JP2019504325A5 - - Google Patents
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- JP2019504325A5 JP2019504325A5 JP2018540384A JP2018540384A JP2019504325A5 JP 2019504325 A5 JP2019504325 A5 JP 2019504325A5 JP 2018540384 A JP2018540384 A JP 2018540384A JP 2018540384 A JP2018540384 A JP 2018540384A JP 2019504325 A5 JP2019504325 A5 JP 2019504325A5
- Authority
- JP
- Japan
- Prior art keywords
- illumination
- array
- weighing system
- hyperspectral imaging
- lens array
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005286 illumination Methods 0.000 claims description 51
- 210000001747 pupil Anatomy 0.000 claims description 19
- 230000003595 spectral effect Effects 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 6
- 238000000701 chemical imaging Methods 0.000 claims 24
- 238000005303 weighing Methods 0.000 claims 23
- 230000003287 optical effect Effects 0.000 claims 6
- 238000003384 imaging method Methods 0.000 claims 3
- 230000008878 coupling Effects 0.000 claims 1
- 238000010168 coupling process Methods 0.000 claims 1
- 238000005859 coupling reaction Methods 0.000 claims 1
- 239000006185 dispersion Substances 0.000 claims 1
- 238000001914 filtration Methods 0.000 claims 1
- 238000001228 spectrum Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 description 10
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662290157P | 2016-02-02 | 2016-02-02 | |
| US62/290,157 | 2016-02-02 | ||
| US201662365120P | 2016-07-21 | 2016-07-21 | |
| US62/365,120 | 2016-07-21 | ||
| US15/233,648 US10018560B2 (en) | 2016-02-02 | 2016-08-10 | System and method for hyperspectral imaging metrology |
| US15/233,648 | 2016-08-10 | ||
| PCT/US2017/015248 WO2017136229A1 (en) | 2016-02-02 | 2017-01-27 | System and method for hyperspectral imaging metrology |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019504325A JP2019504325A (ja) | 2019-02-14 |
| JP2019504325A5 true JP2019504325A5 (enExample) | 2020-03-05 |
| JP6934879B2 JP6934879B2 (ja) | 2021-09-15 |
Family
ID=59386575
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018540384A Active JP6934879B2 (ja) | 2016-02-02 | 2017-01-27 | ハイパースペクトルイメージング計量システム及び方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10018560B2 (enExample) |
| EP (1) | EP3411681A4 (enExample) |
| JP (1) | JP6934879B2 (enExample) |
| KR (1) | KR102424799B1 (enExample) |
| CN (1) | CN108603789B (enExample) |
| IL (1) | IL260415B (enExample) |
| TW (1) | TWI714716B (enExample) |
| WO (1) | WO2017136229A1 (enExample) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018036828A1 (en) * | 2016-08-23 | 2018-03-01 | Asml Netherlands B.V. | Metrology apparatus for measuring a structure formed on a substrate by a lithographic process, lithographic system, and method of measuring a structure formed on a substrate by a lithographic process |
| EP3336495B1 (en) * | 2016-12-16 | 2024-02-14 | F. Hoffmann-La Roche AG | Characterizing the emission properties of samples |
| TWI622810B (zh) * | 2017-04-26 | 2018-05-01 | 和碩聯合科技股份有限公司 | 成像裝置及成像方法 |
| WO2018202270A1 (en) * | 2017-05-04 | 2018-11-08 | Nkt Photonics A/S | Light system for supplying light |
| US10401738B2 (en) | 2017-08-02 | 2019-09-03 | Kla-Tencor Corporation | Overlay metrology using multiple parameter configurations |
| CN107666351B (zh) * | 2017-09-30 | 2019-10-15 | 长春理工大学 | 采用超连续谱载波源大气通信系统 |
| NL2020623B1 (en) | 2018-01-24 | 2019-07-30 | Illumina Inc | Structured illumination microscopy with line scanning |
| US11802841B2 (en) | 2018-02-27 | 2023-10-31 | Hitachi High-Tech Corporation | Defect detection device, defect detection method, and defect observation device |
| US10536686B1 (en) * | 2018-08-02 | 2020-01-14 | Synaptive Medical (Barbados) Inc. | Exoscope with enhanced depth of field imaging |
| US11118903B2 (en) * | 2018-10-17 | 2021-09-14 | Kla Corporation | Efficient illumination shaping for scatterometry overlay |
| US10942135B2 (en) * | 2018-11-14 | 2021-03-09 | Kla Corporation | Radial polarizer for particle detection |
| US10816464B2 (en) * | 2019-01-23 | 2020-10-27 | Applied Materials, Inc. | Imaging reflectometer |
| US12078585B2 (en) | 2019-05-31 | 2024-09-03 | Cytognos, S.L. | Hyperspectral quantitative imaging cytometry system |
| EP3783438A1 (en) * | 2019-08-21 | 2021-02-24 | ASML Netherlands B.V. | Wavelength selection module, illumination system and metrology system |
