KR101724776B1 - 전사용 마스크, 전사용 마스크의 제조 방법 및 반도체 디바이스의 제조 방법 - Google Patents

전사용 마스크, 전사용 마스크의 제조 방법 및 반도체 디바이스의 제조 방법 Download PDF

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KR101724776B1
KR101724776B1 KR1020127011992A KR20127011992A KR101724776B1 KR 101724776 B1 KR101724776 B1 KR 101724776B1 KR 1020127011992 A KR1020127011992 A KR 1020127011992A KR 20127011992 A KR20127011992 A KR 20127011992A KR 101724776 B1 KR101724776 B1 KR 101724776B1
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South Korea
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pattern
thin film
transfer
mask
film
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KR20120086710A (ko
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마사히로 하시모또
가즈야 사까이
도시유끼 스즈끼
가즈노리 오노
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호야 가부시키가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020127011992A 2009-10-12 2010-10-08 전사용 마스크, 전사용 마스크의 제조 방법 및 반도체 디바이스의 제조 방법 Active KR101724776B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2009-235817 2009-10-12
JP2009235817 2009-10-12
PCT/JP2010/067730 WO2011046073A1 (ja) 2009-10-12 2010-10-08 転写用マスク、転写用マスクの製造方法及び半導体デバイスの製造方法

Publications (2)

Publication Number Publication Date
KR20120086710A KR20120086710A (ko) 2012-08-03
KR101724776B1 true KR101724776B1 (ko) 2017-04-07

Family

ID=43876123

Family Applications (1)

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KR1020127011992A Active KR101724776B1 (ko) 2009-10-12 2010-10-08 전사용 마스크, 전사용 마스크의 제조 방법 및 반도체 디바이스의 제조 방법

Country Status (4)

Country Link
US (1) US8658334B2 (https=)
JP (2) JP4797114B2 (https=)
KR (1) KR101724776B1 (https=)
WO (1) WO2011046073A1 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6084391B2 (ja) * 2011-09-28 2017-02-22 Hoya株式会社 マスクブランク、転写用マスク、転写用マスクの製造方法および半導体デバイスの製造方法
JP5879951B2 (ja) * 2011-11-21 2016-03-08 信越化学工業株式会社 光パターン照射方法、ハーフトーン位相シフトマスク及びハーフトーン位相シフトマスクブランク
EP2594994B1 (en) * 2011-11-21 2016-05-18 Shin-Etsu Chemical Co., Ltd. Light pattern exposure method
US20150111134A1 (en) * 2012-03-14 2015-04-23 Hoya Corporation Mask blank and method of manufacturing a transfer mask
US20150079502A1 (en) * 2012-03-14 2015-03-19 Hoya Corporation Mask blank and method of manufacturing a transfer mask
JP6118038B2 (ja) * 2012-05-22 2017-04-19 Hoya株式会社 マスクブランクの欠陥検査方法、マスクブランクの製造方法、及び転写用マスクの製造方法
KR101269062B1 (ko) 2012-06-29 2013-05-29 주식회사 에스앤에스텍 블랭크 마스크 및 이를 이용한 포토 마스크 제조방법
JP6080915B2 (ja) * 2014-08-25 2017-02-15 エスアンドエス テック カンパニー リミテッド 位相反転ブランクマスク及びフォトマスク
KR102069960B1 (ko) * 2015-03-27 2020-01-23 호야 가부시키가이샤 마스크 블랭크, 위상 시프트 마스크 및 위상 시프트 마스크의 제조 방법, 및 반도체 장치의 제조 방법
US11066274B2 (en) 2015-06-30 2021-07-20 Otis Elevator Company Electromagnetic safety trigger
JP6900873B2 (ja) * 2016-12-26 2021-07-07 信越化学工業株式会社 フォトマスクブランク及びその製造方法
JP6900872B2 (ja) * 2016-12-26 2021-07-07 信越化学工業株式会社 フォトマスクブランク及びその製造方法
US20190086809A1 (en) * 2017-09-21 2019-03-21 United Microelectronics Corp. Method for fabricating semiconductor structure involving cleaning mask material
KR102495225B1 (ko) * 2021-12-15 2023-02-06 에스케이엔펄스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002156742A (ja) 2000-11-20 2002-05-31 Shin Etsu Chem Co Ltd 位相シフトマスクブランク、位相シフトマスク及びこれらの製造方法
JP2007241060A (ja) 2006-03-10 2007-09-20 Shin Etsu Chem Co Ltd フォトマスクブランク及びフォトマスクの製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008139904A1 (ja) * 2007-04-27 2008-11-20 Hoya Corporation フォトマスクブランク及びフォトマスク
JP5530075B2 (ja) * 2008-03-31 2014-06-25 Ｈｏｙａ株式会社 フォトマスクブランク、フォトマスク及びこれらの製造方法
JP4739461B2 (ja) * 2009-10-12 2011-08-03 Ｈｏｙａ株式会社 転写用マスクの製造方法及び半導体デバイスの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002156742A (ja) 2000-11-20 2002-05-31 Shin Etsu Chem Co Ltd 位相シフトマスクブランク、位相シフトマスク及びこれらの製造方法
JP2007241060A (ja) 2006-03-10 2007-09-20 Shin Etsu Chem Co Ltd フォトマスクブランク及びフォトマスクの製造方法

Also Published As

Publication number Publication date
JP5470339B2 (ja) 2014-04-16
WO2011046073A1 (ja) 2011-04-21
US20120251931A1 (en) 2012-10-04
KR20120086710A (ko) 2012-08-03
US8658334B2 (en) 2014-02-25
JP2011209762A (ja) 2011-10-20
JP4797114B2 (ja) 2011-10-19
JP2011102968A (ja) 2011-05-26

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