JPH04222818A - Epoxy resin composition for sealing semi-conductor - Google Patents
Epoxy resin composition for sealing semi-conductorInfo
- Publication number
- JPH04222818A JPH04222818A JP41817590A JP41817590A JPH04222818A JP H04222818 A JPH04222818 A JP H04222818A JP 41817590 A JP41817590 A JP 41817590A JP 41817590 A JP41817590 A JP 41817590A JP H04222818 A JPH04222818 A JP H04222818A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- oxide
- laser
- resin composition
- marking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 35
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 35
- 239000000203 mixture Substances 0.000 title claims abstract description 16
- 239000004065 semiconductor Substances 0.000 title claims description 17
- 238000007789 sealing Methods 0.000 title description 6
- 239000003086 colorant Substances 0.000 claims abstract description 27
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims abstract description 14
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 claims abstract description 14
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims abstract description 8
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000005751 Copper oxide Substances 0.000 claims abstract description 7
- 229910000431 copper oxide Inorganic materials 0.000 claims abstract description 7
- 239000011256 inorganic filler Substances 0.000 claims abstract description 4
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 4
- 239000005011 phenolic resin Substances 0.000 claims abstract description 4
- 239000011342 resin composition Substances 0.000 claims description 6
- 238000005538 encapsulation Methods 0.000 claims description 4
- 239000004615 ingredient Substances 0.000 claims 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract description 24
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract description 12
- 239000001569 carbon dioxide Substances 0.000 abstract description 11
- 239000003795 chemical substances by application Substances 0.000 abstract description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 6
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 abstract description 4
- 239000005350 fused silica glass Substances 0.000 abstract description 4
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract description 3
- 229920001568 phenolic resin Polymers 0.000 abstract description 3
- 229920002545 silicone oil Polymers 0.000 abstract description 3
- -1 silicone oil) Chemical class 0.000 abstract description 2
- 238000010330 laser marking Methods 0.000 description 13
- 229920003986 novolac Polymers 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- 239000011572 manganese Substances 0.000 description 7
- 239000012778 molding material Substances 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 239000010949 copper Substances 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 239000006229 carbon black Substances 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 4
- 239000003566 sealing material Substances 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000001066 destructive effect Effects 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910002026 crystalline silica Inorganic materials 0.000 description 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 2
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000006082 mold release agent Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910016516 CuFe2O4 Inorganic materials 0.000 description 1
- 229910016526 CuMn2O4 Inorganic materials 0.000 description 1
- 229910002551 Fe-Mn Inorganic materials 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- DXKGMXNZSJMWAF-UHFFFAOYSA-N copper;oxido(oxo)iron Chemical compound [Cu+2].[O-][Fe]=O.[O-][Fe]=O DXKGMXNZSJMWAF-UHFFFAOYSA-N 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- CAYGQBVSOZLICD-UHFFFAOYSA-N hexabromobenzene Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1Br CAYGQBVSOZLICD-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】炭酸ガスレーザーおよびYAGレ
ーザーのいずれのレーザー捺印装置によっても本発明は
表面に鮮明なマーキングを施すことができる樹脂封止半
導体装置用エポキシ樹脂組成物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for use in resin-sealed semiconductor devices, which allows clear markings to be made on the surface using either a carbon dioxide gas laser or a YAG laser marking device.
【0002】0002
【従来の技術】近年、環境問題により樹脂封止半導体装
置の捺印は、フロン、塩素系溶剤による前洗浄の必要な
インク捺印からレーザー発振器から発生するレーザーを
、型抜きしたマスクを通し、その光像を前記半導体装置
上に集束して、所定のマーキングを施すか直接レーザー
ビームで半導体装置上に文字を描くレーザー捺印方法に
移行してきている。レーザー捺印方式としては、炭酸ガ
スレーザーによるパルス捺印(マスクタイプ)並びにY
AGレーザーによるパルス捺印(マスクタイプ)および
スキャン捺印(一筆書き)がある。[Prior Art] In recent years, due to environmental issues, marking of resin-sealed semiconductor devices has become difficult.In addition to ink marking, which requires pre-cleaning with fluorocarbon or chlorine-based solvents, the laser emitted from a laser oscillator is passed through a die-cut mask. A shift has been made to a laser marking method in which a predetermined marking is performed by focusing an image on the semiconductor device, or characters are drawn directly on the semiconductor device with a laser beam. Laser marking methods include pulse marking using a carbon dioxide laser (mask type) and Y
There are pulse markings (mask type) and scan markings (single stroke) using an AG laser.
