KR101809580B1 - 폴리아릴렌 물질 - Google Patents

폴리아릴렌 물질 Download PDF

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KR101809580B1
KR101809580B1 KR1020160077522A KR20160077522A KR101809580B1 KR 101809580 B1 KR101809580 B1 KR 101809580B1 KR 1020160077522 A KR1020160077522 A KR 1020160077522A KR 20160077522 A KR20160077522 A KR 20160077522A KR 101809580 B1 KR101809580 B1 KR 101809580B1
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alkyl
aryl
independently
monomer
hydroxyalkyl
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KR20170005757A (ko
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핑 딩
펭-웨이 추앙
크리스토퍼 디. 길모어
세실리아 더블유. 키아리
영석 김
치옌 장
아론 에이. 라치포드
신타로 야마다
제임스 카메론
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롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨
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    • C07C65/24Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing ether groups, groups, groups, or groups polycyclic
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    • C07C235/00Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms
    • C07C235/42Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings and singly-bound oxygen atoms bound to the same carbon skeleton
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    • C07C235/46Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings and singly-bound oxygen atoms bound to the same carbon skeleton with carbon atoms of carboxamide groups and singly-bound oxygen atoms bound to carbon atoms of the same non-condensed six-membered aromatic ring having the nitrogen atoms of the carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
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KR1020160077522A 2015-07-06 2016-06-21 폴리아릴렌 물질 Active KR101809580B1 (ko)

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US201562188943P 2015-07-06 2015-07-06
US62/188,943 2015-07-06
US15/056,352 2016-02-29
US15/056,352 US20170009006A1 (en) 2015-07-06 2016-02-29 Polyarylene materials

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US20200348592A1 (en) * 2019-04-30 2020-11-05 Rohm And Haas Electronic Materials Llc Resist underlayer compositions and methods of forming patterns with such compositions
TWI792000B (zh) * 2019-06-23 2023-02-11 美商羅門哈斯電子材料有限公司 氣體感測器和感測氣相分析物之方法
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US11746184B2 (en) 2019-11-19 2023-09-05 Rohm And Haas Electronic Materials Llc Polyimide-polyarylene polymers
US12379660B2 (en) 2020-12-18 2025-08-05 Dupont Electronic Materials International, Llc Adhesion promoting photoresist underlayer composition
JP7541939B2 (ja) 2021-02-15 2024-08-29 信越化学工業株式会社 有機膜形成用材料、半導体装置製造用基板、有機膜の形成方法、パターン形成方法、及び有機膜形成用化合物
JP7565259B2 (ja) 2021-11-25 2024-10-10 信越化学工業株式会社 有機膜形成材料、半導体装置製造用基板、有機膜の形成方法、パターン形成方法

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JP6423821B2 (ja) 2018-11-14
CN106336356B (zh) 2019-09-24
KR20170005757A (ko) 2017-01-16
TW201819454A (zh) 2018-06-01
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