JP3300134B2 - Thermosetting resin composition cured product - Google Patents
Thermosetting resin composition cured productInfo
- Publication number
- JP3300134B2 JP3300134B2 JP25819393A JP25819393A JP3300134B2 JP 3300134 B2 JP3300134 B2 JP 3300134B2 JP 25819393 A JP25819393 A JP 25819393A JP 25819393 A JP25819393 A JP 25819393A JP 3300134 B2 JP3300134 B2 JP 3300134B2
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- release agent
- thermosetting resin
- particles
- cured
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Manufacture Of Macromolecular Shaped Articles (AREA)
- Injection Moulding Of Plastics Or The Like (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Description
【0001】[0001]
【産業上の利用分野】この発明は、成型時の離型性が優
れ、金型汚れが少なく、優れたマ−キング特性を有する
熱硬化性樹脂組成物硬化体、およびその硬化体により封
止されてなる半導体装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cured thermosetting resin composition having excellent releasability at the time of molding, less mold contamination, and excellent marking characteristics, and sealing with the cured product. The present invention relates to a semiconductor device that is manufactured.
【0002】[0002]
【従来の技術】ICやLSIなどの半導体装置は、通常
セラミックパッケ−ジあるいはプラスチックパッケ−ジ
により封止されている。セラミックパッケ−ジは、耐熱
性、耐湿性に優れ、かつパッケ−ジ内部の半導体素子へ
の損傷もなく信頼性の高い封止が可能であるが、構成材
料が比較的高価なものであること、量産性に劣る欠点が
あるために、最近では、プラスチックパッケ−ジを用い
た樹脂封止が主流になっている。なかでもエポキシ樹脂
組成物によるトランスファ−モ−ルドで行われた樹脂封
止は、モ−ルド時の作業性、量産性やモ−ルド後の信頼
性の点において良好な成績を収めている。2. Description of the Related Art Semiconductor devices such as ICs and LSIs are usually sealed with a ceramic package or a plastic package. Ceramic packages have excellent heat resistance and moisture resistance and can be sealed with high reliability without damage to the semiconductor elements inside the package. In recent years, resin sealing using a plastic package has become mainstream due to the disadvantage of poor mass productivity. Above all, resin molding performed by transfer molding with an epoxy resin composition has obtained good results in terms of workability during molding, mass productivity, and reliability after molding.
【0003】通常、このエポキシ樹脂組成物を用いて、
半導体素子をトランスファ−成型で封止する際には、金
型からの離型性を良くするためにエポキシ樹脂組成物に
カルナバワックスやポリエチレンワックスなどの離型剤
が内部添加される。[0003] Usually, using this epoxy resin composition,
When the semiconductor element is sealed by transfer molding, a mold release agent such as carnauba wax or polyethylene wax is internally added to the epoxy resin composition in order to improve mold releasability from a mold.
【0004】[0004]
【発明が解決しようとする課題】これらの離型剤を成型
時に樹脂組成物中から金型表面にブル−ミングさせるこ
とにより離型性が発現するため、離型剤としては、樹脂
と相溶しない材料が用いられる。Since the release agent is developed by blooming the release agent from the resin composition to the surface of the mold at the time of molding, the release agent is compatible with the resin. No material is used.
【0005】また、エポキシ樹脂組成物をトランスファ
−成型する際には、金型からの離型性を良くするため、
比較的多量の離型剤を必要とする場合が多い。しかし、
多量の離型剤を配合すると、成型物表面での離型剤のブ
ル−ミングが激しくなり、離型性は良好になるものの、
これらを除去する工程を経ないと印刷あるいは捺印(マ
−キング性)などを行うことが困難になるといった不都
合が生じる。また離型剤の配合量が増加するにしたがっ
て、金型の微小間隔からの樹脂もれも多くなり、金型汚
れなど他の成型性をも悪くしてしまうといった欠点が生
じる。In addition, when transfer molding an epoxy resin composition, in order to improve the releasability from a mold,
Often a relatively large amount of release agent is required. But,
When a large amount of the release agent is blended, blooming of the release agent on the surface of the molded product becomes intense, and the release property is improved.
Unless these steps are removed, it is difficult to perform printing or stamping (marking). In addition, as the amount of the release agent increases, the resin leaks from the minute space of the mold increases, resulting in a disadvantage that moldability such as mold contamination deteriorates.
【0006】この発明は、このような事情に鑑みなされ
たもので、優れた離型性および金型汚れが少なく、優れ
たマ−キング特性を備えた熱硬化性樹脂組成物硬化体、
およびそれにより包被されてなる半導体装置の提供を目
的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and has been made of a thermosetting resin composition cured product having excellent releasability, less mold stains, and excellent marking characteristics.