【0003】このマーキング方式は、レーザービームの
エネルギーにより樹脂封止半導体装置の表面層を数μm
〜数10μmの深さに破壊して表面を粗面化し、この破
壊部と非破壊部の表面性状の対比によってマーキングと
して視覚的に認識させる方式である。しかしながら、上
記のようなレーザーを用いてマーキングを施す場合、従
来の樹脂封止半導体装置では、上記破壊部と非破壊部と
の対比が必ずしも良好とはならず、したがってインク捺
印と比較してマーキングが鮮明に見えないという様な欠
点を有していた。This marking method uses the energy of a laser beam to mark the surface layer of a resin-sealed semiconductor device by several micrometers.
In this method, the surface is roughened by breaking to a depth of several tens of micrometers, and the marking is visually recognized by comparing the surface properties of the broken part and the non-destructed part. However, when marking is performed using a laser as described above, in conventional resin-sealed semiconductor devices, the contrast between the destroyed portion and the non-destructive portion is not necessarily good, and therefore the marking is more difficult than with ink marking. It had the disadvantage that it could not be seen clearly.
【0004】さらに最近の高集積化の動きの中で主流と
なっている低応力封止材料は応力を低減する目的でシリ
コーン化合物が添加されている為従来材と比較してより
捺印が不鮮明であり視認性の向上が強く望まれている。Furthermore, the low-stress sealing materials that have become mainstream in the recent trend toward higher integration contain silicone compounds for the purpose of reducing stress, so the markings are less clear than conventional materials. There is a strong desire to improve visibility.
【0005】こうした状況の中で視認性の向上の為種々
の検討がなされており、特に着色剤の成分を調整するこ
とが有効であることがわかっている。例えば炭酸ガスレ
ーザー捺印に対してジアゾ系、アジン系染料が視認性の
向上に効果的であるとの特許(例えば特開昭60−11
9760)も出願されている。ところがこういった着色
剤は炭酸ガスレーザーでは良好な捺印を示しても、YA
Gレーザーになると全くレーザーエネルギーを吸収でき
ず、したがって捺印が全く視認できない状態となる。こ
れは炭酸ガスレーザーとYAGレーザーのレーザー波長
の違いによるものと思われる。Under these circumstances, various studies have been made to improve visibility, and it has been found that adjusting the components of the colorant is particularly effective. For example, a patent states that diazo and azine dyes are effective in improving the visibility of carbon dioxide laser marks (e.g., JP-A No. 60-11
No. 9760) has also been filed. However, although these colorants show good marking with a carbon dioxide laser, they cannot be used with YA.
When the laser becomes a G laser, no laser energy can be absorbed, and therefore the stamp cannot be visually recognized at all. This seems to be due to the difference in laser wavelength between the carbon dioxide laser and the YAG laser.
【0006】一方カーボンブラックはYAGレーザーで
は良好な捺印を示すが炭酸ガスレーザーになると視認性
が悪い欠点がある。現状では、炭酸ガスレーザー捺印機
とYAGレーザー捺印機両方とも使われている為、どち
らのレーザータイプでも視認性の良い半導体封止用エポ
キシ樹脂組成物の開発が望まれている。On the other hand, carbon black shows good marking with a YAG laser, but has the disadvantage of poor visibility when using a carbon dioxide laser. Currently, both carbon dioxide gas laser marking machines and YAG laser marking machines are used, so it is desired to develop an epoxy resin composition for semiconductor encapsulation that has good visibility with both laser types.
