KR101915207B1 - Catalyst metal supporting apparatus for synthesizing multiple graphene films - Google Patents

Abstract

According to an aspect of the present invention, there is provided a chemical vapor deposition apparatus comprising: a chamber coupling unit coupled to a chemical vapor deposition chamber; a support bar installation unit installed in the chamber coupling unit and arranged to project from the chamber coupling unit in one direction; A plurality of catalyst metal films provided on the support bars and each having a plurality of holes to be installed on the support bars; And a plurality of spacers disposed at least at any one of the mounting portions and between the catalyst metal films and having holes formed in the supporting bars.

Description

Technical Field [0001] The present invention relates to a catalyst supporting apparatus for synthesizing graphene,

The present invention relates to an apparatus for graphene multifunctional synthesis, and relates to a catalyst metal supporting apparatus, a graphene multifunctional synthesizing apparatus having the same, and a graphene multifunctional synthetic method.

Recently, Graphene has attracted attention as a new material having excellent electrical conductivity, excellent chemical stability, and transparency and ductility. Chemical vapor deposition (CVD) may be used as a method for synthesizing such graphene. Chemical vapor deposition for graphene synthesis uses a method in which a mixed gas of argon, hydrogen, and methane is contacted with a catalytic metal in a high-temperature chamber. As the catalytic metal, a transition metal including copper may be used. According to this chemical vapor deposition method, graphene is synthesized on the surface of the catalytic metal, and then only the graphene can be obtained by removing the catalytic metal.

It is an object of the present invention to provide an apparatus and method capable of stably synthesizing a plurality of graphenes by a chemical vapor deposition process.

According to an aspect of the present invention, there is provided a chemical vapor deposition apparatus comprising: a chamber coupling unit coupled to a chemical vapor deposition chamber; a support bar installation unit installed in the chamber coupling unit and disposed to protrude in one direction from the chamber coupling unit; A plurality of support bars installed on the bar mounting part and arranged to protrude in both lateral directions around the support bar mounting part; a plurality of catalyst metal films each having a plurality of holes formed in the support bar; And a plurality of spacers disposed at least at any one of a position between the metal film and the support bar mounting portion and between the catalyst metal films and having holes formed in the support bar, to provide.

Here, the support bar mounting portion may have a vertically separated shape.

Here, the holes located on both sides of the holes formed in the catalytic metal film may be formed larger than the hole located at the center, with reference to the projecting direction of the support bar mounting portion.

The display device may further include a plurality of frame spacers disposed at at least one of the catalytic metal film and the supporting bar mounting portion and between the catalytic metal films and having holes formed in the supporting bar.

Here, the frame spacer has a through hole formed in the center thereof, and the neighboring catalyst metal films may be arranged to face each other through the through hole.

According to another aspect of the present invention, there is provided a chemical vapor deposition apparatus comprising: a chamber coupling unit coupled to a chemical vapor deposition chamber; a support bar installation unit installed in the chamber coupling unit and disposed to protrude from the chamber coupling unit in one direction; A plurality of supporting bars provided on the bar mounting part and arranged to protrude in both lateral directions around the supporting bar mounting part; a plurality of protruding parts protruding in the longitudinal direction of the supporting bar, And a fixing member for supporting the catalyst metal film so as to be disposed in the through space of the frame, wherein the frame includes a frame having a through-hole formed therein, a catalyst metal film disposed in the through- A catalytic metal support apparatus for multifunctional synthesis is provided.

Here, the support bar mounting portion may have a vertically separated shape.

According to another aspect of the present invention, there is provided a chemical vapor deposition apparatus including: a chamber coupling unit coupled to a chemical vapor deposition chamber; a support bar installation unit installed in the chamber coupling unit and disposed to protrude in one direction from the chamber coupling unit; A plurality of support bars installed on the support bar mounting portions and disposed to be protruded in both lateral directions around the support bar mounting portions; a frame having a coupling hole formed on the support bar and having a through space formed therein; A catalytic metal film disposed in a through space of the frame and having a plurality of holes formed therein, one side of which is hinged to the frame by a hinge, and the other side of which is provided in a hole of the catalytic metal film, Wherein the hinge unit of the pair of hinge members located on the upper side of the frame includes a hinge unit that receives the gravity of the hinge member, Wherein a position of a hinge portion of a pair of hinge members located on the lower side of the frame is smaller than a position of a hinge portion of a pair of hinge members located on an upper side of the frame, The present invention provides a catalytic metal support apparatus for graphene multifunctional synthesis, which is disposed inside a hole of a catalyst metal film on which the other side of a pair of hinge members is located.