And a semiconductor device encapsulated thereby.
【0007】[0007]
【課題を解決するための手段】上記目的を達成するため
に、この発明の熱硬化性樹脂組成物硬化体は、硬化体中
に成型時の離型性を附与する成分を含有する粒子(A)
が、実質的に均一分散していると共に、上記粒子(A)
中には、該粒子よりも親水性の成分を含有する微粒子
(B)が分散した構造をとる。Means for Solving the Problems In order to achieve the above-mentioned object, a cured product of the thermosetting resin composition of the present invention contains particles containing a component imparting releasability at the time of molding in the cured product. A)
Are substantially uniformly dispersed, and the particles (A)
Some of them have a structure in which fine particles (B) containing a component more hydrophilic than the particles are dispersed.
【0008】[0008]
【作用】すなわち、本発明者らは、離型性が良好で、か
つ金型汚れが少なくマ−キング特性に優れた熱硬化性樹
脂組成物硬化体を得るために、できるだけ少量の離型剤
を添加した際の、熱硬化性樹脂組成物硬化体の構造につ
いて研究を重ねた。その結果、先ず始めにHLB価の異
なる二種以上の離型剤を混合し、次いで熱硬化性樹脂組
成物に添加した。それによって、硬化体中に離型性を付
与する成分を含有する粒子(A)(以下「離型剤
(A)」と略す)および離型剤(A)中に離型剤(A)
よりも親水性の成分を含有する微粒子(B)(以下「離
型剤(B)」と略す)が分散した三相以上の相構造をと
る熱硬化性樹脂組成物硬化体は、離型性が良好で、かつ
マ−キング特性にも優れることを見出し、この発明に到
達した。In other words, the present inventors attempted to obtain a cured product of a thermosetting resin composition having a good mold release property, a small amount of mold stains, and an excellent marking property, so that a small amount of a mold release agent was used. The study was repeated on the structure of the cured thermosetting resin composition when was added. As a result, first, two or more release agents having different HLB values were mixed, and then added to the thermosetting resin composition. Thereby, particles (A) containing a component that imparts release properties in the cured product (hereinafter abbreviated as “release agent (A)”) and release agent (A) in release agent (A)
A thermosetting resin composition cured product having a three- or more-phase structure in which fine particles (B) containing a more hydrophilic component (hereinafter abbreviated as “release agent (B)”) are dispersed has a releasability. Was found to be excellent and the marking characteristics were also excellent, and the present invention was achieved.
【0009】つぎに、この発明を詳しく説明する。Next, the present invention will be described in detail.
【0010】この発明に用いられる熱硬化性樹脂組成物
硬化体は、熱硬化性樹脂、硬化剤および特定の離型剤、
必要に応じて硬化促進剤を用いて硬化して得られるもの
である。その実例を図1により説明すると、(X)は組
成物硬化体、(A)はHLB価が2以上であり20未満
の離型剤であり、(B)は実際に使用する特定の(A)
離型剤よりも大きいHLB価を有する離型剤である。そ
のHLB価の差は、0.5〜10.0が好ましい。[0010] The cured product of the thermosetting resin composition used in the present invention comprises a thermosetting resin, a curing agent and a specific release agent,
It is obtained by curing using a curing accelerator as necessary. An example thereof will be described with reference to FIG. 1. (X) is a cured composition, (A) is a mold release agent having an HLB value of 2 or more and less than 20, and (B) is a specific (A) actually used. )
A release agent having an HLB value greater than that of the release agent. The difference in HLB value is preferably 0.5 to 10.0.
【0011】上記熱硬化性樹脂としては、エポキシ樹
脂、尿素樹脂、メラミン樹脂、フェノ−ル樹脂、ポリエ
ステル、ウレタン樹脂およびイミド樹脂等が用いられ
る。また、上記エポキシ樹脂は、シリコ−ン樹脂との反
応によって得られる変性エポキシ樹脂を用いることも可
能である。As the thermosetting resin, epoxy resin, urea resin, melamine resin, phenol resin, polyester, urethane resin, imide resin and the like are used. Further, as the epoxy resin, a modified epoxy resin obtained by a reaction with a silicone resin can be used.