| US11933717B2 (en) * | 2019-09-27 | 2024-03-19 | Kla Corporation | Sensitive optical metrology in scanning and static modes |
| US11417010B2 (en) * | 2020-05-19 | 2022-08-16 | Applied Materials, Inc. | Image based metrology of surface deformations |
| CN112108775A (zh) * | 2020-09-09 | 2020-12-22 | 湖南鼎一致远科技发展有限公司 | 一种并行控制激光的装置、方法及激光打标机 |
| US11526086B2 (en) * | 2021-03-08 | 2022-12-13 | Kla Corporation | Multi-field scanning overlay metrology |
| CN114112043B (zh) * | 2021-11-12 | 2023-11-07 | 杭州电子科技大学 | 一种光谱成像装置 |
| JP2024098435A (ja) * | 2023-01-10 | 2024-07-23 | キオクシア株式会社 | 計測装置、及び、計測方法 |
| KR102873342B1 (ko) * | 2023-05-25 | 2025-10-22 | 한양대학교 산학협력단 | 초분광 이미지를 이용한 입자 분석 장치, 이를 포함하는 입자 분석 시스템 및 입자 분석 방법 |
| KR20250001175A (ko) | 2023-06-28 | 2025-01-06 | 주식회사 스키놀 | 위치 변위를 이용한 초분광 이미지의 2d 확장이 가능한 피부 성분 측정 시스템 및 그 방법 |
| KR20250001170A (ko) | 2023-06-28 | 2025-01-06 | 주식회사 스키놀 | 라만 초분광을 위한 산란광 분리부, 및 산란광 분리부를 이용한 피부 성분 측정 시스템 및 그 방법 |
| KR102684804B1 (ko) | 2024-02-06 | 2024-07-12 | 주식회사 스키놀 | 경사형 프로브를 이용한 라만 초분광 깊이 프로파일 측정 시스템 |
| KR102684802B1 (ko) | 2024-02-06 | 2024-07-12 | 주식회사 스키놀 | 라만 초분광의 분광 감도를 개선한 분광부 및 이를 구비한 라만 초분광 시스템 |
| KR102877820B1 (ko) | 2025-04-04 | 2025-10-31 | 주식회사 스키놀 | 라만 초분광 측정 장치에서 라인 스캔 데이터의 추출 방법 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10122961A (ja) * | 1996-10-16 | 1998-05-15 | Yokogawa Electric Corp | マイクロ分光分析器 |
| CA2245389A1 (en) * | 1998-08-24 | 2000-02-24 | Ilya Golub | Multiplexer/demultiplexer for wdm optical signals |
| US8174694B2 (en) | 2001-12-21 | 2012-05-08 | Bodkin Design And Engineering Llc | Hyperspectral imaging systems |
| US7274011B2 (en) * | 2004-12-27 | 2007-09-25 | Teledyne Licensing, Llc | Spectral imager and fabrication method |
| US7283232B2 (en) * | 2005-06-06 | 2007-10-16 | Duke University | Optical spectroscopy with overlapping images |
| US7317179B2 (en) | 2005-10-28 | 2008-01-08 | Cymer, Inc. | Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate |
| EP1862795A1 (en) * | 2006-05-10 | 2007-12-05 | ABB Schweiz AG | Bulk Material Analyzer System |
| CN101512309A (zh) * | 2006-08-31 | 2009-08-19 | 卡尔蔡司Sms有限责任公司 | 用于位置分辨地确定在物体成像的图像平面中电磁场的相位和幅度的方法和装置 |
| JP4405525B2 (ja) * | 2007-03-29 | 2010-01-27 | 株式会社東芝 | 三次元光線取得装置 |
| NL1036597A1 (nl) | 2008-02-29 | 2009-09-01 | Asml Netherlands Bv | Metrology method and apparatus, lithographic apparatus, and device manufacturing method. |
| US8531650B2 (en) * | 2008-07-08 | 2013-09-10 | Chiaro Technologies LLC | Multiple channel locating |
| RU2011122642A (ru) * | 2008-11-04 | 2012-12-20 | Уилльям Марш Райз Юниверсити | Спектрометры с функцией картирования изображений |
| US9420241B2 (en) * | 2009-08-11 | 2016-08-16 | Koninklijke Philips N.V. | Multi-spectral imaging |
| DE102009043745A1 (de) | 2009-09-30 | 2011-04-07 | Carl Zeiss Microlmaging Gmbh | Spektraldetektor mit variabler Filterung durch räumliche Farbtrennung und Laser-Scanning- Mikroskop |
| EP3567416A1 (en) * | 2009-10-12 | 2019-11-13 | The Trustees of Columbia University in the City of New York | Photonic crystal spectrometer |
| US9041930B1 (en) | 2010-05-20 | 2015-05-26 | Kla-Tencor Corporation | Digital pathology system |
| WO2013038595A1 (ja) * | 2011-09-16 | 2013-03-21 | パナソニック株式会社 | 撮像装置 |
| WO2013064507A1 (en) * | 2011-11-04 | 2013-05-10 | Imec | Spectral camera with overlapping segments of image copies interleaved onto sensor array |
| IN2014CN02916A (enExample) * | 2011-11-04 | 2015-07-03 | Imec | |
| US20150234102A1 (en) * | 2012-08-20 | 2015-08-20 | Drexel University | Dynamically focusable multispectral light field imaging |
| US9219866B2 (en) * | 2013-01-07 | 2015-12-22 | Ricoh Co., Ltd. | Dynamic adjustment of multimode lightfield imaging system using exposure condition and filter position |
| JP6225519B2 (ja) * | 2013-07-09 | 2017-11-08 | 株式会社リコー | 測定装置及び測定方法 |
-
2016
- 2016-08-10 US US15/233,648 patent/US10018560B2/en active Active
-
2017
- 2017-01-27 WO PCT/US2017/015248 patent/WO2017136229A1/en not_active Ceased
- 2017-01-27 JP JP2018540384A patent/JP6934879B2/ja active Active
- 2017-01-27 EP EP17747951.6A patent/EP3411681A4/en active Pending
- 2017-01-27 KR KR1020187024885A patent/KR102424799B1/ko active Active
- 2017-01-27 CN CN201780009256.0A patent/CN108603789B/zh active Active
- 2017-02-02 TW TW106103549A patent/TWI714716B/zh active
-
2018
- 2018-07-04 IL IL260415A patent/IL260415B/en active IP Right Grant
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