KR102424799B1 - 초분광 이미징 계측을 위한 시스템 및 방법 - Google Patents

초분광 이미징 계측을 위한 시스템 및 방법 Download PDF

Info

Publication number
KR102424799B1
KR102424799B1 KR1020187024885A KR20187024885A KR102424799B1 KR 102424799 B1 KR102424799 B1 KR 102424799B1 KR 1020187024885 A KR1020187024885 A KR 1020187024885A KR 20187024885 A KR20187024885 A KR 20187024885A KR 102424799 B1 KR102424799 B1 KR 102424799B1
Authority
KR
South Korea
Prior art keywords
illumination
lens array
sample
array
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020187024885A
Other languages
English (en)
Korean (ko)
Other versions
KR20180101604A (ko
Inventor
앤드류 브이. 힐
Original Assignee
케이엘에이 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 케이엘에이 코포레이션 filed Critical 케이엘에이 코포레이션
Publication of KR20180101604A publication Critical patent/KR20180101604A/ko
Application granted granted Critical
Publication of KR102424799B1 publication Critical patent/KR102424799B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus
    • G03F7/706851—Detection branch, e.g. detector arrangements, polarisation control, wavelength control or dark/bright field detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0208—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using focussing or collimating elements, e.g. lenses or mirrors; performing aberration correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0229—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using masks, aperture plates, spatial light modulators or spatial filters, e.g. reflective filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0262—Constructional arrangements for removing stray light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2823—Imaging spectrometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
    • G01J3/4412—Scattering spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4788—Diffraction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4795—Scattering, i.e. diffuse reflection spatially resolved investigating of object in scattering medium
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
    • G02B27/1013—Beam splitting or combining systems for splitting or combining different wavelengths for colour or multispectral image sensors, e.g. splitting an image into monochromatic image components on respective sensors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2823—Imaging spectrometer
    • G01J2003/2826—Multispectral imaging, e.g. filter imaging
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G01N2021/4709—Backscatter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G01N2021/4711—Multiangle measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N2021/8461—Investigating impurities in semiconductor, e.g. Silicon

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
KR1020187024885A 2016-02-02 2017-01-27 초분광 이미징 계측을 위한 시스템 및 방법 Active KR102424799B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201662290157P 2016-02-02 2016-02-02
US62/290,157 2016-02-02
US201662365120P 2016-07-21 2016-07-21
US62/365,120 2016-07-21
US15/233,648 2016-08-10
US15/233,648 US10018560B2 (en) 2016-02-02 2016-08-10 System and method for hyperspectral imaging metrology
PCT/US2017/015248 WO2017136229A1 (en) 2016-02-02 2017-01-27 System and method for hyperspectral imaging metrology

Publications (2)

Publication Number Publication Date
KR20180101604A KR20180101604A (ko) 2018-09-12
KR102424799B1 true KR102424799B1 (ko) 2022-07-22

Family

ID=59386575

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187024885A Active KR102424799B1 (ko) 2016-02-02 2017-01-27 초분광 이미징 계측을 위한 시스템 및 방법

Country Status (8)

Country Link
US (1) US10018560B2 (enExample)
EP (1) EP3411681A4 (enExample)
JP (1) JP6934879B2 (enExample)
KR (1) KR102424799B1 (enExample)
CN (1) CN108603789B (enExample)
IL (1) IL260415B (enExample)
TW (1) TWI714716B (enExample)
WO (1) WO2017136229A1 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102684804B1 (ko) 2024-02-06 2024-07-12 주식회사 스키놀 경사형 프로브를 이용한 라만 초분광 깊이 프로파일 측정 시스템
KR102684802B1 (ko) 2024-02-06 2024-07-12 주식회사 스키놀 라만 초분광의 분광 감도를 개선한 분광부 및 이를 구비한 라만 초분광 시스템
KR20250001170A (ko) 2023-06-28 2025-01-06 주식회사 스키놀 라만 초분광을 위한 산란광 분리부, 및 산란광 분리부를 이용한 피부 성분 측정 시스템 및 그 방법
KR20250001175A (ko) 2023-06-28 2025-01-06 주식회사 스키놀 위치 변위를 이용한 초분광 이미지의 2d 확장이 가능한 피부 성분 측정 시스템 및 그 방법
KR102877820B1 (ko) 2025-04-04 2025-10-31 주식회사 스키놀 라만 초분광 측정 장치에서 라인 스캔 데이터의 추출 방법

