KR101943239B1 - 갠트리 장치 및 제어 방법 - Google Patents

갠트리 장치 및 제어 방법 Download PDF

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Publication number
KR101943239B1
KR101943239B1 KR1020177010971A KR20177010971A KR101943239B1 KR 101943239 B1 KR101943239 B1 KR 101943239B1 KR 1020177010971 A KR1020177010971 A KR 1020177010971A KR 20177010971 A KR20177010971 A KR 20177010971A KR 101943239 B1 KR101943239 B1 KR 101943239B1
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KR
South Korea
Prior art keywords
sensing element
distance
scanning galvanometer
substrate
gantry
Prior art date
Application number
KR1020177010971A
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English (en)
Korean (ko)
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KR20170091584A (ko
Inventor
천양 한
Original Assignee
상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드
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Publication of KR20170091584A publication Critical patent/KR20170091584A/ko
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Publication of KR101943239B1 publication Critical patent/KR101943239B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laser Beam Processing (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Measurement Of Radiation (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020177010971A 2014-09-28 2015-08-14 갠트리 장치 및 제어 방법 KR101943239B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201410510061.2A CN105527796B (zh) 2014-09-28 2014-09-28 龙门式设备和控制方法
CN201410510061.2 2014-09-28
PCT/CN2015/086912 WO2016045461A1 (zh) 2014-09-28 2015-08-14 龙门式设备和控制方法

Publications (2)

Publication Number Publication Date
KR20170091584A KR20170091584A (ko) 2017-08-09
KR101943239B1 true KR101943239B1 (ko) 2019-01-28

Family

ID=55580265

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020177010971A KR101943239B1 (ko) 2014-09-28 2015-08-14 갠트리 장치 및 제어 방법

Country Status (6)

Country Link
JP (1) JP6242542B2 (zh)
KR (1) KR101943239B1 (zh)
CN (1) CN105527796B (zh)
SG (1) SG11201702491SA (zh)
TW (1) TWI581006B (zh)
WO (1) WO2016045461A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107665826B (zh) * 2016-07-29 2019-11-26 上海微电子装备（集团）股份有限公司 激光封装方法及激光封装装置
CN107883887B (zh) 2016-09-30 2019-11-26 上海微电子装备（集团）股份有限公司 一种光学测量装置和方法
CN106647185A (zh) * 2016-12-31 2017-05-10 江苏九迪激光装备科技有限公司 一种丝网印刷直接制版系统及制版方法
CN106772736B (zh) * 2017-01-11 2019-02-01 中国科学院上海光学精密机械研究所 大尺寸光栅的制造装置和制造方法
CN109471333B (zh) * 2017-09-08 2020-05-01 上海微电子装备（集团）股份有限公司 一种振镜矫正系统及方法
CN109520472A (zh) * 2018-12-26 2019-03-26 交通运输部公路科学研究所 一种接触式路面高程测量装置
CN110727177B (zh) * 2019-09-23 2022-04-01 钧迪智能装备科技(苏州)有限公司 一种异形工件的曝光装置及曝光方法
CN114697535B (zh) * 2020-12-31 2023-05-30 上海微电子装备（集团）股份有限公司 一种光刻机多路同步调焦调平系统和方法

Citations (3)

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US20050051277A1 (en) 2003-09-05 2005-03-10 Eastman Kodak Company Laser transfer of organic material from a donor to form a layer in an OLED device
US20120038899A1 (en) 2010-08-13 2012-02-16 Samsung Electronics Co., Ltd. Exposure apparatus and alignment error compensation method using the same
CN103472681A (zh) 2012-06-08 2013-12-25 上海微电子装备有限公司 光刻机运动台反力抵消装置及应用其的光刻机

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US6335784B2 (en) * 1996-01-16 2002-01-01 Canon Kabushiki Kaisha Scan type projection exposure apparatus and device manufacturing method using the same
US8109395B2 (en) * 2006-01-24 2012-02-07 Asm Technology Singapore Pte Ltd Gantry positioning system
CN101158818A (zh) * 2007-11-16 2008-04-09 上海微电子装备有限公司 一种对准装置与对准方法、像质检测方法
JP2009128830A (ja) * 2007-11-27 2009-06-11 Sharp Corp 基板処理装置及び基板処理装置の制御方法
JP5331622B2 (ja) * 2009-09-02 2013-10-30 株式会社日立ハイテクノロジーズ 露光装置
KR101144958B1 (ko) * 2009-09-14 2012-05-11 순환엔지니어링 주식회사 갠트리 구조형 스테이지의 직각도 오차 측정 방법 및 오차 보상 원점복귀 방법
WO2011059003A1 (ja) * 2009-11-10 2011-05-19 株式会社アルバック 検査装置
JP2013114297A (ja) * 2011-11-25 2013-06-10 Nikon Corp 駆動システム及び駆動方法、並びに露光装置及び露光方法
KR102096955B1 (ko) * 2012-10-11 2020-04-06 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
CN202896121U (zh) * 2012-10-31 2013-04-24 义乌市圣石激光技术有限公司 一种大幅面激光内雕机
CN202963999U (zh) * 2012-11-04 2013-06-05 林志贺 龙门式多主轴加工中心
TWI494725B (zh) * 2012-12-18 2015-08-01 Ind Tech Res Inst 控制裝置、控制方法及位置命令補償方法
CN103100797B (zh) * 2013-01-23 2015-09-09 刘茂珍 基于自适应光学的激光微细加工设备和方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050051277A1 (en) 2003-09-05 2005-03-10 Eastman Kodak Company Laser transfer of organic material from a donor to form a layer in an OLED device
US20120038899A1 (en) 2010-08-13 2012-02-16 Samsung Electronics Co., Ltd. Exposure apparatus and alignment error compensation method using the same
CN103472681A (zh) 2012-06-08 2013-12-25 上海微电子装备有限公司 光刻机运动台反力抵消装置及应用其的光刻机

Also Published As

Publication number Publication date
TWI581006B (zh) 2017-05-01
CN105527796B (zh) 2018-03-13
JP6242542B2 (ja) 2017-12-06
CN105527796A (zh) 2016-04-27
WO2016045461A1 (zh) 2016-03-31
KR20170091584A (ko) 2017-08-09
SG11201702491SA (en) 2017-04-27
JP2017530559A (ja) 2017-10-12
TW201614322A (en) 2016-04-16

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