KR101982158B1

KR101982158B1 - Film surface treatment device and system

Info

Publication number: KR101982158B1
Application number: KR1020150136439A
Authority: KR
Inventors: 전재형; 여정현; 박원찬
Original assignee: 주식회사 엘지화학
Priority date: 2015-09-25
Filing date: 2015-09-25
Publication date: 2019-05-24
Also published as: KR20170037200A

Abstract

The present invention discloses an apparatus and a system for treating a film surface. A surface treatment apparatus for a film according to the present invention comprises: a roll for flowing a film; An electrode that flows by the roll and surface-processes the film introduced into the chamber; At least one gas supply unit positioned inside the chamber and supplying gas between the electrode and the film; And a labyrinth seal chamber for covering a part of the roll and a portion of the roll for flowing the film so as not to interfere with the flow of the film and preventing oxygen from flowing between the film and the electrode, Labyrinth Seal).

Description

TECHNICAL FIELD [0001] The present invention relates to a film surface treatment apparatus and system,

The present invention relates to a film surface treatment apparatus and system, and more particularly, to a film surface treatment apparatus and system capable of suppressing the generation of foreign matter when the surface of the film is treated using a corona.

Corona devices are used for surface treatment in the production of films. However, the corona device has a very narrow gap between the electrode and the film surface, and the production efficiency in the surface treatment of the film is deteriorated due to foreign substances generated by reaction with oxygen, and adversely affecting quality.

Accordingly, in the prior art, as shown in FIG. 1, the exhaust unit is installed in the lower direction of the surface treatment apparatus to remove the generated foreign substances.

BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is a view schematically showing a configuration of a surface treatment apparatus for surface treatment of a film according to the prior art; FIG.

Referring to FIG. 1, the surface treatment apparatus according to the related art includes a structure to which a roll-to-roll process is applied. Due to the characteristics of the process, That is, oxygen is likely to flow into the air, thereby generating foreign matter. In addition, the distance between the electrode 20 and the film 30 is very narrow, i.e., 0.2 to 0.3 mm, which makes it difficult to perform the cleaning process when foreign substances are generated.

The exhaust unit 40 is formed in a downward direction of the chamber 10 to remove foreign matter generated between the electrode 20 and the film 30, It is not easy. In order to perform the surface treatment of the film 30, a nitrogen atmosphere should be maintained between the electrode 20 and the film 30 as much as possible. However, due to the characteristics of the surface treatment apparatus described above, And oxygen is introduced into the chamber 10 through the exhaust unit 40 to promote the generation of foreign substances.

Korean Patent Publication No. 10-2013-0138135 (published Dec. 18, 2013)

SUMMARY OF THE INVENTION The present invention has been made in order to solve the above problems, and it is an object of the present invention to provide a film surface treatment apparatus and system which can improve the structure of a film surface treatment apparatus, have.

According to an aspect of the present invention, there is provided an apparatus for processing a surface of a film, including: a roll for flowing a film; An electrode that flows by the roll and surface-processes the film introduced into the chamber; At least one gas supply unit positioned inside the chamber and supplying gas between the electrode and the film; And a labyrinth seal chamber for covering a part of the roll and a portion of the roll for flowing the film so as not to interfere with the flow of the film and preventing oxygen from flowing between the film and the electrode, Labyrinth Seal).

The supplied gas may be nitrogen.

The labyrinth seal chamber formed in the roll direction may have a plurality of fins spaced inwardly in the roll direction.

According to another aspect of the present invention, there is provided a film surface treatment system comprising: a roll for flowing a film; an electrode for surface treatment of a film flowing into the chamber by the roll; And at least one gas supply part for supplying a gas between the electrode and the film, and at least one gas supplying part for surrounding the chamber and a part of the roll, wherein the film is made to flow so as not to interfere with the flow of the film And a labyrinth seal (Labyrinth Seal) which covers a part of the film and prevents oxygen from flowing between the film and the electrode. And an exhaust unit that is disposed outside the apparatus and removes foreign substances other than oxygen generated in the clean room and foreign matter adhering to the film.

The supplied gas may be nitrogen.

The exhaust portion may be located on the upper portion of the labyrinth seal.

