KR102553751B1 - 인-라인 기판 프로세싱 시스템을 위한 마스크 핸들링 모듈 및 마스크 이송을 위한 방법 - Google Patents

인-라인 기판 프로세싱 시스템을 위한 마스크 핸들링 모듈 및 마스크 이송을 위한 방법 Download PDF

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Publication number
KR102553751B1
KR102553751B1 KR1020217008312A KR20217008312A KR102553751B1 KR 102553751 B1 KR102553751 B1 KR 102553751B1 KR 1020217008312 A KR1020217008312 A KR 1020217008312A KR 20217008312 A KR20217008312 A KR 20217008312A KR 102553751 B1 KR102553751 B1 KR 102553751B1
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KR
South Korea
Prior art keywords
mask
substrate
vacuum
stage
substrate carrier
Prior art date
Application number
KR1020217008312A
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English (en)
Korean (ko)
Other versions
KR20210043684A (ko
Inventor
제바스티안 군터 장
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 어플라이드 머티어리얼스, 인코포레이티드 filed Critical 어플라이드 머티어리얼스, 인코포레이티드
Publication of KR20210043684A publication Critical patent/KR20210043684A/ko
Application granted granted Critical
Publication of KR102553751B1 publication Critical patent/KR102553751B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020217008312A 2018-09-19 2018-09-19 인-라인 기판 프로세싱 시스템을 위한 마스크 핸들링 모듈 및 마스크 이송을 위한 방법 KR102553751B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2018/075374 WO2020057738A1 (en) 2018-09-19 2018-09-19 Mask handling module for an in-line substrate processing system and method for mask transfer

Publications (2)

Publication Number Publication Date
KR20210043684A KR20210043684A (ko) 2021-04-21
KR102553751B1 true KR102553751B1 (ko) 2023-07-07

Family

ID=63667919

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020217008312A KR102553751B1 (ko) 2018-09-19 2018-09-19 인-라인 기판 프로세싱 시스템을 위한 마스크 핸들링 모듈 및 마스크 이송을 위한 방법

Country Status (4)

Country Link
KR (1) KR102553751B1 (zh)
CN (1) CN112740391A (zh)
TW (1) TW202025359A (zh)
WO (1) WO2020057738A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024003604A1 (en) * 2022-07-01 2024-01-04 Applied Materials, Inc. Mask module, substrate carrier, substrate processing system, and method of processing a substrate

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100842020B1 (ko) * 2007-03-16 2008-06-27 세메스 주식회사 유기 박막 증착 장치 및 방법
JP2014056830A (ja) * 2013-10-30 2014-03-27 Hitachi High-Technologies Corp 有機ｅｌデバイス製造装置及びその製造方法
US20170250379A1 (en) * 2016-11-28 2017-08-31 Applied Materials, Inc. Evaporation source having multiple source ejection directions

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1715078A1 (de) * 2005-04-20 2006-10-25 Applied Films GmbH & Co. KG Kontinuierliche OLED-Beschichtungsanlage
EP2098608A1 (en) * 2008-03-05 2009-09-09 Applied Materials, Inc. Coating apparatus with rotation module
WO2018108266A1 (en) * 2016-12-14 2018-06-21 Applied Materials, Inc. Deposition system
KR20180086715A (ko) * 2017-01-23 2018-08-01 어플라이드 머티어리얼스, 인코포레이티드 반송챔버, 이를 포함하는 기판처리시스템 및 이를 이용한 기판처리시스템의 기판처리방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100842020B1 (ko) * 2007-03-16 2008-06-27 세메스 주식회사 유기 박막 증착 장치 및 방법
JP2014056830A (ja) * 2013-10-30 2014-03-27 Hitachi High-Technologies Corp 有機ｅｌデバイス製造装置及びその製造方法
US20170250379A1 (en) * 2016-11-28 2017-08-31 Applied Materials, Inc. Evaporation source having multiple source ejection directions

Also Published As

Publication number Publication date
WO2020057738A1 (en) 2020-03-26
CN112740391A (zh) 2021-04-30
KR20210043684A (ko) 2021-04-21
TW202025359A (zh) 2020-07-01

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