KR102855302B1 - 임프린트 장치, 임프린트 방법 및 물품 제조 방법 - Google Patents

임프린트 장치, 임프린트 방법 및 물품 제조 방법

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Publication number
KR102855302B1
KR102855302B1 KR1020220047946A KR20220047946A KR102855302B1 KR 102855302 B1 KR102855302 B1 KR 102855302B1 KR 1020220047946 A KR1020220047946 A KR 1020220047946A KR 20220047946 A KR20220047946 A KR 20220047946A KR 102855302 B1 KR102855302 B1 KR 102855302B1
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KR
South Korea
Prior art keywords
substrate
imprint
height distribution
component
distribution information
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020220047946A
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English (en)
Korean (ko)
Other versions
KR20220144774A (ko
Inventor
타다시 핫토리
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20220144774A publication Critical patent/KR20220144774A/ko
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Publication of KR102855302B1 publication Critical patent/KR102855302B1/ko
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424—Moulding surfaces provided with means for marking or patterning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/002—Component parts, details or accessories; Auxiliary operations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C2037/90—Measuring, controlling or regulating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023—Microembossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00—Other particular articles
    • B29L2031/34—Electrical apparatus, e.g. sparking plugs or parts thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
KR1020220047946A 2021-04-20 2022-04-19 임프린트 장치, 임프린트 방법 및 물품 제조 방법 Active KR102855302B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021071333A JP7610463B2 (ja) 2021-04-20 2021-04-20 インプリント装置、インプリント方法および物品製造方法
JPJP-P-2021-071333 2021-04-20

Publications (2)

Publication Number Publication Date
KR20220144774A KR20220144774A (ko) 2022-10-27
KR102855302B1 true KR102855302B1 (ko) 2025-09-05

Family

ID=83602048

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020220047946A Active KR102855302B1 (ko) 2021-04-20 2022-04-19 임프린트 장치, 임프린트 방법 및 물품 제조 방법

Country Status (4)

Country Link
US (1) US11840011B2 (https=)
JP (1) JP7610463B2 (https=)
KR (1) KR102855302B1 (https=)
CN (1) CN115220299A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025076140A (ja) * 2023-11-01 2025-05-15 キヤノン株式会社 調整方法、インプリント方法、物品製造方法、およびインプリント装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160193759A1 (en) 2015-01-05 2016-07-07 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005101201A (ja) 2003-09-24 2005-04-14 Canon Inc ナノインプリント装置
JP2007299994A (ja) 2006-05-01 2007-11-15 Canon Inc 加工装置及び方法、並びに、デバイス製造方法
JP2008066634A (ja) 2006-09-11 2008-03-21 Canon Inc 露光装置
US7894038B2 (en) * 2007-03-14 2011-02-22 Asml Netherlands B.V. Device manufacturing method, lithographic apparatus, and a computer program
JP5412713B2 (ja) * 2007-05-22 2014-02-12 大日本印刷株式会社 測定システム、測定方法及びプログラム
WO2015104074A1 (en) * 2014-01-10 2015-07-16 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
JP6762746B2 (ja) * 2015-04-15 2020-09-30 キヤノン株式会社 露光装置および露光方法、ならびに物品の製造方法
JP6732419B2 (ja) 2015-09-02 2020-07-29 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP6590667B2 (ja) 2015-11-30 2019-10-16 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
NL2017860B1 (en) 2015-12-07 2017-07-27 Ultratech Inc Systems and methods of characterizing process-induced wafer shape for process control using cgs interferometry
KR20190005955A (ko) * 2016-05-12 2019-01-16 에이에스엠엘 네델란즈 비.브이. 측정치 획득 방법, 프로세스 단계 수행 장치, 계측 장치, 디바이스 제조 방법
JP2017224812A (ja) 2016-06-09 2017-12-21 キヤノン株式会社 位置合わせ方法、インプリント装置、プログラム、および物品の製造方法
EP3364247A1 (en) 2017-02-17 2018-08-22 ASML Netherlands B.V. Methods & apparatus for monitoring a lithographic manufacturing process
JP7263088B2 (ja) 2019-04-08 2023-04-24 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP7256684B2 (ja) 2019-05-14 2023-04-12 キヤノン株式会社 インプリント装置、インプリント方法および物品製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160193759A1 (en) 2015-01-05 2016-07-07 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article

Also Published As

Publication number Publication date
JP7610463B2 (ja) 2025-01-08
US11840011B2 (en) 2023-12-12
KR20220144774A (ko) 2022-10-27
JP2022165816A (ja) 2022-11-01
CN115220299A (zh) 2022-10-21
US20220332035A1 (en) 2022-10-20

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