KR20030077777A - Black ink coating layer composition for laser marking of tape ball grid array package - Google Patents

Black ink coating layer composition for laser marking of tape ball grid array package Download PDF

Info

Publication number
KR20030077777A
KR20030077777A KR1020020016655A KR20020016655A KR20030077777A KR 20030077777 A KR20030077777 A KR 20030077777A KR 1020020016655 A KR1020020016655 A KR 1020020016655A KR 20020016655 A KR20020016655 A KR 20020016655A KR 20030077777 A KR20030077777 A KR 20030077777A
Authority
KR
South Korea
Prior art keywords
marking
coating layer
black ink
ink coating
heat spreader
Prior art date
Application number
KR1020020016655A
Other languages
Korean (ko)
Inventor
이명호
김근식
이구홍
Original Assignee
주식회사 칩팩코리아
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 칩팩코리아 filed Critical 주식회사 칩팩코리아
Priority to KR1020020016655A priority Critical patent/KR20030077777A/en
Publication of KR20030077777A publication Critical patent/KR20030077777A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67282Marking devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/49105Connecting at different heights
    • H01L2224/49109Connecting at different heights outside the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)

Abstract

PURPOSE: A black ink coating layer composition for laser marking of a tape ball grid array package(TBGA) is provided to be capable of improving marking performance of the laser marking process. CONSTITUTION: A TBGA package is provided with a metal heat spreader(1), a ground plate having a cavity, attached on the upper portion of the heat spreader, and a semiconductor chip attached to the heat spreader in the cavity of the ground plate. A black ink coating layer(22) is formed at the upper portion of the heat spreader for improving marking performance. At this time, the black ink coating layer is made of a black ink coating composition containing bisphenol A type epoxy resin of 15-20 wt%, teflon of 5-10 wt%, titanium oxide of 9-10 wt%, amine of 8-10 wt% as a hardener, and carbon black of 2-3 wt%.

Description

테이프 볼 그리드 어레이 패키지의 레이저 마킹용 블랙 잉크 코팅층 조성물{BLACK INK COATING LAYER COMPOSITION FOR LASER MARKING OF TAPE BALL GRID ARRAY PACKAGE}Black ink coating layer composition for laser marking of tape ball grid array package {BLACK INK COATING LAYER COMPOSITION FOR LASER MARKING OF TAPE BALL GRID ARRAY PACKAGE}

본 발명은 테이프 볼 그리드 어레이(Tape Ball Grid Array) 패키지의 마킹 공정에 관한 것으로, 특히, 레이저 마킹 공정 적용시의 마킹 성능(Markability)을 향상시킬 수 있는 최적의 블랙 잉크 코팅층 조성물에 관한 것이다.The present invention relates to a marking process of a tape ball grid array (Tape Ball Grid Array) package, and more particularly, to an optimal black ink coating layer composition capable of improving the marking performance when applying a laser marking process.

일반적으로, 일련의 반도체 제조 공정을 통해 제조된 반도체 칩들은 조립 공정(Assembly Process)으로 보내져 개별 제품들로 패키징되며, 상기 조립 공정의 마지막 순서로서 패키지의 표면, 즉, 그 상하면에 제품명, 관리코드 및 조립날짜 등의 각종 정보를 표기하는 마킹 공정(Marking Process)을 거치게 된다.In general, semiconductor chips manufactured through a series of semiconductor manufacturing processes are sent to an assembly process and packaged into individual products, and as the final order of the assembly process, the product name, management code on the surface of the package, that is, the upper and lower surfaces thereof, are packaged. And it goes through a marking process (Marking Process) for displaying a variety of information, such as the assembly date.

상기 마킹 공정은 공정 방식에 따라 잉크(Ink) 인쇄에 의한 잉크 마킹과, 레이저(Laser) 조사에 의한 레이저 마킹으로 나눌 수 있으며, 기존에는 잉크 마킹 방식을 주로 사용하였으나, 최근에는 편의성 및 생산성 등을 고려하여 레이저 마킹 방식을 주로 이용하고 있다.The marking process can be divided into ink marking by ink printing and laser marking by laser irradiation according to the process method. In the past, the ink marking method was mainly used. In consideration of the laser marking method is mainly used.

즉, 상기 잉크 마킹 방식은 그 수행이 용이하고 비교적 선명한 마킹 효과를 얻을 수 있으나, 신뢰성 테스트시 또는 사용중에 마크가 지워지는 불량이 발생되고, 특히, 화학용액 사용으로 인해 환경 오염이 유발됨은 물론 작업 시간 및 비용 증가가 초래되는 단점을 갖는다. 이에 반해, 레이저 마킹 방식은 마킹후에 마크가 지워질 염려가 없으며, 특히, 마킹후에 경화과정을 거치지 않아도 되므로 생산성 및 품질향상을 도모할 수 있는 잇점을 갖는다.That is, the ink marking method can be easily performed and a relatively clear marking effect can be obtained, but defects in which the mark is erased during reliability testing or during use are generated, and in particular, environmental pollution is caused by the use of a chemical solution. It has the disadvantage of causing an increase in time and cost. On the other hand, the laser marking method does not have to worry that the mark is erased after marking, and in particular, since it does not need to undergo a curing process after marking, it has the advantage of improving productivity and quality.