According to an aspect of the present invention, production efficiency and quality of a product can be improved by suppressing the generation of foreign matter by keeping the space between the electrode and the film in a nitrogen atmosphere.

In addition, it is possible to prevent the outside air, that is, oxygen, from flowing into the interior of the surface treatment apparatus through the exhaust unit by positioning the exhaust unit outside the surface treatment apparatus.

BRIEF DESCRIPTION OF THE DRAWINGS The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate preferred embodiments of the invention and, together with the description of the invention given below, serve to further the understanding of the technical idea of the invention. And should not be construed as limiting.
BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view schematically showing a configuration of a surface treatment apparatus for surface treatment of a film according to the prior art,
2 is a view schematically showing a configuration of a surface treatment apparatus for surface treatment of a film according to an embodiment of the present invention,
3 is a view showing that a nitrogen atmosphere is maintained in a surface treatment apparatus for surface treatment of a film according to an embodiment of the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. Prior to this, terms and words used in the present specification and claims are to be construed in accordance with the technical idea of the present invention based on the principle that the concept of a term can be properly defined in order to describe its own invention in the best way It must be interpreted as meaning and concept. Therefore, the embodiments described in the present specification and the configurations shown in the drawings are merely the most preferred embodiments of the present invention, and not all of the technical ideas of the present invention are described. Therefore, It should be understood that various equivalents and modifications may be present.

2 is a view schematically showing a configuration of a surface treatment apparatus for surface treatment of a film according to an embodiment of the present invention.

2, a surface treatment apparatus for surface treatment of a film according to the present embodiment includes a chamber 110, a roll 120 for flowing the film 140, A gas supply unit 150 for supplying a gas between the electrode 130 and the film 140 and a gas supply unit 150 for supplying the gas between the electrode 130 and the film 140. [ And a labyrinth seal (160) that can maintain the gas atmosphere supplied by the gas supply unit (150) between the gas supply unit (140) and the gas supply unit (150).

The gas supply unit 150 may be disposed inside the chamber 110 and may include at least one gas supply unit for supplying gas between the electrode 130 and the film 140. At this time, the gas supplied between the electrode 130 and the film 140 may be nitrogen.

The labyrinth seal 160 is installed to surround the outside of the chamber 110 and the roll 120 to prevent the oxygen in the clean room from flowing between the electrode 130 and the film 140, And maintains the space between the film 130 and the film 140 in a nitrogen atmosphere.

One side 161 of the labyrinth seal is installed in the chamber 110 and the other side 163 is a part of the roll 120 that flows the film 140 so as not to interfere with the flow of the film 140. [ So that oxygen can be prevented from flowing between the film 140 and the electrode 130. For example, one side 161 of the labyrinth seal is installed to be in contact with the chamber 110, and the other side 163 is installed to cover a part of the roll 120 that flows the film 140. At this time, it is preferable that the other side 163 of the labyrinth seal chamber is installed at a minimum distance from the film 140 flowing by the roll 120 within a range that does not interfere with the flow of the film 140.

One side 161 and the other side 163 of the labyrinth seal chamber are formed with a plurality of fins at regular intervals and formed inwardly in the direction of the chamber 110 and the film 140 so that the inside of the chamber 110 , And between the electrode (130) and the film (140). In other words, the labyrinth seal 160 according to the present embodiment reduces the leakage amount due to a pressure drop when the gas such as gas passes through a narrow gap several times, thereby preventing the nitrogen in the chamber 110 from leaking to the outside Or the oxygen in the clean room can be prevented from flowing into the interior of the chamber 110.

In the present embodiment, one side 161 of the labyrinth seal chamber is installed in contact with the chamber 110, so that outside air, that is, oxygen does not flow into the inside through the one side 161. However, the other side 163 of the labyrinth seal should not interfere with the flow of the film 140, so that the film 140 and the film 140, Oxygen may be introduced into the space between the electrode 130 and the film 140, that is, the inside of the chamber 110, through the spaced gap. According to the present embodiment, oxygen is supplied between the electrode 130 and the film 140, that is, the inside of the chamber 110, according to the structural characteristics of the labyrinth chamber 160 formed by disposing a plurality of pins at regular intervals So that it is possible to prevent foreign matter from being generated by maintaining a nitrogen atmosphere between the electrode 130 and the film 140.

