KR102566078B1 - 광 중합성 조성물 - Google Patents

광 중합성 조성물 Download PDF

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Publication number
KR102566078B1
KR102566078B1 KR1020187005578A KR20187005578A KR102566078B1 KR 102566078 B1 KR102566078 B1 KR 102566078B1 KR 1020187005578 A KR1020187005578 A KR 1020187005578A KR 20187005578 A KR20187005578 A KR 20187005578A KR 102566078 B1 KR102566078 B1 KR 102566078B1
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South Korea
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anthracene
bis
compound
photopolymerizable composition
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Korean (ko)
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KR20180053651A (ko
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시게아키 누마타
슈지 요코야마
야스아키 미키
아키히코 야마다
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가와사끼가세이고오교 가부시끼가이샤
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F122/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F122/10—Esters
    • C08F122/1006—Esters of polyhydric alcohols or polyhydric phenols, e.g. ethylene glycol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/13—Phenols; Phenolates
    • C08K5/132—Phenols containing keto groups, e.g. benzophenones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020187005578A 2015-09-14 2016-09-13 광 중합성 조성물 Active KR102566078B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015181281A JP6686336B2 (ja) 2015-09-14 2015-09-14 光重合性組成物
JPJP-P-2015-181281 2015-09-14
PCT/JP2016/077018 WO2017047599A1 (ja) 2015-09-14 2016-09-13 光重合性組成物

Publications (2)

Publication Number Publication Date
KR20180053651A KR20180053651A (ko) 2018-05-23
KR102566078B1 true KR102566078B1 (ko) 2023-08-10

Family

ID=58288758

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187005578A Active KR102566078B1 (ko) 2015-09-14 2016-09-13 광 중합성 조성물

Country Status (5)

Country Link
US (1) US10570227B2 (https=)
JP (1) JP6686336B2 (https=)
KR (1) KR102566078B1 (https=)
CN (1) CN108026197B (https=)
WO (1) WO2017047599A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7016226B2 (ja) * 2017-05-17 2022-02-04 川崎化成工業株式会社 高分子光重合増感剤
JP2019048917A (ja) * 2017-09-07 2019-03-28 川崎化成工業株式会社 アントラセン系光ラジカル重合開始剤
JP7145362B2 (ja) * 2017-10-26 2022-10-03 エア・ウォーター・パフォーマンスケミカル株式会社 アントラセン系光ラジカル重合増感剤およびナフタレン系光ラジカル重合増感助剤を含む光ラジカル重合性組成物
JP2019112485A (ja) * 2017-12-21 2019-07-11 川崎化成工業株式会社 酸素阻害を低減する光ラジカル重合性組成物の重合方法
WO2019159908A1 (ja) 2018-02-13 2019-08-22 川崎化成工業株式会社 多環芳香族骨格を有する化合物及びそのエンドペルオキシド化合物
WO2020121384A1 (ja) * 2018-12-10 2020-06-18 川崎化成工業株式会社 耐マイグレーション性を有する光重合増感剤
JP7217160B2 (ja) * 2019-01-29 2023-02-02 マクセル株式会社 モデル材クリア組成物
JP7562079B2 (ja) * 2020-07-17 2024-10-07 株式会社リコー 活性エネルギー線硬化型組成物、硬化型インク、組成物収容容器、像形成装置、像形成方法、硬化物、及び加飾体
JP7743705B2 (ja) * 2021-03-20 2025-09-25 エア・ウォーター・パフォーマンスケミカル株式会社 光ラジカル重合性組成物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3768919D1 (en) 1986-11-26 1991-05-02 Ciba Geigy Ag Fluessige photoinitiatorgemische.
JP2551612B2 (ja) * 1988-01-30 1996-11-06 大倉工業株式会社 熱収縮性多層フイルム
JPH04195043A (ja) * 1990-11-28 1992-07-15 Hitachi Chem Co Ltd 感光性組成物及びこれを用いたソルダレジストの形成された印刷配線板の製造法
JPH0733809A (ja) 1993-07-16 1995-02-03 Toyo Ink Mfg Co Ltd 光開始剤組成物および被覆組成物
JPH11322952A (ja) * 1998-05-15 1999-11-26 Asahi Denka Kogyo Kk 光重合性組成物および硬化塗膜形成方法
JP4201440B2 (ja) * 1999-09-09 2008-12-24 関西ペイント株式会社 活性エネルギー線硬化型組成物およびその組成物を使用してなる被膜形成方法
JP4478928B2 (ja) * 2004-04-28 2010-06-09 川崎化成工業株式会社 蛍光発光性硬化物用の組成物および蛍光発光性硬化物
JP4828201B2 (ja) * 2005-10-19 2011-11-30 東京応化工業株式会社 化学増幅型ホトレジスト組成物、レジスト層積層体およびレジストパタ−ン形成方法

Also Published As

Publication number Publication date
WO2017047599A1 (ja) 2017-03-23
US20180208689A1 (en) 2018-07-26
CN108026197A (zh) 2018-05-11
CN108026197B (zh) 2020-11-17
JP2017057249A (ja) 2017-03-23
JP6686336B2 (ja) 2020-04-22
KR20180053651A (ko) 2018-05-23
US10570227B2 (en) 2020-02-25

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