따라서, 이러한 이유로 최근의 마킹 공정은 대부분 레이저 마킹 방식을 이용하고 있다.Therefore, for this reason, most of the recent marking processes use a laser marking method.

그러나, 상기 레이저 마킹 방식은 그 잇점에도 불구하고, 레이저가 조사되는 대상층의 종류 및 그 조성에 따라 마킹 성능(Markability), 즉, 마크의 선명도가 차이가 나타나는 문제점을 갖고 있어, 이에 대한 해결책이 요구된다.However, despite the advantages of the laser marking method, there is a problem in that the marking performance, that is, the sharpness of the mark varies depending on the type and composition of the target layer to which the laser is irradiated. do.

특히, 본 출원인에 의해 기제안된 테이프 볼 그리드 어레이(Tape Ball Grid Array : 이하, TBGA) 패키지에 레이저 마킹 방식을 적용함에 있어서, 현재는 구리재질의 히트 스프레더(Heat Spreader) 표면에 박막의 니켈층을 코팅한 상태로 레이저를 조사하고 있는데, 이 경우, 레이저 조사 대상층이 금속층인 것과 관련하여 마크의 선명도가 양호하지 못하다.In particular, in applying a laser marking method to a tape ball grid array (TBGA) package proposed by the present applicant, a thin nickel layer on the surface of a heat spreader made of copper is present. The laser is irradiated in the state of coating, but in this case, the sharpness of the mark is not good in relation to the laser irradiation target layer being a metal layer.

참고로, 본 출원인에 의해 제안된 TBGA 패키지는, 도 1에 도시된 바와 같이, 구리 재질의 히트 스프레더(1) 상에 캐버티(Cavity)를 갖으면서 적소에 은 도금(Ag Plating : 4)이 이루어진 접지판(2)이 부착되고, 상기 캐버티 내의 히트 스프레더 부분 상에 반도체 칩(3)이 부착되며, 상기 접지판(2) 상에는 구리배선(6) 및 솔더마스크(7)가 형성된 폴리이미드 테이프(5)가 부착되고, 상기 반도체 칩(3)과 구리배선(6)이 와이어 본딩되며, 상기 반도체 칩(3)과 골드와이어(8)를 포함한 영역이 봉지제(9)로 밀봉되고, 그리고, 노출된 구리배선(6) 상에 솔더 볼(10)이 부착된 구조를 갖으며, 이러한 TBGA 패키지에 대한 레이저 마킹은 외부로 노출된 히트 스프레더(1)의 표면에 박막의 니켈층(11)을 형성한 상태로 수행되고 있다.For reference, as shown in FIG. 1, the TBGA package proposed by the applicant has silver plating (Ag Plating) 4 in place while having a cavity on a copper heat spreader 1. A polyimide having a ground plate (2) formed thereon, a semiconductor chip (3) attached to a heat spreader portion in the cavity, and a copper wiring (6) and a solder mask (7) formed on the ground plate (2). A tape 5 is attached, the semiconductor chip 3 and the copper wiring 6 are wire bonded, an area including the semiconductor chip 3 and the gold wire 8 is sealed with an encapsulant 9, Then, the solder ball 10 is attached to the exposed copper wiring (6), the laser marking for this TBGA package is a thin nickel layer 11 on the surface of the heat spreader (1) exposed to the outside ) Is formed.

한편, 상기 TBGA 패키지에 잉크 마킹을 적용할 경우에는 기본적으로 잉크 마킹 방식에서의 문제점이 나타남은 물론, 솔더 볼 부착을 위한 리플로우 공정 및 플럭스 제거후의 클링닝 공정에서 사용되는 클리닝 용액에 의해 추가적인 마크 손상이 유발되어 마킹 성능이 크게 저하된다.On the other hand, when the ink marking is applied to the TBGA package, the problem of the ink marking is basically shown, as well as additional marks due to the cleaning solution used in the reflow process for solder ball attachment and the cleaning process after flux removal. Damage is caused and marking performance is greatly reduced.

결국, TBGA 패키지에 대한 마킹 성능을 안정적으로 확보할 수 있는 마킹 공정은 현재 이루어지지 않고 있다.As a result, the marking process that can secure the marking performance for the TBGA package is not currently made.

따라서, 본 발명은 상기의 문제점을 해결하기 위해 안출된 것으로, 레이저 마킹 공정에서의 마킹 성능을 향상시킬 수 있는 최적의 블랙 잉크 코팅층 조성물을제공함에 그 목적이 있다.Accordingly, an object of the present invention is to provide an optimum black ink coating layer composition capable of improving the marking performance in a laser marking process.

도 1은 기제안된 테이프 볼 그리드 어레이 패키지를 도시한 단면도.1 is a cross-sectional view of a proposed tape ball grid array package.

