KR102612732B1 - Liquid Crystal Display - Google Patents

Abstract

The liquid crystal display device according to the present invention includes a first substrate, a second substrate, a liquid crystal layer, a column spacer, and a protruding pattern. Open areas and non-open areas are defined in the first and second substrates. The liquid crystal layer is interposed between the first and second substrates. The column spacer is provided on either the first or second substrate within the non-opening area. The protruding pattern is provided in the non-opening area on another substrate opposite to the substrate provided with the column spacer. The upper surface of the column spacer is in contact with the protruding pattern.

Description

Liquid Crystal Display

The present invention relates to a liquid crystal display device having a column spacer for maintaining a cell gap.

Liquid crystal displays display images by adjusting the light transmittance of liquid crystals using an electric field. These liquid crystal display devices can be roughly divided into vertical electric field type and horizontal electric field type depending on the direction of the electric field driving the liquid crystal.

In a vertical electric field type liquid crystal display device, the common electrode formed on the upper substrate and the pixel electrode formed on the lower substrate are arranged to face each other, and the liquid crystal in TN (Twisted Nematic) mode is driven by the vertical electric field formed between them. This vertical electric field type liquid crystal display device has the advantage of a large aperture ratio.

The horizontal electric field type liquid crystal display device drives the liquid crystal in IPS (In Plane Switching) mode or FFS (Fringe Field Switching) mode by the horizontal electric field between the pixel electrode and the common electrode arranged in parallel on the lower substrate. This horizontal electric field type liquid crystal display device has the advantage of a wide viewing angle.

Hereinafter, with reference to FIGS. 1 and 2, a liquid crystal display device according to the prior art and its problems will be described. 1 is a plan view showing the structure of a liquid crystal display device according to the prior art. FIG. 2 is a cross-sectional view of the liquid crystal display device shown in FIG. 1 taken along line II'.

Referring to Figures 1 and 2, the liquid crystal display device according to the prior art includes a lower substrate (SL), an upper substrate (SU), and a liquid crystal layer (LC) interposed between the lower substrate (SL) and the upper substrate (SU). Includes. The lower substrate SL and the upper substrate SU include pixel areas arranged in a matrix manner. The pixel area includes an aperture area and a non-aperture area surrounding the aperture area.

On the lower substrate (SL), the gate wire (GL) and the data wire (DL) cross each other, a thin film transistor (T) formed at the intersection, and a pixel electrode (PXL) formed to form a horizontal electric field in the pixel area provided with the intersection structure. ) and the common electrode (COM), and a common wiring (CL) that is connected to the common electrode (COM) and runs parallel to the gate wiring (GL) is formed.

The gate wiring (GL) supplies a gate signal to the gate electrode (G) of the thin film transistor (T). The data line DL supplies a pixel signal to the pixel electrode PXL through the drain electrode D of the thin film transistor T. The gate wire (GL) and the data wire (DL) are formed in a cross structure to define the pixel area. The common wiring (CL) is formed in parallel with the gate wiring (GL) and supplies a common voltage for driving the liquid crystal to the common electrode (COM).

The thin film transistor T supplies the pixel signal of the data line DL to the pixel electrode PXL in response to the gate signal of the gate line GL. For this purpose, the thin film transistor T has a gate electrode (G) connected to the gate wire (GL), a source electrode (S) connected to the data wire (DL), and a drain electrode ( D) includes. Additionally, the thin film transistor T includes a semiconductor layer. One side of the semiconductor layer is connected to the source electrode (S), and the other side of the semiconductor layer is connected to the drain electrode (D). The area of the semiconductor layer that overlaps the gate electrode (G) is defined as a channel area.

The pixel electrode (PXL) is connected to the drain electrode (D) of the thin film transistor (T) through the pixel contact hole (PH) penetrating the protective film (PAS) and the planarization film (PAC). The pixel electrode (PXL) includes a horizontal pixel electrode (PXLh) connected to the drain electrode (D) and formed parallel to the adjacent gate line (GL), and a plurality of vertical pixel electrodes branched in the vertical direction from the horizontal pixel electrode (PXLh) ( PXLv).

The common electrode (COM) is connected to the common wiring (CL) through the common contact hole (CH) penetrating the gate insulating film (GI), the protective film (PAS), and the planarization film (PAC). The common electrode COM includes a horizontal common electrode COMh formed in the horizontal direction and a plurality of vertical common electrodes COMv branched from the horizontal common electrode COMh in the vertical direction. The vertical common electrode (COMv) is arranged in parallel with the vertical pixel electrode (PXLv) within the pixel area.

The upper substrate (SU) includes a black matrix (BMh, BMv) and a color filter (CF). The color filter (CF) includes red, green, and blue color filters (CF). Color filters (CF) may be arranged alternately in an R-G-B manner. Additionally, the color filter (CF) may further include a white color filter (CF). Each color filter CF is formed to correspond to each pixel area. Neighboring color filters CF are formed to cover a portion of the black matrices BMh and BMv.

Between the lower substrate (SL) and the liquid crystal layer (LC) and between the upper substrate (SU) and the liquid crystal layer (LC), an alignment film (ALL, ALU) is formed. The lower substrate (SL) is bonded to the upper substrate (SU) with the liquid crystal layer (LC) interposed therebetween. At this time, in order to maintain a constant cell gap between the lower substrate SL and the upper substrate SU, a column spacer CS is formed on the inner surface of the upper substrate SU.

A horizontal electric field is formed between the vertical pixel electrode (PXLv) to which the pixel signal is supplied through the thin film transistor (T) and the vertical common electrode (COMv) to which the common voltage is supplied through the common wiring (CL). This horizontal electric field causes the liquid crystal molecules to rotate due to dielectric anisotropy. Images are created by varying the light transmittance passing through the pixel area depending on the degree of rotation of the liquid crystal molecules.

Black matrices (BMh, BMv) are formed to correspond to the non-opening areas. Specifically, the black matrix (BMh, BMv) covers the thin film transistor (T) and various wiring (GL, DL, CL), and when driving the liquid crystal, the end of the vertical pixel electrode (PXLv) and/or the vertical common electrode (COMv) It is formed at a level that can block light leakage due to disclination that may occur at the ends of the device or during the rubbing process of the alignment layer (ALL, ALU).

In particular, the horizontal black matrix (BMh) must be formed with a sufficiently large area to prevent light leakage defects that may occur due to the alignment of liquid crystals being disturbed. In detail, when an external force is applied to the liquid crystal display device, damage occurs on the surface of the lower alignment layer ALL according to the movement of the column spacer CS formed on the upper substrate SU. At this time, damage occurs on the surface of the lower alignment layer ALL, thereby disrupting the alignment of the liquid crystal. Light leakage defects occur in the area (DA1) where the basic orientation of the liquid crystal has changed. Figure 2(a) shows a state before an external force acts on the liquid crystal display device, and Figure 2(b) shows the upper substrate SU on which the column spacer CS is formed due to an external force acting on the liquid crystal display device. This shows the interval shifted.

