KR102423263B1 - 센서 유입 가스 흐름 안정화 시스템 - Google Patents
센서 유입 가스 흐름 안정화 시스템 Download PDFInfo
- Publication number
- KR102423263B1 KR102423263B1 KR1020200137988A KR20200137988A KR102423263B1 KR 102423263 B1 KR102423263 B1 KR 102423263B1 KR 1020200137988 A KR1020200137988 A KR 1020200137988A KR 20200137988 A KR20200137988 A KR 20200137988A KR 102423263 B1 KR102423263 B1 KR 102423263B1
- Authority
- KR
- South Korea
- Prior art keywords
- sensor
- process chamber
- connection pipe
- stabilization system
- sensor device
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Control Of Fluid Pressure (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW110101749A TWI829991B (zh) | 2020-01-17 | 2021-01-15 | 感測器流入氣流的穩定化系統 |
PCT/KR2021/000582 WO2021145716A1 (ko) | 2020-01-17 | 2021-01-15 | 센서 유입 가스 흐름 안정화 시스템 |
JP2022543504A JP2023510419A (ja) | 2020-01-17 | 2021-01-15 | センサーに導入されるガスの流れを安定させるためのシステム |
US17/792,947 US20230045932A1 (en) | 2020-01-17 | 2021-01-15 | System for stabilizing flow of gas introduced into sensor |
CN202180009531.5A CN114981943A (zh) | 2020-01-17 | 2021-01-15 | 传感器进气流稳定系统 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20200006792 | 2020-01-17 | ||
KR1020200006792 | 2020-01-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20210093148A KR20210093148A (ko) | 2021-07-27 |
KR102423263B1 true KR102423263B1 (ko) | 2022-07-21 |
Family
ID=77125521
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020200137988A KR102423263B1 (ko) | 2020-01-17 | 2020-10-23 | 센서 유입 가스 흐름 안정화 시스템 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR102423263B1 (zh) |
TW (1) | TWI829991B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117026220B (zh) * | 2023-10-09 | 2023-12-15 | 上海陛通半导体能源科技股份有限公司 | 压力调节装置及包含其的沉积设备、系统及压力控制方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004069436A (ja) * | 2002-08-05 | 2004-03-04 | Honda Motor Co Ltd | ガスセンサの結露防止構造 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2390935A (en) | 2002-07-16 | 2004-01-21 | Anatoli Nicolai Verentchikov | Time-nested mass analysis using a TOF-TOF tandem mass spectrometer |
CN1200262C (zh) * | 2003-01-10 | 2005-05-04 | 清华大学 | 测量粉末吸附气体量的方法和设备 |
KR100934794B1 (ko) * | 2007-12-22 | 2009-12-31 | 주식회사 동부하이텍 | 반도체 제조설비의 배기압력조절장치 |
KR102090057B1 (ko) | 2017-12-11 | 2020-03-17 | 주식회사 이엘 | 반도체 공정 챔버 및 가스라인의 가스분석을 위한 tof ms 가스질량분석 모니터링 시스템 |
KR102096162B1 (ko) * | 2018-04-26 | 2020-04-01 | 이무남 | 대기압 전용 잔류가스 분석장치에 연결되는 잔류가스 공급장치 |
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2020
- 2020-10-23 KR KR1020200137988A patent/KR102423263B1/ko active IP Right Grant
-
2021
- 2021-01-15 TW TW110101749A patent/TWI829991B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004069436A (ja) * | 2002-08-05 | 2004-03-04 | Honda Motor Co Ltd | ガスセンサの結露防止構造 |
Also Published As
Publication number | Publication date |
---|---|
TWI829991B (zh) | 2024-01-21 |
TW202129807A (zh) | 2021-08-01 |
KR20210093148A (ko) | 2021-07-27 |
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