도 2는 본 발명에 따른 테이프 볼 그리드 어레이 패키지의 레이저 마킹 공정을 설명하기 위한 도면.2 is a view for explaining a laser marking process of the tape ball grid array package according to the present invention.

* 도면의 주요 부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings

1 : 히트 스프레더 21 : 구리 블랙 옥사이드층DESCRIPTION OF SYMBOLS 1: Heat spreader 21: Copper black oxide layer

22 : 블랙 잉크 코팅층 23 : 마크22: black ink coating layer 23: mark

상기와 같은 목적들을 달성하기 위한 본 발명의 TBGA 패키지의 레이저 마킹용 블랙 잉크 코팅층 조성물은, 금속 히트 스프레더와 상기 히트 스프레더 상에 부착되는 캐버티를 갖는 접지판 및 상기 캐버티 내의 히트 스프레더 부분 상에 부착되는 반도체 칩을 포함하는 TBGA 패키지에 레이저 마킹 공정을 적용함에 있어서의 마킹 성능을 향상시키기 위해 상기 금속 히트 스프레더 상에 코팅하는 블랙 잉크 코팅층 조성물에 있어서, 비스페놀 A 타입(Bisphenol A type)의 에폭시 레진을 15∼20wt% 함유하고, 테프론을 5∼10wt% 함유하며, 티타늄 옥사이드를 9∼10wt% 함유하고, 경화제로서 아민을 8∼10wt% 함유하며, 카본 블랙을 2∼3wt% 함유한 것을 특징으로 한다.The black ink coating layer composition for laser marking of the TBGA package of the present invention for achieving the above objects is a ground plate having a metal heat spreader and a cavity attached to the heat spreader and on the heat spreader portion in the cavity. In the black ink coating layer composition coated on the metal heat spreader to improve the marking performance in applying a laser marking process to a TBGA package including a semiconductor chip to be attached, a bisphenol A type epoxy resin 15 to 20 wt% of Teflon, 5 to 10 wt% of Teflon, 9 to 10 wt% of titanium oxide, 8 to 10 wt% of amine as a curing agent, and 2 to 3 wt% of carbon black. do.

본 발명에 따르면, TBGA 패키지에 대한 레이저 마킹 공정을 적용함에 있어서의 최적의 블랙 잉크 코팅층 조성을 설정함으로써 마킹 성능을 향상시킬 수 있으며, 아울러, TBGA 패키지에 대한 레이저 마킹 공정의 신뢰성을 확보할 수 있다.According to the present invention, the marking performance can be improved by setting an optimal black ink coating layer composition in applying the laser marking process for the TBGA package, and it is possible to secure the reliability of the laser marking process for the TBGA package.

(실시예)(Example)

이하, 첨부된 도면을 참조하여 본 발명의 바람직한 실시예를 보다 상세하게 설명하도록 한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

도 2는 본 발명에 따른 TBGA 패키지의 레이저 마킹 공정을 설명하기 위한 도면이다.2 is a view for explaining a laser marking process of the TBGA package according to the present invention.

도시된 바와 같이, 본 발명의 레이저 마킹 공정은, 구리 재질의 히트 스프레더 상에 산화 방지를 위한 박막의 니켈층을 코팅한 후에 상기 니켈층에 레이저를 조사하는 종래의 레이저 마킹 공정과는 달리, 히트 스프레더(1) 상에 블랙 잉크 코팅층(22)을 형성한 후, 이 블랙 잉크 코팅층(22)에 레이저를 조사하여 레이저 마킹(23)을 수행한다. 도면부호 21은 구리 재질의 히트 스프레더(1) 표면 상에 형성된 구리 블랙 옥사이드층을 나타낸다.As shown, the laser marking process of the present invention is different from the conventional laser marking process in which a nickel layer of a thin film for oxidation prevention is coated on a copper heat spreader and then the laser is irradiated to the nickel layer. After the black ink coating layer 22 is formed on the spreader 1, the black ink coating layer 22 is irradiated with a laser to perform laser marking 23. Reference numeral 21 denotes a copper black oxide layer formed on the surface of the heat spreader 1 made of copper.

자세하게, 본 발명은 TBGA 패키지에 레이저 마킹 공정을 적용함에 있어서, 우선, 패키지의 외부로 노출됨에 따라 표면에 구리 블랙 옥사이드층(21)이 형성된 구리 재질의 히트 스프레더(1) 상에 마킹 성능을 높이기 위해 0.015∼0.017㎜ 두께, 바람직하게는, 0.016㎜ 두께로 블랙 잉크 코팅층(22)을 형성하고, 그런다음, 상기 블랙 잉크 코팅층(22)에 YGA 레이저를 조사하여 대략 0.004∼0.010㎜ 깊이로 마크(23)을 형성한다.In detail, in the present invention, in applying a laser marking process to a TBGA package, first, to increase the marking performance on a copper heat spreader 1 having a copper black oxide layer 21 formed on a surface thereof as it is exposed to the outside of the package. To form a black ink coating layer 22 to a thickness of 0.015 to 0.017 mm, preferably 0.016 mm, and then irradiate the YGA laser to the black ink coating layer 22 to a depth of approximately 0.004 to 0.010 mm. 23).