According to the catalyst metal support apparatus for graphene multifunctional synthesis according to an embodiment of the present invention, a plurality of graphenes can be simultaneously and stably synthesized by chemical vapor deposition.

1 is a schematic perspective view of a catalytic metal support apparatus according to an embodiment of the present invention.
Fig. 2 is an exploded perspective view schematically showing a part of the catalytic metal support apparatus of Fig. 1; Fig.
FIG. 3 is a schematic view of a graphene multifunctional apparatus having the catalyst metal support apparatus of FIG. 1; FIG.
4 is a flowchart for schematically explaining a graphene duplex synthesis method according to an aspect of the present invention.
FIGS. 5A and 5B are graphs showing Raman analysis results for checking whether graphene synthesis is smoothly performed by the graphene composite apparatus of FIG. 3. FIG.
FIGS. 6A to 6D and FIGS. 7A to 7D are graphs showing the results of measuring the sheet resistance of the graphene synthesized using the graphene multifunctional apparatus of FIG.
8 is a schematic perspective view of a catalytic metal support apparatus according to another embodiment of the present invention.
FIG. 9 is a schematic view showing a part of the configuration of a graphene multifunction composite apparatus having the catalyst metal support apparatus of FIG. 8. FIG.
Figure 10 is a schematic view of a variant of some of the components of the catalytic metal support apparatus of Figure 8;
11 is a schematic perspective view of a catalytic metal support apparatus according to another embodiment of the present invention.
FIG. 12 is a schematic view showing a part of a graphene multifunctional synthesizing apparatus having the catalytic metal support apparatus of FIG. 11. FIG.
13 is a flowchart schematically showing a graphene duplex synthesis method according to another aspect of the present invention.
FIGS. 14A and 14B are graphs showing Raman analysis results for checking whether graphene synthesis is smoothly performed by the graphene composite apparatus of FIG.
FIGS. 15A and 15B and FIGS. 16A and 16B are graphs showing the results of measurement of the sheet resistance of graphene synthesized by the graphene composite apparatus of FIG.
17 is a view schematically showing a modification of some components of the catalytic metal support apparatus of Fig.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

FIG. 1 is a schematic perspective view of a catalytic metal support apparatus according to an embodiment of the present invention, and FIG. 2 is an exploded perspective view schematically showing a part of the catalytic metal support apparatus of FIG.

1 and 2, the catalytic metal supporting apparatus 1 according to the present embodiment is for supporting the catalytic metal film 200 stably in the CVD chamber, and includes a base portion 100, a plurality of supporting bars 130, and a plurality of spacers 300. Meanwhile, the catalytic metal film 200 used in the present embodiment serves as a catalyst in the synthesis of graphene by a chemical vapor deposition (CVD) process. The catalyst metal film 200 is composed of iron (Fe), nickel (Ni), cobalt (Co) (Ir), gold (Au), aluminum (Al), chromium (Cr), copper (Cu), magnesium (Mg), manganese (Mn), silicon (Si), titanium (Ti) or rubidium Or at least a part of the material. In this embodiment, a copper thin plate is used as the catalytic metal film 200, for example.

The base portion 100 is for supporting the support bar 130 and is fixedly installed in the CVD chamber. The base part 100 includes a chamber coupling part 110 and a support bar installation part 120.

The chamber engaging portion 110 is engaged with the CVD chamber so that the catalytic metal support apparatus 1 can be stably positioned in the CVD chamber. The coupling between the chamber coupling part 110 and the CVD chamber may be made by various types of mechanical coupling such as a screw coupling, a fitting coupling, and the like. An interface for transmitting and receiving an electrical signal is provided to the CVD chamber so that the catalytic metal support apparatus 1 can exchange electrical signals with the outside of the chamber, and the chamber coupling unit 110 is electrically coupled to the interface .

The supporting bar mounting portion 120 is a portion to which a plurality of supporting bars 130 are coupled and has a plate-like shape. The supporting bar mounting portion 120 is coupled to the chamber coupling portion 110 and is disposed so as to protrude in one direction from the chamber coupling portion 110. A plurality of temperature sensors 140 may be mounted on the support bar mounting portion 120. The data measured at the temperature sensor 140 may be transmitted to the outside of the CVD chamber through an electrical interface provided in the CVD chamber.

In the present embodiment, a plurality of temperature sensors 140 are mounted on the support bar mounting portion 120, but the present invention is not limited thereto. That is, according to the present invention, the temperature sensor may be installed in the chamber coupling part 110.

