KR102418637B9 - 다중반사 액침 실리콘 기반 미세유로 측정장치 및 측정방법 - Google Patents

다중반사 액침 실리콘 기반 미세유로 측정장치 및 측정방법

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Publication number
KR102418637B9
KR102418637B9 KR1020200121427A KR20200121427A KR102418637B9 KR 102418637 B9 KR102418637 B9 KR 102418637B9 KR 1020200121427 A KR1020200121427 A KR 1020200121427A KR 20200121427 A KR20200121427 A KR 20200121427A KR 102418637 B9 KR102418637 B9 KR 102418637B9
Authority
KR
South Korea
Prior art keywords
multiple reflection
solution immersed
silicon biosensor
reflection solution
immersed silicon
Prior art date
Application number
KR1020200121427A
Other languages
English (en)
Other versions
KR20220038962A (ko
KR102418637B1 (ko
Inventor
조현모
김동형
제갈원
조용재
Original Assignee
한국표준과학연구원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 한국표준과학연구원 filed Critical 한국표준과학연구원
Priority to JP2022565873A priority Critical patent/JP7403003B2/ja
Priority to KR1020200121427A priority patent/KR102418637B1/ko
Priority to PCT/KR2020/012705 priority patent/WO2022059824A1/ko
Priority to US17/921,706 priority patent/US20230168185A1/en
Priority to CN202080100193.1A priority patent/CN115461608A/zh
Publication of KR20220038962A publication Critical patent/KR20220038962A/ko
Application granted granted Critical
Publication of KR102418637B1 publication Critical patent/KR102418637B1/ko
Publication of KR102418637B9 publication Critical patent/KR102418637B9/ko

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0477—Prisms, wedges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/03—Cuvette constructions
    • G01N21/05—Flow-through cuvettes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/11—Filling or emptying of cuvettes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G01N21/552—Attenuated total reflection
    • G01N21/553—Attenuated total reflection and using surface plasmons
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/03—Cuvette constructions
    • G01N21/05—Flow-through cuvettes
    • G01N2021/052—Tubular type; cavity type; multireflective
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/212—Arrangement with total internal reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G01N2021/558—Measuring reflectivity and transmission
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N2021/752—Devices comprising reaction zones
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N2021/757—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated using immobilised reagents
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G01N2021/7756—Sensor type
    • G01N2021/7763—Sample through flow
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/03—Cuvette constructions
    • G01N21/031—Multipass arrangements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts
    • G01N2201/0638—Refractive parts

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
KR1020200121427A 2020-09-21 2020-09-21 다중반사 액침 실리콘 기반 미세유로 측정장치 및 측정방법 KR102418637B1 (ko)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2022565873A JP7403003B2 (ja) 2020-09-21 2020-09-21 多重反射液浸シリコン基盤の微細流路測定装置及び測定方法
KR1020200121427A KR102418637B1 (ko) 2020-09-21 2020-09-21 다중반사 액침 실리콘 기반 미세유로 측정장치 및 측정방법
PCT/KR2020/012705 WO2022059824A1 (ko) 2020-09-21 2020-09-21 다중반사 액침 실리콘 기반 미세유로 측정장치 및 측정방법
US17/921,706 US20230168185A1 (en) 2020-09-21 2020-09-21 Device and method for multi-reflection solution immersed silicon-based microchannel measurement
CN202080100193.1A CN115461608A (zh) 2020-09-21 2020-09-21 多重反射液浸硅基微流路测定装置及测定方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020200121427A KR102418637B1 (ko) 2020-09-21 2020-09-21 다중반사 액침 실리콘 기반 미세유로 측정장치 및 측정방법

Publications (3)

Publication Number Publication Date
KR20220038962A KR20220038962A (ko) 2022-03-29
KR102418637B1 KR102418637B1 (ko) 2022-07-08
KR102418637B9 true KR102418637B9 (ko) 2022-12-05

Family

ID=80776853

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200121427A KR102418637B1 (ko) 2020-09-21 2020-09-21 다중반사 액침 실리콘 기반 미세유로 측정장치 및 측정방법

Country Status (5)

Country Link
US (1) US20230168185A1 (ko)
JP (1) JP7403003B2 (ko)
KR (1) KR102418637B1 (ko)
CN (1) CN115461608A (ko)
WO (1) WO2022059824A1 (ko)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3380744B2 (ja) * 1998-05-19 2003-02-24 株式会社日立製作所 センサおよびこれを利用した測定装置
FR2809491B1 (fr) * 2000-05-26 2008-07-04 Production Rech S Appliquees Procede et appareil de metrologie ellipsometrique pour echantillon contenu dans une chambre ou analogue
US7564612B2 (en) * 2004-09-27 2009-07-21 Idc, Llc Photonic MEMS and structures
US7271914B2 (en) * 2005-02-02 2007-09-18 National Taiwan University Biomolecular sensor system utilizing a transverse propagation wave of surface plasmon resonance (SPR)
KR101105328B1 (ko) 2009-11-23 2012-01-16 한국표준과학연구원 분자 흡착 및 해리 동특성 측정장치 및 측정방법
KR101383652B1 (ko) 2012-10-15 2014-04-09 한국표준과학연구원 분자접합특성 및 완충용액 굴절률 동시 측정장치 및 측정방법
KR101684138B1 (ko) 2015-06-30 2016-12-21 한국표준과학연구원 경사 입사구조 프리즘 입사형 실리콘 기반 액침 미세유로 측정장치 및 측정방법
JP6775195B2 (ja) * 2016-04-06 2020-10-28 パナソニックＩｐマネジメント株式会社 検知装置、検知方法及び検知プログラム
KR101884091B1 (ko) 2016-11-30 2018-08-02 한국표준과학연구원 사다리꼴 입사구조 프리즘 입사형 실리콘 기반 액침 미세유로 측정장치 및 측정방법
KR102056971B1 (ko) * 2017-12-28 2019-12-19 한국표준과학연구원 이중 프리즘 실리콘 기반 액침 미세유로 측정장치 및 측정방법
CN112119294B (zh) * 2018-04-12 2024-05-24 雷迪奥米特医学公司 多孔膜传感器元件

Also Published As

Publication number Publication date
US20230168185A1 (en) 2023-06-01
WO2022059824A1 (ko) 2022-03-24
KR20220038962A (ko) 2022-03-29
KR102418637B1 (ko) 2022-07-08
JP2023523990A (ja) 2023-06-08
JP7403003B2 (ja) 2023-12-21
CN115461608A (zh) 2022-12-09

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