In the liquid crystal display device according to the prior art, in order to prevent light leakage defects caused by movement of the column spacer (CS), a black matrix (BMh, BMv) is used in consideration of the margin area (M1) where the column spacer (CS) can move. It forms a large area. In particular, the vertical width W1 of the horizontal black matrix BMh is formed to be wide. An increase in the black matrix (BMh, BMv) area causes problems with a decrease in aperture ratio and luminance. This problem becomes more problematic when implementing a high-resolution liquid crystal display device. In other words, a high-resolution liquid crystal display device includes a relatively large number of pixel areas in a single panel. In order to secure a large number of pixel areas in a limited panel area, the area of each pixel area has no choice but to become small. When forming a large-area black matrix (BMh, BMv) in pixel areas with a small area, there is a problem in that it becomes difficult to secure an aperture ratio for product implementation.

The purpose of the present invention is to provide a liquid crystal display device that can secure an aperture ratio while preventing light leakage by providing a protruding pattern that overlaps a column spacer. Another object of the present invention is to provide a liquid crystal display device in which color mixing defects are reduced by changing the arrangement of the black matrix.

The liquid crystal display device according to the present invention includes a first substrate, a second substrate, a liquid crystal layer, a column spacer, and a protruding pattern. Open areas and non-open areas are defined in the first and second substrates. The liquid crystal layer is interposed between the first and second substrates. The column spacer is provided on either the first or second substrate within the non-opening area. The protruding pattern is provided in the non-opening area on another substrate opposite to the substrate provided with the column spacer. The upper surface of the column spacer is in contact with the protruding pattern.

The protrusion pattern may include a horizontal protrusion pattern provided in a horizontal direction and a vertical protrusion pattern provided in a vertical direction on the upper substrate. The column spacer may be disposed on the lower substrate to overlap an area where a horizontal protrusion pattern and a vertical protrusion pattern intersect.

The protrusion pattern may include a vertical protrusion pattern provided in a vertical direction on the lower substrate. The column spacer may be arranged to overlap the vertical protrusion pattern on the upper substrate.

The present invention can provide a liquid crystal display device that prevents light leakage defects by providing a protruding pattern that overlaps a column spacer. In addition, there is an advantage of securing a sufficient aperture ratio even in high-resolution liquid crystal displays.

The present invention can significantly reduce color mixing defects by changing the arrangement of the black matrix. In the present invention, there is no need to expand the width of the black matrix to prevent color mixing defects, thereby preventing a decrease in the aperture ratio. Accordingly, the present invention can provide a liquid crystal display device with improved display quality.

1 is a plan view showing the structure of a liquid crystal display device according to the prior art.
FIG. 2 is a cross-sectional view of the liquid crystal display device shown in FIG. 1 taken along line II'.
Figure 3 is a plan view showing the structure of a liquid crystal display device according to the first embodiment of the present invention.
FIG. 4 is a cross-sectional view of the liquid crystal display device shown in FIG. 3 taken along the line II-II'.
Figure 5 is a diagram for explaining various examples of structures of protrusion patterns.
Figure 6 is a drawing for explaining the effect of the liquid crystal display device according to the present invention.
Figure 7 is a plan view showing the structure of a liquid crystal display device according to a second embodiment of the present invention.
FIG. 8 is a plan view schematically showing only the protrusion pattern and column spacer in FIG. 7.
Figure 9 is a plan view showing the structure of a liquid crystal display device according to a third embodiment of the present invention.
FIG. 10 is a plan view schematically showing only the protrusion pattern and column spacer in FIG. 9.
Figure 11 is a plan view showing the structure of a liquid crystal display device according to a fourth embodiment of the present invention.
FIG. 12 is a cross-sectional view of the liquid crystal display device shown in FIG. 11 taken along line III-III'.
FIG. 13 is a diagram of the liquid crystal display device shown in FIG. 11 cut along the perforated lines IV-IV', and is a diagram for explaining various structural examples of vertical protrusion patterns.
Figures 14 and 15 are diagrams for explaining the arrangement of the first auxiliary pattern.
Figures 16 and 17 show the structure of a liquid crystal display device according to a fifth embodiment of the present invention, and are plan views schematically showing only the vertical protrusion pattern and column spacer.

Hereinafter, preferred embodiments of the present invention will be described with reference to the attached drawings. Like reference numerals refer to substantially the same elements throughout the specification. In the following description, if it is determined that a detailed description of a known technology or configuration related to the present invention may unnecessarily obscure the gist of the present invention, the detailed description will be omitted. In describing various embodiments, the same components may be representatively described at the beginning and omitted in other embodiments.

<First embodiment>

Hereinafter, a liquid crystal display device according to a first embodiment of the present invention will be described with reference to FIGS. 3 to 5. Figure 3 is a plan view showing the structure of a liquid crystal display device according to the first embodiment of the present invention. FIG. 4 is a cross-sectional view of the liquid crystal display device shown in FIG. 3 taken along the line II-II'. Figure 5 is a diagram for explaining various examples of structures of protrusion patterns.

Referring to FIGS. 3 and 4, the liquid crystal display device according to the first embodiment of the present invention includes a first substrate (hereinafter referred to as “lower substrate”) (SL) and a second substrate (hereinafter referred to as “upper substrate”). ) (SU), and a liquid crystal layer (LC) interposed between the lower substrate (SL) and the upper substrate (SU). The lower substrate SL and the upper substrate SU include pixel areas arranged in a matrix manner. The pixel area includes an aperture area and a non-aperture area surrounding the aperture area. The aperture area may be defined by a black matrix (BM). The non-aperture area may be defined as an area obscured by the black matrix (BM).

On the lower substrate (SL), the gate wire (GL) and the data wire (DL) cross each other, a thin film transistor (T) formed at the intersection, and a pixel electrode (PXL) formed to form a horizontal electric field in the pixel area provided with the intersection structure. ) and the common electrode (COM), and a common wiring (CL) that is connected to the common electrode (COM) and runs parallel to the gate wiring (GL) is formed.

At least one thin film transistor T is disposed in each pixel area. The thin film transistor (T) has a gate electrode (G) connected to the gate wire (GL), a source electrode (S) connected to the data wire (DL), and a drain electrode (D) connected to the pixel electrode (PXL). Includes. Additionally, the thin film transistor T includes a semiconductor layer. One side of the semiconductor layer is connected to the source electrode (S), and the other side of the semiconductor layer is connected to the drain electrode (D). The area of the semiconductor layer that overlaps the gate electrode (G) is defined as a channel area. The thin film transistor (T) can be implemented in any known structure as long as it can drive a liquid crystal display device. For example, it may include a top gate structure, a bottom gate structure, a double gate structure, etc.

The thin film transistor T supplies the pixel signal of the data line DL to the pixel electrode PXL in response to the gate signal of the gate line GL. The common wiring (CL) is formed in parallel with the gate wiring (GL) and supplies a common voltage for driving the liquid crystal to the common electrode (COM). The storage capacitor (STG) is connected to the thin film transistor (T) and charges the difference voltage between the pixel signal and the common voltage.