【0007】上記のように従来のエポキシ樹脂封止材で
は炭酸ガスレーザー捺印およびYAGレーザー捺印のど
ちらのレーザータイプでも良好な視認性を示すものがな
かった。As described above, none of the conventional epoxy resin sealing materials exhibits good visibility in both laser types, carbon dioxide gas laser marking and YAG laser marking.
【0008】[0008]
【発明が解決しようとする課題】本発明はこのような事
情に鑑みなされたもので、炭酸ガスレーザー捺印機、Y
AGレーザー捺印機のいずれで捺印されても比較的暗い
雰囲下でも、また樹脂成形部分が灰色、黒色等でもレー
ザーによるマーキングが明瞭に見える半導体封止用エポ
キシ樹脂組成物を提供するものである。[Problems to be Solved by the Invention] The present invention was made in view of the above circumstances, and includes a carbon dioxide gas laser marking machine, Y
To provide an epoxy resin composition for semiconductor encapsulation in which the laser marking is clearly visible even when stamped with any AG laser marking machine in a relatively dark atmosphere and even when the resin molded part is gray or black. .
【0009】[0009]
【課題を解決するための手段】本発明は無機充填材、エ
ポキシ樹脂、フェノール樹脂、硬化促進剤、シリコーン
化合物および酸化銅・酸化鉄・酸化マンガン系着色剤を
必須成分とし、全体の樹脂組成物中に酸化銅・酸化鉄・
酸化マンガン系着色剤を0.1〜3.0重量%含有する
ことからなる半導体封止用エポキシ樹脂組成物である。[Means for Solving the Problems] The present invention includes an inorganic filler, an epoxy resin, a phenolic resin, a curing accelerator, a silicone compound, and a coloring agent based on copper oxide, iron oxide, and manganese oxide as essential components, and the entire resin composition. Copper oxide, iron oxide,
This is an epoxy resin composition for semiconductor encapsulation containing 0.1 to 3.0% by weight of a manganese oxide colorant.
【0010】すなわちエポキシ樹脂組成物としては、従
来から熱硬化性樹脂、特にエポキシ樹脂を主成分とする
ものが広く用いられている。このようなエポキシ樹脂を
主成分とする樹脂組成物は、一般にエポキシ樹脂以外に
、通常、硬化剤、硬化促進剤、充填剤、離型剤が配合さ
れ、必要に応じて難燃剤、着色剤、カップリング剤等が
配合される。上記顔料としては、通常、カーボンブラッ
クやジアゾ染料が用いられている。このような樹脂組成
物を用いて封止して得られる樹脂封止半導体装置では、
先に述べたように炭酸ガス、YAGのいずれのレーザー
においてもレーザー光による半導体装置表面の破壊部と
非破壊部との対比が鮮明とはいえずマーキングが明瞭に
は見えない。That is, as epoxy resin compositions, thermosetting resins, particularly those containing epoxy resin as a main component, have been widely used. In addition to the epoxy resin, such resin compositions containing epoxy resin as a main component generally contain a curing agent, a curing accelerator, a filler, a mold release agent, and, if necessary, a flame retardant, a colorant, Coupling agents and the like are added. As the pigment, carbon black or diazo dye is usually used. In a resin-sealed semiconductor device obtained by sealing using such a resin composition,
As mentioned above, in both carbon dioxide and YAG lasers, the contrast between the damaged and non-destructed areas on the surface of the semiconductor device caused by the laser beam is not clear, and the markings cannot be clearly seen.