【0012】上記熱硬化性樹脂とともに用いられる硬化
剤としては、例えば、エポキシ樹脂では、アミン類、フ
ェノ−ル樹脂、酸無水物、ポリアミドおよびポリメルカ
プタン等が用いられる。また、尿素樹脂、メラミン樹脂
およびフェノ−ル樹脂では、ホルムアルデヒドやヘキサ
メチレンテトラミン等のアルデヒド類、ポリエステルや
ウレタン樹脂では、多価アルコ−ル、イミド樹脂では、
多価アミンおよび多価アミド等が用いられる。As the curing agent used together with the thermosetting resin, for example, in the case of epoxy resin, amines, phenol resin, acid anhydride, polyamide, polymercaptan and the like are used. In the case of urea resins, melamine resins and phenol resins, aldehydes such as formaldehyde and hexamethylenetetramine, in the case of polyesters and urethane resins, in the case of polyvalent alcohols and in the case of imide resins,
Polyamines and amides are used.
【0013】上記熱硬化性樹脂と硬化剤の配合比は、熱
硬化性樹脂100重量部(以下「部」と略す)に対して
硬化剤を30〜150部の範囲に設定することが好まし
い。特に、エポキシ樹脂においては、エポキシ樹脂のエ
ポキシ基に対する硬化剤中の反応性官能基の当量比(エ
ポキシ基/反応性官能基)が通常1/0.4〜1/1.
2、好ましくは1/0.8〜1/1.1の範囲が半導体
装置の耐熱性および耐湿性の観点から選ばれる。The mixing ratio between the thermosetting resin and the curing agent is preferably set in the range of 30 to 150 parts by weight of the curing agent per 100 parts by weight of the thermosetting resin (hereinafter abbreviated as "part"). Particularly, in an epoxy resin, the equivalent ratio of the reactive functional group in the curing agent to the epoxy group of the epoxy resin (epoxy group / reactive functional group) is usually 1 / 0.4 to 1/1.
2, preferably in the range of 1 / 0.8 to 1 / 1.1, from the viewpoint of heat resistance and moisture resistance of the semiconductor device.
【0014】本発明に用いられる離型剤(A)として
は、物質の親水性/親油性を表す尺度であるHLB価
が、2以上であり20未満の界面活性剤であれば特定さ
れるものでない。例えば、脂肪族アルコ−ル、芳香族ア
ルコ−ル、脂肪酸、脂肪酸エステル、脂肪酸金属塩、脂
肪族スルホキシドポリエ−テル類、脂肪族アミンおよび
脂肪族アミド等が挙げられる。好ましくは、HLB価が
2以上であり15未満の界面活性剤がよく、脂肪酸およ
び脂肪族エステル等が挙げられる。このような離型剤
(A)の硬化体中における粒子径は、0.01〜10μ
mになるように設定されているのが好ましく、さらに好
ましくは、0.01〜1μmである。The release agent (A) used in the present invention is specified as a surfactant having an HLB value which is a measure of hydrophilicity / lipophilicity of a substance of 2 or more and less than 20. Not. Examples thereof include aliphatic alcohols, aromatic alcohols, fatty acids, fatty acid esters, fatty acid metal salts, aliphatic sulfoxide polyethers, aliphatic amines and aliphatic amides. Preferably, a surfactant having an HLB value of 2 or more and less than 15 is preferable, and examples thereof include fatty acids and aliphatic esters. The particle size of the release agent (A) in the cured product is 0.01 to 10 μm.
m is preferably set, and more preferably 0.01 to 1 μm.
【0015】離型剤(A)中に形成される離型剤(B)
の成分としては、HLB価が3以上であり20以下の界
面活性剤がよく、さらに好ましくはHLB価が10以上
であり20以下の界面活性剤である。かつHLB価が
(A)成分のそれよりも大きいものであれば特定される
ものでない。そのような界面活性剤としては、脂肪族の
金属塩、脂肪族スルホキシドおよび脂肪族アミド等が挙
げられる。このような離型剤(B)の硬化体中における
粒子径は、0.005〜0.5μmになるように設定さ
れているのが好ましく、さらに好ましくは、0.005
〜0.1μmである。Release agent (B) formed in release agent (A)
As the component, a surfactant having an HLB value of 3 or more and 20 or less is preferable, and a surfactant having an HLB value of 10 or more and 20 or less is more preferable. If the HLB value is higher than that of the component (A), it is not specified. Examples of such surfactants include aliphatic metal salts, aliphatic sulfoxides and aliphatic amides. The particle size of the release agent (B) in the cured product is preferably set to 0.005 to 0.5 μm, more preferably 0.005 to 0.5 μm.
0.10.1 μm.
【0016】上記離型剤(A)を形成する成分に対し
て、離型剤(B)を形成する成分の配合量は、離型剤
(A)成分100部に対して、離型剤(B)成分が5〜
100部が好ましく、さらに好ましくは5〜50部に設
定することが望まれる。すなわち、離型剤(B)成分の
配合量が5部以下であるとマ−キング性や信頼性に問題
が生じる傾向があるためである。The amount of the component forming the release agent (B) is 100 parts by weight of the component forming the release agent (A) with respect to the component forming the release agent (A). B) Component is 5
100 parts is preferable, and it is more preferable to set it to 5 to 50 parts. That is, if the compounding amount of the release agent (B) component is 5 parts or less, there is a tendency that problems are caused in the markability and reliability.
