KR101732467B1 - Bonding device, and method for detecting breakage in semiconductor die by bonding device - Google Patents
Bonding device, and method for detecting breakage in semiconductor die by bonding device Download PDFInfo
- Publication number
- KR101732467B1 KR101732467B1 KR1020147033124A KR20147033124A KR101732467B1 KR 101732467 B1 KR101732467 B1 KR 101732467B1 KR 1020147033124 A KR1020147033124 A KR 1020147033124A KR 20147033124 A KR20147033124 A KR 20147033124A KR 101732467 B1 KR101732467 B1 KR 101732467B1
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- KR
- South Korea
- Prior art keywords
- semiconductor die
- image
- collet
- area
- bonding
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/75—Apparatus for connecting with bump connectors or layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/757—Means for aligning
- H01L2224/75743—Suction holding means
- H01L2224/75745—Suction holding means in the upper part of the bonding apparatus, e.g. in the bonding head
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/759—Means for monitoring the connection process
- H01L2224/75901—Means for monitoring the connection process using a computer, e.g. fully- or semi-automatic bonding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/83908—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector involving monitoring, e.g. feedback loop
Abstract
The die bonder 100 is provided with a back side camera (hereinafter referred to as a back side camera) for picking up an entire image including an image of the suction side image of the collet 20 that adsorbs the semiconductor die 40 and an image of the semiconductor die 40 adsorbed to the collet 20 And an image processing unit 80 for processing each image acquired by the back side camera 30. The image processing unit 80 is a unit for acquiring the image of the attraction surface of the collet 20 and the image of the semiconductor die 40 An image area delimiting means for delimiting the image area of the semiconductor die 40 in the entire image based on the brightness difference and the reference image of the semiconductor die 40; And determines that the semiconductor die is damaged if the rate of change of brightness in the scanning direction is equal to or larger than a predetermined threshold value. This effectively prevents the broken semiconductor die from being bonded and improves the quality of the semiconductor device manufactured by the die bonder 100. [
Description
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of a bonding apparatus for detecting damage such as cracks or defects of a semiconductor die to be bonded, and a method of detecting breakage of a semiconductor die by a bonding apparatus.
BACKGROUND ART A die bonder is widely used as an apparatus for bonding a semiconductor die to a circuit board such as a lead frame. The die bonder includes a pick-up stage for picking up a semiconductor die from a wafer after dicing and a bonding stage for bonding the semiconductor die picked up from the wafer to a circuit board, and picking up and bonding the semiconductor die by a collet which is a bonding tool. More specifically, the collet picks up a semiconductor die from a wafer on a pick-up stage by sucking a semiconductor die at the tip, transfers the semiconductor die to a bonding position of the circuit board on the bonding stage, The semiconductor die is bonded (see, for example, Patent Document 1).
It is necessary to precisely match the positions of the semiconductor die and the circuit board at the time of bonding. For example, when the semiconductor die is transferred from the pick-up stage to the bonding stage by the collet, There has been proposed a method of acquiring an image of a semiconductor die and correcting the displacement of the relative position between the semiconductor die and the circuit board based on the alignment mark of the semiconductor die (see, for example, Patent Document 2).
In addition, when a reference member having a mirror and a rectangular through hole is fixed to a transfer head of a semiconductor die through an L-shaped connecting member and the semiconductor die is transported by the transfer head, The position of the semiconductor die relative to the reference component is detected, and the position of the semiconductor die on the circuit board of the semiconductor die is detected on the basis of the detection result There has been proposed a method of correcting the mounting position (see, for example, Patent Document 3).
