KR102256830B1 - 비정질 합금을 이용한 압력센서 - Google Patents
비정질 합금을 이용한 압력센서 Download PDFInfo
- Publication number
- KR102256830B1 KR102256830B1 KR1020180099461A KR20180099461A KR102256830B1 KR 102256830 B1 KR102256830 B1 KR 102256830B1 KR 1020180099461 A KR1020180099461 A KR 1020180099461A KR 20180099461 A KR20180099461 A KR 20180099461A KR 102256830 B1 KR102256830 B1 KR 102256830B1
- Authority
- KR
- South Korea
- Prior art keywords
- thin film
- pressure detection
- detection thin
- substrate
- strain
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/001—Amorphous alloys with Cu as the major constituent
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/005—Amorphous alloys with Mg as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/08—Amorphous alloys with aluminium as the major constituent
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/10—Amorphous alloys with molybdenum, tungsten, niobium, tantalum, titanium, or zirconium or Hf as the major constituent
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Fluid Pressure (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Pressure Sensors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20170107220 | 2017-08-24 | ||
KR1020170107220 | 2017-08-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20190022415A KR20190022415A (ko) | 2019-03-06 |
KR102256830B1 true KR102256830B1 (ko) | 2021-05-28 |
Family
ID=65439137
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020180099461A KR102256830B1 (ko) | 2017-08-24 | 2018-08-24 | 비정질 합금을 이용한 압력센서 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR102256830B1 (fr) |
WO (1) | WO2019039921A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102331191B1 (ko) * | 2020-06-08 | 2021-11-25 | 인제대학교 산학협력단 | 비정질 합금을 이용한 탄성 변형 부재 및 이를 이용한 압력 센서 |
KR102398725B1 (ko) * | 2020-08-04 | 2022-05-17 | 주식회사 멤스팩 | 반도체형 풀 브리지 스트레인 게이지 모듈 및 이를 적용한 로드셀 |
KR200495431Y1 (ko) * | 2020-10-27 | 2022-05-23 | 인제대학교 산학협력단 | 비정질 금속층을 포함하는 유연성 필름을 이용한 정밀 저울 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59132327A (ja) * | 1983-01-18 | 1984-07-30 | Aisin Seiki Co Ltd | 圧力センサ |
JPH06200357A (ja) * | 1991-12-18 | 1994-07-19 | Hitachi Metals Ltd | 非晶質合金 |
JPH06248399A (ja) * | 1993-02-23 | 1994-09-06 | Kyowa Electron Instr Co Ltd | ひずみゲージ用アモルファス合金およびひずみゲージ |
KR20010105084A (ko) | 2000-05-19 | 2001-11-28 | 김정희 | 압력변환기를 위한 고온용 금속 박막 스트레인 게이지의제조방법 |
KR101811214B1 (ko) * | 2015-05-29 | 2017-12-22 | 고려대학교 세종산학협력단 | 비정질 금속을 이용한 유연한 압력 센서와, 압력 및 온도를 동시에 감지하는 유연한 이중모드 센서 |
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2018
- 2018-08-24 KR KR1020180099461A patent/KR102256830B1/ko active IP Right Grant
- 2018-08-24 WO PCT/KR2018/009839 patent/WO2019039921A1/fr active Application Filing
Also Published As
Publication number | Publication date |
---|---|
KR20190022415A (ko) | 2019-03-06 |
WO2019039921A1 (fr) | 2019-02-28 |
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