【0017】さらに、これら離型剤全体、すなわち離型
剤(A)と離型剤(B)の配合量は、熱硬化性樹脂組成
物硬化体全体の0.01〜10部の範囲になるように設
定することが好ましい。すなわち、離型剤の配合量が
0.01部未満であると離型剤に問題が生じ易く、逆に
10部を越えるとマ−キング性に劣る傾向があるからで
ある。Further, the total amount of these release agents, that is, the compounding amount of the release agent (A) and the release agent (B) is in the range of 0.01 to 10 parts of the whole cured thermosetting resin composition. It is preferable to set as follows. That is, if the compounding amount of the release agent is less than 0.01 part, a problem tends to occur in the release agent, and if it exceeds 10 parts, the marking property tends to be inferior.
【0018】必要に応じて本発明に用いられる硬化促進
剤は、通常の触媒であり、特に限定されない。具体例と
しては、例えば、エポキシ樹脂の場合、三級アミン、イ
ミダゾ−ル類、イミダゾリン類、ジアザビシクロアルケ
ン類、脂肪族アミン類および芳香族アミン類等の窒素原
子含有化合物、トリアリ−ルホスフィン、モノアルキル
ジアリ−ルホスフィンおよびテトラアリ−ルホスホニウ
ムテトラアリルボレ−ト等のホスホニウム塩、さらに
は、トリアリ−ルホスフィントリアリ−ルボロン錯体等
のリン化合物、アルミニウムトリアセタ−ルアセトナ−
ト等の金属錯体等が挙げられる。また、フェノ−ル樹脂
の場合は、トリエチルアミン、ホウ酸などの無機酸、有
機酸およびアルカリ等、ポリエステルの場合は、テトラ
ブチルジルコネ−トやテトラブチルチタネ−ト等の金属
有機化合物、ウレタン樹脂の場合は、有機すずや三級ア
ミン等が挙げられる。If necessary, the curing accelerator used in the present invention is a usual catalyst and is not particularly limited. Specific examples include, for example, in the case of an epoxy resin, nitrogen atom-containing compounds such as tertiary amines, imidazoles, imidazolines, diazabicycloalkenes, aliphatic amines and aromatic amines, and triarylphosphine. Phosphonium salts such as monoalkyl diallyl phosphine and tetraaryl phosphonium tetraallyl borate; phosphorus compounds such as triaryl phosphine triaryl boron complex; aluminum triacetate acetonate;
And metal complexes such as In the case of phenol resins, inorganic acids such as triethylamine and boric acid, organic acids and alkalis, and in the case of polyesters, metal organic compounds such as tetrabutyl zirconate and tetrabutyl titanate, and urethane. In the case of a resin, an organic tin, a tertiary amine, or the like is used.
【0019】さらに、この発明に用いられる熱硬化性樹
脂組成物硬化体は、上記各成分以外に、必要に応じて、
種々のものを配合した後、硬化して得られる。例えば、
充填剤や、充填剤の表面を処理するための表面処理剤や
難燃剤、着色剤および可撓性附与剤である。The cured thermosetting resin composition used in the present invention may further comprise, if necessary, other than the above-mentioned components.
After blending various things, it is obtained by curing. For example,
It is a filler, a surface treating agent for treating the surface of the filler, a flame retardant, a coloring agent and a flexible additive.
【0020】充填剤としては、特に限定はなく、例え
ば、結晶性シリカ粉、溶融性シリカ粉、石英ガラス粉、
タルク、ケイ酸カルシウム粉、ケイ酸ジルコニア粉およ
び炭酸カルシウム粉等が挙げられるが、シリカ系のもの
が好ましい。その充填剤の配合割合は、全樹脂組成物に
対して0〜90重量%がよい。すなわち、充填剤の配合
量が90重量%を超えると、樹脂組成物の流動性が低く
なり、成型が困難になるためである。The filler is not particularly limited. For example, crystalline silica powder, fusible silica powder, quartz glass powder,
Examples thereof include talc, calcium silicate powder, zirconia silicate powder, and calcium carbonate powder, and a silica-based powder is preferable. The compounding ratio of the filler is preferably from 0 to 90% by weight based on the entire resin composition. That is, if the compounding amount of the filler exceeds 90% by weight, the fluidity of the resin composition decreases, and molding becomes difficult.