However, as described in Patent Document 1, when the semiconductor die is taken out from the wafer sheet to pick up the semiconductor die, the semiconductor die is deformed, so that a thin semiconductor die may be broken at the time of picking up. Patent Document 1 discloses a collet and pickup method in which the semiconductor die is not broken at the time of picking up, but does not describe a countermeasure in the case where the semiconductor die is broken at the time of picking up. In Patent Documents 2 and 3, the position of the semiconductor die sucked and fixed to the collet is detected and the semiconductor die is precisely bonded to a predetermined position of the circuit board before bonding. However, The action when there was was not mentioned. For this reason, in the prior art die bonders disclosed in Patent Documents 1 to 3, even if the semiconductor die is broken at the time of picking up, the semiconductor die is bonded directly onto the circuit board, causing a defect in the semiconductor device manufactured by the die bonder There was a problem.
In recent years, the thickness of the semiconductor die has become thinner, and the thickness thereof has been reduced to about 15 to 50 mu m. When such a thin semiconductor die is attracted to the collet, a part of the semiconductor die may float or bend from the attracted surface of the collet. In this case, when the image of the semiconductor die is obtained by the method described in Patent Documents 2 and 3, the brightness of the image continuously changes in accordance with the rising or bending of the semiconductor die from the attracting surface, It is difficult to discriminate between the two.
SUMMARY OF THE INVENTION It is therefore an object of the present invention to effectively suppress the bonding of a damaged semiconductor die in a bonding apparatus, thereby improving the quality of a semiconductor device manufactured by the bonding apparatus.
A bonding apparatus of the present invention includes a camera for picking up an entire image including an image of an adsorption face of a collet that adsorbs a semiconductor die and an image of a semiconductor die adsorbed to a collet and an image processing section for processing each image acquired by the camera And the image processing section includes image area delimiting means for delimiting the lightness difference between the image of the suction face of the collet and the image of the semiconductor die and the image area of the semiconductor die in the entire image based on the reference image of the semiconductor die, And a failure detecting means for determining that the semiconductor die is damaged when the rate of change of brightness in the scanning direction is equal to or larger than a predetermined threshold value.
In the bonding apparatus of the present invention, it is preferable that the breakage detecting means is configured to set the inner portion excluding the periphery of the image area of the semiconductor die defined by the image delimiting means as the inspection region, and scan the inspection region.
A method of detecting breakage of a semiconductor die by a bonding apparatus of the present invention includes an image capturing step of capturing an entire image including an image of an adsorption face of a collet to be adsorbed on a semiconductor die and an image of a semiconductor die adsorbed on a collet, An image area demarcation step of demarcating an image area of a semiconductor die in a whole image based on a difference in brightness between a face image and an image of the semiconductor die and a reference image of the semiconductor die; And determining that the semiconductor die is broken if the rate of change of brightness in the scanning direction is equal to or greater than a predetermined threshold value.
In the method of detecting breakage of a semiconductor die by the bonding apparatus of the present invention, in the breakage detecting step, the inner portion excluding the periphery of the image region of the semiconductor die defined by the image delimiting step is set as the inspection region, .
INDUSTRIAL APPLICABILITY The present invention effectively suppresses bonding of a broken semiconductor die in a bonding apparatus and can improve the quality of a semiconductor device manufactured by a bonding apparatus.
BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is a systematic diagram showing a configuration of a die bonder in an embodiment of the present invention. FIG.
Fig. 2 is an explanatory view showing the operation of the die bonder in the embodiment of the present invention. Fig.
3 is a flowchart showing the reference image registration operation of the die bonder in the embodiment of the present invention.
4 is a flowchart showing the breakage detecting operation of the die bonder in the embodiment of the present invention.
Fig. 5 is an explanatory view showing a take-out operation of a reference image of a die bonder in the embodiment of the present invention. Fig.
Fig. 6 is an explanatory view showing the image area delimiting operation of the die bonder in the embodiment of the present invention. Fig.
7 is an explanatory diagram showing an image area delimiting operation of the die bonder in the embodiment of the present invention.
8 is an explanatory view showing the setting operation of the inspection area of the die bonder in the embodiment of the present invention.
Fig. 9 is an explanatory view showing the scanning of the inspection area of the die bonder in the embodiment of the present invention. Fig.
