KR102850976B1 - 가열 처리 장치 - Google Patents

가열 처리 장치

Info

Publication number
KR102850976B1
KR102850976B1 KR1020230118322A KR20230118322A KR102850976B1 KR 102850976 B1 KR102850976 B1 KR 102850976B1 KR 1020230118322 A KR1020230118322 A KR 1020230118322A KR 20230118322 A KR20230118322 A KR 20230118322A KR 102850976 B1 KR102850976 B1 KR 102850976B1
Authority
KR
South Korea
Prior art keywords
heater
plate
cassette
chamber
central axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020230118322A
Other languages
English (en)
Korean (ko)
Other versions
KR20240045100A (ko
Inventor
준지 이시하라
아키노리 이소
히로카즈 마스다
조지 후쿠다
Original Assignee
시바우라 메카트로닉스 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 시바우라 메카트로닉스 가부시끼가이샤 filed Critical 시바우라 메카트로닉스 가부시끼가이샤
Publication of KR20240045100A publication Critical patent/KR20240045100A/ko
Application granted granted Critical
Publication of KR102850976B1 publication Critical patent/KR102850976B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation
    • H01L21/67115—
    • H01L21/68771—
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/62—Heating elements specially adapted for furnaces
    • H05B3/66—Supports or mountings for heaters on or in the wall or roof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7621—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting two or more semiconductor substrates

Landscapes

  • Muffle Furnaces And Rotary Kilns (AREA)
  • Furnace Details (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Furnace Charging Or Discharging (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020230118322A 2022-09-29 2023-09-06 가열 처리 장치 Active KR102850976B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022156267A JP7810625B2 (ja) 2022-09-29 2022-09-29 加熱処理装置
JPJP-P-2022-156267 2022-09-29

Publications (2)

Publication Number Publication Date
KR20240045100A KR20240045100A (ko) 2024-04-05
KR102850976B1 true KR102850976B1 (ko) 2025-08-26

Family

ID=90384129

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020230118322A Active KR102850976B1 (ko) 2022-09-29 2023-09-06 가열 처리 장치

Country Status (3)

Country Link
JP (2) JP7810625B2 (https=)
KR (1) KR102850976B1 (https=)
CN (1) CN117781689A (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000022014A (ja) * 1998-07-01 2000-01-21 Nippon Avionics Co Ltd 減圧オーブンのヒータ装置
JP2019184229A (ja) 2018-04-16 2019-10-24 芝浦メカトロニクス株式会社 有機膜形成装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02142082A (ja) * 1988-11-24 1990-05-31 Matsushita Electric Ind Co Ltd シーズヒーターの接地装置
JP3328763B2 (ja) * 1995-10-30 2002-09-30 エヌティティエレクトロニクス株式会社 縦型ウエハボートのウエハ支持構造
EP1976337A1 (en) * 2005-12-22 2008-10-01 Harison Toshiba Lighting Corp. Heater lamp
JP5467743B2 (ja) 2008-08-29 2014-04-09 光洋サーモシステム株式会社 ヒータユニットおよび熱処理装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000022014A (ja) * 1998-07-01 2000-01-21 Nippon Avionics Co Ltd 減圧オーブンのヒータ装置
JP2019184229A (ja) 2018-04-16 2019-10-24 芝浦メカトロニクス株式会社 有機膜形成装置

Also Published As

Publication number Publication date
JP2024049807A (ja) 2024-04-10
JP7810625B2 (ja) 2026-02-03
CN117781689A (zh) 2024-03-29
JP2025122208A (ja) 2025-08-20
KR20240045100A (ko) 2024-04-05

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