【0011】本発明者は、レーザー光による半導体装置
表面の破壊部と非破壊部との対比の鮮明さを得ることを
目的として研究を重ねた結果、金属酸化物着色剤が大き
な影響を及ぼすことをつきとめ、この顔料を中心にさら
に研究を重ねた結果、酸化銅・酸化鉄・酸化マンガン系
着色剤(以下Cu・Fe・Mn系着色剤という)を用い
るといずれのレーザーによるマーキングに際しても破壊
部と非破壊部との対比が鮮明になることを見いだした。
そして、これにもとづきさらに研究を重ねた結果、樹脂
組成物中にCu・Fe・Mn系着色剤を0.1〜3.0
重量%(以下「%」と略す)含有させるようにすると、
特にマーキングの鮮明性が向上し、半導体装置の樹脂成
形部分が、灰色、黒色等の有色であっても、また比較的
暗い雰囲気下であってもマーキングが明瞭に認められる
ようになることを見いだし、この発明に到達した。[0011] As a result of repeated research with the aim of obtaining a clear contrast between the destroyed and non-destructed areas on the surface of a semiconductor device caused by laser light, the inventor has found that metal oxide colorants have a large effect. As a result of further research focusing on this pigment, we found that when copper oxide, iron oxide, and manganese oxide colorants (hereinafter referred to as Cu, Fe, and Mn colorants) are used, the broken parts are not damaged when marking with any laser. It was found that the contrast between the non-destructive part and the non-destructive part becomes clear. As a result of further research based on this, we found that 0.1 to 3.0 of Cu/Fe/Mn colorants were added to the resin composition.
When it is made to contain % by weight (hereinafter abbreviated as "%"),
In particular, we have found that the clarity of markings has been improved, and the markings can be clearly recognized even if the resin molded parts of semiconductor devices are colored such as gray or black, or even in a relatively dark atmosphere. , arrived at this invention.
【0012】本発明の封止用エポキシ樹脂組成物はエポ
キシ樹脂、硬化剤、硬化促進剤、シリコーン化合物およ
び溶融シリカあるいは 結晶シリカ等の無機充填材を
必須成分とするが、これ以外に必要に応じてシランカッ
プリング剤、ブロム化エポキシ樹脂、三酸化アンチモン
、ヘキサブロムベンゼン等の難燃剤、天然ワックス、合
成ワックス等の離型剤および種々の添加剤を適宜配合し
ても差し支えがない。The epoxy resin composition for sealing of the present invention contains an epoxy resin, a curing agent, a curing accelerator, a silicone compound, and an inorganic filler such as fused silica or crystalline silica as essential components. There is no problem in adding a silane coupling agent, a brominated epoxy resin, a flame retardant such as antimony trioxide or hexabromobenzene, a mold release agent such as natural wax or synthetic wax, and various additives as appropriate.
【0013】また、本発明の封止用エポキシ樹脂組成物
を成形材料として製造するには、エポキシ樹脂、硬化剤
、硬化促進剤、シリコーン化合物、充填材、その他添加
剤をミキサー等によって十分に均一に混合した後、更に
熱ロールまたはニーダー等で溶融混練し、冷却後粉砕し
て成形材料とすることができる。[0013] In order to produce the epoxy resin composition for sealing of the present invention as a molding material, the epoxy resin, curing agent, curing accelerator, silicone compound, filler, and other additives are sufficiently uniformly mixed using a mixer or the like. After mixing, the mixture is further melt-kneaded using a hot roll or a kneader, cooled, and then pulverized to obtain a molding material.
