KR102598142B1 - 증착 장치 - Google Patents

증착 장치 Download PDF

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Publication number
KR102598142B1
KR102598142B1 KR1020200085034A KR20200085034A KR102598142B1 KR 102598142 B1 KR102598142 B1 KR 102598142B1 KR 1020200085034 A KR1020200085034 A KR 1020200085034A KR 20200085034 A KR20200085034 A KR 20200085034A KR 102598142 B1 KR102598142 B1 KR 102598142B1
Authority
KR
South Korea
Prior art keywords
crucible
nozzle plate
plate
nozzle
guide tab
Prior art date
Application number
KR1020200085034A
Other languages
English (en)
Korean (ko)
Other versions
KR20220007179A (ko
Inventor
문병준
이용환
조용일
조영수
Original Assignee
엘지전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지전자 주식회사 filed Critical 엘지전자 주식회사
Priority to KR1020200085034A priority Critical patent/KR102598142B1/ko
Priority to PCT/KR2021/006942 priority patent/WO2022010105A1/ko
Priority to CN202180055096.XA priority patent/CN116018424A/zh
Publication of KR20220007179A publication Critical patent/KR20220007179A/ko
Application granted granted Critical
Publication of KR102598142B1 publication Critical patent/KR102598142B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1020200085034A 2020-07-10 2020-07-10 증착 장치 KR102598142B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020200085034A KR102598142B1 (ko) 2020-07-10 2020-07-10 증착 장치
PCT/KR2021/006942 WO2022010105A1 (ko) 2020-07-10 2021-06-03 증착 장치
CN202180055096.XA CN116018424A (zh) 2020-07-10 2021-06-03 沉积装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020200085034A KR102598142B1 (ko) 2020-07-10 2020-07-10 증착 장치

Publications (2)

Publication Number Publication Date
KR20220007179A KR20220007179A (ko) 2022-01-18
KR102598142B1 true KR102598142B1 (ko) 2023-11-06

Family

ID=79553289

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200085034A KR102598142B1 (ko) 2020-07-10 2020-07-10 증착 장치

Country Status (3)

Country Link
KR (1) KR102598142B1 (zh)
CN (1) CN116018424A (zh)
WO (1) WO2022010105A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023167347A1 (ko) * 2022-03-03 2023-09-07 엘지전자 주식회사 선형 증발원

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100691025B1 (ko) * 2005-12-16 2007-03-09 두산디앤디 주식회사 유기박막 증착용 도가니 장치
KR100712217B1 (ko) * 2005-09-30 2007-04-27 삼성에스디아이 주식회사 증발원 및 이를 이용한 진공증착기

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101015336B1 (ko) * 2008-08-22 2011-02-16 삼성모바일디스플레이주식회사 내부 플레이트 및 이를 구비한 증착용 도가니 장치
KR101633112B1 (ko) * 2009-12-03 2016-06-24 엘지디스플레이 주식회사 유기박막 진공 열 증착 장치용 소스
KR20160017671A (ko) 2014-07-31 2016-02-17 에스엔유 프리시젼 주식회사 박막형성용 증발원
KR102221757B1 (ko) * 2018-11-26 2021-03-03 주식회사 선익시스템 점 증발원용 도가니 및 점 증발원

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100712217B1 (ko) * 2005-09-30 2007-04-27 삼성에스디아이 주식회사 증발원 및 이를 이용한 진공증착기
KR100691025B1 (ko) * 2005-12-16 2007-03-09 두산디앤디 주식회사 유기박막 증착용 도가니 장치

Also Published As

Publication number Publication date
CN116018424A (zh) 2023-04-25
KR20220007179A (ko) 2022-01-18
WO2022010105A1 (ko) 2022-01-13

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