The support bar 130 is coupled to the support bar mount 120 of the base 100 and is disposed to protrude from both sides of the support bar mount 120. At least a part of the outer peripheral surface of each support bar 130 may be formed with a screw. The plurality of support bars 130 are disposed corresponding to the holes 201 and 202 formed in the catalyst metal film 200 so that the catalyst metal film 200 can be fitted into the support bar 130. On the other hand, holes 202 formed on both sides of the holes formed in the catalytic metal film 200 may be formed larger than holes 201 located in the center of the supporting bar mounting portion 120, This is to prevent curvature from being formed even if the catalytic metal film 200 is subjected to thermal expansion in the CVD chamber.

The spacer 300 is disposed between the catalyst metal film 200 and the catalyst metal film 200 and between the catalyst metal film 200 and the support bar installation portion 120 of the base portion 100, Can prevent the catalytic metal film 200 from contacting with the base portion 100. The spacer 300 may be threaded on the inner surface of the inner hole so that the spacer 300 can be screwed onto the support bar 130. The spacer 300 may be disposed between the catalyst metal films 200 by being sandwiched between the catalyst metal films 200 and the support bars 130.

Next, a description will be given of a graphene multifiber composite apparatus 10 having a catalyst metal support apparatus 1 of the present embodiment.

FIG. 3 is a schematic view of a graphene multifiber composite apparatus 10 having the catalytic metal support apparatus 1 of FIG.

3, the graphene composite apparatus 10 of the present embodiment includes a CVD chamber 400, a catalytic metal support apparatus 1 of FIG. 1, a susceptor 600, and a heating source 500 do.

The CVD chamber 400 has a space therein and includes a gas injection unit 410 and a gas discharge unit 420. A source gas (G) for the synthesis of graphene, for example, a mixed gas of argon, hydrogen, and methane is injected into the gas injection unit 410 of the CVD chamber 400. The gas injecting part 410 is provided on the side of the catalytic metal supporting device 1 so as to allow the raw material gas G to pass between the catalytic metal films 200 provided on the catalytic metal supporting device 1, . The gas outflow portion 420 may be formed in the catalytic metal support apparatus 1 so that the raw gas G injected into the CVD chamber 400 may escape from the CVD chamber 400 after contacting the catalytic metal film 200. [ May be located on the opposite side of the gas injection unit 410.

The catalytic metal support apparatus 1 is disposed inside the CVD chamber 400 and its base unit 100 is fixed in position by being coupled with the CVD chamber 400. Therefore, the catalyst metal supporting apparatus 1 can stably maintain its position even when the raw material gas G is injected. The configuration of the catalytic metal support apparatus 1 is as described above.

The susceptor 600 is disposed on both sides of the catalytic metal supporting apparatus 1 and transfers heat generated in the heating source 500 to the catalytic metal support apparatus. The susceptor 600 may be formed in a plane so that heat generated in the heating source 500 can be uniformly propagated spatially. That is, the space between the susceptors 600 is uniformly heated as a whole, and the catalytic metal films 200 disposed therebetween can be uniformly heated evenly.

 The heating source 500 is for heating the inside of the CVD chamber 400 and may be for heating the inside of the CVD chamber 400 by emitting radiant heat using electric energy. The heating source 500 can heat the CVD chamber 400 to 1000 degrees Celsius or more so that graphene can be synthesized on the surface of the catalyst metal film 200. [ The heat generated in the heating source 500 is transmitted to the catalytic metal support 1 via the susceptor 600 so that a specific portion of the CVD chamber 400 is prevented from being intensively heated and the inside of the CVD chamber 400 is heated So that it can be uniformly heated as a whole.

Next, a method of synthesizing graphene complexes according to another aspect of the present invention will be described by using the above-described graphene composite synthesis apparatus.

4 is a flow chart schematically illustrating a method of synthesizing graphene fibers according to an aspect of the present invention.

Referring to FIG. 4, the method of synthesizing graphene in the present embodiment includes a step (S10) of arranging a plurality of catalyst metal films 200 in parallel, a step of forming a spacer 300 between the plurality of catalyst metal films 200 A step S30 of heating the inside of the CVD chamber 400 and a step S40 of injecting the source gas G into the CVD chamber 400. The step S30 includes the steps of:

Step S10 of arranging the plurality of catalytic metal films 200 in parallel is a step of installing a plurality of catalytic metal films 200 on the supporting bar 130 of the catalytic metal supporting apparatus 1 described above. The process of disposing the plurality of catalytic metal films 200 in the CVD chamber 400 may be performed by placing the catalytic metal supporting apparatus 1 inside the CVD chamber 400 and then placing the catalytic metal film 200 thereon Or the catalytic metal film 200 may be installed outside the CVD chamber 400 on the catalytic metal support apparatus 1 and then the catalytic metal support apparatus 1 provided with the catalytic metal film 200 may be placed in the CVD chamber 400). ≪ / RTI >

The step S20 of placing the spacers 300 between the plurality of catalyst metal films 200 is a step of disposing the spacers 300 between the plurality of catalyst metal films 200, 200) in parallel (S10). That is, this step may be performed by installing a plurality of catalyst metal films 200 on the catalyst metal support apparatus while installing the spacers 300 between the catalyst metal films 200.