【0014】これらの成形材料は電子部品あるいは電子
部品の封止、被覆、絶縁に適用することができる。本発
明に用いるエポキシ樹脂としては、その分子中にエポキ
シ基を少なくとも2個以上有する化合物であれば分子構
造、分子量などは特に制限はなく、一般に封止用材料と
して使用されているものであり、例えばビスフェノール
A型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、
ビスフェノールS型エポキシ樹脂、フェノールノボラッ
ク型エポキシ樹脂、クレゾールノボラック型エポキシ樹
脂、脂環式エポキシ型エポキシ樹脂、グリシジルエステ
ル型エポキシ樹脂、ジリシジルアミン型エポキシ樹脂、
イソシアヌレート型エポキシ樹脂、ビスフェノールAま
たはビスフェノールFとホルムアルデヒドの重縮合物グ
リシジルエーテル化物およびそれらのハロゲン化物、水
素添加物などが挙げられ、これらは単独もしくは2種以
上混合して用いても差し支えない。[0014] These molding materials can be applied to electronic parts or for sealing, covering, and insulating electronic parts. The epoxy resin used in the present invention is not particularly limited in molecular structure, molecular weight, etc. as long as it is a compound having at least two or more epoxy groups in its molecule, and is generally used as a sealing material. For example, bisphenol A type epoxy resin, bisphenol F type epoxy resin,
Bisphenol S type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, alicyclic epoxy type epoxy resin, glycidyl ester type epoxy resin, dilycidylamine type epoxy resin,
Examples include isocyanurate type epoxy resins, glycidyl etherified polycondensates of bisphenol A or bisphenol F and formaldehyde, and halogenated and hydrogenated products thereof, and these may be used alone or in combination of two or more.
【0015】また、硬化剤としてはノボラック型フェノ
ール樹脂系およびこれらの変性樹脂であり、例えばフェ
ノールノボラック、o−クレゾールノボラックの他アル
キル変性したフェノールノボラック樹脂等が挙げられ、
これらは単独もしくは2種以上混合して使用しても差し
支えがない。[0015] The curing agent is a novolak type phenolic resin or a modified resin thereof, such as phenol novolac, o-cresol novolac, or alkyl-modified phenol novolak resin.
These may be used alone or in combination of two or more without any problem.
【0016】エポキシ樹脂と硬化剤の配合比はエポキシ
樹脂のエポキシ基と硬化剤の水酸基との当量比が住0.
5〜5の範囲内にあることが望ましい。当量比が0.5
未満または5を越えたものは耐湿性、成形作業性および
硬化物の電気特性が悪くなるので好ましくない。The compounding ratio of the epoxy resin and the curing agent is such that the equivalent ratio of the epoxy groups of the epoxy resin to the hydroxyl groups of the curing agent is 0.
It is desirable that it be within the range of 5 to 5. Equivalence ratio is 0.5
If it is less than 5 or more than 5, the moisture resistance, molding workability, and electrical properties of the cured product will deteriorate, so it is not preferable.
【0017】本発明に使用される硬化促進剤はエポキシ
基とフェノール性水酸基との反応を促進するものであれ
ば良く、一般に封止用材料に使用されているものを広く
使用することができ、例えばジアザビシクロウンデセン
(DBU)、トリフェニルホスフィン(TPP)、ジメ
チルベンジルアミン(BDMA)や2メチルイミダゾー
ル(2MZ)等が単独もしくは2種以上混合して用いら
れる。The curing accelerator used in the present invention may be one that promotes the reaction between the epoxy group and the phenolic hydroxyl group, and a wide variety of those commonly used in sealing materials can be used. For example, diazabicycloundecene (DBU), triphenylphosphine (TPP), dimethylbenzylamine (BDMA), 2methylimidazole (2MZ), and the like are used alone or in combination of two or more.
【0018】本発明に用いられる充填材は、溶融シリカ
、結晶シリカ、アルミナ窒化珪素、酸化マグネシウム等
が挙げられ、これは単独もしくは2種以上混合して使用
しても差し支えない。シリコーン化合物としてはシリコ
ーンオイル、シリコーンゴム、シリコーンゲル等が挙げ
られ単独もしくは2種以上混合して使用してもかまわず
エポキシ樹脂組成物中に低応力性を賦与する為配合され
る。着色剤としてはCu・Fe・Mn系着色剤が用いら
れるがこの着色剤はCuFe2O4とCuMn2O4の
固溶体と考えられるスピネル構造をとっている微粉末で
ある。Fillers used in the present invention include fused silica, crystalline silica, alumina silicon nitride, magnesium oxide, etc., and these may be used alone or in combination of two or more. Examples of silicone compounds include silicone oil, silicone rubber, and silicone gel, which may be used alone or in combination of two or more, and are blended in order to impart low stress properties to the epoxy resin composition. As the colorant, a Cu-Fe-Mn colorant is used, and this colorant is a fine powder having a spinel structure, which is considered to be a solid solution of CuFe2O4 and CuMn2O4.