여기서, 통상 사용되고 있는 블랙 잉크는 35∼65wt%의 솔벤트, 20∼30wt%의 에폭시 레진, 3∼5wt%의 카본 블랙 및 그 밖에 다른 성분들을 함유하는데, 이러한 블랙 잉크에 레이저 조사를 행하여 마크을 형성할 경우, 초기의 마크 선명도는 우수하지만, TBGA 패키지에 적용함에 따라 후속 공정, 예컨데, 솔더 볼 부착을 위한 리플로우 공정 및 플럭스 제거후의 클링닝 공정에서 사용되는 클리닝 용액에 의해 마크 손상이 유발되며, 그래서, 상기 기존의 블랙 잉크로는 TBGA 패키지에서의 마킹 성능을 확보할 수 없다.Here, commonly used black ink contains 35 to 65 wt% solvent, 20 to 30 wt% epoxy resin, 3 to 5 wt% carbon black, and other components, which are subjected to laser irradiation to form a mark. In this case, the initial mark clarity is good, but as applied to the TBGA package, the mark damage is caused by the cleaning solution used in the subsequent process, e.g. reflow process for solder ball attachment, and the cleaning process after flux removal. In the conventional black ink, marking performance in a TBGA package cannot be secured.

따라서, 본 발명은 TBGA 패키지에 레이저 마킹 공정을 적용함에 있어서, 마킹 성능을 확보할 수 있도록 상기 히트 스프레더 상에 코팅하는 블랙 잉크 코팅층의 조성을 비스페놀 A 타입(Bisphenol A type)의 에폭시 레진을 5∼20wt% 함유하고, 테프론을 5∼10wt% 함유하며, 티타늄 옥사이드를 9∼10wt% 함유하고, 경화제로서 아민(Amin)을 8∼10wt% 함유하며, 그리고, 카본 블랙은 2∼3wt% 함유하도록 하며, 이러한 최적의 블랙 잉크 코팅층의 조성을 찾아내고자 다음과 같은 실험을 수행하였다.Therefore, in the present invention, in applying a laser marking process to a TBGA package, the composition of the black ink coating layer coated on the heat spreader to secure marking performance is 5 to 20 wt% of bisphenol A type epoxy resin. %, 5-10 wt% of Teflon, 9-10 wt% of titanium oxide, 8-10 wt% of amine (Amin) as a curing agent, and 2-3 wt% of carbon black, In order to find the optimal composition of the black ink coating layer, the following experiment was performed.

하기의 표 1은 실험 진행 순서를 도시한 것이다.Table 1 below shows the procedure of the experiment.

(표 1)Table 1

공정fair 조건Condition 고려 사항Considerations 다이/어태치 경화Die / attach hardening 175±5℃/15분175 ± 5 ℃ / 15min 코팅물질이 반응하였는가?Did the coating react? 플라즈마plasma 300W/200초300 W / 200 seconds 코팅물질이 반응하였는가?Did the coating react? 와이어본딩Wire bonding W/B 가열(150℃/2분)W / B heating (150 ℃ / 2 minutes) 코팅물질이 반응하였는가?Did the coating react? 봉지제 경화Encapsulant Curing 125℃/30분 & 165℃/90분125 ℃ / 30min & 165 ℃ / 90min 코팅물질이 반응하였는가?Did the coating react? 마크Mark 레이저 마킹Laser marking 육안 검사Visual inspection 솔더볼실장 리플로우Solder Ball Mount Reflow 183℃/40초183 ° C / 40 seconds 마킹 색이 변하였는가?Did the marking color change? 클리닝Cleaning 코팅물질이 플럭스와 반응하였는가?Did the coating react with the flux? 베이크Bake 135℃/6시간135 ℃ / 6 hours 마킹 색이 변하였는가?Did the marking color change?

[실험 1][Experiment 1]

하기의 표 2 및 표 3은 불소(Fluorine) 성분비를 변경한 경우에서의 블랙 잉크 코팅층의 기본 물질 조성(Base Material Composition)과 불소 함량에 따른 마킹 성능을 나타낸 것이다.Tables 2 and 3 below show the marking performance according to the base material composition and fluorine content of the black ink coating layer when the fluorine component ratio is changed.