Meanwhile, in the present embodiment, the step S20 of arranging the spacers 300 is performed simultaneously with the step (S10) of arranging the plurality of catalyst metal films 200 in parallel, The placing step S20 may be performed after the plurality of catalytic metal films 200 are installed in the catalytic metal supporting apparatus 1. [ For example, if the spacer 300 is formed in a C-shape and is capable of side-approach engagement with the supporting bar 130, a plurality of catalytic metal films 200 may be installed parallel to the catalytic metal support apparatus 1, The spacer 300 may be positioned between the catalytic metal films 200 in such a manner that the spacer 300 is laterally joined to the supporting bar 130 between the catalytic metal films 200. [

The step S30 of heating the inside of the CVD chamber 400 may be performed by operating the heating source 500 in a state where the catalytic metal supporting apparatus 1 provided with the catalytic metal film 200 is disposed inside the CVD chamber 400 Thereby raising the interior of the CVD chamber 400 to the graphene synthesis temperature.

The step of injecting the raw material gas into the CVD chamber (S40) is a step of injecting the raw material gas (G) for synthesis of graphene into the CVD chamber 400 having the high temperature environment. The injected raw material gas G flows into the space between the catalytic metal films 200 provided in the catalytic metal supporting apparatus 1 and is brought into contact with the surface of the catalytic metallic film 200 to cause a chemical reaction. Thus, a thin film of graphene is synthesized on the surface of the catalyst metal film 200. The gas after the graphene synthesis reaction flows out of the CVD chamber 400 through the gas outflow portion 420. The step S40 of injecting the raw material gas into the CVD chamber may be performed after or simultaneously with the step S30 of heating the inside of the CVD chamber 400 depending on the situation.

By performing the above steps, thin film type graphenes can be synthesized on both surfaces of each catalytic metal film 200 provided in the catalytic metal supporting apparatus 1. [ That is, multiple graphens can be simultaneously synthesized through a single chemical vapor deposition process.

In order to actually confirm the effect of the graphene synthesis method according to the above-described method, the present applicant conducted a test to measure the sheet resistance of the graphene analyzed and the synthesized graphene. In the test by the present applicant, four catalyst metal films 200 in total were placed on both sides of the support bar mounting portion 120 of the base portion 100 of the above-described catalytic metal supporting apparatus 1, Process.

FIGS. 5A and 5B show the results of Raman analysis, wherein 5a is the Raman analysis result of the two catalyst metal films 200 disposed on the left side with respect to the base part 100, 100 of the two catalyst metal films 200 disposed on the right side with respect to the center of the catalyst metal film 200. According to the Raman analysis results of FIGS. 5A and 5B, it can be seen that a single layer thickness of graphene was successfully formed on both sides of a total of four catalyst metal films 200.

Figs. 6A to 6D and Figs. 7A to 7D show sheet resistance values of the graphenes synthesized, respectively. More specifically, FIGS. 6A and 6B show sheet resistance values of graphene formed on one surface and the other surface of the catalyst metal film 200 disposed at the left edge around the base portion 100, respectively. FIGS. And 6d show sheet resistance values of graphene formed on one surface and the other surface of the catalyst metal film 200 disposed on the left side adjacent to the base portion 100, respectively. 7A and 7B show the sheet resistance values of graphene formed on one surface and the other surface of the catalytic metal film 200 arranged on the right edge around the base portion 100, And surface resistance values of graphene formed on one surface and the other surface of the catalyst metal film 200 disposed on the right side adjacent to the base portion 100, respectively.

Referring to Figs. 6A to 6D and Figs. 7A to 7D, it can be seen that graphene synthesized on both sides of a total of four catalyst metal films 200 has excellent sheet resistance characteristics. This is because the gap between the catalytic metal films 200 is stably maintained by the catalytic metal supporting apparatus 1 of this embodiment. That is, since the catalytic metal film 200 is not in contact with each other despite the flow of the raw material gas G and the thermal expansion of the catalytic metal film 200, graphene is uniformly formed on the surface of the catalytic metal film 200 You can.

