KR101834015B1 - 하이브리드 수직공진 레이저 - Google Patents

하이브리드 수직공진 레이저 Download PDF

Info

Publication number
KR101834015B1
KR101834015B1 KR1020117020785A KR20117020785A KR101834015B1 KR 101834015 B1 KR101834015 B1 KR 101834015B1 KR 1020117020785 A KR1020117020785 A KR 1020117020785A KR 20117020785 A KR20117020785 A KR 20117020785A KR 101834015 B1 KR101834015 B1 KR 101834015B1
Authority
KR
South Korea
Prior art keywords
layer
diffraction grating
refractive index
silicon
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020117020785A
Other languages
English (en)
Korean (ko)
Other versions
KR20110126661A (ko
Inventor
정일석
Original Assignee
덴마크스 텍니스케 유니버시테트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 덴마크스 텍니스케 유니버시테트 filed Critical 덴마크스 텍니스케 유니버시테트
Publication of KR20110126661A publication Critical patent/KR20110126661A/ko
Application granted granted Critical
Publication of KR101834015B1 publication Critical patent/KR101834015B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18361Structure of the reflectors, e.g. hybrid mirrors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/0206Substrates, e.g. growth, shape, material, removal or bonding
    • H01S5/0215Bonding to the substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1028Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
    • H01S5/1032Coupling to elements comprising an optical axis that is not aligned with the optical axis of the active region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/11Comprising a photonic bandgap structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18341Intra-cavity contacts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18386Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/0206Substrates, e.g. growth, shape, material, removal or bonding
    • H01S5/021Silicon based substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/026Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H01S5/18311Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18361Structure of the reflectors, e.g. hybrid mirrors
    • H01S5/18363Structure of the reflectors, e.g. hybrid mirrors comprising air layers
    • H01S5/18366Membrane DBR, i.e. a movable DBR on top of the VCSEL
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18361Structure of the reflectors, e.g. hybrid mirrors
    • H01S5/1838Reflector bonded by wafer fusion or by an intermediate compound
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/305Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
    • H01S5/3095Tunnel junction

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)
  • Semiconductor Lasers (AREA)
KR1020117020785A 2009-02-11 2010-01-22 하이브리드 수직공진 레이저 Expired - Fee Related KR101834015B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US15163109P 2009-02-11 2009-02-11
US61/151,631 2009-02-11
EP09153659.9 2009-02-25
EP09153659 2009-02-25
PCT/DK2010/050015 WO2010091688A1 (en) 2009-02-11 2010-01-22 Hybrid vertical-cavity laser

Publications (2)

Publication Number Publication Date
KR20110126661A KR20110126661A (ko) 2011-11-23
KR101834015B1 true KR101834015B1 (ko) 2018-04-13

Family

ID=40580884

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117020785A Expired - Fee Related KR101834015B1 (ko) 2009-02-11 2010-01-22 하이브리드 수직공진 레이저

Country Status (7)

Country Link
US (1) US9184562B2 (enExample)
EP (1) EP2396861B1 (enExample)
JP (1) JP2012517705A (enExample)
KR (1) KR101834015B1 (enExample)
CN (1) CN102388513B (enExample)
AU (1) AU2010213223A1 (enExample)
WO (1) WO2010091688A1 (enExample)

Families Citing this family (63)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8217410B2 (en) * 2009-03-27 2012-07-10 Wisconsin Alumni Research Foundation Hybrid vertical cavity light emitting sources
FR2954638B1 (fr) * 2009-12-21 2012-03-23 Commissariat Energie Atomique Laser hybride couple a un guide d'onde
US8725001B2 (en) * 2010-03-10 2014-05-13 Ofs Fitel, Llc Multicore fiber transmission systems and methods
JP5777722B2 (ja) * 2010-10-29 2015-09-09 ヒューレット−パッカード デベロップメント カンパニー エル.ピー.Hewlett‐Packard Development Company, L.P. 小モード体積垂直共振器面発光レーザ
WO2012149497A2 (en) * 2011-04-29 2012-11-01 The Regents Of The University Of California Vertical cavity surface emitting lasers with silicon-on-insulator high contrast grating
WO2013004241A1 (en) * 2011-07-04 2013-01-10 Danmarks Tekniske Universitet Laser device
KR20130048628A (ko) 2011-11-02 2013-05-10 삼성전자주식회사 광 직접 회로의 멀티 포트 광원
KR20140113911A (ko) * 2012-01-18 2014-09-25 휴렛-팩커드 디벨롭먼트 컴퍼니, 엘.피. 고밀도 레이저 광학장치
KR20130085763A (ko) * 2012-01-20 2013-07-30 삼성전자주식회사 광 집적 회로용 혼성 레이저 광원
WO2013110004A1 (en) * 2012-01-20 2013-07-25 The Regents Of The University Of California Short cavity surface emitting laser with double high contrast gratings with and without airgap
CN102692682B (zh) * 2012-06-12 2013-07-17 中国科学院上海微系统与信息技术研究所 一种光栅耦合器及其制作方法
KR20150037863A (ko) * 2012-07-30 2015-04-08 휴렛-팩커드 디벨롭먼트 컴퍼니, 엘.피. 소형 포토닉 플랫폼
US10209445B2 (en) 2012-07-30 2019-02-19 Hewlett Packard Enterprise Development Lp Method of fabricating a compact photonics platform
KR101928436B1 (ko) 2012-10-10 2019-02-26 삼성전자주식회사 광 집적 회로용 하이브리드 수직 공명 레이저
US9106048B2 (en) * 2013-02-11 2015-08-11 Oracle International Corporation Waveguide-coupled vertical cavity laser
KR102050502B1 (ko) * 2013-03-18 2020-01-08 삼성전자주식회사 하이브리드 수직 공진 레이저 및 그 제조방법
TW201504599A (zh) * 2013-05-30 2015-02-01 Univ California 具有高對比光柵及可作爲雙重用途之高對比光柵垂直腔表面發射雷射檢測器之二維週期結構的極化無關光檢測器
US9438009B2 (en) 2013-05-31 2016-09-06 Danmarks Tekniske Universitet Wavelength tunable photon source with sealed inner volume
FR3007589B1 (fr) 2013-06-24 2015-07-24 St Microelectronics Crolles 2 Circuit integre photonique et procede de fabrication
EP3069420B1 (en) * 2013-11-13 2017-10-04 Danmarks Tekniske Universitet Method for generating a compressed optical pulse
CN103633551B (zh) * 2013-12-19 2016-04-20 武汉电信器件有限公司 用于片上光互连的激光器封装方法
JP2015133426A (ja) * 2014-01-14 2015-07-23 古河電気工業株式会社 面発光レーザ素子
WO2015155188A2 (en) * 2014-04-07 2015-10-15 Danmarks Tekniske Universitet Vcsel structure
WO2015167521A1 (en) * 2014-04-30 2015-11-05 Hewlett-Packard Development Company, L.P. Controllable diamond waveguide tuner
CN104051957A (zh) * 2014-06-23 2014-09-17 天津工业大学 一种1550nm长波长垂直腔面发射激光器的制备方法及其应用
US10069274B2 (en) 2014-07-25 2018-09-04 Hewlett Packard Enterprise Development Lp Tunable optical device
US10366883B2 (en) 2014-07-30 2019-07-30 Hewlett Packard Enterprise Development Lp Hybrid multilayer device
WO2016048268A1 (en) 2014-09-22 2016-03-31 Hewlett Packard Enterprise Development Lp Single mode vertical-cavity surface-emitting laser
US10447011B2 (en) 2014-09-22 2019-10-15 Hewlett Packard Enterprise Development Lp Single mode vertical-cavity surface-emitting laser
GB201418637D0 (en) 2014-10-20 2014-12-03 Univ St Andrews Laser
WO2016076793A1 (en) * 2014-11-10 2016-05-19 Agency for Science,Technology and Research An optical device and a method for fabricating thereof
JP6581022B2 (ja) * 2015-03-20 2019-09-25 株式会社東芝 半導体発光デバイスおよび光半導体デバイス
US10103514B2 (en) * 2015-03-20 2018-10-16 Kabushiki Kaisha Toshiba Optical semiconductor device and method for manufacturing the same
WO2016184471A1 (en) 2015-05-15 2016-11-24 Danmarks Tekniske Universitet Vertical cavity laser
US9874693B2 (en) 2015-06-10 2018-01-23 The Research Foundation For The State University Of New York Method and structure for integrating photonics with CMOs
WO2017039674A1 (en) 2015-09-03 2017-03-09 Hewlett Packard Enterprise Development Lp Defect free heterogeneous substrates
US10586847B2 (en) 2016-01-15 2020-03-10 Hewlett Packard Enterprise Development Lp Multilayer device
WO2017171737A1 (en) 2016-03-30 2017-10-05 Hewlett Packard Enterprise Development Lp Devices having substrates with selective airgap regions
US10109983B2 (en) * 2016-04-28 2018-10-23 Hewlett Packard Enterprise Development Lp Devices with quantum dots
US10566765B2 (en) 2016-10-27 2020-02-18 Hewlett Packard Enterprise Development Lp Multi-wavelength semiconductor lasers
US10680407B2 (en) 2017-04-10 2020-06-09 Hewlett Packard Enterprise Development Lp Multi-wavelength semiconductor comb lasers
US10396521B2 (en) 2017-09-29 2019-08-27 Hewlett Packard Enterprise Development Lp Laser
US10381801B1 (en) 2018-04-26 2019-08-13 Hewlett Packard Enterprise Development Lp Device including structure over airgap
US10541214B2 (en) * 2018-04-27 2020-01-21 Juniper Networks, Inc. Enhanced bonding between III-V material and oxide material
CN108683078B (zh) * 2018-06-21 2023-06-09 中国科学院福建物质结构研究所 一种波长可调谐的半导体激光器
JP2020047783A (ja) * 2018-09-19 2020-03-26 株式会社東芝 半導体発光デバイスの製造方法及び半導体発光デバイス
JP7166871B2 (ja) * 2018-10-18 2022-11-08 スタンレー電気株式会社 垂直共振器型発光素子
JP7190865B2 (ja) 2018-10-18 2022-12-16 スタンレー電気株式会社 垂直共振器型発光素子
CN111435781B (zh) * 2019-01-15 2022-03-18 中国科学院半导体研究所 垂直腔面发射半导体激光器结构
CN110265871A (zh) * 2019-07-02 2019-09-20 深圳市柠檬光子科技有限公司 用于激光雷达的激光发射模组
FR3101442B1 (fr) * 2019-09-27 2022-04-22 Commissariat Energie Atomique Miroir de Bragg et procédé de réalisation d’un miroir de Bragg
CN110932091B (zh) * 2019-12-06 2020-10-09 北京大学 一种基于能带反转光场限制效应的拓扑体态激光器及方法
CN111106533A (zh) * 2019-12-21 2020-05-05 江西德瑞光电技术有限责任公司 一种vcsel芯片及其制造方法
US11243350B2 (en) * 2020-03-12 2022-02-08 Globalfoundries U.S. Inc. Photonic devices integrated with reflectors
CN111600198B (zh) * 2020-05-26 2021-05-04 陕西源杰半导体科技股份有限公司 一种通讯用超大功率激光器及其制备方法
CN111751830B (zh) * 2020-07-08 2021-02-19 北京工业大学 一种基于vcsel混合激光的空间微弱目标红外探测系统
US20220385041A1 (en) * 2021-05-27 2022-12-01 Lumentum Operations Llc Emitter with variable light reflectivity
CN114498295B (zh) * 2022-04-13 2022-06-24 常州纵慧芯光半导体科技有限公司 一种带增益耦合光栅的dfb激光器及其制备方法
CN118263765A (zh) * 2022-12-27 2024-06-28 青岛海信宽带多媒体技术有限公司 一种激光器及光模块
DE102023104674A1 (de) * 2023-02-27 2024-08-29 Trumpf Photonic Components Gmbh VCSEL zum Erzeugen eines Laserlichts
JP2025171589A (ja) * 2024-05-10 2025-11-20 浜松ホトニクス株式会社 光集積回路
JP2025171590A (ja) * 2024-05-10 2025-11-20 浜松ホトニクス株式会社 光集積回路
JP2025171584A (ja) * 2024-05-10 2025-11-20 浜松ホトニクス株式会社 光集積回路

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002543452A (ja) * 1999-04-23 2002-12-17 サントル・ナショナル・ドゥ・ラ・レシェルシュ・サイエンティフィーク 共振光学コンポーネントを含む集積型フォトニック回路とその製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6031243A (en) 1996-10-16 2000-02-29 Geoff W. Taylor Grating coupled vertical cavity optoelectronic devices
US6330265B1 (en) * 1998-04-21 2001-12-11 Kabushiki Kaisha Toshiba Optical functional element and transmission device
US6829286B1 (en) 2000-05-26 2004-12-07 Opticomp Corporation Resonant cavity enhanced VCSEL/waveguide grating coupler
US6624444B1 (en) * 2002-03-28 2003-09-23 Intel Corporation Electrical-optical package with capacitor DC shunts and associated methods
US6775448B2 (en) * 2002-11-05 2004-08-10 Mesophotonics Limited Optical device
WO2005089098A2 (en) 2004-01-14 2005-09-29 The Regents Of The University Of California Ultra broadband mirror using subwavelength grating
EP1966636A2 (en) 2005-12-22 2008-09-10 Université Jean-Monnet Mirror structure and laser device comprising such a mirror structure
US8110823B2 (en) * 2006-01-20 2012-02-07 The Regents Of The University Of California III-V photonic integration on silicon
JP5037835B2 (ja) * 2006-02-28 2012-10-03 キヤノン株式会社 垂直共振器型面発光レーザ
US7583712B2 (en) * 2006-06-16 2009-09-01 Pbc Lasers Gmbh Optoelectronic device and method of making same
FR2909491B1 (fr) * 2006-12-05 2010-04-23 Commissariat Energie Atomique Dispositif laser a source laser et guide d'onde couples
CN100546135C (zh) * 2007-12-28 2009-09-30 武汉光迅科技股份有限公司 可调谐半导体激光器的制作方法及可调谐半导体激光器
US8116171B1 (en) * 2009-11-11 2012-02-14 Western Digital (Fremont), Llc Method and system for providing energy assisted magnetic recording disk drive using a vertical surface emitting laser
US8257990B2 (en) * 2009-12-30 2012-09-04 Intel Corporation Hybrid silicon vertical cavity laser with in-plane coupling
US8422342B1 (en) * 2010-06-25 2013-04-16 Western Digital (Fremont), Llc Energy assisted magnetic recording disk drive using a distributed feedback laser
US8451695B2 (en) * 2011-06-23 2013-05-28 Seagate Technology Llc Vertical cavity surface emitting laser with integrated mirror and waveguide

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002543452A (ja) * 1999-04-23 2002-12-17 サントル・ナショナル・ドゥ・ラ・レシェルシュ・サイエンティフィーク 共振光学コンポーネントを含む集積型フォトニック回路とその製造方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
J. Witzens et al., Appl. Phys. Lett., vol. 86, March 2 2005, 101105-1 - 101105-3쪽.
L. Ferrier et al., Proc. of SPIE, Vol. 6989, April 21 2008, 69890W-1 - 69890W-12쪽.*

Also Published As

Publication number Publication date
CN102388513A (zh) 2012-03-21
CN102388513B (zh) 2014-12-10
AU2010213223A1 (en) 2011-09-01
EP2396861B1 (en) 2013-08-28
WO2010091688A1 (en) 2010-08-19
US20120008658A1 (en) 2012-01-12
KR20110126661A (ko) 2011-11-23
US9184562B2 (en) 2015-11-10
JP2012517705A (ja) 2012-08-02
EP2396861A1 (en) 2011-12-21

Similar Documents

Publication Publication Date Title
KR101834015B1 (ko) 하이브리드 수직공진 레이저
EP2720327B1 (en) Hybrid vertical cavity laser for photonic integrated circuit
US8917752B2 (en) Reflectivity-modulated grating mirror
JP4237828B2 (ja) 光電子デバイスの性能を改善し、可用性を高めた共振反射器
KR100759603B1 (ko) 수직 공진기형 면발광 레이저 장치
US9941663B2 (en) Hybrid vertical cavity light emitting sources
CA2589452C (en) Single-mode photonic-crystal vcsels
US20120128019A1 (en) Monolithically integrated multi-wavelength high-contrast grating vcsel array
US20140198815A1 (en) Laser device
KR20080101720A (ko) 면 발광 레이저 소자
CA2433357A1 (en) Spatially modulated reflector for an optoelectronic device
US20070013991A1 (en) Photonic crystal semiconductor device and production method thereof
JPWO2008053672A1 (ja) 半導体光素子及び該半導体光素子を用いる半導体レーザ及び該半導体レーザを用いる光トランスポンダ
Viktorovitch et al. Double photonic crystal vertical-cavity surface-emitting lasers
US9373936B1 (en) Resonant active grating mirror for surface emitting lasers
JP2004296560A (ja) 半導体レーザの製造方法および集積光回路の製造方法
JP2024547119A (ja) 分布帰還型レーザおよびそのようなレーザを製造する方法
WO2009119172A1 (ja) 面発光レーザ
EP3407122B1 (en) Method for manufacturing an electro-absorption modulator
Rao InP-based long wavelength VCSEL using high contrast grating
Bissinger et al. Waveguide Coupling of an Integrated Nanowire Laser on Silicon with Enhanced End-Facet Reflectivity
KR102317437B1 (ko) Dbr이 없는 단방향 수직 공진 표면 발광 레이저
Kwon et al. Photonic crystal lasers
WO2016184471A1 (en) Vertical cavity laser

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

AMND Amendment
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E601 Decision to refuse application
PE0601 Decision on rejection of patent

St.27 status event code: N-2-6-B10-B15-exm-PE0601

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PX0901 Re-examination

St.27 status event code: A-2-3-E10-E12-rex-PX0901

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PX0701 Decision of registration after re-examination

St.27 status event code: A-3-4-F10-F13-rex-PX0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20210224

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20210224

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000