3 is a view showing that a nitrogen atmosphere is maintained in a surface treatment apparatus for surface treatment of a film 140 according to an embodiment of the present invention.

3 indicates that the oxygen atmosphere is maintained in the clean room and the area 330 indicated in red indicates that the nitrogen atmosphere is applied to the interior of the surface treatment apparatus for surface treatment of the film 140 Respectively.

That is, according to the improved structural characteristics of the surface treatment apparatus described above, oxygen is not introduced into the space between the electrode 130 and the film 140, that is, the inside of the chamber 110, It can be avoided in principle.

In addition, the surface treatment apparatus in the prior art has a structure in which the exhaust unit 40 is disposed on the lower side of the chamber 10 for discharging foreign matter between the electrode 20 and the film 30 as shown in Fig. 1 Respectively. However, there is a problem that oxygen is introduced into the chamber 10 through the exhaust part 40 to promote the generation of foreign matter between the electrode 20 and the film 30.

In order to solve such a problem, in the system according to the present embodiment, the exhaust part 350 is separated from the surface treatment apparatus and installed outside.

According to the present embodiment as described above, the inside of the surface treatment apparatus 330 can maintain the atmosphere of nitrogen, so that generation of foreign matter can be fundamentally blocked, so that almost no foreign matter is generated. Therefore, as in the prior art, an exhaust part for removing foreign matter is not required.

Accordingly, in the system according to the present embodiment, the exhaust part 350 is separated from the surface treatment apparatus and installed outside, thereby discharging foreign substances other than oxygen generated in the clean room to the outside of the clean room. More specifically, the exhaust unit 350 may be installed in the upper part of the other side 163 of the labyrinth seal covering the part of the roll 120, so that the film 140, which flows into the chamber 110, If foreign matter is adhered, it can be sucked and removed. In addition, the inside of the chamber 110 is maintained in a nitrogen atmosphere so that foreign substances are hardly generated in the film 140 that has been subjected to the surface treatment. However, if foreign matters are generated in the film 140, . At this time, a fan (not shown) is installed at one side of the exhaust part 350 to exhaust gas and foreign substances from the clean room to the outside. Therefore, there is an effect that oxygen can be prevented from being introduced into the chamber through the exhaust part, which is a problem occurring in the related art.

While the present invention has been described with reference to the particular embodiments and drawings, it is to be understood that the invention is not limited to the disclosed embodiments, but is to be limited only by the person of ordinary skill in the art to which the invention pertains It will be understood by those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the present invention as defined by the appended claims and their equivalents.

110: chamber
120: roll
130: Electrode
140: Film
150: gas supply unit
160: Labyrinth Seal

Claims

A system comprising a film surface treatment apparatus and an exhaust port in a clean room,
The film surface treatment apparatus comprises:
A chamber 110;
A roll 120 for flowing the film 140;
An electrode (130) for surface-treating the film (140) flowing by the roll (120) and flowing into the chamber (110);
At least one gas supply unit 150 positioned inside the chamber 110 for supplying a nitrogen gas between the electrode 130 and the film 140; And
The electrode 130 and the film 140 are provided to surround the chamber 110 and the roll 120 so as to be maintained in a nitrogen gas atmosphere supplied by the gas supply unit 150. A labyrinth seal 160,
One side 161 of the labyrinth chamber 160 is installed to be in contact with the chamber 110 and the other side 163 of the labyrinth chamber 160 is connected to the roll 110 to prevent the flow of the film 140. [ (140) and the electrode (130) so as to prevent the oxygen in the clean room from flowing between the film (140) and the electrode (130)
The exhaust unit may be provided on the other side (163) of the labyrinth chamber (160) which is separated from the film surface treatment apparatus and is provided outside the film surface treatment apparatus and covers a part of the roll (120) A system configured to suck and remove a foreign substance adhering to a film (140) introduced into a chamber (110) or to suck and remove a foreign substance generated in a surface treated film (140) by the film surface treatment apparatus.

The method according to claim 1,
Wherein the labyrinth seal (160) has a plurality of fins spaced inwardly in the direction of the roll (120).

delete