10 is an explanatory view showing a change in brightness in the scanning direction at the time of detecting breakage of the die bonder in the embodiment of the present invention.
11 is an explanatory diagram showing a change in brightness in the scanning direction at the time of detecting breakage of the die bonder in the embodiment of the present invention.
Best Mode for Carrying Out the Invention Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. The present invention is not limited to a die bonder but may be applied to other types of bonding devices such as a flip chip bonder. You can. 1, the
The
The
The
The basic operation of the
2 (d), the
The operation of detecting breakage such as cracks or defects of the semiconductor die 40 by the die bonders described with reference to Figs. 1 and 2 has been described above. In order to detect breakage, it is necessary to define a region in the acquired image or a position in the image representing the semiconductor die 40 when the semiconductor die 40 picked up on the attracting
As shown in step S101 in Fig. 3, the
3, when the model semiconductor die 42 is sucked to the
3, the operator has the same shape and size as those of the model semiconductor die 42, that is, the model semiconductor die 42 is formed on the outline of the model semiconductor die 42 in the
After the registration of the
Next, the
Next, as shown in step S207 in Fig. 4, the
The
The actual semiconductor die 41 floats a little more than the
As described above, the
The present invention is not limited to the above-described embodiments, but includes all changes and modifications that do not depart from the technical scope and nature of the present invention, which are defined by the claims. For example, But can be applied to other types of bonding devices such as flip chip bonders.
10 ...
13 ...
15 ...
20 ...
22 ... The
24 ...
26 ... Absorbing
29 ...
35 ...
41 ... Actual semiconductor die 42 ... Model Semiconductor Die
43 ...
45 ... Upper
48 ...
60 ...
73 ...
80 ... The
82 ... The
84 ... Image
86 ...
88, 92 ...
90 ...
100 ... Die bonder 110 ... Dispenser section
120 ... Bonding section
Claims (4)
A pickup stage for holding a wafer including a semiconductor die,
A bonding stage for holding a substrate on which the semiconductor die is mounted,
Up stage to the bonding stage, the entire image including the image of the semiconductor die sucked to the collet and the image of the adsorption face of the collet that adsorbs the semiconductor die, A camera which acquires a plurality of reference images including a part of the surface and each part of the semiconductor die, the reference image being smaller in area than the entire image; And
An image processing unit for processing each image acquired by the camera;
And,
Wherein the image processing unit comprises:
Comparing the brightness distribution of the whole image with the brightness distribution of the plurality of reference images to specify a boundary of the entire image corresponding to each of the respective angles, Image area delimiting means for delimiting an outer side of a region corresponding to the semiconductor die in the entire image from the inspection region; And
A damage detection means for scanning within the inspection region and judging that the semiconductor die is broken when the rate of change of brightness in the scanning direction is equal to or larger than a predetermined threshold value;
To have,
Wherein the breakage detecting means is set as an inspection region inside the image region of the semiconductor die defined by the image region delimiting means and is scanned in the inspection region, And judges whether or not the semiconductor die is broken until the semiconductor die is mounted on the semiconductor die.