(표 2)Table 2

조성물(component)Component 함량(content)Content Epoxy Resin, Bisphenol A typeEpoxy Resin, Bisphenol A type 15∼20wt%15 to 20 wt% Carbon BlackCarbon black 2∼3wt%2-3 wt% P.T.F.EP.T.F.E 불소(Fluorine) 포함Fluorine SolventSolvent 10∼13wt%10-13 wt% n-butyl alcoholn-butyl alcohol 10∼13wt%10-13 wt% diaceton alcoholdiaceton alcohol 10∼13wt%10-13 wt% methyl isobutyl ketonmethyl isobutyl keton 15∼20wt%15 to 20 wt% xylxyl 10∼15wt%10-15 wt% Solvent ASolvent A 3wt% 미만Less than 3wt%

(표 3)Table 3

불소함량테스트 모드Fluorine content test mode 0wt%0wt% 5wt%5wt% 10wt%10wt% 15wt%15 wt% 내화학성Chemical resistance 낮음lowness 높음height 높음height 높음height 마킹 성능Marking performance 양호하지 않음Not good 양호하지 않음Not good 양호하지 않음Not good 양호하지 않음Not good 베이크후 색 변화Color change after baking 테스트 필요치 않음No test required

실험 1의 결과, 코팅층 성분이 플럭스(Flux) 용액에 녹았으며, 마킹 색이 불분명해졌으며, 또한, P.T.F.E(Poly Tetra Fluorine Ethylene) 성분이 마킹 색과 관련이 관련이 없음을 알았다.As a result of Experiment 1, it was found that the coating layer component was dissolved in the flux solution, the marking color became unclear, and the P.T.F.E (Poly Tetra Fluorine Ethylene) component was not related to the marking color.

[실험 2][Experiment 2]

하기의 표 4 및 표 5는 새로운 성분을 첨가한 경우에서의 블랙 잉크 코팅층의 기본 물질 조성과 새로운 성분에 따른 마킹 성능을 나타낸 것이다.Tables 4 and 5 below show the base material composition of the black ink coating layer and the marking performance according to the new component when a new component is added.

(표 4)Table 4

조성물(component)Component 함량(content)Content Epoxy Resin, Bisphenol AEpoxy Resin, Bisphenol A 15∼20wt%15 to 20 wt% Carbon BlackCarbon black 2∼3wt%2-3 wt% SolventSolvent n-butyl alcoholn-butyl alcohol 7∼10wt%7-10 wt% diaceton alcoholdiaceton alcohol 7∼10wt%7-10 wt% methyl isobutyl ketonmethyl isobutyl keton 10∼15wt%10-15 wt% xylxyl 7∼10wt%7-10 wt% Solvent ASolvent A 3wt% 미만Less than 3wt%

(표 5)Table 5

새로운 성분테스트모드New ingredient test mode SilkPolyethylene resin등급 A, 20∼30wt%SilkPolyethylene Resin Grade A, 20 ~ 30wt% PoltoPolyethylene resin등급 B, 20∼30wt%PoltoPolyethylene Resin Grade B, 20 ~ 30wt% PropylPolyethylene20∼30wt%PropylPolyethylene20-30wt% MSP실록산20∼30wt%MSP siloxane 20-30 wt% 내화학성Chemical resistance 높음height 높음height 높음height 높음height 마킹 성능Marking performance 양호하지 않음Not good 베이크후 색 변화Color change after baking 테스트 필요치 않음No test required

실험 2의 결과, 내화학성은 우수하지만, 마킹 색이 불분명하고, 레이저 마킹 성능 향상에 대한 성과가 크지 않았다.As a result of Experiment 2, the chemical resistance was excellent, but the marking color was unclear, and the result of the laser marking performance improvement was not great.

[실험 3][Experiment 3]

하기의 표 6 및 표 7은 페놀 경화제(Phenol Hardener)를 사용하며, 카본 블랙의 종류를 변경한 경우에서의 블랙 잉크 코팅층의 기본 물질 조성과 카본 블랙의 종류에 따른 마킹 성능을 나타낸 것이다.Tables 6 and 7 below show a marking performance according to the basic material composition of the black ink coating layer and the type of carbon black when a phenol hardener is used and the type of carbon black is changed.

(표 6)Table 6

조성물(component)Component 함량(content)Content Epoxy Resin, Bisphenol AEpoxy Resin, Bisphenol A 15∼20wt%15 to 20 wt% Carbon BlackCarbon black 2∼3wt%2-3 wt% Hardener, PhenolHardener, Phenol 3∼5wt%3-5 wt% SolventSolvent n-butyl alcoholn-butyl alcohol 10∼13wt%10-13 wt% diaceton alcoholdiaceton alcohol 10∼13wt%10-13 wt% methyl isobutyl ketonmethyl isobutyl keton 15∼20wt%15 to 20 wt% xylxyl 10∼15wt%10-15 wt% Solvent ASolvent A 3wt% 미만Less than 3wt%

(표 7)Table 7

카본 블랙테스트모드Carbon Black Test Mode 111111 211211 116116 411411 내화학성Chemical resistance 높음height 높음height 높음height 높음height 마킹신뢰성Marking Reliability 양호하지 않음Not good 양호하지 않음Not good 양호하지 않음Not good 양호하지 않음Not good 베이크후 색변화Color change after baking 테스트 필요치 않음No test required

표 7에서, 111은 덴카 블랙(Denka Black)을, 211은 퍼니스 내추럴 글래스 불칸 카본 블랙(Furnace Natural Glass Vulcane Carbon Black)을, 116은 퍼니스 패트로륨 카본 블랙(Fanrnace Petroleum Carbon Black)을, 그리고, 411은 채널 타입 카본 블랙(Channel Type Carbon Balck)을 각각 나타낸다.In Table 7, 111 is Denka Black, 211 is Furnace Natural Glass Vulcane Carbon Black, 116 is Furnace Petroleum Carbon Black, and 411 denotes Channel Type Carbon Balck, respectively.

