KR102219053B1 - 폴리머, 이를 포함하는 감광성 수지 조성물, 감광성 수지막, 컬러필터 및 디스플레이 장치 - Google Patents

폴리머, 이를 포함하는 감광성 수지 조성물, 감광성 수지막, 컬러필터 및 디스플레이 장치 Download PDF

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KR102219053B1
KR102219053B1 KR1020170180163A KR20170180163A KR102219053B1 KR 102219053 B1 KR102219053 B1 KR 102219053B1 KR 1020170180163 A KR1020170180163 A KR 1020170180163A KR 20170180163 A KR20170180163 A KR 20170180163A KR 102219053 B1 KR102219053 B1 KR 102219053B1
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South Korea
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formula
unsubstituted
substituted
photosensitive resin
group
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KR1020170180163A
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Korean (ko)
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KR20190078314A (ko
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서광원
송해니
이진아
김규영
이영
최은정
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삼성에스디아이 주식회사
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Priority to KR1020170180163A priority Critical patent/KR102219053B1/ko
Priority to TW107137039A priority patent/TWI687487B/zh
Priority to CN201811243864.0A priority patent/CN109957065B/zh
Publication of KR20190078314A publication Critical patent/KR20190078314A/ko
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • C09B69/109—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing other specific dyes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • C08F220/387—Esters containing sulfur and containing nitrogen and oxygen

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
KR1020170180163A 2017-12-26 2017-12-26 폴리머, 이를 포함하는 감광성 수지 조성물, 감광성 수지막, 컬러필터 및 디스플레이 장치 KR102219053B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020170180163A KR102219053B1 (ko) 2017-12-26 2017-12-26 폴리머, 이를 포함하는 감광성 수지 조성물, 감광성 수지막, 컬러필터 및 디스플레이 장치
TW107137039A TWI687487B (zh) 2017-12-26 2018-10-19 聚合物、包含此聚合物的感光性樹脂組合物、感光性樹脂層、彩色濾光片及顯示裝置
CN201811243864.0A CN109957065B (zh) 2017-12-26 2018-10-24 聚合物、包含此聚合物的感光性树脂组合物、感光性树脂层、彩色滤光片及显示装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020170180163A KR102219053B1 (ko) 2017-12-26 2017-12-26 폴리머, 이를 포함하는 감광성 수지 조성물, 감광성 수지막, 컬러필터 및 디스플레이 장치

Publications (2)

Publication Number Publication Date
KR20190078314A KR20190078314A (ko) 2019-07-04
KR102219053B1 true KR102219053B1 (ko) 2021-02-22

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KR1020170180163A KR102219053B1 (ko) 2017-12-26 2017-12-26 폴리머, 이를 포함하는 감광성 수지 조성물, 감광성 수지막, 컬러필터 및 디스플레이 장치

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Country Link
KR (1) KR102219053B1 (zh)
CN (1) CN109957065B (zh)
TW (1) TWI687487B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102422792B1 (ko) * 2019-08-14 2022-07-18 삼성에스디아이 주식회사 화합물, 이를 포함하는 감광성 수지 조성물, 감광성 수지 조성물을 이용한 감광성 수지막, 컬러필터 및 디스플레이 장치
CN114230491B (zh) * 2021-12-15 2023-03-31 广东博兴新材料科技有限公司 一种氰基改性聚氨酯丙烯酸酯树脂、涂料及其制备方法和应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
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KR101361679B1 (ko) * 2012-03-30 2014-02-12 (주)경인양행 크산텐계 자색 염료 화합물, 이를 포함하는 컬러필터용 착색 수지 조성물 및 이를 이용한 컬러필터
WO2014126167A1 (ja) * 2013-02-15 2014-08-21 和光純薬工業株式会社 着色組成物
KR20150089702A (ko) * 2014-01-28 2015-08-05 제일모직주식회사 신규 화합물, 신규 폴리머, 이를 포함하는 착색제, 이를 포함하는 감광성 수지 조성물 및 컬러필터
JP6374172B2 (ja) * 2014-01-31 2018-08-15 富士フイルム株式会社 着色組成物、およびこれを用いた硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子、画像表示装置ならびに染料多量体
KR20150134191A (ko) * 2014-05-21 2015-12-01 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 컬러필터
CN106125508A (zh) * 2015-05-06 2016-11-16 奇美实业股份有限公司 彩色滤光片用感光性树脂组成物及其应用
KR101747077B1 (ko) * 2015-06-23 2017-06-15 (주)경인양행 크산텐계 고분자 화합물, 이를 포함하는 컬러필터용 수지 조성물 및 이를 이용한 컬러필터
KR102055478B1 (ko) * 2015-09-21 2019-12-12 주식회사 엘지화학 크산텐계 화합물, 이를 포함하는 색재 조성물 및 이를 포함하는 수지 조성물
KR101895910B1 (ko) * 2016-01-19 2018-09-07 삼성에스디아이 주식회사 감광성 수지 조성물, 감광성 수지막 및 이를 포함하는 컬러필터
US10101655B2 (en) * 2016-02-26 2018-10-16 Samsung Sdi Co., Ltd. Compound, polymer, photosensitive resin composition, and color filter
KR101942488B1 (ko) * 2016-02-26 2019-01-25 삼성에스디아이 주식회사 신규 화합물, 신규 폴리머, 이를 포함하는 착색제, 이를 포함하는 감광성 수지 조성물 및 컬러필터

Also Published As

Publication number Publication date
CN109957065A (zh) 2019-07-02
KR20190078314A (ko) 2019-07-04
CN109957065B (zh) 2021-07-20
TWI687487B (zh) 2020-03-11
TW201927912A (zh) 2019-07-16

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