완전히 해결하지는 못하였다.Japanese Patent Laid-Open No. 7-161878 and Japanese Patent Laid-Open No. 7-238210 propose methods using cyan dyes and antioxidants, but have not completely solved laser marking characteristics.

본 발명의 목적은 상기와 같은 문제점을 해결하기 위하여 안출된 것으로, 반도체 소자 밀봉용 에폭시 수지 조성물의 착색제로서 블랙티타늄옥사이드(Black titanium oxide)단독 혹은 블랙티타늄 옥사이드와 카본블랙을 혼합하여 사용함으로써 레이저 마킹후 문자의 선명도를 향상시킬 수 있는 반도체 소자 밀봉용 에폭시 수지 조성물을 제공하는 것이다.An object of the present invention is to solve the above problems, laser marking by using black titanium oxide alone or a mixture of black titanium oxide and carbon black as a colorant of the epoxy resin composition for sealing semiconductor devices. It is providing the epoxy resin composition for semiconductor element sealing which can improve the sharpness of a later character.

즉, 본 발명은 에폭시 수지, 경화제, 경화촉진제, 충진제, 난연제, 착색제 및 첨가제로 이루어지는 에폭시 수지 조성물에 있어서, 착색제로서 블랙티타늄옥사이드 0.2 내지 0.3중량% 또는 블랙티타늄 옥사이드와 카본블랙을 1/2 내지 2/1의 비율로 혼합한 혼합물을 0.3 내지 0.4중량% 사용하는 것을 특징으로 하는 반도체 소자 밀봉용 에폭시 수지 조성물에 관한 것이다.That is, the present invention is an epoxy resin composition consisting of an epoxy resin, a curing agent, a curing accelerator, a filler, a flame retardant, a coloring agent and an additive, wherein the coloring agent is from 0.2 to 0.3 wt% of black titanium oxide or from 1/2 to about black titanium oxide and carbon black. It is related with the epoxy resin composition for semiconductor element sealing characterized by using 0.3-0.4 weight% of the mixture mixed by the ratio of 2/1.

본 발명에서 사용되는 에폭시 수지 조성물은 에폭시 수지, 경화제, 경화촉진제, 입도가 상이한 여러 종류의 실리카 충진제, 착색제 및 기타 첨가제로 구성되는 종래의 에폭시 수지 조성물의 구성으로 특별히 본 발명을 위하여 한정되는 것은 아니다.The epoxy resin composition used in the present invention is a configuration of a conventional epoxy resin composition composed of an epoxy resin, a curing agent, a curing accelerator, various kinds of silica fillers, colorants, and other additives having different particle sizes, and is not particularly limited for the present invention. .

따라서, 일반적인 반도체 패키지용 에폭시 수지 조성물, 예를들면, 에폭시 수지 3 내지 10중량%, 경화제 3 내지 8중량%, 경화촉진제 0.1 내지 1.0중량%, 충진제 73 내지 88중량%, 유기난연제 0.1 내지 3.0중량%, 무기난연제 0.1 내지 4.0중량% 등으로 조성된 것을 본 발명에 사용할 수 있다.Therefore, epoxy resin compositions for general semiconductor packages, for example, 3 to 10% by weight of epoxy resin, 3 to 8% by weight of curing agent, 0.1 to 1.0% by weight of curing accelerator, 73 to 88% by weight of filler, organic flame retardant 0.1 to 3.0% by weight %, Inorganic flame retardant 0.1 to 4.0% by weight can be used in the present invention.

다만, 본 발명은 종래의 에폭시 수지 조성물의 구성중 첨가되는 착색제를 카본블랙 단독으로 사용하는 종래의 것과는 달리 블랙티타늄옥사이드 0.2 내지 0.3중량% 또는 블랙티타늄 옥사이드와 카본블랙을 1/2 내지 2/1의 비율로 혼합한 혼합물을 0.3 내지 0.4중량% 사용함으로써 레이저 마킹에 대한 선명성을 만족할 수 있게 된다. 착색제의 범위가 본 발명의 범위를 벗어나는 경우에는 기존의 성질과 유사하게 되어 요구하는 레이저 마킹 특성을 달성할 수 없게되므로 본 발명의 따른 범위내로 첨가되는 것이 요구된다.However, the present invention is 0.2 to 0.3% by weight of black titanium oxide or 1/2 to 2/1 of black titanium oxide and carbon black, unlike the conventional one using carbon black alone as a coloring agent added in the composition of the conventional epoxy resin composition. By using 0.3 to 0.4% by weight of the mixture mixed in the ratio of it is possible to satisfy the sharpness for laser marking. When the range of the colorant is outside the scope of the present invention, it is required to be added within the scope of the present invention because it becomes similar to the existing properties and thus cannot achieve the required laser marking properties.