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018036828A1 (en) * 2016-08-23 2018-03-01 Asml Netherlands B.V. Metrology apparatus for measuring a structure formed on a substrate by a lithographic process, lithographic system, and method of measuring a structure formed on a substrate by a lithographic process
EP3336495B1 (en) * 2016-12-16 2024-02-14 F. Hoffmann-La Roche AG Characterizing the emission properties of samples
TWI622810B (zh) * 2017-04-26 2018-05-01 和碩聯合科技股份有限公司 成像裝置及成像方法
CN110692003B (zh) * 2017-05-04 2022-02-18 Nkt光子学有限公司 用于提供光的光系统
US10401738B2 (en) * 2017-08-02 2019-09-03 Kla-Tencor Corporation Overlay metrology using multiple parameter configurations
CN107666351B (zh) * 2017-09-30 2019-10-15 长春理工大学 采用超连续谱载波源大气通信系统
NL2020623B1 (en) 2018-01-24 2019-07-30 Illumina Inc Structured illumination microscopy with line scanning
WO2019167129A1 (ja) * 2018-02-27 2019-09-06 株式会社日立ハイテクノロジーズ 欠陥検出装置、欠陥検出方法および欠陥観察装置
US10536686B1 (en) * 2018-08-02 2020-01-14 Synaptive Medical (Barbados) Inc. Exoscope with enhanced depth of field imaging
US11118903B2 (en) * 2018-10-17 2021-09-14 Kla Corporation Efficient illumination shaping for scatterometry overlay
US10942135B2 (en) * 2018-11-14 2021-03-09 Kla Corporation Radial polarizer for particle detection
US10816464B2 (en) * 2019-01-23 2020-10-27 Applied Materials, Inc. Imaging reflectometer
EP3977091A1 (en) 2019-05-31 2022-04-06 Cytognos, S.L. Hyperspectral quantitative imaging cytometry system
EP3783438A1 (en) * 2019-08-21 2021-02-24 ASML Netherlands B.V. Wavelength selection module, illumination system and metrology system
US11933717B2 (en) * 2019-09-27 2024-03-19 Kla Corporation Sensitive optical metrology in scanning and static modes
US11417010B2 (en) * 2020-05-19 2022-08-16 Applied Materials, Inc. Image based metrology of surface deformations
CN112108775A (zh) * 2020-09-09 2020-12-22 湖南鼎一致远科技发展有限公司 一种并行控制激光的装置、方法及激光打标机
US11526086B2 (en) * 2021-03-08 2022-12-13 Kla Corporation Multi-field scanning overlay metrology
CN114112043B (zh) * 2021-11-12 2023-11-07 杭州电子科技大学 一种光谱成像装置
KR102873342B1 (ko) * 2023-05-25 2025-10-22 한양대학교 산학협력단 초분광 이미지를 이용한 입자 분석 장치, 이를 포함하는 입자 분석 시스템 및 입자 분석 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060274308A1 (en) 2005-06-06 2006-12-07 Brady David J Optical Spectroscopy with Overlapping Images
WO2011046875A1 (en) 2009-10-12 2011-04-21 Nadia Pervez Photonic crystal spectrometer