【0021】表面処理剤としては、公知のシランカップ
リング剤等が挙げられ、難燃剤としては、三酸化アンチ
モン、五酸化アンチモン、リン酸塩および臭化物が挙げ
られ、可撓性附与剤としては、シリコ−ン樹脂およびブ
タジエン−アクリロニトリルゴム等が用いられる。ただ
し、これらに限定されるものでない。Examples of the surface treating agent include known silane coupling agents and the like, examples of the flame retardant include antimony trioxide, antimony pentoxide, phosphate and bromide, and examples of the flexible additive include: , Silicone resin and butadiene-acrylonitrile rubber. However, it is not limited to these.
【0022】このような熱硬化性樹脂組成物は、例え
ば、次のようにして製造することができる。すなわち、
上記熱硬化性樹脂および硬化剤に、あらかじめ離型剤
(A)と離型剤(B)を配合しておいたものを加え、必
要に応じて硬化促進剤、それ以外の添加剤を適宜配合
し、予備混合した後、混練機により所定の温度で混練し
溶融混合する。そして、これを室温に冷却した後、固体
の場合は公知の手段により粉砕し、必要に応じてタブレ
ット状に打錠することにより熱硬化性樹脂組成物を製造
することができる。また、液状の場合は、混合するのみ
で熱硬化性樹脂組成物を得ることができる。Such a thermosetting resin composition can be produced, for example, as follows. That is,
To the above-mentioned thermosetting resin and curing agent, the one in which the release agent (A) and the release agent (B) are previously blended is added, and if necessary, a curing accelerator and other additives are appropriately blended. After pre-mixing, the mixture is kneaded at a predetermined temperature by a kneader and melt-mixed. After cooling to room temperature, if it is a solid, it is pulverized by a known means, and if necessary, tableted into a tablet, whereby a thermosetting resin composition can be produced. In the case of a liquid, a thermosetting resin composition can be obtained only by mixing.
【0023】このようにして得られた熱硬化性樹脂組成
物を、注型やトランスファ−成型など公知の成型法によ
り、本発明の目的とする熱硬化性樹脂組成物硬化体が得
られる。The cured thermosetting resin composition of the present invention can be obtained by subjecting the thus obtained thermosetting resin composition to a known molding method such as casting or transfer molding.
【0024】このようにして得られる熱硬化性樹脂組成
物硬化体は、組成物中に含まれる特定の離型剤が特定の
構造をとる作用により、成型時の離型性に優れ、かつマ
−キング性や信頼性にも極めて優れている。なお、特定
の構造、すなわち三相構造は透過型電子顕微鏡により観
察できる。The cured product of the thermosetting resin composition thus obtained is excellent in mold releasability at the time of molding due to the effect that the specific release agent contained in the composition takes a specific structure, and has a high performance. -Extremely excellent in kingability and reliability. In addition, a specific structure, that is, a three-phase structure, can be observed with a transmission electron microscope.
【0025】[0025]
【発明の効果】以上のように、この発明の熱硬化性樹脂
硬化体は、特定の離型剤が硬化体中で特定の構造を有し
ている。すなわち、硬化体中に離型剤(A)、離型剤
(A)中に離型剤(B)の如く三相構造を有しているた
め、より少ない離型剤量で優れた離型性を備え、しかも
マ−キング特性が優れている。従って、従来に比較し、
成型効率が格段に向上し、半導体装置用の封止材として
使用する際の信頼性も極めて高くなる。As described above, in the cured thermosetting resin of the present invention, the specific release agent has a specific structure in the cured product. That is, since the cured product has a three-phase structure like the release agent (A) in the cured body and the release agent (B) in the release agent (A), excellent release with a smaller amount of the release agent. With excellent marking characteristics. Therefore, compared to the conventional
The molding efficiency is remarkably improved, and the reliability when used as a sealing material for a semiconductor device becomes extremely high.
【0026】[0026]
【実施例】次に実施例について比較例と併せて説明す
る。 〔実施例1〕エポキシ当量650のビスフェノ−ルA型
エポキシ樹脂(固形樹脂)100部に、硬化剤としてテ
トラヒドロ無水フタル酸100部、硬化触媒として2−
エチル−4−メチルイミダゾ−ル0.3部に、あらかじ
め、離型剤(A)としてベヘン酸n−ブチル(HLB価
5.2)1.5部、離型剤(B)としてステアリン酸亜
鉛(HLB価13.0)0.5部配合しておいたものを
添加し、90〜120℃で溶融混合して冷却した後、粉
砕し、粉末をタブレット状に打錠した後、150℃でト
ランスファ−成型により硬化体を作製した。Next, examples will be described together with comparative examples. Example 1 100 parts of a bisphenol A type epoxy resin (solid resin) having an epoxy equivalent of 650, 100 parts of tetrahydrophthalic anhydride as a curing agent, and 2-part as a curing catalyst
0.3 parts of ethyl-4-methylimidazole, 1.5 parts of n-butyl behenate (HLB value 5.2) as a releasing agent (A) and zinc stearate as a releasing agent (B) in advance (HLB value: 13.0) 0.5 part of the compounded mixture was added, melted and mixed at 90 to 120 ° C, cooled, pulverized, and the powder was tabletted into tablets. A cured product was prepared by transfer molding.