【0019】このCu・Fe・Mn系着色剤は組成物全
体中に0.1〜3%、さらに好ましくは0.3〜1.5
%含有されるのが良い。すなわちCu・Fe・Mn系着
色剤の添加量が0.1%未満の時は、破壊部と非破壊部
との対比が鮮明でなくなり、逆に3%を超えるときには
樹脂封止された半導体装置の信頼性(耐湿性)が低下す
る等の欠点を生じるからである。特にチタンブラックの
含有量を0.3〜1.5%に設定するときにマーキング
が著しく鮮明となる。なお、上記着色剤と共に、従来か
ら樹脂組成物に添加される着色剤、例えばカーボンブラ
ック、有機染料等を用いても差支えはない。このように
、着色剤としてCu・Fe・Mn系着色剤を用いること
がこの発明の大きな特徴であり、これによって比較的暗
い雰囲気下や樹脂成形部分が、灰色、黒色等であっても
明瞭なマーキングがなされるようになるのである。[0019] This Cu/Fe/Mn colorant is contained in the entire composition in an amount of 0.1 to 3%, more preferably 0.3 to 1.5%.
% content is preferable. In other words, when the amount of Cu/Fe/Mn colorant added is less than 0.1%, the contrast between the destroyed part and the non-destructed part is not clear, whereas when it exceeds 3%, the resin-sealed semiconductor device This is because disadvantages such as a decrease in reliability (moisture resistance) occur. In particular, when the content of titanium black is set to 0.3 to 1.5%, the marking becomes extremely clear. In addition, there is no problem in using colorants conventionally added to resin compositions, such as carbon black, organic dyes, etc., in addition to the above-mentioned colorants. As described above, a major feature of this invention is the use of Cu/Fe/Mn colorants as colorants, which allows for clear coloring even in a relatively dark atmosphere or on resin molded parts, such as gray or black. Markings will be made.
【0020】以下本発明を実施例で具体的に示す。The present invention will be specifically illustrated below with examples.
【0021】[0021]
【実施例】実施例1
溶融シリカ
6
7.0重量部oークレゾールノボラックエポキシ樹脂
16.0重量部
(エポキシ当量200、軟化点65℃)フェノールノ
ボラック樹脂
9.0重量部 (OH当
量104、軟化点100℃)ブロム化ビスフェノールA
型エポキシ樹脂
1.7重量部 (Br含有量46%、エポキシ当量3
60)DBU
0.2重量部三酸化アンチモン
1.7重量部カルナバワックス
0.3重量部シリコーン
オイル(SF−8413、東レ・ダウコーニング・シリ
コーン) 3.0重量部
γ−グリシドメトキシシラン
0.8重量部c
u・Fe・Mn系着色剤
0.15重量部
をミキサーで常温で混合し、70〜100℃で2軸ロー
ルにより混練し、冷却後粉砕し成形材料とした。[Example] Example 1 Fused silica
6
7.0 parts by weight o-cresol novolak epoxy resin
16.0 parts by weight
(Epoxy equivalent: 200, softening point: 65°C) Phenol novolak resin
9.0 parts by weight (OH equivalent: 104, softening point: 100°C) Brominated bisphenol A
mold epoxy resin
1.7 parts by weight (Br content 46%, epoxy equivalent 3
60) DBU
0.2 parts by weight antimony trioxide
1.7 parts by weight carnauba wax
0.3 parts by weight Silicone oil (SF-8413, Toray Dow Corning Silicone) 3.0 parts by weight γ-glycidomethoxysilane
0.8 parts by weight c
u・Fe・Mn colorant
0.15 parts by weight were mixed at room temperature in a mixer, kneaded at 70 to 100°C with a twin-screw roll, cooled, and then ground to obtain a molding material.