 6A to 6D, the graphene synthesized on the catalyst metal film 200 on the left side of the base 100 has a slight variation in the sheet resistance value. However, the graphene synthesized on the catalyst metal film 200 on the left side of the base 100, The deviation of the sheet resistance value of the graphene synthesized in the catalyst metal film 200 on the left side of the base part 100 is not affected by the handling of the catalyst metal film 200 It is understood that this is merely a deviation of the sheet resistance due to the creep and the like.

Next, a catalyst metal supporting apparatus according to another embodiment of the present invention will be described.

8 is a schematic exploded perspective view of a catalytic metal support apparatus according to another embodiment of the present invention.

8, the catalytic metal support apparatus 2 of the present embodiment also includes a base portion 100, a plurality of support bars 130, and a plurality of spacers 301 and 302. The base portion 101, the support bar 130 and the spacers 301 and 302 of the present embodiment function as the base portion 100, the support bar 130 and the spacer 300 of the catalytic metal support apparatus 1 of FIG. Because roles are similar, the overlapping description is omitted and the difference is emphasized.

The base portion 101 includes a chamber coupling portion 111 and a support bar installation portion 121. The chamber coupling portion 111 is a portion coupled to the CVD chamber, and a plurality of temperature sensors 140 can be disposed. The supporting bar mounting portion 121 is coupled to the chamber coupling portion 111 and has a vertically separated shape. Since the supporting bar mounting portion 121 is vertically separated, the raw gas can be more easily flowed into the space between the catalytic metal films 200 on both sides adjacent to the supporting bar mounting portion 121.

In this embodiment, a plurality of temperature sensors 140 are attached to the chamber coupling portion 111, but the present invention is not limited thereto. That is, according to the present invention, the temperature sensor may be installed in the support bar mounting portion 120.

The plurality of support bars 130 are disposed to protrude from both sides of the support bar installation part 121, and the screws 132 may be formed only on the end sides thereof. According to the present embodiment, a screw is formed only on the end side of the support bar 130, but the present invention is not limited thereto. That is, according to the present invention, a screw may be formed on part or all of the support bar 130.

The spacers 301 and 302 have a frame spacer 301 and a spacer 302.

The frame spacer 301 has a through hole 3011 formed at the center thereof and has a shape corresponding to the edge of the catalytic metal film 200. A plurality of holes are formed at the edge of the frame spacer 301, and the support bar 130 is fitted in the hole. The frame spacer 301 is disposed between the catalytic metal film 200 and between the catalytic metal film 200 and the supporting bar mounting portion 121 of the base portion 101. [ Therefore, the neighboring catalyst metal films 200 face each other through the through holes 3011 of the frame spacer 301.

The spacer 302 is disposed between the frame spacer 301 and the catalyst metal film 200 and between the frame spacer 301 and the support bar mounting portion 121 of the base portion 101, Respectively. Thus, since the spacers 302 are disposed between the frame spacers 301, the neighboring frame spacers 301 are spaced from each other.

Since the frame spacer 301 having the shape corresponding to the edge of the catalytic metal film 200 is disposed between the catalytic metal films 200, the mutual contact of the catalytic metal films can be more effectively blocked.

The catalytic metal support apparatus 2 of the present embodiment can also be employed in the graphene composite synthesis apparatus. Fig. 9 is a view schematically showing only a part of the configuration of the graphene slurry synthesizing apparatus having the above-described metal supporting apparatus 2 except for the CVD chamber and the heating source. The CVD chamber and the heating source are substantially the same as those of the graphene composite synthesis apparatus 10 of FIG. 3, so that a duplicate description thereof will be omitted.

Referring to FIG. 9, the space between the spaced frame spacers 301 becomes a space through which the source gas G can flow in the chemical vapor deposition process. The space between the frame spacers 301 is in contact with the catalytic metal film 200 so that the raw material gas G can smoothly contact the surface of the catalytic metal film 200. Therefore, graphene can be smoothly synthesized on both surfaces of each catalytic metal film 200 even in the graphene composite synthesizing apparatus of this embodiment.

Meanwhile, the frame spacer 301 can be modified into various shapes. 10 schematically shows an example of a modified form of the frame spacer. As shown in FIG. 10, the frame spacer 303 is not in a form to be fitted to the support bar 130, but on the upper side of the support bar 130 It may be formed in a form in which it is placed. That is, the upper side of the through hole 3031 may be placed on the support bar 130, and the lower side of the frame spacer 303 may be placed on the support bar 130. At this time, a groove corresponding to the support bar 130 of the frame spacer 303 may be formed and the support bar 130 may be fitted. In this case, the frame spacer 303 can be stably held in position without swinging with respect to the support bar 130.