The pixel electrode (PXL) is connected to the drain electrode (D) of the thin film transistor (T) through the pixel contact hole (PH) penetrating the protective film (PAS) and the planarization film (PAC). The pixel electrode (PXL) includes a horizontal pixel electrode (PXLh) connected to the drain electrode (D) and formed parallel to the adjacent gate line (GL), and a plurality of vertical pixel electrodes branched in the vertical direction from the horizontal pixel electrode (PXLh) ( PXLv).

The common electrode COM may be connected to the common wiring CL through the common contact hole CH passing through the gate insulating film GI, the protective film PAS, and the planarization film PAC. The common electrode COM includes a horizontal common electrode COMh formed in the horizontal direction and a plurality of vertical common electrodes COMv branched from the horizontal common electrode COMh in the vertical direction.

The pixel electrode (PXL) and the common electrode (COM) may be formed of the same material and on the same layer. The vertical common electrode (COMv) and the vertical pixel electrode (PXLv) may have a comb-tooth structure in which a plurality of line segments are arranged in parallel at regular intervals within the pixel area. The vertical common electrode (COMv) and the vertical pixel electrode (PXLv) are arranged to engage each other, but are arranged side by side so as not to contact each other. However, it is not limited to this.

In other words, the location and shape of the pixel electrode (PXL) and common electrode (COM) can be selected to suit the design environment and purpose. For example, the pixel electrode (PXL) and the common electrode (COM) may be provided in different layers with an insulating film interposed therebetween. That is, on the planarization film (PAC), the pixel electrode (PXL) and an insulating film covering the pixel electrode (PXL) may be sequentially formed, and the common electrode (COM) may be formed on the insulating film to maintain a horizontal electric field with the pixel electrode (PXL). can be formed. Alternatively, a common electrode (COM) and an insulating film covering the common electrode (COM) may be sequentially formed on the planarization film (PAC), and the pixel electrode (PXL) may be formed on the insulating film to maintain a horizontal electric field with the common electrode (COM). can be formed.

In this case, the pixel electrode (PXL) (or common electrode (COM)) located below the insulating film may have a plate shape with a preset area, and the common electrode (COM) (or, The pixel electrode (PXL) may have a comb-tooth structure in which a plurality of line segments are arranged in parallel at regular intervals within the pixel area.

The upper substrate (SU) includes a color filter (CF). The color filter (CF) includes red, green, and blue color filters (CF). Color filters (CF) may be arranged alternately in an R-G-B manner. Additionally, the color filter (CF) may further include a white color filter (CF). Each color filter CF may be formed one by one to correspond to each pixel area.

The non-opening area of the upper substrate SU includes protruding patterns (or steps) SGh and SGv. In the upper substrate SU, a step occurs due to a height difference between the structures placed in the open area and the structures placed in the non-open area. The portion of the non-opening area that protrudes from the opening area due to the height difference is defined as a protruding pattern (SGh, SGv).

The protruding patterns (SGh, SGv) may include a color filter (CF) and a black matrix (BM). For example, the black matrix BM may be disposed on neighboring color filters CF extending to the non-aperture area to form a step. A color filter (CF) is disposed in the opening area of the upper substrate (SU), and a neighboring color filter (CF) and a black matrix (BM) are stacked and disposed in the non-opening area of the upper substrate (SU), so that the ratio between the opening area and the Protrusion patterns (SGh, SGv) are formed due to the height difference between the opening areas.

The protrusion patterns (SGh, SGv) include a vertical protrusion pattern (SGv) and a horizontal protrusion pattern (SGh). The vertical protrusion pattern (SGv) refers to the vertical component extending in the vertical direction among the protrusion patterns (SGh, SGv), and the horizontal protrusion pattern (SGh) refers to the horizontal component extending in the horizontal direction among the protrusion patterns (SGh, SGv). do. The vertical protrusion pattern SGv is arranged in parallel with the data line DL of the lower substrate SL and overlaps the data line DL so as to completely cover the data line DL. The horizontal protrusion pattern (SGh) overlaps the thin film transistor and various wiring (GL, DL, CL) of the lower substrate (SL), and when driving the liquid crystal, the end of the vertical pixel electrode (PXLv) and/or the vertical common electrode (COMv) It can be formed at a level that can block light leakage due to disclination that may occur at the ends of the , or disclination that may occur during the rubbing process of the alignment layer (ALL, ALU). When the upper substrate SU is viewed from a plane, the protruding patterns SGh and SGv may be arranged in a mesh shape surrounding the opening areas arranged in a matrix.

As described above, the protruding patterns SGh and SGv may be formed by stacking the black matrix BM on the color filter CF adjacent to the non-aperture area, but are not limited thereto. Referring to (a) of FIG. 5, the protruding patterns SGh and SGv may be formed using only the black matrix BM. That is, the upper substrate SU includes a color filter CF disposed in the opening area, and a black matrix BM disposed in the non-opening area. At this time, the black matrix BM is formed on the upper substrate SU, and extends from the upper substrate SU to a preset height to partition the color filters CF disposed in neighboring opening areas. The black matrix BM is formed to have a higher height than the neighboring color filter CF. Accordingly, the protruding patterns SGh and SGv are formed by the height difference between the black matrix BM and the neighboring color filters CF.

Referring to FIG. 5 (b), the protruding patterns SGh and SGv may be formed of color filters CF. That is, the upper substrate SU includes color filters CF provided to correspond to each pixel area. At this time, the color filters CF are arranged in the aperture area of each pixel area, but are also arranged to extend to the non-aperture area. Neighboring color filters CF in the non-aperture area are stacked on each other. A single-layer color filter (CF) is disposed in the aperture area and stacked color filters (CF) are disposed in the non-aperture area, resulting in a height difference between the aperture area and the non-aperture area. Protrusion patterns (SGh, SGv) are formed by this height difference. In the non-aperture area, color filters (CF) stacked on each other may function as a black matrix (BM).

Referring to FIG. 5 (c), the protruding patterns SGh and SGv may be formed of a color filter CF and a black matrix BM. That is, the upper substrate SU includes color filters CF provided to correspond to each pixel area. Color filters (CF) are disposed in the aperture area of each pixel area and extend to the non-aperture area. Neighboring color filters CF in the non-aperture area are stacked on each other. At this time, a black matrix BM may be further disposed on the color filter CF stacked in the non-aperture area. A single-layer color filter (CF) is disposed in the opening area, and stacked color filters (CF) and a black matrix (BM) are disposed in the non-opening area, resulting in a height difference between the open area and the non-opening area. Protrusion patterns (SGh, SGv) are formed by this height difference.

Although not shown, an overcoat layer may be further formed on the entire surface of the upper substrate SU on which the protruding patterns SGh and SGv are formed. When forming the black matrix (BM) on the color filter (CF) in configuring the above-described protrusion patterns (SGh, SGv), the overcoat layer may be interposed between the color filter (CF) and the black matrix (BM). there is.

