KR101986894B1 - 액적 토출 장치 및 액적 토출 조건 보정 방법 - Google Patents

액적 토출 장치 및 액적 토출 조건 보정 방법 Download PDF

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Publication number
KR101986894B1
KR101986894B1 KR1020170104557A KR20170104557A KR101986894B1 KR 101986894 B1 KR101986894 B1 KR 101986894B1 KR 1020170104557 A KR1020170104557 A KR 1020170104557A KR 20170104557 A KR20170104557 A KR 20170104557A KR 101986894 B1 KR101986894 B1 KR 101986894B1
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KR
South Korea
Prior art keywords
droplet
scanning direction
workpiece
ejection
liquid
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KR1020170104557A
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English (en)
Korean (ko)
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KR20180021647A (ko
Inventor
데루유키 하야시
기요미 오시마
아키노리 시마무라
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도쿄엘렉트론가부시키가이샤
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Publication of KR20180021647A publication Critical patent/KR20180021647A/ko
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Publication of KR101986894B1 publication Critical patent/KR101986894B1/ko

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/07Ink jet characterised by jet control
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J29/00Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
    • B41J29/38Drives, motors, controls or automatic cut-off devices for the entire printing mechanism
    • B41J29/393Devices for controlling or analysing the entire machine ; Controlling or analysing mechanical parameters involving printing of test patterns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
KR1020170104557A 2016-08-22 2017-08-18 액적 토출 장치 및 액적 토출 조건 보정 방법 KR101986894B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2016-162041 2016-08-22
JP2016162041A JP6695237B2 (ja) 2016-08-22 2016-08-22 液滴吐出装置及び液滴吐出条件補正方法

Publications (2)

Publication Number Publication Date
KR20180021647A KR20180021647A (ko) 2018-03-05
KR101986894B1 true KR101986894B1 (ko) 2019-06-07

Family

ID=61264977

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KR1020170104557A KR101986894B1 (ko) 2016-08-22 2017-08-18 액적 토출 장치 및 액적 토출 조건 보정 방법

Country Status (3)

Country Link
JP (1) JP6695237B2 (zh)
KR (1) KR101986894B1 (zh)
CN (1) CN107768278B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7119417B2 (ja) 2018-02-22 2022-08-17 Agc株式会社 透光性構造体
KR20200144198A (ko) * 2019-06-17 2020-12-29 삼성디스플레이 주식회사 잉크 액적 부피 측정장치와, 그것을 이용한 잉크 액적 부피 측정방법과, 그 잉크 액적 부피 측정장치를 활용하는 박막층 형성장치 및, 상기 박막층 형성장치를 이용한 디스플레이 장치의 제조방법
KR102432531B1 (ko) * 2019-10-23 2022-08-18 세메스 주식회사 액적 검사 모듈 및 액적 검사 방법
KR102420993B1 (ko) * 2020-06-30 2022-07-15 참엔지니어링(주) 리페어 장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001203859A (ja) * 2000-01-21 2001-07-27 Canon Inc 画像読み取り装置及び画像読み取り方法
KR101369700B1 (ko) * 2011-08-05 2014-03-04 스미도모쥬기가이고교 가부시키가이샤 박막패턴 형성장치, 박막패턴 형성방법, 및 장치의 조정방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4765278B2 (ja) 2004-08-04 2011-09-07 セイコーエプソン株式会社 液滴吐出装置の液滴着弾位置補正方法および液滴吐出装置、並びに電気光学装置の製造方法
JP2008249958A (ja) * 2007-03-30 2008-10-16 Fujifilm Corp 基準位置計測装置及び方法、並びに描画装置
JP2010204411A (ja) 2009-03-04 2010-09-16 Seiko Epson Corp 液滴吐出装置、液滴吐出方法、及びカラーフィルターの製造方法
JP5423148B2 (ja) * 2009-05-27 2014-02-19 セイコーエプソン株式会社 液滴吐出方法及び液滴吐出装置
JP2011120821A (ja) * 2009-12-14 2011-06-23 Nikkiso Co Ltd 血液浄化装置
JP2013071292A (ja) * 2011-09-27 2013-04-22 Fujifilm Corp 液滴吐出装置、および、検出装置のメンテナンス方法
JP2014195891A (ja) * 2013-03-29 2014-10-16 セイコーエプソン株式会社 補正値の算出方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001203859A (ja) * 2000-01-21 2001-07-27 Canon Inc 画像読み取り装置及び画像読み取り方法
KR101369700B1 (ko) * 2011-08-05 2014-03-04 스미도모쥬기가이고교 가부시키가이샤 박막패턴 형성장치, 박막패턴 형성방법, 및 장치의 조정방법

Also Published As

Publication number Publication date
KR20180021647A (ko) 2018-03-05
CN107768278A (zh) 2018-03-06
JP6695237B2 (ja) 2020-05-20
CN107768278B (zh) 2021-07-20
JP2018030054A (ja) 2018-03-01

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