실험 3의 결과, 페놀 경화제(Penol Hardener)를 사용하고 카본 블랙의 종류를 변경한 경우, 실험 2의 결과와 마찬가지로 내화학성은 우수한 반면, 마킹 색이 불분명하였다. 또한, 레이저 마킹 성능 향상을 위해서는 특별한 첨가제가 필요함을 알았다.As a result of Experiment 3, when the phenol hardener (Penol Hardener) was used and the type of carbon black was changed, the chemical resistance was excellent as in the Experiment 2, but the marking color was unclear. In addition, it was found that special additives are needed to improve the laser marking performance.

[실험 4][Experiment 4]

하기의 표 8 및 표 9는 테프론(Teflon), 티타늄 옥사이드(Titanium Oxide)와 경화제(Hardener)로서 아민 또는 페놀(Amin or Phenol)을 첨가한 경우에서의 블랙 잉크 코팅층의 기본 물질 조성과 첨가물에 따른 마킹 성능을 나타낸 것이다.Tables 8 and 9 below show the basic material composition and additives of the black ink coating layer when Teflon, Titanium Oxide, and amine or phenol (Amin or Phenol) were added as a hardener. Marking performance is shown.

(표 8)Table 8

조성물(component)Component 함량(content)Content Epoxy Resin, Bisphenol AEpoxy Resin, Bisphenol A 15∼20wt%15 to 20 wt% Carbon BlackCarbon black 2∼3wt%2-3 wt% SolventSolvent n-butyl alcoholn-butyl alcohol 7∼10wt%7-10 wt% diaceton alcoholdiaceton alcohol 7∼10wt%7-10 wt% methyl isobutyl ketonmethyl isobutyl keton 10∼15wt%10-15 wt% xylxyl 7∼10wt%7-10 wt% Solvent ASolvent A 3wt% 미만Less than 3wt%

(표 9)Table 9

타입성분/테스트모드Type Component / Test Mode 타입 AType A 타입 BType B 타입 CType C 타입 DType D 타입 EType E 테프롬(Teflon)Teflon 5∼10wt%5-10wt% 55∼10wt%55-10 wt% 5∼10wt%5-10wt% ×× 5∼10wt%5-10wt% 티타늄 옥사이드Titanium oxide 10wt%10wt% 15wt%15 wt% 20wt%20wt% 10wt%10wt% 10wt%10wt% 경화제 (3∼5%)Hardener (3-5%) 아민Amine 아민Amine 아민Amine 아민Amine 페놀phenol 내화학성Chemical resistance 높음height 높음height 높음height 높음height 높음height 마킹 성능Marking performance 한계 성능Marginal performance 양호하지않음Not good 양호하지않음Not good 양호하지않음Not good 한계 성능Marginal performance 마킹 색Marking color 화이트White 판독할 수 없음Unreadable 다크 옐로우Dark yellow

실험 4의 결과, 전체적으로 내화학성이 좋으며, 특히, 타입 A 및 E는 마킹 성능이 비교적 양호하였다. 또한, 에폭시와 테프론의 함량이 레이저 마킹의 중요 요인임을 알았으며, 티타늄 옥사이드는 화이트 마킹과 관련이 있고, 페놀 타입의 경화제는 옐로우 계열의 마킹과 관련이 있음을 알았다.As a result of Experiment 4, the chemical resistance was good as a whole, in particular, type A and E had a relatively good marking performance. In addition, it was found that the content of epoxy and Teflon was an important factor for laser marking, titanium oxide was associated with white marking, and phenolic type curing agent was associated with yellow-based marking.

[실험 5][Experiment 5]

하기의 표 10 및 표 11은 실험 4의 기본 물질 조성에 티타늄 옥사이드와 경화제로서 아민 및 페놀을 적정한 비율로 첨가한 경우에서의 블랙 잉크 코팅층의 기본 물질 조성과 첨가물에 따른 마킹 성능을 나타낸 것이다.Table 10 and Table 11 below show the marking performance according to the base material composition and additives of the black ink coating layer in the case where an appropriate ratio of titanium oxide and amine and phenol as the curing agent were added to the base material composition of Experiment 4.