【0027】〔実施例2〜8〕および〔比較例1〜8〕
後記の表1、表2、表3、表4および表5に示された離
型剤(A)と離型剤(B)の種類および配合量で、それ
以外は実施例1と同様にして目的とする硬化体を得た。Examples 2 to 8 and Comparative Examples 1 to 8
The types and amounts of the release agents (A) and (B) shown in Table 1, Table 2, Table 3, Table 4, and Table 5 described below, and otherwise the same as in Example 1 The desired cured product was obtained.
【0028】〔実施例9〕エポキシ当量180のビスフ
ェノ−ルA型エポキシ樹脂(液状樹脂)100部にメチ
ルヘキサヒドロ無水フタル酸100部、硬化触媒として
2−エチル−4−メチルイミダゾ−ル0.3部に、あら
かじめ、離型剤(A)としてベヘン酸n−ブチル1.5
部、離型剤(B)としてステアリン酸亜鉛0.5部配合
しておいたものを添加混合し、十分離型剤を樹脂中に分
散させた後、その樹脂組成物を注型後、120℃で16
時間硬化させて硬化体を作製した。Example 9 100 parts of bisphenol A type epoxy resin (liquid resin) having an epoxy equivalent of 180 were mixed with 100 parts of methylhexahydrophthalic anhydride, and 0.2% of 2-ethyl-4-methylimidazole was used as a curing catalyst. In 3 parts, n-butyl behenate 1.5 was previously used as a release agent (A).
And 0.5 parts of zinc stearate as a mold release agent (B) were added and mixed, and the ten-separation mold agent was dispersed in the resin. 16 at ° C
After curing for a time, a cured product was prepared.
【0029】〔実施例10〕エポキシ当量195のo−
クレゾ−ルノボラック型エポキシ樹脂(固形樹脂)10
0部に、ノボラック型フェノ−ル樹脂(フェノ−ル当量
106)60部、硬化触媒として2−エチルイミダゾ−
ル0.3部に、あらかじめ、離型剤(A)としてベヘン
酸n−ブチル1.5部、離型剤(B)としてステアリン
酸亜鉛0.5部配合しておいたものを添加し、90〜1
20℃で溶融混合して冷却した後、粉砕し、粉末をタブ
レット状に打錠した後、150℃でトランスファ−成型
により硬化体を作製した。Example 10 o- having an epoxy equivalent of 195
Cresol novolak type epoxy resin (solid resin) 10
0 parts, 60 parts of a novolak phenol resin (phenol equivalent: 106), and 2-ethylimidazo- as a curing catalyst.
To 0.3 part of a mixture, previously added 1.5 parts of n-butyl behenate as a release agent (A) and 0.5 part of zinc stearate as a release agent (B), 90-1
After melt-mixing at 20 ° C. and cooling, the mixture was pulverized, the powder was tabletted, and then a cured product was prepared at 150 ° C. by transfer molding.
【0030】〔実施例11〕エポキシ当量195のo−
クレゾ−ルノボラック型エポキシ樹脂(固形樹脂)10
0部に、あらかじめ両末端アミノ基ジメチルシリコ−ン
(分子量4000)を12部配合し、100℃で5時間
反応させた樹脂に、ノボラック型フェノ−ル樹脂(フェ
ノ−ル当量106)60部、硬化触媒として2−メチル
イミダゾ−ル0.3部に、あらかじめ、離型剤(A)と
してベヘン酸n−ブチル1.5部、離型剤(B)として
ステアリン酸亜鉛0.5部配合しておいたものを添加
し、90〜120℃で溶融混合して冷却した後、粉砕
し、粉末をタブレット状に打錠した後、150℃でトラ
ンスファ−成型により硬化体を作製した。Example 11 o- having an epoxy equivalent of 195
Cresol novolak type epoxy resin (solid resin) 10
To 0 parts, 12 parts of a dimethyl silicone having amino groups at both ends (molecular weight: 4000) were mixed in advance, and reacted at 100 ° C. for 5 hours, 60 parts of a novolak-type phenol resin (phenol equivalent: 106), 0.3 parts of 2-methylimidazole as a curing catalyst, 1.5 parts of n-butyl behenate as a release agent (A) and 0.5 parts of zinc stearate as a release agent (B) are previously mixed. The resulting mixture was added, melted and mixed at 90 to 120 ° C., cooled, pulverized, and the powder was tabletted into tablets, followed by transfer molding at 150 ° C. to produce a cured product.