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10122961A (ja) * 1996-10-16 1998-05-15 Yokogawa Electric Corp マイクロ分光分析器
CA2245389A1 (en) * 1998-08-24 2000-02-24 Ilya Golub Multiplexer/demultiplexer for wdm optical signals
US8174694B2 (en) 2001-12-21 2012-05-08 Bodkin Design And Engineering Llc Hyperspectral imaging systems
US7274011B2 (en) * 2004-12-27 2007-09-25 Teledyne Licensing, Llc Spectral imager and fabrication method
US7317179B2 (en) 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
EP1862795A1 (en) * 2006-05-10 2007-12-05 ABB Schweiz AG Bulk Material Analyzer System
CN101512309A (zh) * 2006-08-31 2009-08-19 卡尔蔡司Sms有限责任公司 用于位置分辨地确定在物体成像的图像平面中电磁场的相位和幅度的方法和装置
JP4405525B2 (ja) * 2007-03-29 2010-01-27 株式会社東芝 三次元光線取得装置
NL1036597A1 (nl) 2008-02-29 2009-09-01 Asml Netherlands Bv Metrology method and apparatus, lithographic apparatus, and device manufacturing method.
US8531650B2 (en) * 2008-07-08 2013-09-10 Chiaro Technologies LLC Multiple channel locating
RU2011122642A (ru) * 2008-11-04 2012-12-20 Уилльям Марш Райз Юниверсити Спектрометры с функцией картирования изображений
EP2464952B1 (en) * 2009-08-11 2018-10-10 Koninklijke Philips N.V. Multi-spectral imaging
DE102009043745A1 (de) 2009-09-30 2011-04-07 Carl Zeiss Microlmaging Gmbh Spektraldetektor mit variabler Filterung durch räumliche Farbtrennung und Laser-Scanning- Mikroskop
US9041930B1 (en) 2010-05-20 2015-05-26 Kla-Tencor Corporation Digital pathology system
WO2013038595A1 (ja) * 2011-09-16 2013-03-21 パナソニック株式会社 撮像装置
JP6082401B2 (ja) * 2011-11-04 2017-02-15 アイメックＩｍｅｃ センサアレイ上にインターリーブ配置された画像コピーのオーバーラップしたセグメントを備えたスペクトルカメラ
WO2013064512A1 (en) * 2011-11-04 2013-05-10 Imec Spectral camera with mirrors for projecting multiple adjacent image copies onto sensor array
US20150234102A1 (en) * 2012-08-20 2015-08-20 Drexel University Dynamically focusable multispectral light field imaging
US9219866B2 (en) * 2013-01-07 2015-12-22 Ricoh Co., Ltd. Dynamic adjustment of multimode lightfield imaging system using exposure condition and filter position
JP6225519B2 (ja) * 2013-07-09 2017-11-08 株式会社リコー 測定装置及び測定方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060274308A1 (en) 2005-06-06 2006-12-07 Brady David J Optical Spectroscopy with Overlapping Images
WO2011046875A1 (en) 2009-10-12 2011-04-21 Nadia Pervez Photonic crystal spectrometer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250001170A (ko) 2023-06-28 2025-01-06 주식회사 스키놀 라만 초분광을 위한 산란광 분리부, 및 산란광 분리부를 이용한 피부 성분 측정 시스템 및 그 방법
KR20250001175A (ko) 2023-06-28 2025-01-06 주식회사 스키놀 위치 변위를 이용한 초분광 이미지의 2d 확장이 가능한 피부 성분 측정 시스템 및 그 방법
KR102684804B1 (ko) 2024-02-06 2024-07-12 주식회사 스키놀 경사형 프로브를 이용한 라만 초분광 깊이 프로파일 측정 시스템
KR102684802B1 (ko) 2024-02-06 2024-07-12 주식회사 스키놀 라만 초분광의 분광 감도를 개선한 분광부 및 이를 구비한 라만 초분광 시스템
KR102877820B1 (ko) 2025-04-04 2025-10-31 주식회사 스키놀 라만 초분광 측정 장치에서 라인 스캔 데이터의 추출 방법

Also Published As

Publication number Publication date
CN108603789B (zh) 2021-10-08
US20170219487A1 (en) 2017-08-03
TW201732271A (zh) 2017-09-16
KR20180101604A (ko) 2018-09-12
IL260415B (en) 2021-05-31
JP6934879B2 (ja) 2021-09-15
US10018560B2 (en) 2018-07-10
EP3411681A1 (en) 2018-12-12
EP3411681A4 (en) 2019-09-25
WO2017136229A1 (en) 2017-08-10
JP2019504325A (ja) 2019-02-14
CN108603789A (zh) 2018-09-28
TWI714716B (zh) 2021-01-01

Similar Documents

Publication Publication Date Title
KR102424799B1 (ko) 초분광 이미징 계측을 위한 시스템 및 방법
KR102347059B1 (ko) 다수의 파라미터 구성들을 사용한 오버레이 계측
CN112840202B (zh) 多极照明系统以及叠对度量系统
CN110494966B (zh) 用于以层特定照明光谱的计量的系统及方法
US11841621B2 (en) Moiré scatterometry overlay
JP7411683B2 (ja) 光学計測のための高輝度の照明源
US20150015891A1 (en) Systems and methods for supressing coherent structured illumination artifacts
KR20170094288A (ko) 분광 빔 프로파일 계측학
JP2019504325A5 (enExample)
KR20180004239A (ko) 2d 어레이의 스폿을 이용한 경사 입사 스캐닝 시스템 및 방법
RU2608012C2 (ru) Двухканальный дифракционный фазовый микроскоп
JP7318868B2 (ja) 試料の測定装置、測定方法およびプログラム
RU199542U1 (ru) Гиперспектральная насадка для оптического микроскопа
CN119301827A (zh) 用于基于交错、非相干重叠光斑产生平顶照明光束的系统及方法
JP2024057657A (ja) 波面計測装置、波面計測方法、及び光学系の製造方法

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20180829

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20220105

Comment text: Request for Examination of Application

PA0302 Request for accelerated examination

Patent event date: 20220105

Patent event code: PA03022R01D

Comment text: Request for Accelerated Examination

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20220222

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20220520

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20220720

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20220720

End annual number: 3

Start annual number: 1

PG1601 Publication of registration