KR102262115B1 - 임프린트 장치 및 물품 제조 방법 - Google Patents

임프린트 장치 및 물품 제조 방법 Download PDF

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Publication number
KR102262115B1
KR102262115B1 KR1020180027233A KR20180027233A KR102262115B1 KR 102262115 B1 KR102262115 B1 KR 102262115B1 KR 1020180027233 A KR1020180027233 A KR 1020180027233A KR 20180027233 A KR20180027233 A KR 20180027233A KR 102262115 B1 KR102262115 B1 KR 102262115B1
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South Korea
Prior art keywords
substrate
mold
unit
mark
relative position
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Korean (ko)
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KR20180103730A (ko
Inventor
겐지 야에가시
다카미츠 고마키
도시키 이와이
고헤이 스즈키
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • H01L21/027—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020180027233A 2017-03-09 2018-03-08 임프린트 장치 및 물품 제조 방법 Active KR102262115B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2017-045251 2017-03-09
JP2017045251A JP6993782B2 (ja) 2017-03-09 2017-03-09 インプリント装置および物品製造方法

Publications (2)

Publication Number Publication Date
KR20180103730A KR20180103730A (ko) 2018-09-19
KR102262115B1 true KR102262115B1 (ko) 2021-06-09

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JP (1) JP6993782B2 (cg-RX-API-DMAC10.html)
KR (1) KR102262115B1 (cg-RX-API-DMAC10.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6982316B2 (ja) * 2018-09-26 2021-12-17 株式会社ソフイア 遊技機
JP2020154063A (ja) 2019-03-19 2020-09-24 キオクシア株式会社 アライメントマーク、インプリント方法、半導体装置の製造方法、及び位置合わせ装置
JP7236325B2 (ja) * 2019-05-28 2023-03-09 キヤノン株式会社 インプリント装置および物品製造方法
JP7395307B2 (ja) * 2019-10-01 2023-12-11 キヤノン株式会社 インプリント方法、インプリント装置および物品の製造方法
KR102804042B1 (ko) * 2021-08-12 2025-05-12 (주) 오로스테크놀로지 모아레 위상 변위 오버레이 타겟 및 그 타겟의 오버레이 오차 측정 방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007073939A (ja) 2005-08-12 2007-03-22 Canon Inc インプリント装置およびインプリント方法
JP2014241398A (ja) 2013-05-16 2014-12-25 キヤノン株式会社 インプリント装置、デバイス製造方法およびインプリント方法
JP2016096269A (ja) * 2014-11-14 2016-05-26 キヤノン株式会社 インプリント装置及び物品の製造方法
WO2016092697A1 (ja) * 2014-12-12 2016-06-16 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP2016162516A (ja) * 2015-02-27 2016-09-05 東芝ライテック株式会社 電源装置および照明システム

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63119232A (ja) * 1986-11-07 1988-05-23 Nikon Corp 露光装置
JPH09306813A (ja) * 1996-05-15 1997-11-28 Nikon Corp 観察装置及び該装置を備えた露光装置
AU2001297642A1 (en) 2000-10-12 2002-09-04 Board Of Regents, The University Of Texas System Template for room temperature, low pressure micro- and nano-imprint lithography
JP3668129B2 (ja) 2000-12-25 2005-07-06 株式会社ミツトヨ 光学式寸法測定方法及び装置
JP5061525B2 (ja) 2006-08-04 2012-10-31 株式会社日立製作所 インプリント方法及びインプリント装置
EP2584408B1 (en) * 2007-02-06 2020-10-07 Canon Kabushiki Kaisha Imprint method and imprint apparatus
JP2012084732A (ja) 2010-10-13 2012-04-26 Canon Inc インプリント方法及び装置
US8842294B2 (en) 2011-06-21 2014-09-23 Canon Kabushiki Kaisha Position detection apparatus, imprint apparatus, and position detection method
JP6285666B2 (ja) 2013-09-03 2018-02-28 キヤノン株式会社 検出装置、リソグラフィ装置、物品の製造方法及び検出方法
JP6552329B2 (ja) * 2014-09-12 2019-07-31 キヤノン株式会社 インプリント装置、インプリントシステム及び物品の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007073939A (ja) 2005-08-12 2007-03-22 Canon Inc インプリント装置およびインプリント方法
JP2014241398A (ja) 2013-05-16 2014-12-25 キヤノン株式会社 インプリント装置、デバイス製造方法およびインプリント方法
JP2016096269A (ja) * 2014-11-14 2016-05-26 キヤノン株式会社 インプリント装置及び物品の製造方法
WO2016092697A1 (ja) * 2014-12-12 2016-06-16 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP2016162516A (ja) * 2015-02-27 2016-09-05 東芝ライテック株式会社 電源装置および照明システム

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KR20180103730A (ko) 2018-09-19
JP6993782B2 (ja) 2022-01-14
JP2018152374A (ja) 2018-09-27

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