Next, a catalyst metal supporting apparatus according to another embodiment of the present invention will be described.

11 is a perspective view schematically showing a catalytic metal supporting apparatus 3 according to another embodiment of the present invention. Referring to Fig. 11, the catalytic metal support apparatus 3 of this embodiment includes a base portion 101 and a frame 305. Fig.

The base portion 101 is substantially similar to the base portion 101 of the catalytic metal support apparatus 2 of Fig. 8, so that a duplicate description thereof will be omitted. However, in the case of the base portion 101 of the present embodiment, the temperature sensor 142 is disposed in the chamber coupling portion 111 so as to protrude to a position corresponding to the center portion of the catalytic metal film 200. When the temperature sensor is disposed as described above, the temperature of the central portion of the catalytic metal film 200 can be measured more effectively. According to the present embodiment, the temperature sensor 142 is provided in the chamber coupling portion 111, but the present invention is not limited thereto. That is, according to the present invention, the temperature sensor 142 may be installed in the support bar mounting portion 121.

The frame 305 has a through space on the inside. A plurality of protrusions 3052 projecting in the longitudinal direction of the support bar 130 are formed on the front and rear surfaces of the frame 305. A coupling hole is formed in the protrusions 3052 so that the support bars 130 can be inserted into the protrusions 3052 have. That is, the frame 305 is attached to the support bar 130 by fitting the protrusion 3052 to the support bar 130, and the portion other than the protrusion 3052 of the frames 305 adjacent to each other by the protrusion 3052 They are separated from each other.

A catalytic metal film (200) is disposed in the through space in the middle of the frame (305). At this time, the catalyst metal film 200 is fixed to the frame 305 using the fixing member 3054 so as to support the catalyst metal film 200 to be disposed in the through space of the frame 305. The fixing member may be any member that can stably bond the catalytic metal film 200 and the frame 305 even in a high-temperature CVD chamber environment. For example, a copper wire may be used as the fixing member 3054, and it may be to fit the catalytic metal film 200 to the frame 305 while being fitted into the hole 201 of the catalytic metal film 200.

The plurality of support bars 130 are arranged to protrude from both sides of the support bar installation part 121, and a screw may be formed only on the end side. According to the present embodiment, a screw is formed only on the end side of the support bar 130, but the present invention is not limited thereto. That is, according to the present invention, a screw may be formed on part or all of the support bar 130.

When a plurality of frames 305 provided with the catalytic metal film 200 are prepared, they are successively fitted to the support bar 130. The nut 3056 may be coupled to the end of the support bar 130 to prevent the frame 305 from being detached from the support bar 130.

The catalytic metal support apparatus 3 of the present embodiment can also be employed in a graphene multimode synthesis apparatus. Fig. 12 schematically shows only a part of the configuration of the graphene slurry synthesizing apparatus having the catalytic metal support apparatus 3 of Fig. 11 except for the CVD chamber and the heating source. Since the CVD chamber and the heating source are substantially the same as those in FIG. 3, a description thereof will be omitted.

Referring to Fig. 12, each of the frames 305 is spaced apart from each other by the protruding portions 3052 thereof. In addition, since the catalytic metal film 200 is disposed in the through space inside each frame 305, the respective catalytic metal films 200 are also separated from each other. The raw material gas G may flow into the space between the respective catalytic metal films 200. Therefore, the raw material gas G can smoothly contact both surfaces of each catalytic metal film 200. Therefore, when the chemical vapor deposition method is performed using the graphene composite apparatus of this embodiment, graphene can be effectively synthesized on both sides of each catalytic metal film 200.

FIG. 13 is a flowchart schematically showing a graphene duplex synthesizing method according to an aspect of the present invention, wherein the graphene multiplex synthesizing apparatus described above can be used. Referring to FIG. 13, a method of synthesizing graphene fibers according to an aspect of the present invention includes a step (S11) of installing a catalyst metal film 200 on a frame 305, a step of arranging a plurality of frames 305 in parallel (S21) of heating the inside of the CVD chamber, a step (S30) of heating the inside of the CVD chamber, and a step (S40) of injecting the source gas into the CVD chamber.

In the step S11 of installing the catalytic metal film 200 on the frame, the catalytic metal film 200 is disposed in the through space of the frame 305 and the catalytic metal film 200 and the frame 305 are fixed with the fixing member 3054. [ Respectively. By repeating this operation for the plurality of frames 305, the catalytic metal film 200 is coupled to each of the plurality of frames 305.