Between the lower substrate (SL) and the liquid crystal layer (LC) and between the upper substrate (SU) and the liquid crystal layer (LC), an alignment film (ALL, ALU) is formed. The lower substrate (SL) is bonded to the upper substrate (SU) with the liquid crystal layer (LC) interposed therebetween. A horizontal electric field is formed between the vertical pixel electrode (PXLv) to which the pixel signal is supplied through the thin film transistor (T) and the vertical common electrode (COMv) to which the common voltage is supplied through the common wiring (CL). This horizontal electric field causes the liquid crystal molecules to rotate due to dielectric anisotropy. Images are created by varying the light transmittance passing through the pixel area depending on the degree of rotation of the liquid crystal molecules.

The present invention provides protruding patterns (SGh, SGv) so that the upper alignment layer (ALU) and/or the overcoat layer have a height difference between the open area and the non-open area. For example, when an overcoat layer is formed, the overcoat layer is intended to reduce a step that may occur due to a color filter (CF), etc. However, in the present invention, even if the overcoat layer is formed, a step is maintained between the open area and the non-open area. It is characterized by being formed. To this end, the structures forming the protruding patterns SGh and SGv are formed to have a preset height. The preset height of the protruding pattern (SGh, SGv) is appropriately selected in consideration of the height of the neighboring color filters (CF), the physical properties of the material constituting the alignment layer (ALL, ALU), and the physical properties of the material constituting the overcoat layer. It can be done.

In order to maintain a constant cell gap between the lower substrate SL and the upper substrate SU, a column spacer CS is formed. The column spacer CS is disposed on the lower alignment layer ALL of the lower substrate SL. The column spacer CS formed on the lower substrate SL is formed to overlap the protruding patterns SGh and SGv disposed on the upper substrate SU. The upper surface of the column spacer (CS) contacts the upper alignment layer (ALU) disposed on the upper substrate (SU). In the drawing, an example is shown where the cross-sectional shape of the column spacer CS is circular, but the present invention is not limited thereto. The cross-sectional shape of the column spacer (CS) may have various planar shapes, including circular and polygonal shapes.

The horizontal protrusion pattern (SGh) must be formed with an area that can block light leakage that may occur when the liquid crystal arrangement is disturbed. In detail, when an external force is applied to the liquid crystal display device, damage occurs on the surface of the upper alignment layer (ALU) in contact with the upper surface of the column spacer (CS) according to the movement of the upper substrate (SU). At this time, damage occurs on the surface of the upper alignment layer (ALU), thereby disrupting the alignment of the liquid crystal. Light leakage defects occur in the area (DA2) where the basic orientation of the liquid crystal has changed. FIG. 4(a) shows a state before an external force acts on the liquid crystal display device, and FIG. 4(b) shows a state in which the upper substrate SU is shifted at a certain interval due to an external force acting on the liquid crystal display device. In order to prevent light leakage, the present invention sets the vertical width W2 of the horizontal protrusion pattern SGh in consideration of the margin area M2 where the column spacer CS can move.

Hereinafter, the effect of the liquid crystal display device according to the present invention will be explained through comparative description of FIGS. 2 and 4. In the present invention, the column spacer (CS) is formed on the lower substrate (SL), and the upper surface of the column spacer is in contact with the upper alignment layer (ALU) formed on the upper substrate (SU). At this time, because the column spacer (CS) overlaps the protruding patterns (SGh, SGv) of the upper substrate (SU), the area of the upper alignment layer (ALU) in contact with the column spacer is smaller than other areas of the upper alignment layer (ALU). It protrudes in the direction of the lower substrate SL. A protruding area of the upper alignment layer (ALU) corresponds to a non-opening area, and another area of the upper alignment layer (ALU) corresponds to an opening area.

When an external force is applied to the liquid crystal display device and the upper substrate SU is shifted at a certain interval, the column spacer CS is contacted only on the protruding upper alignment layer ALU area. Assuming that the same external force acts on the liquid crystal display device and the upper substrate SU is shifted at equal intervals, the area where damage to the alignment layer occurs and light leakage occurs is different between the present invention and the prior art. That is, in the prior art, as the column spacer CS moves, damage occurs in the corresponding area DA1 of the lower alignment layer ALL. In contrast, in the present invention, even if the upper substrate (SU) is shifted, the column spacer (CS) can span the end of the protruding upper alignment layer (ALU) area, so the upper alignment layer (CS) is larger than the distance at which the upper substrate (SU) is shifted. The area (DA2) where damage occurs in the ALU is reduced. FIG. 2 (b) and FIG. 4 (b) illustrate a case where the same external force acts on the liquid crystal display device and the upper substrate SU is shifted at equal intervals.

The liquid crystal display device according to the present invention can reduce the light leakage area DA2 due to the provision of external force compared to the prior art. Accordingly, in the present invention, the width (W2) of the horizontal protruding pattern (SGh) to cover the light leakage area (DA2) is the width (W1) of the horizontal black matrix (BMh) to cover the conventional light leakage area (DA1). ) can be set narrower than that. Accordingly, the present invention can provide a liquid crystal display device with an improved aperture ratio compared to the prior art. In addition, according to the present invention, a sufficient aperture ratio can be secured even in a high-resolution liquid crystal display device.

Hereinafter, other effects of the liquid crystal display device according to the present invention will be described with further reference to FIG. 6. Figure 6 is a drawing for explaining the effect of the liquid crystal display device according to the present invention. Figure 6(a) shows a liquid crystal display device according to the prior art, and Figure 6(b) shows an example of a liquid crystal display device according to the present invention.

Since liquid crystal displays cannot emit their own light, a separate light source is needed to produce images. Accordingly, although not shown, an additional backlight unit may be disposed on the rear surface of the lower substrate SL.

Light irradiated from the backlight unit to the lower substrate SL is incident on each pixel area and passes through color filters corresponding to each pixel area to create a display image. At this time, color mixing defects may occur between adjacent pixel areas. This color mixing defect may become more problematic when the user views the liquid crystal display device from the side.

For example, referring to (a) of FIG. 6, the first color filter (CF1) disposed in the first pixel area (PA1) among the light (①, ②, ③) passing through the first pixel area (PA1) A color mixing defect may occur in which the light ① passing through and the light ③ passing through the second color filter CF2 disposed in the adjacent second pixel area PA2 are perceived at the same time. This color mixing defect deteriorates the display quality of the liquid crystal display device.

To prevent color mixing defects, a black matrix BM is formed on the upper substrate SU. The black matrix (BM) blocks light (②) incident from the pixel area in the lateral direction. Accordingly, the black matrix BM reduces defects that occur due to mixing of unwanted colors in adjacent pixel areas. Despite forming a black matrix (BM), there are limitations in preventing color mixing defects. That is, in order to effectively prevent color mixing defects using the black matrix (BM), a black matrix (BM) having a wide width is required. For example, in order to block light (hereinafter referred to as 'mixed light') (③) that causes color mixing defects between adjacent pixel areas, the width of the black matrix BM may be formed wider. However, when forming a black matrix (BM) with a wide width, light incident from the side can be effectively blocked, but there is a problem in that it also blocks light coming from the front, reducing the aperture ratio.

In the present invention, in order to form the protruding patterns SGh and SGv, the black matrix BM provided in the non-opening area is formed to protrude compared to the color filter CF. Figure 6(b) shows an example. Accordingly, compared to the prior art, the liquid crystal display device according to the present invention forms a narrower gap between the black matrix (BM) and the lower alignment layer (ALL), so that the black matrix (BM) can block the mixed color light (③). The range can be increased.

