KR102250672B1 - 광학 이미징 장치의 모델 기반 제어 - Google Patents

광학 이미징 장치의 모델 기반 제어 Download PDF

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KR102250672B1
KR102250672B1 KR1020157026275A KR20157026275A KR102250672B1 KR 102250672 B1 KR102250672 B1 KR 102250672B1 KR 1020157026275 A KR1020157026275 A KR 1020157026275A KR 20157026275 A KR20157026275 A KR 20157026275A KR 102250672 B1 KR102250672 B1 KR 102250672B1
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KR20150122722A (ko
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마르쿠스 하우프
게랄트 로텐회퍼
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칼 짜이스 에스엠테 게엠베하
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/028—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020157026275A 2013-02-28 2014-02-28 광학 이미징 장치의 모델 기반 제어 Active KR102250672B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361770400P 2013-02-28 2013-02-28
US61/770,400 2013-02-28
DE102013203338.9A DE102013203338A1 (de) 2013-02-28 2013-02-28 Modellbasierte Steuerung einer optischen Abbildungseinrichtung
DE102013203338.9 2013-02-28
PCT/EP2014/053955 WO2014131889A1 (en) 2013-02-28 2014-02-28 Model-based control of an optical imaging device

Publications (2)

Publication Number Publication Date
KR20150122722A KR20150122722A (ko) 2015-11-02
KR102250672B1 true KR102250672B1 (ko) 2021-05-12

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KR1020157026275A Active KR102250672B1 (ko) 2013-02-28 2014-02-28 광학 이미징 장치의 모델 기반 제어

Country Status (5)

Country Link
US (1) US9581912B2 (https=)
JP (1) JP6530718B2 (https=)
KR (1) KR102250672B1 (https=)
DE (1) DE102013203338A1 (https=)
WO (1) WO2014131889A1 (https=)

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* Cited by examiner, † Cited by third party
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DE102014223750A1 (de) * 2014-11-20 2016-05-25 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Manipulator
DE102017219151A1 (de) * 2017-10-25 2019-04-25 Carl Zeiss Smt Gmbh Verfahren zum Temperieren einer Komponente
WO2019081187A1 (en) 2017-10-25 2019-05-02 Carl Zeiss Smt Gmbh METHOD FOR REGULATING THE TEMPERATURE OF A COMPONENT
KR102445886B1 (ko) * 2017-12-20 2022-09-22 현대자동차주식회사 온도센서 고장 판단방법 및 판단시스템
DE102018208653A1 (de) * 2018-05-30 2019-12-05 Carl Zeiss Smt Gmbh Verfahren sowie Vorrichtung zum Bestimmen des Erwärmungszustandes eines Spiegels in einem optischen System
DE102019206865B4 (de) * 2019-05-13 2024-09-12 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system
DE102021100995A1 (de) 2021-01-19 2022-07-21 Carl Zeiss Smt Gmbh Verfahren sowie Vorrichtung zum Bestimmen des Erwärmungszustandes eines optischen Elements in einem optischen System
KR20230131202A (ko) 2021-01-28 2023-09-12 칼 짜이스 에스엠테 게엠베하 광학 시스템 및 광학 시스템을 동작시키는 방법
DE102021207580A1 (de) * 2021-07-16 2023-01-19 Carl Zeiss Smt Gmbh Optisches System, sowie Verfahren zum Betreiben eines optischen Systems
DE102021208488B4 (de) 2021-08-05 2025-03-13 Carl Zeiss Smt Gmbh Verfahren zum Betreiben eines optischen Systems
DE102024200558A1 (de) 2024-01-22 2024-12-19 Carl Zeiss Smt Gmbh Verfahren sowie Vorrichtung zum Charakterisieren des Erwärmungszustandes eines Spiegels hinsichtlich des zeitliches Abstandes von einem thermischen Gleichgewichtszustand

Citations (4)

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US20030111458A1 (en) * 2001-10-03 2003-06-19 Canon Kabushiki Kaisha Temperature adjusting system in exposure apparatus
JP2006024941A (ja) * 2004-07-08 2006-01-26 Asml Netherlands Bv リソグラフィ投影装置及びそのリソグラフィ投影装置を使用するデバイス製造方法
JP2010147469A (ja) 2008-12-18 2010-07-01 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
WO2011092020A2 (en) * 2010-01-29 2011-08-04 Carl Zeiss Smt Gmbh Arrangement for use in a projection exposure tool for microlithography having a reflective optical element

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DE19820158A1 (de) 1998-05-06 1999-11-11 Convergenza Ag Vaduz Verfahren und Vorrichtung zur Blutoxygenierung
JP2004363559A (ja) 2003-05-14 2004-12-24 Canon Inc 光学部材保持装置
EP1513021B1 (en) * 2003-09-04 2007-10-03 ASML Netherlands B.V. Lithographic apparatus and a method of compensating for thermal deformation in a lithographic apparatus
JP4666908B2 (ja) * 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
WO2009039883A1 (en) * 2007-09-26 2009-04-02 Carl Zeiss Smt Ag Optical imaging device with thermal stabilization
EP2136250A1 (en) * 2008-06-18 2009-12-23 ASML Netherlands B.V. Lithographic apparatus and method
TWI498679B (zh) * 2010-07-30 2015-09-01 卡爾蔡司Ｓｍｔ有限公司 超紫外線曝光裝置
DE102010061950A1 (de) * 2010-11-25 2012-05-31 Carl Zeiss Smt Gmbh Verfahren sowie Anordnung zum Bestimmen des Erwärmungszustandes eines Spiegels in einem optischen System

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030111458A1 (en) * 2001-10-03 2003-06-19 Canon Kabushiki Kaisha Temperature adjusting system in exposure apparatus
JP2006024941A (ja) * 2004-07-08 2006-01-26 Asml Netherlands Bv リソグラフィ投影装置及びそのリソグラフィ投影装置を使用するデバイス製造方法
JP2010147469A (ja) 2008-12-18 2010-07-01 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
WO2011092020A2 (en) * 2010-01-29 2011-08-04 Carl Zeiss Smt Gmbh Arrangement for use in a projection exposure tool for microlithography having a reflective optical element

Also Published As

Publication number Publication date
JP2016513292A (ja) 2016-05-12
KR20150122722A (ko) 2015-11-02
DE102013203338A1 (de) 2014-08-28
WO2014131889A1 (en) 2014-09-04
US9581912B2 (en) 2017-02-28
US20160026093A1 (en) 2016-01-28
JP6530718B2 (ja) 2019-06-12

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