KR102266120B1 - 광학 장치, 노광 장치 및 물품의 제조 방법 - Google Patents

광학 장치, 노광 장치 및 물품의 제조 방법 Download PDF

Info

Publication number
KR102266120B1
KR102266120B1 KR1020170169969A KR20170169969A KR102266120B1 KR 102266120 B1 KR102266120 B1 KR 102266120B1 KR 1020170169969 A KR1020170169969 A KR 1020170169969A KR 20170169969 A KR20170169969 A KR 20170169969A KR 102266120 B1 KR102266120 B1 KR 102266120B1
Authority
KR
South Korea
Prior art keywords
mirror
magnet
actuator
area
bonding surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020170169969A
Other languages
English (en)
Korean (ko)
Other versions
KR20180072550A (ko
Inventor
가즈유키 가스미
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20180072550A publication Critical patent/KR20180072550A/ko
Application granted granted Critical
Publication of KR102266120B1 publication Critical patent/KR102266120B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
KR1020170169969A 2016-12-21 2017-12-12 광학 장치, 노광 장치 및 물품의 제조 방법 Active KR102266120B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2016-248395 2016-12-21
JP2016248395A JP6854638B2 (ja) 2016-12-21 2016-12-21 光学装置、露光装置、および物品の製造方法

Publications (2)

Publication Number Publication Date
KR20180072550A KR20180072550A (ko) 2018-06-29
KR102266120B1 true KR102266120B1 (ko) 2021-06-17

Family

ID=62652413

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170169969A Active KR102266120B1 (ko) 2016-12-21 2017-12-12 광학 장치, 노광 장치 및 물품의 제조 방법

Country Status (3)

Country Link
JP (1) JP6854638B2 (cg-RX-API-DMAC7.html)
KR (1) KR102266120B1 (cg-RX-API-DMAC7.html)
CN (1) CN108227401B (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7406338B2 (ja) * 2019-10-16 2023-12-27 キヤノン株式会社 ステージ装置、ステージ装置の調整方法、および物品製造方法
DE102020211691A1 (de) 2020-09-17 2022-03-17 Carl Zeiss Smt Gmbh Optisches system und lithographieanlage
KR20260056155A (ko) * 2023-08-21 2026-04-24 에이에스엠엘 네델란즈 비.브이. 광학 시스템 및 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014507786A (ja) * 2010-12-20 2014-03-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子を取り付ける配置構成
JP2015050353A (ja) * 2013-09-02 2015-03-16 キヤノン株式会社 光学装置、投影光学系、露光装置、並びに物品の製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10253872A (ja) * 1997-03-13 1998-09-25 Nikon Corp 反射光学部材の保持装置及び露光装置
FR2935054B1 (fr) * 2008-08-14 2011-01-28 Alpao Miroir deformable a actionneurs de force et raideur repartie
JP4994341B2 (ja) * 2008-10-29 2012-08-08 三菱電機株式会社 可変形ミラー装置
FR2985320B1 (fr) * 2011-12-29 2014-02-14 Alpao Systeme a etalonnage commun et procede correspondant
DE102012221831A1 (de) * 2012-11-29 2014-06-05 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung wenigstens eines optischen Elementes in einem optischen System
DE102013211310A1 (de) * 2013-06-17 2014-12-18 Carl Zeiss Smt Gmbh EUV-Abbildungsvorrichtung
JP2015065246A (ja) * 2013-09-24 2015-04-09 キヤノン株式会社 光学装置、光学系、露光装置及び物品の製造方法
JP6336274B2 (ja) * 2013-12-25 2018-06-06 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014507786A (ja) * 2010-12-20 2014-03-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子を取り付ける配置構成
JP2015050353A (ja) * 2013-09-02 2015-03-16 キヤノン株式会社 光学装置、投影光学系、露光装置、並びに物品の製造方法

Also Published As

Publication number Publication date
CN108227401B (zh) 2021-03-09
KR20180072550A (ko) 2018-06-29
CN108227401A (zh) 2018-06-29
JP2018101112A (ja) 2018-06-28
JP6854638B2 (ja) 2021-04-07

Similar Documents

Publication Publication Date Title
JP6053081B2 (ja) 光学系の少なくとも１つの光学素子を作動させる機構
JP6336274B2 (ja) 光学装置、投影光学系、露光装置、および物品の製造方法
JP6168957B2 (ja) 光学装置、投影光学系、露光装置および物品の製造方法
JP4820842B2 (ja) ステージシステムおよびそのようなステージシステムを備えるリソグラフィ装置
JP2015050353A (ja) 光学装置、投影光学系、露光装置、並びに物品の製造方法
CN108227401B (zh) 光学装置、曝光装置以及物品的制造方法
TWI631430B (zh) Optical device, projection optical system, exposure device, and article manufacturing method
JP2011119551A (ja) 光学部材変形装置、光学系、露光装置、デバイスの製造方法
CN106873148B (zh) 光学设备、具有光学设备的曝光装置及物品制造方法
CN109416457B (zh) 光学装置、曝光装置及物品的制造方法
JP6866131B2 (ja) 光学装置、それを備えた露光装置、および物品の製造方法
JP2012253144A (ja) 位置決め装置、露光装置およびデバイス製造方法
KR102319819B1 (ko) 광학장치, 투영 광학계, 노광장치, 및 물품 제조방법
JP2018066958A (ja) 光学装置、投影光学系、露光装置及び物品の製造方法
JP2018066959A (ja) 光学装置、投影光学系、露光装置及び物品の製造方法
JP2018072662A (ja) 光学装置、それを備えた露光装置、および物品の製造方法
KR20170142886A (ko) 위치 조정 기구, 노광 장치 및 물품의 제조 방법
CN107015341B (zh) 光学设备、投影光学系统、曝光装置及物品制造方法
JP2011171386A (ja) 変位センサ、駆動装置、露光装置、及びデバイスの製造方法
WO2018043314A1 (ja) 光学装置、投影光学系、露光装置、および物品の製造方法

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

U11 Full renewal or maintenance fee paid

Free format text: ST27 STATUS EVENT CODE: A-4-4-U10-U11-OTH-PR1001 (AS PROVIDED BY THE NATIONAL OFFICE)

Year of fee payment: 5