A reference image acquiring step of acquiring a plurality of reference images including the attracting surface and each part of the semiconductor die by dividing and imaging the back surface of the semiconductor die adsorbed on the attracting surface of the collet into a plurality of regions;
The semiconductor die is picked up from the pick-up stage to the bonding stage, and an entire image including an image of the semiconductor die sucked to the collet and an attracting surface image of the collet that attracts the semiconductor die is obtained A whole image acquiring step;
The brightness distribution of the whole image is compared with the brightness distribution of the plurality of reference images to specify the boundary of the entire image corresponding to each part of the semiconductor die to inspect the area corresponding to the semiconductor die in the whole image An image area delimiting step of delimiting the outside of the area corresponding to the semiconductor die in the entire image from the inspection area; And
A damage detection step of the semiconductor die which scans the inspection area and judges that the semiconductor die is damaged when the rate of change of brightness in the scanning direction is equal to or larger than a predetermined threshold value;
To have,
Wherein the breakage detecting step includes setting an inspection area inside the image area of the semiconductor die defined by the image area demarcining step, scanning the inspection area, and causing the semiconductor die to move to the substrate And judging whether or not the semiconductor die is damaged before mounting the semiconductor die.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2013-009877 | 2013-01-23 | ||
JP2013009877A JP2016076505A (en) | 2013-01-23 | 2013-01-23 | Die bonder and damage detection method for semiconductor die with die bonder |
PCT/JP2013/072091 WO2014115359A1 (en) | 2013-01-23 | 2013-08-19 | Bonding device, and method for detecting breakage in semiconductor die by bonding device |
Publications (2)
Publication Number | Publication Date |
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KR20150013613A KR20150013613A (en) | 2015-02-05 |
KR101732467B1 true KR101732467B1 (en) | 2017-05-24 |
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Application Number | Title | Priority Date | Filing Date |
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KR1020147033124A KR101732467B1 (en) | 2013-01-23 | 2013-08-19 | Bonding device, and method for detecting breakage in semiconductor die by bonding device |
Country Status (5)
Country | Link |
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JP (1) | JP2016076505A (en) |
KR (1) | KR101732467B1 (en) |
CN (1) | CN104937702B (en) |
TW (1) | TWI512854B (en) |
WO (1) | WO2014115359A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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KR102247600B1 (en) * | 2015-03-16 | 2021-05-03 | 한화정밀기계 주식회사 | Bonding apparatus and bonding method |
JP6975551B2 (en) * | 2017-05-18 | 2021-12-01 | ファスフォードテクノロジ株式会社 | Semiconductor manufacturing equipment and methods for manufacturing semiconductor equipment |
JP6839143B2 (en) * | 2017-09-28 | 2021-03-03 | 芝浦メカトロニクス株式会社 | Element mounting device, element mounting method and element mounting board manufacturing method |
JP2022182232A (en) * | 2021-05-28 | 2022-12-08 | ファスフォードテクノロジ株式会社 | Method for manufacturing die bonding device and semiconductor device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003185590A (en) * | 2001-12-18 | 2003-07-03 | Stk Technology Co Ltd | Work inspection method and device therefor |
JP2007115851A (en) * | 2005-10-19 | 2007-05-10 | Toshiba Corp | Method and device for inspecting position of semiconductor component, and manufacturing method of semiconductor device |
Family Cites Families (3)
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JPS6216538A (en) * | 1985-07-16 | 1987-01-24 | Toshiba Corp | Pattern-recognizing device |
CN1518085B (en) * | 2003-01-15 | 2010-05-12 | 内格夫技术有限公司 | High-speed in-line electro-optics testing method and system for defects on chip |
JP2007278928A (en) * | 2006-04-10 | 2007-10-25 | Olympus Corp | Defect inspection device |
-
2013
- 2013-01-23 JP JP2013009877A patent/JP2016076505A/en active Pending
- 2013-08-19 KR KR1020147033124A patent/KR101732467B1/en active IP Right Grant
- 2013-08-19 CN CN201380023188.5A patent/CN104937702B/en active Active
- 2013-08-19 WO PCT/JP2013/072091 patent/WO2014115359A1/en active Application Filing
- 2013-09-11 TW TW102132694A patent/TWI512854B/en active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003185590A (en) * | 2001-12-18 | 2003-07-03 | Stk Technology Co Ltd | Work inspection method and device therefor |
JP2007115851A (en) * | 2005-10-19 | 2007-05-10 | Toshiba Corp | Method and device for inspecting position of semiconductor component, and manufacturing method of semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
TWI512854B (en) | 2015-12-11 |
CN104937702A (en) | 2015-09-23 |
WO2014115359A1 (en) | 2014-07-31 |
CN104937702B (en) | 2017-09-29 |
KR20150013613A (en) | 2015-02-05 |
JP2016076505A (en) | 2016-05-12 |
TW201430969A (en) | 2014-08-01 |
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