KR102634520B1 - 유기주석 클러스터, 유기주석 클러스터의 용액, 및 고해상도 패턴화에 대한 적용 - Google Patents
유기주석 클러스터, 유기주석 클러스터의 용액, 및 고해상도 패턴화에 대한 적용 Download PDFInfo
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- KR102634520B1 KR102634520B1 KR1020207012752A KR20207012752A KR102634520B1 KR 102634520 B1 KR102634520 B1 KR 102634520B1 KR 1020207012752 A KR1020207012752 A KR 1020207012752A KR 20207012752 A KR20207012752 A KR 20207012752A KR 102634520 B1 KR102634520 B1 KR 102634520B1
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- 238000000059 patterning Methods 0.000 title claims abstract description 35
- 238000000576 coating method Methods 0.000 claims abstract description 87
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- 230000005855 radiation Effects 0.000 claims abstract description 56
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- 125000000217 alkyl group Chemical group 0.000 claims abstract description 34
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- 239000011248 coating agent Substances 0.000 claims description 75
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Classifications
-
- C—CHEMISTRY; METALLURGY
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| CN117023564B (zh) * | 2023-08-07 | 2025-10-28 | 清华大学 | 一种负载锡单原子和团簇的碳材料及其制备方法和应用 |
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| US20240272547A1 (en) * | 2024-03-28 | 2024-08-15 | Intel Corporation | Tin carboxylate precursors for metal oxide resist layers and related methods |
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| CN121005732A (zh) * | 2024-05-24 | 2025-11-25 | 珠海基石科技有限公司 | 有机锡簇结构及其制备方法、图案化组合物、图案化方法、图案化薄膜、图案化基底和电子元器件 |
| CN118393812B (zh) * | 2024-06-24 | 2024-08-30 | 珠海基石科技有限公司 | 图案化组合物、图案化薄膜、图案化基底、半导体器件及其制备方法 |
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| US20170146909A1 (en) | 2015-11-20 | 2017-05-25 | Lam Research Corporation | Euv photopatterning of vapor-deposited metal oxide-containing hardmasks |
| US20170256418A1 (en) | 2016-03-04 | 2017-09-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Lithography Patterning with a Gas Phase Resist |
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| US9310684B2 (en) | 2013-08-22 | 2016-04-12 | Inpria Corporation | Organometallic solution based high resolution patterning compositions |
| KR102696070B1 (ko) * | 2014-10-23 | 2024-08-16 | 인프리아 코포레이션 | 유기 금속 용액 기반의 고해상도 패터닝 조성물 및 상응하는 방법 |
| IL239852A (en) | 2015-07-08 | 2016-12-29 | Algolion Ltd | Lithium-ion battery safety monitoring |
| US11098070B2 (en) * | 2017-11-20 | 2021-08-24 | Inpria Corporation | Organotin clusters, solutions of organotin clusters, and application to high resolution patterning |
| TW202523764A (zh) * | 2018-04-05 | 2025-06-16 | 美商英培雅股份有限公司 | 包含錫化合物的輻射可圖案化塗層及其應用 |
| US10787466B2 (en) * | 2018-04-11 | 2020-09-29 | Inpria Corporation | Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods |
| US20220064192A1 (en) * | 2020-08-25 | 2022-03-03 | Inpria Corporation | Methods to produce organotin compositions with convenient ligand providing reactants |
| KR20240095279A (ko) * | 2021-11-08 | 2024-06-25 | 인프리아 코포레이션 | 안정성이 강화된 유기주석 포토레지스트 조성물 |
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| US20170102612A1 (en) | 2015-10-13 | 2017-04-13 | Inpria Corporation | Organotin oxide hydroxide patterning compositions, precursors, and patterning |
| US20170146909A1 (en) | 2015-11-20 | 2017-05-25 | Lam Research Corporation | Euv photopatterning of vapor-deposited metal oxide-containing hardmasks |
| US20170256418A1 (en) | 2016-03-04 | 2017-09-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Lithography Patterning with a Gas Phase Resist |
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| US12129271B2 (en) | 2024-10-29 |
| US11098070B2 (en) | 2021-08-24 |
| US20250011346A1 (en) | 2025-01-09 |
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