본 발명의 반도체 소자 밀봉용 에폭시 수지 조성물은 각 성분들을 평량한 뒤 헨셀믹서를 이용, 균일하게 혼합하여 분말상태의 1차 조성물을 제조한 후 믹싱 2-롤밀을 이용하여 100℃에서 7분간 용융 혼련한 뒤 냉각 및 분쇄과정을 거쳐 제조된다.The epoxy resin composition for sealing a semiconductor device of the present invention, after weighing each component, is uniformly mixed using a Henschel mixer to prepare a powdery primary composition, followed by melt kneading at 100 ° C. for 7 minutes using a mixing 2-roll mill. It is then manufactured by cooling and grinding.

이하 본 발명을 실시예를 들어 더욱 상세히 설명하고자 하나, 본 발명이 하기 실시예에 의하여 제한 되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited by the following Examples.

실시예 1∼6 및 비교예 1∼7Examples 1-6 and Comparative Examples 1-7

일반적인 에폭시 수지 조성물 100중량부에 대하여 착색제의 함량을 하기 표 1과 같이 첨가하여 제조된 반도체 소자 밀봉용 에폭시 수지 조성물을 각 패키지 별로 몰딩한 후 175℃에서 6시간 동안 후경화한 후 레이저 마킹성을 평가하여 표 1에 나타내었다.After molding the epoxy resin composition for semiconductor element sealing prepared by adding the content of the colorant to 100 parts by weight of the general epoxy resin composition as shown in Table 1 for each package, and after curing at 175 ℃ for 6 hours, laser marking properties The evaluation is shown in Table 1.

레이저 마킹성은 에폭시 수지 조성물로 반도체 패키지를 성형한 후 레이저 마킹 공정을 거친 성형품의 외관을 육안에 의하여 관찰하였다.The laser marking property was observed by visual observation of the appearance of the molded article after the laser marking process after molding the semiconductor package with the epoxy resin composition.

착색제coloring agent 애쉬(Ash)Ash 에폭시수지Epoxy resin 적용패키지Applicable Package 레이저마킹성(선명도)Laser marking property (sharpness) 카본블랙Carbon black 블랙티타늄옥사이드Black titanium oxide 실시예 1Example 1 00 0.20.2 8484 O/N/BO / N / B SOJSOJ 실시예 2Example 2 00 0.250.25 8484 O/DO / D SOJSOJ 실시예 3Example 3 00 0.30.3 8484 00 SOJSOJ 실시예 4Example 4 0.20.2 0.10.1 7676 00 SOPSOP 실시예 5Example 5 0.150.15 0.150.15 7676 00 SOPSOP 실시예 6Example 6 0.10.1 0.20.2 7373 00 DIPDIP 비교예 1Comparative Example 1 0.20.2 00 8484 O/N/BO / N / B SOJSOJ 비교예 2Comparative Example 2 0.10.1 00 8484 O/DO / D SOJSOJ ×× 비교예 3Comparative Example 3 0.30.3 00 8484 00 SOJSOJ 비교예 4Comparative Example 4 0.30.3 00 7676 00 SOPSOP 비교예 5Comparative Example 5 0.20.2 00 7676 00 SOJSOJ ×× 비교예 6Comparative Example 6 0.30.3 00 7373 00 DIPDIP 비교예 7Comparative Example 7 0.20.2 00 7373 00 DIPDIP ××