For example, in the prior art, among the lights (①, ②, ③) passing through the first pixel area (PA1), the light (③) passing through the second color filter (CF2) disposed in the second pixel area (PA2) This is recognized by the user. This means that among the lights (①, ②, ③) passing through the first pixel area (PA1), the light (①, ②) passing through the first color filter (CF1) disposed in the first pixel area (PA1) is transmitted simultaneously to the user. It is recognized and causes color mixing defects (Figure 6(a)).

In contrast, in the present invention, among the lights ①, ②, ③ passing through the first pixel area PA1, the light ③ directed to the second color filter B disposed in the second pixel area PA2 is black. It is blocked by the matrix (BM) to prevent color mixing defects. That is, compared to the prior art, the liquid crystal display device according to the present invention can effectively prevent color mixing defects by increasing the range of color mixing light blocked by the black matrix (BM) (FIG. 6(b)).

Compared to the prior art, the liquid crystal display device according to the present invention can significantly reduce color mixing defects by changing the arrangement and/or thickness of the black matrix (BM). Additionally, there is no need to expand the width of the black matrix BM to prevent color mixing defects, thereby preventing a decrease in the aperture ratio. Accordingly, the present invention, which reduces color mixing defects, can provide a liquid crystal display device with improved display quality.

<Second Embodiment>

Hereinafter, a liquid crystal display device according to a second embodiment of the present invention will be described with reference to FIGS. 7 and 8. In describing the second embodiment, descriptions of parts that are substantially the same as those of the first embodiment will be omitted. Figure 7 is a plan view showing the structure of a liquid crystal display device according to a second embodiment of the present invention. FIG. 8 is a plan view schematically showing only the protrusion pattern and column spacer in FIG. 7.

In the second embodiment of the present invention, the column spacer CS formed on the lower substrate SL is arranged to overlap the protruding patterns SGh and SGv formed on the upper substrate SU. The protrusion patterns (SGh, SGv) include a horizontal protrusion pattern (SGh) and a vertical protrusion pattern (SGv). At this time, the column spacer CS may be preferably formed in an area where the horizontal protrusion pattern SGh and the vertical protrusion pattern SGv intersect each other.

As mentioned above, when an external force acts on the liquid crystal display device and the upper substrate (SU) shifts, a phenomenon of light leakage (hereinafter referred to as 'light leakage') occurs due to damage to the upper alignment layer (ALU), and it is necessary to cover it. For this purpose, the present invention forms protrusion patterns (SGh, SGv) having a certain area. At this time, since the horizontal protrusion pattern SGh is arranged to extend along the horizontal direction, it can sufficiently cover the light leakage phenomenon when the upper substrate SU is shifted in the horizontal direction due to an external force. The horizontal protruding pattern SGh must be arranged to extend in the horizontal direction to cover the thin film transistor T and various wiring lines GL and CL. Therefore, there is no need to separately increase the length of the horizontal protruding pattern SGh in the horizontal direction to block light leakage.

However, in order to cover the light leakage phenomenon that occurs when the upper substrate (SU) is shifted in the vertical direction, a sufficient margin area (M2) where the column spacer (CS) can move must be secured. That is, in order to block light leakage, the horizontal protrusion pattern SGh must secure a width W2 in the vertical direction corresponding to the margin area M2. Therefore, the width W2 of the horizontal protrusion pattern SGh is required to be widened.

In the second embodiment of the present invention, in order to prevent the width W2 of the horizontal protrusion pattern SGh from becoming too long, the column spacer CS is formed into a horizontal protrusion pattern SGh and a vertical protrusion pattern SGv. It is characterized by overlapping arrangement in the intersecting area. Accordingly, even when the upper substrate SU is shifted in the vertical direction due to an external force, the column spacer CS can move (RT) along the vertical protrusion pattern SGv. When the column spacer CS moves (RT) along the vertical protrusion pattern SGv, no damage occurs in the upper alignment layer (ALU) area corresponding to the opening area.

In the second embodiment of the present invention, the column spacer (CS) is overlapped in the area where the horizontal protrusion pattern (SGh) and the vertical protrusion pattern (SGv) intersect to block light leakage. It is possible to prevent the problem of having to make the width (W2) in the vertical direction too wide. Accordingly, the second embodiment of the present invention can provide a liquid crystal display device that can block light leakage due to damage to the alignment film while securing a sufficient aperture ratio.

<Third Embodiment>

Hereinafter, a liquid crystal display device according to a third embodiment of the present invention will be described with reference to FIGS. 9 and 10. In describing the third embodiment, descriptions of parts that are substantially the same as those of the first embodiment will be omitted. Figure 9 is a plan view showing the structure of a liquid crystal display device according to a third embodiment of the present invention. FIG. 10 is a plan view schematically showing only the protrusion pattern and column spacer in FIG. 9.

The liquid crystal display device according to the third embodiment of the present invention includes a horizontal protrusion pattern (SGh) arranged in a horizontal direction and a vertical protrusion pattern (SGv) arranged in a vertical direction in a non-opening area of the upper substrate (SU), , and includes a column spacer (CS) disposed to overlap the area where the horizontal protrusion pattern (SGh) and the vertical protrusion pattern (SGv) intersect in the non-opening area of the lower substrate (SL).

The cross-sectional shape of the column spacer CS may be a planar shape including an oval or a polygon. At this time, the column spacer CS has a preset length in the horizontal direction. For example, the preset length in the horizontal direction may be the length of the long axis when the cross-sectional shape of the column spacer (CS) is oval, and may be the length of one side when the cross-sectional shape of the column spacer (CS) is square. . Hereinafter, the case where the column spacer CS is rectangular will be described as an example. As an example, the column spacer CS may have a bar shape with a cross-sectional shape having a preset length LE1 in the horizontal direction and a preset width WI1 in the vertical direction.

The horizontal length LE1 of the column spacer CS is preferably longer than the width LE2 of the vertical protrusion pattern SGv. By forming the horizontal length (LE1) of the column spacer (CS) to be longer than the width (LE2) of the vertical protrusion pattern (SGv), when the column spacer (CS) moves along the vertical protrusion pattern (SGv), the vertical Sufficient area to overlap with the protrusion pattern (SGv) can be secured. When a sufficient area overlapping with the vertical protrusion pattern SGv is secured when the column spacer CS is moved, the vertical width W3 of the horizontal protrusion pattern SGh can be further reduced.

Specifically, when the upper substrate (SU) is shifted in the vertical direction by an external force, the column spacer (CS) can move (RT) along the vertical protrusion pattern (SGv), so that the upper alignment film (RT) provided in the opening area ALU) damage can be prevented. In addition, by forming the horizontal length LE1 of the column spacer CS to be sufficiently longer than the width LE2 of the vertical protruding pattern SGv, even when the upper substrate SU is shifted in the diagonal direction due to an external force, , the column spacer (CS) can move (TT) along the vertical protrusion pattern (SGv), thereby preventing damage to the upper alignment layer (ALU) provided in the opening area.