The step S21 of arranging the plurality of frames 305 in parallel in the CVD chamber is performed by joining the plurality of frames 305 coupled with the catalytic metal film 200 to the support bars 130 of the base portion 101 And placing a catalytic metal support apparatus in the CVD chamber. At this time, a plurality of frames 305 coupled to the support bars 130 of the base portion 101 are arranged in parallel to each other, and portions other than the projecting portions 3052 are mutually spaced.

The step of heating the inside of the CVD chamber (S30) and the step of injecting the raw material gas (S40) into the CVD chamber are performed by heating the catalyst metal support apparatus disposed inside the CVD chamber and spraying the raw gas into the catalyst metal support apparatus So that graphene is synthesized on the surface of the combined catalytic metal film 200. Since the spacing space is formed between each frame, the raw material gas flows between the frames, and the graphene is smoothly contacted with the catalyst metal film 200.

Applicants have conducted a Raman analysis and a test to measure the sheet resistance of the synthesized graphene in order to actually confirm the effect of the graphene shortage synthesis method according to the above-mentioned method. In the test by the present applicant, four catalyst metal films 200 in total were disposed on both sides of the support bar mounting portion 121 of the base portion 101 of the catalyst metal support apparatus 3, Process.

Figs. 14A and 14B show the results of Raman analysis, where 14a is the Raman analysis result of the two catalyst metal films 200 disposed on the left side with respect to the base portion 101, Fig. 101 of the two catalyst metal films 200 disposed on the right side with respect to each other. According to the Raman analysis results of FIGS. 14A and 14B, it can be seen that a single layer thickness of graphene was successfully formed on both sides of a total of four catalyst metal films 200.

Figs. 15A and 15B and Figs. 16A and 16B show the sheet resistance values of the synthesized graphene. More specifically, FIG. 15A shows the sheet resistance values of graphene formed on one surface of the catalyst metal film 200 disposed at the left edge with respect to the base portion 101, FIG. 15B shows sheet resistance values And the surface resistance of graphene formed on one surface of the catalyst metal film 200 disposed on the left side. 16A shows the sheet resistance value of graphene formed on one surface of the catalytic metal film 200 disposed on the right edge with respect to the base portion 101. Fig. And the surface resistance of graphene formed on one surface of the disposed catalyst metal film 200. On the other hand, since the characteristics of graphene formed on both surfaces of each catalytic metal film 200 have very similar values, the measurement results are described only for the graphene on one surface of each catalytic metal film 200.

The mean, standard deviation, minimum and maximum values of the sheet resistance values of the graphene synthesized on the surface of the catalyst metal film 200 were also determined.

Left outskirt Left medial side Right medial side Right outline Average sheet resistance (Ohm / sq.) 297 382 343 376 Standard Deviation (%) 9.4 16.5 5.3 14.2 Minimum value (Ohm / sq.) 115 313 308 311 Maximum value (Ohm / sq.) 368 566 380 612

As a result of the sheet resistance measurement, graphene was found to have relatively uniform quality at an average of 300 ~ 380 Ohm / sq. (STDEV 5 ~ 15%) in all four sheets.

That is, according to the graphene multiple synthesis method of this embodiment, it is understood that several graphenes can be effectively synthesized. This is because the frame 305 stably supports the catalytic metal films 200 so as to be spaced apart from each other, thereby effectively preventing the catalytic metal film 200 from being deformed or sticking to each other.

On the other hand, the frame 305 of the above-described catalyst metal supporting apparatus 3 may be configured in a different form. Fig. 17 is a view schematically showing another example of the frame of the catalytic metal support apparatus 3. Fig. The frame 307 shown in Fig. 17 has a plurality of hinge members 3072 and 3076 for coupling the frame 307 and the catalytic metal film 200 together.

The hinge members 3072 and 3076 are disposed on the upper side and the lower side of the frame 307 and each of them is hinged to the frame 307 and the other side 3074 is connected to the hole 3074 formed in the catalytic metal film 200 (201).

The position of the hinge portion 3073 of the pair of hinge members 3072 positioned on the upper side of the frame 307 is set to be shorter than the position of the hinge member 3072 on the upper side of the frame 307, Is disposed outside the position of the hole (201) of the housing (200). The pair of hinge members 3072 positioned on the upper side of the frame 307 are located outside the positions of the holes 201 of the catalytic metal film 200 so that the hinge portions 3073 hinged to the frame 307 . The hinge member 3072 on the upper side of the frame 307 is subjected to a force in the direction in which the end portion 3074 fitted to the hole 201 of the catalytic metal film 200 is opened by its own weight, .