【0031】[0031]
【表1】 [Table 1]
【表2】 [Table 2]
【表3】 [Table 3]
【表4】 [Table 4]
【表5】 [Table 5]
【0032】次に、上記実施例および比較例によって得
られた硬化体の成型時の金型からの離型性、硬化体表面
へのマ−キング特性および硬化体中での離型剤の相構造
について評価した。これらの結果を下記の表4、表5お
よび表6に示した。Next, the releasability from the mold, the marking property on the surface of the cured product, and the phase of the release agent in the cured product were obtained by molding the cured products obtained in the above Examples and Comparative Examples. The structure was evaluated. The results are shown in Tables 4, 5 and 6 below.
【0033】〔離型性〕離型性は、離型性評価用金型を
用いて、成型直後の離型荷重を測定し5段階で評価し
た。離型性の良い方から順番に5、4、3、2、1とし
た。 〔マ−キング特性〕マ−キング特性は、YAGレ−ザ−
(エネルギ−密度0.3ジュ−ル/cm2)を用いて、
硬化体に照射し、比較的暗い雰囲気下でのマ−キングの
鮮明度で評価した。これも、鮮明度の度合いを視覚的に
5段階に分けて評価した。良い方から順番に5、4、
3、2、1とした。 〔離型剤の相構造〕離型剤の相構造は、TEM観察(透
過型電子顕微鏡による観察)により行った。TEM観察
するために超薄切片法を用い、硬化体試料をミクロト−
ムで0.1μmに薄く削り、上記顕微鏡にて観察を行っ
た。硬化体試料が、硬化体も含んで三相構造の場合を
○、二相構造の場合を△、相構造がない場合を×とし
た。[Releasability] The releasability was evaluated in five steps by measuring the release load immediately after molding using a mold for releasability evaluation. 5, 4, 3, 2, and 1 in order from the one having good releasability. [Marking characteristics] The marking characteristics are based on YAG laser.
(Energy density 0.3 joules / cm 2 )
The cured product was irradiated and evaluated for the sharpness of the marking under a relatively dark atmosphere. In this case, the degree of sharpness was visually evaluated in five stages. 5,4,
3, 2, and 1. [Phase Structure of Release Agent] The phase structure of the release agent was determined by TEM observation (observation with a transmission electron microscope). The ultra-thin section method was used for TEM observation,
It was shaved to a thickness of 0.1 μm with a microscope and observed with the above microscope. The case where the cured body sample had a three-phase structure including the cured body was evaluated as ○, the case where the two-phase structure was observed, and the case where there was no phase structure as X.
【0034】[0034]
【表6】 [Table 6]
【表7】 [Table 7]
【0035】表6および表7の結果から、比較例1は、
離型剤(A)および離型剤(B)をまったく配合してい
ないため、離型性が非常に悪く、硬化体の表面平滑性も
悪いためにマ−キング特性も悪い。比較例2は、離型剤
(A)のみであり、その離型剤(A)だけでは樹脂組成
物と相溶するために離型性がほとんど発現しない。比較
例3は、離型剤(B)だけで、その極性が高いため離型
性は良好であるが、離型剤のブリ−ドが多いためマ−キ
ング特性が非常に悪い。比較例4および比較例5は、三
相構造を有していて分散性も良好であるが、極性の離型
剤(B)が少ないため離型性が悪い。また、比較例6は
三相構造を有するものの、離型剤(B)が離型剤(A)
に比べて、その量が多いため、離型剤のブリ−ドが多
く、離型性は良好であるもののマ−キング特性が悪い。
比較例7も、三相構造を有するものの、離型剤(A)お
よび離型剤(B)の合計量が多いため、離型剤のブリ−
ドが多く、離型性は良好であるもののマ−キング特性が
悪い。さらに、比較例8は、いずれの離型剤も樹脂組成
物と相溶してしまうため離型性が悪い。これに対して、
実施例品は、いずれも三相構造を示し、成型時の金型か
らの離型性が良好で、マ−キング特性にも優れているこ
とがわかる。From the results in Tables 6 and 7, Comparative Example 1 shows that
Since the release agent (A) and the release agent (B) are not incorporated at all, the releasability is very poor, and the surface smoothness of the cured product is also poor, so that the marking property is also poor. In Comparative Example 2, only the release agent (A) was used, and only the release agent (A) was compatible with the resin composition, so that almost no release property was exhibited. In Comparative Example 3, only the release agent (B) was used, and the polarity was high, so that the release property was good. However, since the release agent had many bleeds, the marking property was very poor. Comparative Examples 4 and 5 have a three-phase structure and good dispersibility, but have poor release properties due to a small amount of the polar release agent (B). Comparative Example 6 has a three-phase structure, but the release agent (B) is different from the release agent (A).