In the third embodiment according to the present invention, considering the case where the upper substrate SU is shifted in the diagonal direction, the vertical width of the horizontal protruding pattern SGh is equal to the movement margin in the diagonal direction of the column spacer CS There is no need to increase W3). The third embodiment according to the present invention can reduce the width W3 of the horizontal protruding pattern SGh compared to the third embodiment. Accordingly, the third embodiment of the present invention can provide a liquid crystal display device that can block light leakage due to damage to the alignment film while securing a sufficient aperture ratio.

However, when the column spacer (CS) moves in a diagonal direction, the end of the column spacer (CS) may come into contact with the upper alignment layer (ALU) of the opening area, causing damage to the alignment layer. To prevent this, the horizontal length LE1 of the column spacer CS may be longer than the separation distance LE3 between adjacent vertical protrusion patterns SGv. When the upper substrate (SU) is shifted in the diagonal direction due to an external force, the column spacer (CS) can move along the neighboring vertical protrusion patterns (SGv) with both ends overlapped with the neighboring vertical protrusion patterns (SGv). . By forming the horizontal length LE1 of the column spacer CS to be sufficiently longer than the separation distance LE3 between neighboring vertical protruding patterns SGv, when the upper substrate SU is shifted in the diagonal direction, the column It is possible to prevent the end of the spacer (CS) from directly contacting the upper alignment layer (ALU) of the opening area.

The horizontal length LE1 and the vertical width WI1 of the column spacer CS may be set in consideration of the distribution density of the column spacer CS. That is, the length LE1 and width WI1 of the column spacer CS may be set in consideration of the distribution density necessary to maintain the cell gap between the upper substrate SU and the lower substrate SL. . When the column spacer (CS) is required to have a specific area to match the distribution density, the present invention can secure the length (LE1) of the column spacer (CS) sufficiently long and reduce the width (WI1). That is, as described above, the column spacer CS in the present invention needs to secure a certain length LE1 in the horizontal direction. Therefore, the present invention sets the area of the column spacer (CS) in consideration of the required distribution density, but forms the horizontal length (LE1) of the column spacer (CS) to be longer than the vertical width (WI1). You can.

The column spacer CS may be formed to overlap at least one of the contact holes arranged in the non-opening area. Contact holes disposed in the non-opening area may include a pixel contact hole (PH) and a common contact hole (CH). When the lower alignment film (ALL) is applied on top of the area where the contact holes are formed, the alignment film may not spread. That is, during the lower alignment film (ALL) application process, the alignment film non-spreading phenomenon in which the lower alignment film (ALL) is not sufficiently applied to the contact hole area may occur due to surface tension. Non-spreading of the alignment film causes spotting defects and deteriorates display quality. The present invention can prevent the alignment film from spreading by applying an alignment film after forming a column spacer (CS) to cover the contact hole area. Therefore, the third embodiment of the present invention can provide a liquid crystal display device that improves product reliability and product yield by preventing stain defects.

<Example 4>

Hereinafter, a liquid crystal display device according to a fourth embodiment of the present invention will be described with reference to FIGS. 11 to 13. Figure 11 is a plan view showing the structure of a liquid crystal display device according to a fourth embodiment of the present invention. FIG. 12 is a cross-sectional view of the liquid crystal display device shown in FIG. 11 taken along line III-III'. FIG. 13 is a diagram of the liquid crystal display device shown in FIG. 11 cut along the perforated lines IV-IV', and is a diagram for explaining various structural examples of vertical protrusion patterns. Figures 14 and 15 are diagrams for explaining the arrangement of the first auxiliary pattern.

11 and 12, the liquid crystal display device according to the fourth embodiment of the present invention includes a lower substrate (SL), an upper substrate (SU), and a liquid crystal display device disposed between the lower substrate (SL) and the upper substrate (SU). It includes a liquid crystal layer (LC). The lower substrate SL and the upper substrate SU include pixel areas arranged in a matrix manner. The pixel area includes an aperture area and a non-aperture area surrounding the aperture area. The aperture area may be defined by a black matrix (BM). The non-aperture area may be defined as an area obscured by the black matrix (BM).

On the lower substrate (SL), the gate wire (GL) and the data wire (DL) cross each other, a thin film transistor (T) formed at the intersection, and a pixel electrode (PXL) formed to form a horizontal electric field in the pixel area provided with the intersection structure. ) and a common electrode (COM) are formed.

At least one thin film transistor T is disposed in each pixel area. The thin film transistor (T) has a gate electrode (G) connected to the gate wire (GL), a source electrode (S) connected to the data wire (DL), and a drain electrode (D) connected to the pixel electrode (PXL). Includes. Additionally, the thin film transistor T includes a semiconductor layer. One side of the semiconductor layer is connected to the source electrode (S), and the other side of the semiconductor layer is connected to the drain electrode (D). The area of the semiconductor layer that overlaps the gate electrode (G) is defined as a channel area.

The thin film transistor T supplies the pixel signal of the data line DL to the pixel electrode PXL in response to the gate signal of the gate line GL. The common electrode (COM) is electrically connected to a common voltage source (not shown) and receives a common voltage. The storage capacitor is connected to the thin film transistor (T) and charges the differential voltage between the pixel signal and the common voltage.

A common electrode (COM) and a pixel electrode (PXL) are provided on the protective film (PAS) and the planarization film (PAC) covering the thin film transistor to form a horizontal electric field. The location and shape of the pixel electrode (PXL) and common electrode (COM) can be selected to suit the design environment and purpose.

For example, a common electrode (COM) and an insulating film covering the common electrode (COM) may be formed sequentially on the planarization film (PAC), and the pixel electrode (PXL) may be formed on the insulating film and be horizontal to the common electrode (COM). An electric field can be formed. In addition, although not shown, a pixel electrode (PXL) and an insulating film covering the pixel electrode (PXL) may be sequentially formed on the planarization film (PAC), and a common electrode (COM) may be formed on the insulating film to cover the pixel electrode (PXL). and may form a horizontal electric field.

In this case, the common electrode (COM) (or pixel electrode (PXL)) located below the insulating film may have a plate shape with a preset area, and the pixel electrode (PXL) (or common electrode () located above the insulating film. COM)) may have a comb-tooth structure in which a plurality of line segments are arranged in parallel at regular intervals within the pixel area.

The non-opening area of the lower substrate SL includes a vertical protrusion pattern SGv. In the lower substrate SL, a step occurs due to a height difference between the structures placed in the open area and the structures placed in the non-open area. The portion of the non-opening area that protrudes from the opening area due to the height difference is defined as a vertical protruding pattern (SGv).

The vertical protruding pattern SGv includes a first auxiliary pattern ME arranged to overlap a data line extending in the vertical direction in the non-opening area. The first auxiliary pattern ME is provided to have a preset thickness. Accordingly, the vertical protrusion pattern SGv including the first auxiliary pattern ME has a shape that protrudes more in the direction of the upper substrate SU compared to the peripheral area (eg, the opening area).