(표 10)Table 10

조성물(component)Component 함량(content)Content Epoxy Resin, Bisphenol AEpoxy Resin, Bisphenol A 15∼20wt%15 to 20 wt% Carbon BlackCarbon black 2∼3wt%2-3 wt% SolventSolvent n-butyl alcoholn-butyl alcohol 7∼10wt%7-10 wt% diaceton alcoholdiaceton alcohol 7∼10wt%7-10 wt% methyl isobutyl ketonmethyl isobutyl keton 10∼15wt%10-15 wt% xylxyl 7∼10wt%7-10 wt% Solvent ASolvent A 3wt% 미만Less than 3wt%

(표 11)Table 11

타입성분/테스트모드Type Component / Test Mode 타입 FType F 타입 GType G 타입 HType H 타입 IType I 테프롬(Teflon)Teflon 5∼10wt%5-10wt% 55∼10wt%55-10 wt% 5∼10wt%5-10wt% 5∼10wt%5-10wt% 티타늄 옥사이드Titanium oxide 10wt%10wt% 15v%15v% 20wt%20wt% 10wt%10wt% 경화제(아민 : 페놀)Curing agent (amine: phenol) 7 : 37: 3 3 : 73: 7 10 : 010: 0 5 : 55: 5 내화학성Chemical resistance 높음height 높음height 높음height 높음height 마킹 성능Marking performance 한계성능(marginal)Marginal performance 양호Good 한계성능(marginal)Marginal performance 양호Good 마킹 색Marking color 화이트(white)White 화이트White 그레이(gray)Gray 그레이Gray 베이크후 색After baking color 그레이(gray)Gray

실험 5의 결과, 티타늄 옥사이드와 아민 및 페놀의 경화제가 첨가된 경우, 내화학성이 우수하고, 특히, 마킹 성능이 우수한 결과를 얻었다. 아울러, 마킹 색이 베이크 후에 그레이(gray)로 변했음을 관찰하였다.As a result of Experiment 5, when a hardening agent of titanium oxide, amine and phenol was added, excellent chemical resistance was obtained, and in particular, excellent marking performance was obtained. In addition, it was observed that the marking color changed to gray after baking.

상기의 실험 1∼5의 결과, TBGA 패키지에 대한 레이저 마킹의 성능을 최대한 얻기 위해서는 블랙 잉크 코팅층의 조성을 비스페놀 A 타입의 에폭시 레진, 테프론, 티타늄 옥사이드, 아민 경화제 및 카본 블랙을 포함하도록 해야 한다.As a result of the above experiments 1 to 5, in order to maximize the performance of laser marking on the TBGA package, the composition of the black ink coating layer should include bisphenol A type epoxy resin, teflon, titanium oxide, amine curing agent, and carbon black.

따라서, 본 발명은 블랙 잉크 코팅층의 조성을 비스페놀 A 타입의 에폭시 레진을 5∼20% 함유하도록 하고, 화학적 열적 저항력을 증대시킬 수 있는 테프론을 5∼10% 함유하도록 하며, 화이트의 마킹 색과 관련이 있는 티타늄 옥사이드를9∼10% 함유하도록 하고, 경화제로서 아민을 8∼10wt% 함유하도록 하며, 그리고, 카본 블랙을 2∼3wt% 함유하도록 하여 TBGA 패키지에 대한 레이저 마킹 공정시의 마킹 성능을 향상시킨다.Therefore, the present invention is intended to contain 5 to 20% of bisphenol A type epoxy resin and 5 to 10% of Teflon which can increase chemical and thermal resistance. Improved marking performance during the laser marking process for TBGA packages by containing 9-10% titanium oxide, 8-10 wt% amine as a curing agent, and 2-3 wt% carbon black. .

이상에서 설명한 바와 같이, 본 발명은 TBGA 패키지에 레이저 마킹을 수행함에 있어서 히트 스프레더 표면에 코팅되는 블랙 잉크 코팅층의 조성을 최적화시킴으로써, 열적, 화학적, 기계적 외부 환경에 대해서 마킹 성능을 향상시킬 수 있으며, 그래서, TGBA 패키지에 대한 레이저 마킹 공정의 신뢰성을 확보할 수 있음은 물론, 더나아가, 제품 신뢰성을 확보할 수 있다.As described above, the present invention can improve the marking performance against thermal, chemical and mechanical external environments by optimizing the composition of the black ink coating layer coated on the surface of the heat spreader when performing laser marking on the TBGA package. In addition, the reliability of the laser marking process for the TGBA package can be secured, and furthermore, the product reliability can be secured.

기타, 본 발명은 그 요지를 일탈하지 않는 범위에서 다양하게 변경하여 실시할 수 있다.In addition, this invention can be implemented in various changes within the range which does not deviate from the summary.

