KR102423263B1 - 센서 유입 가스 흐름 안정화 시스템 - Google Patents

센서 유입 가스 흐름 안정화 시스템 Download PDF

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Publication number
KR102423263B1
KR102423263B1 KR1020200137988A KR20200137988A KR102423263B1 KR 102423263 B1 KR102423263 B1 KR 102423263B1 KR 1020200137988 A KR1020200137988 A KR 1020200137988A KR 20200137988 A KR20200137988 A KR 20200137988A KR 102423263 B1 KR102423263 B1 KR 102423263B1
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KR
South Korea
Prior art keywords
sensor
process chamber
connection pipe
stabilization system
sensor device
Prior art date
Application number
KR1020200137988A
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English (en)
Korean (ko)
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KR20210093148A (ko
Inventor
홍영호
최현식
홍기우
나가오 히로후미
미키 신이치
Original Assignee
주식회사 에이티아이케이
아토나프 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 주식회사 에이티아이케이, 아토나프 가부시키가이샤 filed Critical 주식회사 에이티아이케이
Priority to PCT/KR2021/000582 priority Critical patent/WO2021145716A1/ko
Priority to TW110101749A priority patent/TWI829991B/zh
Priority to CN202180009531.5A priority patent/CN114981943A/zh
Priority to JP2022543504A priority patent/JP2023510419A/ja
Priority to US17/792,947 priority patent/US20230045932A1/en
Publication of KR20210093148A publication Critical patent/KR20210093148A/ko
Application granted granted Critical
Publication of KR102423263B1 publication Critical patent/KR102423263B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Control Of Fluid Pressure (AREA)
  • Drying Of Semiconductors (AREA)
KR1020200137988A 2020-01-17 2020-10-23 센서 유입 가스 흐름 안정화 시스템 KR102423263B1 (ko)

Priority Applications (5)

Application Number Priority Date Filing Date Title
PCT/KR2021/000582 WO2021145716A1 (ko) 2020-01-17 2021-01-15 센서 유입 가스 흐름 안정화 시스템
TW110101749A TWI829991B (zh) 2020-01-17 2021-01-15 感測器流入氣流的穩定化系統
CN202180009531.5A CN114981943A (zh) 2020-01-17 2021-01-15 传感器进气流稳定系统
JP2022543504A JP2023510419A (ja) 2020-01-17 2021-01-15 センサーに導入されるガスの流れを安定させるためのシステム
US17/792,947 US20230045932A1 (en) 2020-01-17 2021-01-15 System for stabilizing flow of gas introduced into sensor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020200006792 2020-01-17
KR20200006792 2020-01-17

Publications (2)

Publication Number Publication Date
KR20210093148A KR20210093148A (ko) 2021-07-27
KR102423263B1 true KR102423263B1 (ko) 2022-07-21

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200137988A KR102423263B1 (ko) 2020-01-17 2020-10-23 센서 유입 가스 흐름 안정화 시스템

Country Status (2)

Country Link
KR (1) KR102423263B1 (zh)
TW (1) TWI829991B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117026220B (zh) * 2023-10-09 2023-12-15 上海陛通半导体能源科技股份有限公司 压力调节装置及包含其的沉积设备、系统及压力控制方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004069436A (ja) * 2002-08-05 2004-03-04 Honda Motor Co Ltd ガスセンサの結露防止構造

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2390935A (en) 2002-07-16 2004-01-21 Anatoli Nicolai Verentchikov Time-nested mass analysis using a TOF-TOF tandem mass spectrometer
CN1200262C (zh) * 2003-01-10 2005-05-04 清华大学 测量粉末吸附气体量的方法和设备
KR100934794B1 (ko) * 2007-12-22 2009-12-31 주식회사 동부하이텍 반도체 제조설비의 배기압력조절장치
KR102090057B1 (ko) 2017-12-11 2020-03-17 주식회사 이엘 반도체 공정 챔버 및 가스라인의 가스분석을 위한 tof ms 가스질량분석 모니터링 시스템
KR102096162B1 (ko) * 2018-04-26 2020-04-01 이무남 대기압 전용 잔류가스 분석장치에 연결되는 잔류가스 공급장치

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004069436A (ja) * 2002-08-05 2004-03-04 Honda Motor Co Ltd ガスセンサの結露防止構造

Also Published As

Publication number Publication date
TW202129807A (zh) 2021-08-01
KR20210093148A (ko) 2021-07-27
TWI829991B (zh) 2024-01-21

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