As shown in FIG. 12 , it may be preferable that the first auxiliary pattern ME overlaps the data line DL and is located on the uppermost layer excluding the lower alignment layer ALL, but is not limited to this. In other words, various materials are sequentially stacked on the lower substrate SL to form devices. At this time, the first auxiliary pattern ME does not need to have the latest stacking order. That is, even if another layer is formed after the first auxiliary pattern ME, it is sufficient as long as the first auxiliary pattern ME is provided with a preset thickness to form the vertical protruding pattern SGv with a sufficient height.

The first auxiliary pattern ME may be in contact with another electrode to receive a specific voltage (or signal), or may be provided independently. However, in order to prevent unnecessary parasitic capacitors from being formed, it may be desirable for the first auxiliary pattern ME to be electrically connected to an electrode to which a specific signal is applied.

For example, referring to (a) of FIG. 13, the pixel electrode PXL and the common electrode COM may be provided in different layers with the first insulating film IN1 and the second insulating film IN2 interposed therebetween. . That is, the common electrode COM may be provided on the planarization film PAC to have a plate shape with a preset area. A first insulating film IN1 may be provided on the common electrode COM to cover the common electrode COM. The first auxiliary pattern ME may be provided on the first insulating layer IN1 to overlap the data line DL. The first auxiliary pattern ME may be electrically connected to the common electrode COM through the first contact hole INH penetrating the first insulating film IN1 in a preset area. A second insulating film IN2 may be provided on the first auxiliary pattern ME, and a pixel electrode PXL may be provided on the second insulating film IN2. The pixel electrode (PXL) is connected to the drain electrode (D) of the thin film transistor (T). The pixel electrode PXL may have a comb-tooth structure in which a plurality of line segments are arranged in parallel at regular intervals within the pixel area. At this time, the vertical protruding pattern SGv formed by the first auxiliary pattern ME is provided to have a sufficient height compared to the area where the pixel electrode PXL is formed, and protrudes in the direction of the upper substrate SU.

As another example, referring to (b) of FIG. 13, the pixel electrode PXL and the common electrode COM may be provided in different layers with the first insulating film IN1 interposed therebetween. That is, the common electrode COM may be provided on the planarization film PAC to have a plate shape with a preset area. The first auxiliary pattern ME may be provided to overlap the data line DL on the common electrode COM. The first auxiliary pattern (ME) is directly connected to the common electrode (COM). A first insulating film IN1 may be provided on the first auxiliary pattern ME, and a pixel electrode PXL may be provided on the first insulating film IN1. The pixel electrode (PXL) is connected to the drain electrode (D) of the thin film transistor (T). The pixel electrode PXL may have a comb-tooth structure in which a plurality of line segments are arranged in parallel at regular intervals within the pixel area. At this time, the vertical protruding pattern SGv formed by the first auxiliary pattern ME is provided to have a sufficient height compared to the area where the pixel electrode PXL is formed, and protrudes in the direction of the upper substrate SU.

Since liquid crystal displays cannot emit their own light, a separate light source is needed to produce images. Accordingly, an additional backlight unit may be disposed on the rear surface of the lower substrate SL. It passes from the backlight unit through the lower substrate (SL) and upper substrate (SU) and is recognized by the user. At this time, the common electrode COM, which has a plate shape with a preset area, needs to be formed of a transparent conductive material such as ITO (Idium Tin Oxide) in order to pass the light emitted from the backlight unit. In the case of such transparent conductive materials, the specific resistance value is high, so a problem may occur in which a constant voltage value is not maintained over the entire area of the common electrode (COM). This problem is even more problematic in the case of large-area liquid crystal displays and may cause image quality deterioration problems.

The first auxiliary pattern (ME) is formed of a conductive material with a low specific resistance value, and may be electrically connected to the common electrode (COM) directly or through a contact hole. In this case, the first auxiliary pattern ME can lower the resistance of the common electrode COM. Accordingly, the common electrode COM can supply a uniform common voltage to each pixel without deviation depending on position. The first auxiliary pattern (ME) is an alloy formed from molybdenum (Mo), titanium (Ti), tantalum (Ta), tungsten (W), copper (Cu), chromium (Cr), aluminum (Al), and combinations thereof. It may include any one of the following. However, it is not limited to this.

The upper substrate (SU) includes a color filter (CF). The color filter (CF) includes red, green, and blue color filters (CF). Color filters (CF) may be arranged alternately in an R-G-B manner. Additionally, the color filter (CF) may further include a white color filter (CF). Each color filter CF may be formed one by one to correspond to each pixel area.

A black matrix BM may be further provided between neighboring color filters CF. The black matrix BM may be formed directly on the upper substrate SU or on the adjacent color filter CF. The black matrix (BM) may be implemented in a form in which neighboring color filters (CF) are stacked.

The black matrix includes a vertical black matrix (BMv) and a horizontal black matrix (BMh). The vertical black matrix (BMv) refers to the vertical component of the black matrix extending in the vertical direction, and the horizontal black matrix (BMh) refers to the horizontal component of the black matrix extending in the horizontal direction. The vertical black matrix BMv is arranged in parallel with the data line DL of the lower substrate SL and overlaps the data line DL so as to completely cover the data line DL. The horizontal black matrix BMh is disposed to overlap the thin film transistor and various wiring lines GL and DL of the lower substrate SL. The vertical black matrix (BMv) and horizontal black matrix (BMh) are formed at a level that can block light leakage that may occur due to the alignment of the liquid crystals being disturbed. When the upper substrate SU is viewed on a plane, the black matrix may be arranged in a mesh shape surrounding the opening areas arranged in a matrix shape.

The lower substrate (SL) and the upper substrate (SU) are bonded with the liquid crystal layer (LC) interposed therebetween. Between the lower substrate (SL) and the liquid crystal layer (LC) and between the upper substrate (SU) and the liquid crystal layer (LC), an alignment film (ALL, ALU) is formed. The liquid crystal layer (LC) is driven by an electric field formed between the pixel electrode (PXL) and the common electrode (COM).

In order to keep the cell gap between the lower substrate SL and the upper substrate SU constant, a column spacer CS is formed. The column spacer (CS) is formed on the upper alignment layer (ALU) of the upper substrate (SU). The column spacer CS formed on the upper substrate SU is disposed to overlap the vertical protrusion pattern SGv formed on the lower substrate SL. The upper surface of the column spacer (CS) contacts the lower alignment layer (ALL) on the vertical protrusion pattern (SGv) provided on the lower substrate (SL). The area where the column spacer (CS) is disposed may be an area that overlaps with the area where the vertical black matrix (BMv) and the horizontal black matrix (BMh) intersect.

When the upper substrate (SU) is shifted in the vertical direction by an external force, the column spacer (CS) can move along the vertical protrusion pattern (SGv), preventing damage to the lower alignment film (ALL) provided in the opening area. there is. In addition, by forming the horizontal length of the column spacer (CS) to be sufficiently longer than the width of the vertical protruding pattern (SGv), even when the upper substrate (SU) is shifted in the diagonal direction due to an external force, the column spacer (CS) can move at the top along the vertical protrusion pattern (SGv), thereby more effectively preventing damage to the lower alignment layer (ALL) provided in the opening area.