Claims (1)

금속 히트 스프레더와 상기 히트 스프레더 상에 부착되는 캐버티를 갖는 접지판 및 상기 캐버티 내의 히트 스프레더 부분 상에 부착되는 반도체 칩을 포함하는 테이프 볼 그리드 어레이(Tape Ball Grid Array) 패키지에 레이저 마킹 공정을 적용함에 있어서의 마킹 성능을 향상시키기 위해 상기 금속 히트 스프레더 상에 코팅하는 블랙 잉크 코팅층 조성물에 있어서,A laser marking process is applied to a tape ball grid array package comprising a metal heat spreader, a ground plate having a cavity attached to the heat spreader, and a semiconductor chip attached to the heat spreader portion within the cavity. In the black ink coating layer composition coated on the metal heat spreader to improve the marking performance in the application, 비스페놀 A 타입(Bisphenol A type)의 에폭시 레진을 15∼20wt% 함유하고, 테프론을 5∼10wt% 함유하며, 티타늄 옥사이드를 9∼10wt% 함유하고, 경화제로서 아민을 8∼10wt% 함유하며, 카본 블랙을 2∼3wt% 함유한 것을 특징으로 하는 테이프 볼 그리드 어레이 패키지의 레이저 마킹용 블랙 잉크 코팅층 조성물.It contains 15-20 wt% of bisphenol A type epoxy resin, 5-10 wt% of teflon, 9-10 wt% of titanium oxide, 8-10 wt% of amine as a curing agent, and carbon A black ink coating layer composition for laser marking of a tape ball grid array package, comprising 2-3 wt% of black.
KR1020020016655A 2002-03-27 2002-03-27 Black ink coating layer composition for laser marking of tape ball grid array package KR20030077777A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020020016655A KR20030077777A (en) 2002-03-27 2002-03-27 Black ink coating layer composition for laser marking of tape ball grid array package

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020020016655A KR20030077777A (en) 2002-03-27 2002-03-27 Black ink coating layer composition for laser marking of tape ball grid array package

Publications (1)

Publication Number Publication Date
KR20030077777A true KR20030077777A (en) 2003-10-04

Family

ID=32376802

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020016655A KR20030077777A (en) 2002-03-27 2002-03-27 Black ink coating layer composition for laser marking of tape ball grid array package

Country Status (1)

Country Link
KR (1) KR20030077777A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100018957A1 (en) * 2006-12-19 2010-01-28 Siltech Limited Laser marking

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01254743A (en) * 1988-02-18 1989-10-11 Bayer Ag Laser writable molded article
KR19990055606A (en) * 1997-12-27 1999-07-15 유현식 Epoxy Resin Compositions for Semiconductor Device Sealing
KR20000009057A (en) * 1998-07-21 2000-02-15 유현식 Composition of semiconductor device epoxy resins which is an excellent marking properties
JP2002249640A (en) * 2001-02-22 2002-09-06 Toray Ind Inc Resin-sealed semiconductor device and epoxy resin composition for sealing semiconductor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01254743A (en) * 1988-02-18 1989-10-11 Bayer Ag Laser writable molded article
KR19990055606A (en) * 1997-12-27 1999-07-15 유현식 Epoxy Resin Compositions for Semiconductor Device Sealing
KR20000009057A (en) * 1998-07-21 2000-02-15 유현식 Composition of semiconductor device epoxy resins which is an excellent marking properties
JP2002249640A (en) * 2001-02-22 2002-09-06 Toray Ind Inc Resin-sealed semiconductor device and epoxy resin composition for sealing semiconductor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100018957A1 (en) * 2006-12-19 2010-01-28 Siltech Limited Laser marking
US9498999B2 (en) * 2006-12-19 2016-11-22 Siltech Limited Laser marking

Similar Documents

Publication Publication Date Title
US10834823B2 (en) Producing metal/ceramic circuit board by removing residual silver
US6524881B1 (en) Method and apparatus for marking a bare semiconductor die
KR20000028558A (en) Thermosetting resin composition
CN105493270A (en) Resin sheet for sealing electronic device and method for manufacturing electronic device package
JP2989406B2 (en) Preplated frame for semiconductor device and method of manufacturing the same
JP2009141147A (en) Manufacturing method of semiconductor device
KR20030077777A (en) Black ink coating layer composition for laser marking of tape ball grid array package
JP2009013264A (en) Epoxy resin composition for sealing optical semiconductor element and optical semiconductor device using the same
JP2013236037A (en) Semiconductor module and manufacturing method of the same
JP2007039521A (en) Thermosetting resin composition, translucent cured product obtained by thermosetting composition, light-emitting diode sealed with cured product
US6413619B1 (en) Method of making ceramic member and marked ceramic member
JP2010073830A (en) Lead frame and method of manufacturing same
KR20030095195A (en) Lead frame and method of manufacturing the same, and semiconductor device
US20160316572A1 (en) Method for mounting a component on a substrate
US10665563B2 (en) Semiconductor chip packaging structure without soldering wire, and packaging method thereof
JPH06177268A (en) Fabrication of semiconductor device
WO2022014318A1 (en) Insulating substrate and method for manufacturing same
TWI375313B (en) Semiconductor package having marking layer
JP2006036941A (en) Epoxy resin composition for sealing semiconductor, and semiconductor device obtained using the same
JPH0817951A (en) Semiconductor device
JPH06283623A (en) Semiconductor package
KR100548012B1 (en) Semiconductor package
JP2740162B2 (en) Semiconductor device
JP2001002894A (en) Epoxy resin composition for sealing semiconductor and semiconductor system using the same
JP2002275246A (en) Epoxy resin composition and semiconductor device

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application