The position of the hinge portion 3077 of the pair of hinge members 3076 located below the frame 307 is determined by the position of the hinge member 3076 And is disposed inside the position of the hole 201 of the metal film 200. That is, the pair of hinge members 3076 located below the frame 307 are located inside the positions of the holes 201 of the catalytic metal film 200, the hinge portions 3077 hinged to the frame 307 . The hinge member 3076 on the lower side of the frame 307 is subjected to a force in the direction in which the end portion 3078 fitted in the hole 201 of the catalytic metal film 200 is opened by the self weight, .

Since the hinge members 3072 and 3076 are gravitated in the direction in which the hinge members 3072 and 3076 are spread outward, that is, in the direction in which the catalyst metal film 200 is stretched, when the catalyst metal film 200 is thermally expanded in the high temperature CVD chamber, It is effectively spread out. Therefore, the phenomenon that the catalyst metal film 200 is thermally expanded and bending or wrinkling can be effectively suppressed. Therefore, in the chemical vapor deposition process, the flatness of the catalytic metal film 200 is effectively maintained, and the graphene synthesized on the surface thereof can be uniformly formed.

The left and right hinge members 3072 and 3076 are all hinged to the frame 307 but one of the left and right hinge members 3072 and 3076 is fixed to the frame and the other frame 307 is hinged to the frame 307, It may be combined.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments.

1,2,3,4 ... Catalytic metal support device 10,20 ... Graphene composite device
100, 101 ... base portion 130 ... support bar
200 ... Catalyst metal film 300 ... Spacer
400 ... CVD chamber 500 ... heating source
600 ... Susceptor G ... Raw gas

Claims (8)

A chamber coupling portion for coupling with the chemical vapor deposition chamber;
A support bar installation part installed in the chamber connection part and arranged to protrude from the chamber connection part in one direction;
A plurality of support bars installed on the support bar mounting portions and disposed to protrude from both sides of the support bar mounting portions;
A plurality of catalyst metal films each having a plurality of holes formed in the support bar; And
And a plurality of spacers disposed on at least one of the catalyst metal film and the support bar mounting portion and between the catalyst metal films and having holes formed in the support bar, Device. The method according to claim 1,
Wherein the supporting bar mounting portion has a vertically separated shape. The method according to claim 1,
Wherein the holes located on both sides of the holes formed in the catalyst metal film are formed to be larger than the hole located at the center, with reference to the projecting direction of the support bar mounting portion. The method according to claim 1,
Further comprising a plurality of frame spacers disposed at least at any one of between the catalyst metal film and the support bar mounting portion and between the catalyst metal films and having holes formed in the support bar, Supporting device. 5. The method of claim 4,
The frame spacer has a through hole formed in the center thereof,
And the neighboring catalyst metal films are arranged to face each other through the through holes. A chamber coupling portion for coupling with the chemical vapor deposition chamber;
A support bar installation part installed in the chamber connection part and arranged to protrude from the chamber connection part in one direction;
A plurality of support bars installed on the support bar mounting portions and disposed to protrude from both sides of the support bar mounting portions;
A frame having a plurality of protrusions protruding in the longitudinal direction of the support bar and having a through hole formed in the support bar;
A catalytic metal film disposed in a through space of the frame; And
And a fixing member for supporting the catalytic metal film so as to be disposed in the through space of the frame. The method according to claim 6,
Wherein the supporting bar mounting portion has a vertically separated shape. A chamber coupling portion for coupling with the chemical vapor deposition chamber;
A support bar installation part installed in the chamber connection part and arranged to protrude from the chamber connection part in one direction;
A plurality of support bars installed on the support bar mounting portions and disposed to protrude from both sides of the support bar mounting portions;
A frame having a coupling hole formed in the support bar and having a through space formed therein;
A catalyst metal film disposed in the through-hole of the frame and having a plurality of holes formed therein; And
And a plurality of hinge members that are hinged to one side of the frame by a hinge portion and the other side of which is installed in an opening of the catalytic metal film and receive gravity in a direction to expose the catalytic metal film,
Wherein a position of the hinge portion of the pair of hinge members located on the upper side of the frame is located outside the position of the hole of the catalytic metal film on which the other side of the pair of hinge members located on the upper side of the frame is provided,
Wherein a position of the hinge portion of the pair of hinge members located below the frame is determined by graphen slurry synthesis which is disposed inside the position of the hole of the catalyst metal film on which the other side of the pair of hinge members located on the lower side of the frame is provided, / RTI >

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