KR102454243B1 - 기판 에지들에서 이면 증착을 감소시키고 두께 변화들을 완화하기 위한 시스템들 및 방법들 - Google Patents

기판 에지들에서 이면 증착을 감소시키고 두께 변화들을 완화하기 위한 시스템들 및 방법들 Download PDF

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KR102454243B1
KR102454243B1 KR1020150126922A KR20150126922A KR102454243B1 KR 102454243 B1 KR102454243 B1 KR 102454243B1 KR 1020150126922 A KR1020150126922 A KR 1020150126922A KR 20150126922 A KR20150126922 A KR 20150126922A KR 102454243 B1 KR102454243 B1 KR 102454243B1
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substrate
film
processing chamber
supplying
reaction volume
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KR20160031419A (ko
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세샤 바라다라잔
샹카 스와미나단
상러트 상플러그
프랭크 파스콸레
테드 민셜
애드리언 라보이
모하메드 사브리
코디 바네트
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램 리써치 코포레이션
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    • C23C16/45597—Reactive back side gas
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US9852901B2 (en) 2017-12-26
CN108642474B (zh) 2020-09-15
KR20220142411A (ko) 2022-10-21
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KR102598660B1 (ko) 2023-11-06
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