【0022】得られた成形材料をタブレット化し、低圧
トランスファー成形機 にて175℃、70kg/c
m2、120秒の条件で16pDIPパッケージに封止
し 175℃、8時間の条件でポストキュアー後、レ
ーザー捺印し視認性を21ステップセンシビティーガイ
ドにて評価した。[0022] The obtained molding material was made into tablets and heated at 175°C at 70kg/c using a low-pressure transfer molding machine.
After sealing in a 16p DIP package under conditions of m2 and 120 seconds and post-curing at 175°C for 8 hours, laser marking was performed and visibility was evaluated using a 21-step sensitivity guide.
【0023】なお、レーザー捺印機としてはルモニクス
製炭酸ガスレーザーマーク940型およびNEC製YA
GレーザーマークSL−476Aを使用した。[0023] As a laser marking machine, CO2 gas laser mark 940 model manufactured by Lumonics and YA manufactured by NEC are used.
G Lasermark SL-476A was used.
【0024】実施例2〜4
Cu・Fe・Mn系着色剤の配合量を変えた以外は実施
例1と同一配合とし実施例1と同様にして成形材料を得
て、この成形材料で試験用の成形品を作成し、レーザー
捺印試験を行なった。試験結果を表1に示す。Examples 2 to 4 Molding materials were obtained in the same manner as in Example 1 using the same formulation as in Example 1 except that the amount of the Cu/Fe/Mn colorant was changed, and this molding material was used for testing. A molded product was created and a laser marking test was conducted. The test results are shown in Table 1.
【0025】比較例1
実施例1に更に着色剤をカボンブラック0.3重量部配
合した以外はすべて実施例1と同様にし試験を行った。
結果を第1表に示す。Comparative Example 1 A test was carried out in the same manner as in Example 1 except that 0.3 parts by weight of carbon black was added as a coloring agent. The results are shown in Table 1.
【0026】比較例2
実施例1における着色剤を黒色有機染料の0.5重量部
とした以外はすべて実施例1と同様にし試験を行った。
試験結果を表1に示す。Comparative Example 2 A test was conducted in the same manner as in Example 1 except that 0.5 parts by weight of black organic dye was used as the coloring agent. The test results are shown in Table 1.
【0027】比較例3、4
実施例1における着色剤の配合量を変えた以外はすべて
実施例1と同様にして試験を行なった。結果を表1に示
す。Comparative Examples 3 and 4 Tests were carried out in the same manner as in Example 1, except that the amount of colorant blended in Example 1 was changed. The results are shown in Table 1.
【0028】[0028]
【表1】[Table 1]
【0029】[0029]
【発明の効果】本発明によると被覆モールドされる樹脂
封止半導体装置はレーザー光によるマーキングの形成に
際して樹脂成形部が、灰色、黒色等であっても、また薄
暗い雰囲気下であっても明瞭に識別できるマーキングを
施しうるようになり、マーキングの鮮明度の大幅な向上
を実現できるようになる。According to the present invention, a resin-sealed semiconductor device that is covered and molded can be clearly marked even when the resin molded part is gray, black, etc. or in a dim atmosphere when marking is formed by laser light. It becomes possible to apply distinguishable markings, and it becomes possible to realize a significant improvement in the clarity of the markings.
Claims (1)
(C)フェノール樹脂(D)硬化促進剤(E)シリコー
ン化合物(F)酸化銅・酸化鉄・酸化マンガン系着色剤
を必須成分とし、全体の樹脂組成物中に(F)酸化銅・
酸化鉄・酸化マンガン系着色剤を0.1〜3.0重量%
含有することを特徴とする半導体封止用エポキシ樹脂組
成物。Claim 1: (A) Inorganic filler (B) Epoxy resin (C) Phenol resin (D) Curing accelerator (E) Silicone compound (F) Copper oxide, iron oxide, manganese oxide colorant as essential ingredients. , (F) copper oxide in the entire resin composition.