O : 올소크레졸노볼락계 N : 나프탈렌계O: allocresol novolak series N: naphthalene series

B : 비스페놀계 D : 디사이클로펜타디엔계B: Bisphenol-based D: Dicyclopentadiene-based

SOJ :Small out line 'J' Lead SOJ :Small out line packageSOJ: Small out line 'J' Lead SOJ: Small out line package

DIP :Dual in line packageDIP: Dual in line package

이상에서 살펴본 바와 같이 본 발명에 의하여 제조된 에폭시 수지 조성물은 블랙티타늄옥사이드 또는 블랙티타늄 옥사이드와 카본블랙을 혼합한 혼합물을 사용함으로써 에폭시 수지의 종류나 패키지 종류에 상관없이 레이저 마킹후 표기 문자의 선명도면에서 매우 우수한 효과를 나타낸다.As described above, the epoxy resin composition prepared according to the present invention uses a mixture of black titanium oxide or a mixture of black titanium oxide and carbon black, so that the sharpness of the written characters after laser marking regardless of the epoxy resin type or package type Shows a very good effect.

Claims (2)

에폭시 수지, 경화제, 경화촉진제, 충진제, 난연제, 착색제 및 첨가제로 이루어지는 에폭시 수지 조성물에 있어서, 착색제로서 블랙티타늄옥사이드 0.2 내지 0.3중량% 또는 블랙티타늄 옥사이드와 카본블랙을 1/2 내지 2/1의 비율로 혼합한 혼합물을 0.3 내지 0.4중량% 사용하는 것을 특징으로 하는 반도체 소자 밀봉용 에폭시 수지 조성물.In the epoxy resin composition comprising an epoxy resin, a curing agent, a curing accelerator, a filler, a flame retardant, a coloring agent and an additive, 0.2 to 0.3% by weight of black titanium oxide or a ratio of 1/2 to 2/1 of black titanium oxide and carbon black as a colorant. Epoxy resin composition for semiconductor element sealing, characterized by using a mixture of 0.3 to 0.4% by weight. 에폭시 수지 3.0 내지 10.0 중량%,Epoxy resin 3.0-10.0 wt%, 경화제 3.0 내지 8.0중량%,Curing agent 3.0 to 8.0% by weight, 경화촉진제 0.1 내지 1.0중량%,0.1 to 1.0 wt% of a curing accelerator, 실리카표면처리제 0.1 내지 1.0중량%,0.1 to 1.0 wt% silica surface treatment agent, 무기충전제 73.0 내지 88.0중량%,Inorganic filler 73.0 to 88.0% by weight, 개질제 0.1 내지 5.0중량%,0.1 to 5.0% by weight modifier, 유기난연제 0.1 내지 3.0중량%,0.1 to 3.0% by weight of organic flame retardant, 무기난연제 0.1 내지 4.0중량%,Inorganic flame retardant 0.1 to 4.0% by weight, 이형제 0.1 내지 4.0중량%,0.1 to 4.0% by weight of release agent, 블랙티타늄옥사이드 0.2 내지 0.3중량%,0.2-0.3 wt% of black titanium oxide, 혹은 블랙티타늄옥사이드와 카본블랙 1/2 내지 2/1의 비율로Or black titanium oxide and carbon black at a ratio of 1/2 to 2/1 혼합한 혼합물 0.3 내지 0.4중량%0.3-0.4 wt% of mixed mixture 으로 조성되는 반도체 소자 밀봉용 에폭시 수지 조성물.Epoxy resin composition for sealing semiconductor elements formed by.
KR1019970075561A 1997-12-27 1997-12-27 Epoxy molding compound for sealing semiconductor device KR100347316B1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030077777A (en) * 2002-03-27 2003-10-04 주식회사 칩팩코리아 Black ink coating layer composition for laser marking of tape ball grid array package
KR100709659B1 (en) * 1999-09-17 2007-04-19 히다치 가세고교 가부시끼가이샤 Epoxy resin and an electronic device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100709659B1 (en) * 1999-09-17 2007-04-19 히다치 가세고교 가부시끼가이샤 Epoxy resin and an electronic device
KR20030077777A (en) * 2002-03-27 2003-10-04 주식회사 칩팩코리아 Black ink coating layer composition for laser marking of tape ball grid array package

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