KR101674279B1 - 임프린트 방법, 임프린트 장치 및 물품 제조 방법 - Google Patents

임프린트 방법, 임프린트 장치 및 물품 제조 방법 Download PDF

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KR101674279B1
KR101674279B1 KR1020147025332A KR20147025332A KR101674279B1 KR 101674279 B1 KR101674279 B1 KR 101674279B1 KR 1020147025332 A KR1020147025332 A KR 1020147025332A KR 20147025332 A KR20147025332 A KR 20147025332A KR 101674279 B1 KR101674279 B1 KR 101674279B1
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South Korea
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substrate
mold
shot
detector
pattern
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Korean (ko)
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KR20140124836A (ko
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노조무 하야시
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캐논 가부시끼가이샤
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    • H10P76/2041—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7038—Alignment for proximity or contact printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020147025332A 2012-03-12 2013-03-07 임프린트 방법, 임프린트 장치 및 물품 제조 방법 Active KR101674279B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2012-053991 2012-03-12
JP2012053991 2012-03-12
JPJP-P-2013-042700 2013-03-05
JP2013042700A JP6029495B2 (ja) 2012-03-12 2013-03-05 インプリント方法およびインプリント装置、それを用いた物品の製造方法
PCT/JP2013/001446 WO2013136733A1 (en) 2012-03-12 2013-03-07 Imprint method, imprint apparatus, and article manufacturing method

Publications (2)

Publication Number Publication Date
KR20140124836A KR20140124836A (ko) 2014-10-27
KR101674279B1 true KR101674279B1 (ko) 2016-11-08

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KR1020147025332A Active KR101674279B1 (ko) 2012-03-12 2013-03-07 임프린트 방법, 임프린트 장치 및 물품 제조 방법

Country Status (6)

Country Link
US (1) US9703190B2 (enExample)
EP (1) EP2826059B1 (enExample)
JP (1) JP6029495B2 (enExample)
KR (1) KR101674279B1 (enExample)
CN (1) CN104160476B (enExample)
WO (1) WO2013136733A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6097704B2 (ja) * 2014-01-06 2017-03-15 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP6294680B2 (ja) 2014-01-24 2018-03-14 キヤノン株式会社 インプリント装置、および物品の製造方法
JP2015170815A (ja) * 2014-03-10 2015-09-28 キヤノン株式会社 インプリント装置、アライメント方法及び物品の製造方法
JP6401501B2 (ja) * 2014-06-02 2018-10-10 キヤノン株式会社 インプリント装置、および物品の製造方法
JP2016134441A (ja) * 2015-01-16 2016-07-25 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
EP3291011B1 (en) * 2015-03-25 2025-11-05 Nikon Corporation Layout method, mark detection method, exposure method, measurement device, exposure apparatus, and device manufacturing method
TWI619145B (zh) * 2015-04-30 2018-03-21 佳能股份有限公司 壓印裝置，基板運送裝置，壓印方法以及製造物件的方法
JP6685821B2 (ja) * 2016-04-25 2020-04-22 キヤノン株式会社 計測装置、インプリント装置、物品の製造方法、光量決定方法、及び、光量調整方法
JP6865650B2 (ja) * 2017-07-27 2021-04-28 キヤノン株式会社 インプリント装置、および物品製造方法
US10788749B2 (en) 2017-11-30 2020-09-29 Canon Kabushiki Kaisha System and method for improving the throughput of a nanoimprint system
JP7317575B2 (ja) * 2019-05-28 2023-07-31 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP7433861B2 (ja) * 2019-11-27 2024-02-20 キヤノン株式会社 インプリント装置、インプリント方法、物品の製造方法、基板、および、型
JP7603395B2 (ja) * 2020-08-26 2024-12-20 キヤノン株式会社 インプリント装置、および物品の製造方法
US11966157B2 (en) * 2021-05-20 2024-04-23 Canon Kabushiki Kaisha Imprint apparatus, imprint method, and article manufacturing method
JP7633908B2 (ja) * 2021-09-10 2025-02-20 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
JP2024013107A (ja) * 2022-07-19 2024-01-31 キヤノン株式会社 制御方法、成形装置、および物品の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006165371A (ja) 2004-12-09 2006-06-22 Canon Inc 転写装置およびデバイス製造方法
JP2011035408A (ja) 2010-08-30 2011-02-17 Canon Inc インプリント装置およびデバイス製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4827513B2 (ja) 2005-12-09 2011-11-30 キヤノン株式会社 加工方法
JP4185941B2 (ja) * 2006-04-04 2008-11-26 キヤノン株式会社 ナノインプリント方法及びナノインプリント装置
CN102360162B (zh) * 2007-02-06 2015-08-26 佳能株式会社 刻印方法和刻印装置
JP5279397B2 (ja) * 2008-08-06 2013-09-04 キヤノン株式会社 インプリント装置、インプリント方法、およびデバイス製造方法
NL2003871A (en) * 2009-02-04 2010-08-05 Asml Netherlands Bv Imprint lithography.
JP5495767B2 (ja) * 2009-12-21 2014-05-21 キヤノン株式会社 インプリント装置及び方法、並びに物品の製造方法
JP5539011B2 (ja) * 2010-05-14 2014-07-02 キヤノン株式会社 インプリント装置、検出装置、位置合わせ装置、及び物品の製造方法
JP5597031B2 (ja) * 2010-05-31 2014-10-01 キヤノン株式会社 リソグラフィ装置及び物品の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006165371A (ja) 2004-12-09 2006-06-22 Canon Inc 転写装置およびデバイス製造方法
JP2011035408A (ja) 2010-08-30 2011-02-17 Canon Inc インプリント装置およびデバイス製造方法

Also Published As

Publication number Publication date
CN104160476A (zh) 2014-11-19
KR20140124836A (ko) 2014-10-27
JP2013219333A (ja) 2013-10-24
EP2826059A4 (en) 2015-11-18
US20150013559A1 (en) 2015-01-15
CN104160476B (zh) 2017-03-08
US9703190B2 (en) 2017-07-11
WO2013136733A1 (en) 2013-09-19
JP6029495B2 (ja) 2016-11-24
EP2826059B1 (en) 2019-10-09
EP2826059A1 (en) 2015-01-21

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