0.1-3.0% by weight of iron oxide/manganese oxide colorant
An epoxy resin composition for semiconductor encapsulation characterized by containing:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP41817590A JP2859449B2 (en) | 1990-12-25 | 1990-12-25 | Epoxy resin composition for semiconductor encapsulation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP41817590A JP2859449B2 (en) | 1990-12-25 | 1990-12-25 | Epoxy resin composition for semiconductor encapsulation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04222818A true JPH04222818A (en) | 1992-08-12 |
JP2859449B2 JP2859449B2 (en) | 1999-02-17 |
Family
ID=18526096
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP41817590A Expired - Fee Related JP2859449B2 (en) | 1990-12-25 | 1990-12-25 | Epoxy resin composition for semiconductor encapsulation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2859449B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6251548B1 (en) | 1996-03-27 | 2001-06-26 | Dai Nippon Printing Co., Ltd. | Color filter |
JP2002249640A (en) * | 2001-02-22 | 2002-09-06 | Toray Ind Inc | Resin-sealed semiconductor device and epoxy resin composition for sealing semiconductor |
-
1990
- 1990-12-25 JP JP41817590A patent/JP2859449B2/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6251548B1 (en) | 1996-03-27 | 2001-06-26 | Dai Nippon Printing Co., Ltd. | Color filter |
JP2002249640A (en) * | 2001-02-22 | 2002-09-06 | Toray Ind Inc | Resin-sealed semiconductor device and epoxy resin composition for sealing semiconductor |
JP4736203B2 (en) * | 2001-02-22 | 2011-07-27 | 住友ベークライト株式会社 | Resin-encapsulated semiconductor device and epoxy resin composition for encapsulating semiconductor |
Also Published As
Publication number | Publication date |
---|---|
JP2859449B2 (en) | 1999-02-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3201503B2 (en) | Resin composition | |
JPH04222818A (en) | Epoxy resin composition for sealing semi-conductor | |
JP3357235B2 (en) | Epoxy resin composition for semiconductor encapsulation | |
JP2598585B2 (en) | Epoxy resin composition for semiconductor encapsulation | |
JP3332332B2 (en) | Epoxy resin composition and semiconductor device | |
JPH0472360A (en) | Thermosetting resin composition for sealing semiconductor | |
JP4572866B2 (en) | Epoxy resin composition for semiconductor encapsulation and semiconductor device | |
KR20000009057A (en) | Composition of semiconductor device epoxy resins which is an excellent marking properties | |
JPH10158479A (en) | Semiconductor-sealing resin composition | |
JP3186586B2 (en) | Epoxy resin composition for semiconductor encapsulation and semiconductor device | |
JP3354419B2 (en) | Epoxy resin composition | |
JP2000191884A (en) | Resin composition and semiconductor device | |
KR100384471B1 (en) | Epoxy resin composition for semiconductor device package | |
JP2008133325A (en) | Semiconductor-sealing epoxy resin composition and semiconductor device | |
JP2006036941A (en) | Epoxy resin composition for sealing semiconductor, and semiconductor device obtained using the same | |
KR100347316B1 (en) | Epoxy molding compound for sealing semiconductor device | |
JP3300134B2 (en) | Thermosetting resin composition cured product | |
JP4736203B2 (en) | Resin-encapsulated semiconductor device and epoxy resin composition for encapsulating semiconductor | |
KR100540909B1 (en) | Epoxy molding compound for encapsulating semiconductors elements with good markability | |
KR100384469B1 (en) | Epoxy resin composition for semiconductor sealing | |
JPH02127449A (en) | Thermosetting resin composition | |
JPH02245055A (en) | Sealing resin composition | |
JP2023111897A (en) | Semiconductor device | |
JP2002275350A (en) | Epoxy resin composition and semiconductor device made by using the composition | |
JPH01236264A (en) | Epoxy resin composition |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |