KR101823726B1 - 스테이지 장치 및 그 구동 방법 - Google Patents

스테이지 장치 및 그 구동 방법 Download PDF

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Publication number
KR101823726B1
KR101823726B1 KR1020140116973A KR20140116973A KR101823726B1 KR 101823726 B1 KR101823726 B1 KR 101823726B1 KR 1020140116973 A KR1020140116973 A KR 1020140116973A KR 20140116973 A KR20140116973 A KR 20140116973A KR 101823726 B1 KR101823726 B1 KR 101823726B1
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South Korea
Prior art keywords
stage
drive unit
relative position
actuator
stroke
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Korean (ko)
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KR20150027718A (ko
Inventor
츠토무 데라오
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캐논 가부시끼가이샤
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Publication of KR101823726B1 publication Critical patent/KR101823726B1/ko
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/202—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials for lift-off processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020140116973A 2013-09-04 2014-09-03 스테이지 장치 및 그 구동 방법 Active KR101823726B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2013-182874 2013-09-04
JP2013182874 2013-09-04
JPJP-P-2014-156173 2014-07-31
JP2014156173A JP6452338B2 (ja) 2013-09-04 2014-07-31 ステージ装置、およびその駆動方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020180008567A Division KR20180043759A (ko) 2013-09-04 2018-01-24 스테이지 장치 및 그 구동 방법

Publications (2)

Publication Number Publication Date
KR20150027718A KR20150027718A (ko) 2015-03-12
KR101823726B1 true KR101823726B1 (ko) 2018-01-30

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KR1020140116973A Active KR101823726B1 (ko) 2013-09-04 2014-09-03 스테이지 장치 및 그 구동 방법
KR1020180008567A Ceased KR20180043759A (ko) 2013-09-04 2018-01-24 스테이지 장치 및 그 구동 방법

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KR1020180008567A Ceased KR20180043759A (ko) 2013-09-04 2018-01-24 스테이지 장치 및 그 구동 방법

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Country Link
US (1) US20150062552A1 (https=)
JP (1) JP6452338B2 (https=)
KR (2) KR101823726B1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230142201A (ko) * 2022-04-01 2023-10-11 (주)마이크로모션텍 6자유도 모션 장치

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7022527B2 (ja) * 2017-07-07 2022-02-18 キヤノン株式会社 ステージ装置、リソグラフィ装置、および物品製造方法
JP7005344B2 (ja) * 2017-12-28 2022-01-21 キヤノン株式会社 制御方法、制御装置、リソグラフィ装置、および物品の製造方法
WO2019177337A1 (ko) 2018-03-12 2019-09-19 (주)큐엠씨 발광다이오드 칩을 전사하는 전사 장치 및 방법
KR102042100B1 (ko) * 2018-03-12 2019-11-07 ㈜큐엠씨 발광다이오드 칩을 전사하는 전사 장치
KR102238999B1 (ko) * 2019-07-18 2021-04-12 세메스 주식회사 기판 지지 모듈 및 이를 구비하는 프로브 스테이션

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003045785A (ja) * 2001-08-01 2003-02-14 Nikon Corp ステージ装置及び露光装置、並びにデバイス製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6130517A (en) * 1998-02-12 2000-10-10 Nikon Corporation Magnetic actuator producing large acceleration on fine stage and low RMS power gain
JP2003022960A (ja) * 2001-07-09 2003-01-24 Canon Inc ステージ装置及びその駆動方法
US7253576B2 (en) * 2004-04-05 2007-08-07 Nikon Corporation E/I core actuator commutation formula and control method
US9507276B2 (en) * 2012-10-09 2016-11-29 Koninklijke Philips N.V. Positioning device, control device and control method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003045785A (ja) * 2001-08-01 2003-02-14 Nikon Corp ステージ装置及び露光装置、並びにデバイス製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230142201A (ko) * 2022-04-01 2023-10-11 (주)마이크로모션텍 6자유도 모션 장치
KR102731545B1 (ko) 2022-04-01 2024-11-18 (주)마이크로모션텍 6자유도 모션 장치

Also Published As

Publication number Publication date
KR20150027718A (ko) 2015-03-12
JP6452338B2 (ja) 2019-01-16
KR20180043759A (ko) 2018-04-30
JP2015073083A (ja) 2015-04-16
US20150062552A1 (en) 2015-03-05

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