Referring further to FIG. 14 , the first auxiliary pattern ME may extend long in the vertical direction (or vertical direction). At this time, the first auxiliary pattern ME may be formed of a low-resistance conductive material, and may receive a common voltage from a common voltage source and transmit it to the common electrode COM. Accordingly, the common voltage can be uniformly supplied to each pixel without deviation depending on location.

Referring further to FIG. 15 , the first auxiliary pattern ME extends in the vertical direction and may have an independent island pattern. That is, the first auxiliary pattern ME may be provided limited to a certain area in consideration of the movement of the column spacer CS when an external force is applied. The certain area includes at least a part of the non-open area (NA) and at least a part of the open area (AA).

The first auxiliary pattern ME is not provided in all areas where the data line DL is formed, and may be provided locally only in the area where the column spacer CS is formed. In other words, the vertical protrusion pattern SGv may be provided only in the area where the column spacer CS is formed. Accordingly, in the liquid crystal display, the distribution density of the column spacer (CS) and the distribution density of the first auxiliary pattern (ME) may correspond.

<Embodiment 5>

Hereinafter, a liquid crystal display device according to a fifth embodiment of the present invention will be described with reference to FIGS. 16 and 17. In describing the fifth embodiment, descriptions of parts that are substantially the same as those of the fourth embodiment will be omitted. Figures 16 and 17 show the structure of a liquid crystal display device according to a fifth embodiment of the present invention, and are plan views schematically showing only the vertical protrusion pattern and column spacer.

The liquid crystal display device according to the fifth embodiment of the present invention includes a vertical protrusion pattern (SGv) extending in the vertical direction from the non-opening area (NA) of the lower substrate (SL), and a non-opening area ( NA) includes a column spacer (CS) disposed overlapping with a vertical protrusion pattern (SGv).

Referring to FIG. 16, the cross-sectional shape of the column spacer CS may be a planar shape including an oval or a polygon. At this time, the column spacer CS has a preset length LE in the horizontal direction. For example, the preset length (LE) in the horizontal direction may be the length of the long axis when the cross-sectional shape of the column spacer (CS) is oval, and the length of one side when the cross-sectional shape of the column spacer (CS) is square. It can be. Hereinafter, the case where the column spacer CS is rectangular will be described as an example.

The horizontal length (LE) of the column spacer (CS) may be longer than the gap (GAP) between vertical protruding patterns (SGv) that are adjacent in the horizontal direction. That is, both ends of the column spacer CS may be positioned above the vertical protrusion patterns SGv that are adjacent to each other in the horizontal direction. This means that the column spacer CS can be induced to shift on top of the neighboring vertical protrusion patterns SGv.

In the fifth embodiment of the present invention, when an external force is provided, the column spacer CS moves in contact with the top of the vertical protruding patterns SGv adjacent to the horizontal direction. Accordingly, the fifth embodiment of the present invention can minimize damage caused by the column spacer CS contacting the lower alignment layer ALL provided in the opening area AA.

Additionally, in this case, there is no need to secure a wide width (W) of the vertical protrusion pattern (SGv) over which the column spacer (CS) can move. In other words, since there is no need to secure a sufficient contact area between any one vertical protrusion pattern (SGv) and the column spacer (CS) moving along it, the width ( W) can be relatively reduced. Accordingly, the fifth embodiment of the present invention can provide a liquid crystal display device that can block light leakage due to damage to the alignment film while securing a sufficient aperture ratio.

Referring further to FIG. 17, when the gap (GAP) between vertical protruding patterns (SGv) neighboring in the horizontal direction is wide, the column spacer (CS) located on top of the vertical protruding patterns (SGv) is moved by the provided external force. Sagging may occur. In this case, the column spacer CS and the lower alignment layer ALL of the opening area AA may come into contact, and damage may occur in the lower alignment layer ALL.

To prevent this, at least one second auxiliary pattern AME may be further formed between vertical protruding patterns SGv that are adjacent in the horizontal direction. The second auxiliary pattern AME may be located below the column spacer CS and support it when the column spacer CS is shifted to the opening area AA. The second auxiliary pattern (AME) may have an isolated island pattern. The second auxiliary pattern (AME) is disposed at a predetermined distance from the neighboring first auxiliary pattern (ME). One of the second auxiliary patterns AME is spaced apart from the other by a predetermined distance.

The second auxiliary pattern AME may be placed locally only in a portion of the pixel area. The partial area may be a part of the open area (AA) and a part of the non-open area (NA) extending therefrom. Alternatively, the partial area may be part of the opening area AA.

The second auxiliary pattern (AME) is preferably formed of the same material as the first auxiliary pattern (ME) during the same process. However, the first auxiliary pattern (ME) and the second auxiliary pattern (AME) may be respectively connected to different electrodes (or wires) so that different signals may be applied.

The shape, size, and number of the second auxiliary patterns AME may be appropriately selected in consideration of the aperture ratio. The fifth embodiment of the present invention further includes a second auxiliary pattern (AME), thereby minimizing damage to the alignment film due to sagging of the column spacer (CS).

The technical idea of the present invention is not limited to the structure of the liquid crystal display device described above. In other words, the technical idea of the present invention can be applied to any liquid crystal display device that has a column spacer to maintain a cell gap, regardless of its driving method. Through the above-described content, those skilled in the art will be able to see that various changes and modifications can be made without departing from the technical spirit of the present invention. Accordingly, the present invention should not be limited to what is described in the detailed description, but should be defined by the scope of the patent claims.

SU: Upper substrate SL: Lower substrate
CS: Column spacer LC: Liquid crystal layer
SGh: Horizontal extrusion pattern SGv: Vertical extrusion pattern

Claims (15)

an upper substrate and a lower substrate with defined open and non-open areas;
a liquid crystal layer interposed between the upper substrate and the lower substrate;
a column spacer provided on any one of the upper and lower substrates within the non-opening area; and
In the non-opening area, a protruding pattern provided on another substrate facing the substrate provided with the column spacer,
The protruding pattern is,
It includes a first auxiliary pattern provided in a vertical direction,
The column spacer is,
On the upper substrate, it is arranged to overlap the first auxiliary pattern,
The lower substrate is,
In the non-opening area, gate wires are provided in parallel in the horizontal direction, and data wires are provided in parallel in the vertical direction,
The lower substrate is,
a thin film transistor provided in a pixel area including the opening area and the non-opening area;
a pixel electrode connected to the thin film transistor; and
It includes a common electrode that forms an electric field with the pixel electrode,
The first auxiliary pattern overlapping the column spacer is,
A liquid crystal display device electrically connected to the common electrode and formed locally only in an area where the column spacer is formed. delete delete delete delete delete delete delete delete delete According to claim 1,
Further comprising a common voltage source that generates the common voltage,
The first auxiliary pattern is,
A liquid crystal display device that receives the common voltage from the common voltage source and transmits it to the common electrode. According to claim 1,
It further includes at least one second auxiliary pattern provided between the first auxiliary patterns that are adjacent in the horizontal direction,
The second auxiliary pattern is,
A liquid crystal display device overlapping at least a portion of the opening area. delete delete delete

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