KR102446900B1 - 증착 장치 시스템 - Google Patents

증착 장치 시스템 Download PDF

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Publication number
KR102446900B1
KR102446900B1 KR1020170138391A KR20170138391A KR102446900B1 KR 102446900 B1 KR102446900 B1 KR 102446900B1 KR 1020170138391 A KR1020170138391 A KR 1020170138391A KR 20170138391 A KR20170138391 A KR 20170138391A KR 102446900 B1 KR102446900 B1 KR 102446900B1
Authority
KR
South Korea
Prior art keywords
crucible
deposition
plate
deposition apparatus
inner plates
Prior art date
Application number
KR1020170138391A
Other languages
English (en)
Korean (ko)
Other versions
KR20190045606A (ko
Inventor
송기철
이승훈
원종하
Original Assignee
엘지전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 엘지전자 주식회사 filed Critical 엘지전자 주식회사
Priority to KR1020170138391A priority Critical patent/KR102446900B1/ko
Priority to PCT/KR2018/012589 priority patent/WO2019083261A1/fr
Publication of KR20190045606A publication Critical patent/KR20190045606A/ko
Application granted granted Critical
Publication of KR102446900B1 publication Critical patent/KR102446900B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Polarising Elements (AREA)
  • Glass Compositions (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020170138391A 2017-10-24 2017-10-24 증착 장치 시스템 KR102446900B1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020170138391A KR102446900B1 (ko) 2017-10-24 2017-10-24 증착 장치 시스템
PCT/KR2018/012589 WO2019083261A1 (fr) 2017-10-24 2018-10-23 Dispositif de dépôt

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020170138391A KR102446900B1 (ko) 2017-10-24 2017-10-24 증착 장치 시스템

Publications (2)

Publication Number Publication Date
KR20190045606A KR20190045606A (ko) 2019-05-03
KR102446900B1 true KR102446900B1 (ko) 2022-09-26

Family

ID=66247560

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170138391A KR102446900B1 (ko) 2017-10-24 2017-10-24 증착 장치 시스템

Country Status (2)

Country Link
KR (1) KR102446900B1 (fr)
WO (1) WO2019083261A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102265055B1 (ko) * 2019-06-05 2021-06-15 엘지전자 주식회사 증착 장치
KR102229164B1 (ko) * 2019-10-18 2021-03-17 주식회사 에스에프에이 고온 증착 소스
CN114585770A (zh) * 2019-11-29 2022-06-03 Lg电子株式会社 沉积装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007100216A (ja) * 2005-09-30 2007-04-19 Samsung Sdi Co Ltd 蒸発源及びこれを用いた真空蒸着装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101209107B1 (ko) * 2010-06-23 2012-12-06 (주)알파플러스 소스 튐 방지용 구조물을 구비한 증발원 장치
KR20140086334A (ko) * 2012-12-28 2014-07-08 엘아이지에이디피 주식회사 증발원 조립체
KR20150017866A (ko) * 2013-08-08 2015-02-23 주식회사 원익아이피에스 박막증착장치
KR20150068153A (ko) * 2013-12-11 2015-06-19 주식회사 선익시스템 도가니 개별 증발형 선형증발원

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007100216A (ja) * 2005-09-30 2007-04-19 Samsung Sdi Co Ltd 蒸発源及びこれを用いた真空蒸着装置

Also Published As

Publication number Publication date
WO2019083261A1 (fr) 2019-05-02
KR20190045606A (ko) 2019-05-03

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