Since the amount of the release agent is larger than that of the above, the release agent has a large amount of bleed, and the releasability is good, but the marking characteristics are poor.
Comparative Example 7 also has a three-phase structure, but the release agent (A) and the release agent (B) have a large total amount.
And the releasability is good, but the marking characteristics are poor. Furthermore, in Comparative Example 8, all the release agents are compatible with the resin composition, so that the release properties are poor. On the contrary,
It can be seen that all of the examples have a three-phase structure, exhibit good releasability from the mold during molding, and have excellent marking characteristics.
【0036】[0036]
【図1】樹脂組成物硬化体が三相構造であることを示す
説明図である。FIG. 1 is an explanatory diagram showing that a cured resin composition has a three-phase structure.
(X) 組成物硬化体 (A) 離型剤(A) (B) 離型剤(B) (X) Cured composition (A) Release agent (A) (B) Release agent (B)
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI H01L 23/31 (58)調査した分野(Int.Cl.7,DB名) C08J 5/00 C08L 1/00 - 101/16 ──────────────────────────────────────────────────続 き Continuation of the front page (51) Int.Cl. 7 identification code FI H01L 23/31 (58) Field surveyed (Int.Cl. 7 , DB name) C08J 5/00 C08L 1/00-101/16
Claims (7)
成分を含有する粒子(A)が、実質的に均一分散してい
ると共に、上記粒子(A)中には、該粒子よりも親水性
の成分を含有する微粒子(B)が分散してなる熱硬化性
樹脂組成物硬化体。The particles (A) containing a component imparting releasability during molding are substantially uniformly dispersed in the cured product, and the particles (A) contain the particles (A). A cured thermosetting resin composition in which fine particles (B) containing a component more hydrophilic than the particles are dispersed.
20未満である請求項1記載の熱硬化性樹脂組成物硬化
体。2. The cured thermosetting resin composition according to claim 1, wherein the HLB value of the particles (A) is 2 or more and less than 20.
20以下である請求項1記載の熱硬化性樹脂組成物硬化
体。3. The cured thermosetting resin composition according to claim 1, wherein the HLB value of the particles (B) is 3 or more and 20 or less.
が、0.01〜10μmである請求項1記載の熱硬化性
樹脂組成物硬化体。4. The cured thermosetting resin composition according to claim 1, wherein the size of the particles (A) in the cured product is 0.01 to 10 μm.
量が硬化体100重量部に対して、0.01〜10重量
部である請求項1記載の熱硬化性樹脂組成物硬化体。5. The cured thermosetting resin composition according to claim 1, wherein the total content of the particles (A) and the particles (B) is 0.01 to 10 parts by weight based on 100 parts by weight of the cured body. .
エステルであり、粒子(B)成分が脂肪族金属塩である
請求項1記載の熱硬化性樹脂組成物硬化体。6. The cured thermosetting resin composition according to claim 1, wherein the component (A) is a fatty acid or an aliphatic ester, and the component (B) is an aliphatic metal salt.
載の熱硬化性樹脂組成物硬化体により包被されてなる半
導体装置。7. A semiconductor device covered with the cured thermosetting resin composition according to any one of claims 1 to 6.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25819393A JP3300134B2 (en) | 1993-10-15 | 1993-10-15 | Thermosetting resin composition cured product |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25819393A JP3300134B2 (en) | 1993-10-15 | 1993-10-15 | Thermosetting resin composition cured product |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07109361A JPH07109361A (en) | 1995-04-25 |
JP3300134B2 true JP3300134B2 (en) | 2002-07-08 |
Family
ID=17316807
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JP25819393A Expired - Lifetime JP3300134B2 (en) | 1993-10-15 | 1993-10-15 | Thermosetting resin composition cured product |
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JP (1) | JP3300134B2 (en) |
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JP4608736B2 (en) * | 2000-05-30 | 2011-01-12 | 住友ベークライト株式会社 | Method for producing epoxy resin composition for semiconductor encapsulation |
WO2014184863A1 (en) * | 2013-05-14 | 2014-11-20 | 株式会社日立製作所 | Composite insulating resin material for high-voltage devices and high-voltage device using same |
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