KR101600128B1 - 편광 이미징 - Google Patents
편광 이미징 Download PDFInfo
- Publication number
- KR101600128B1 KR101600128B1 KR1020117021587A KR20117021587A KR101600128B1 KR 101600128 B1 KR101600128 B1 KR 101600128B1 KR 1020117021587 A KR1020117021587 A KR 1020117021587A KR 20117021587 A KR20117021587 A KR 20117021587A KR 101600128 B1 KR101600128 B1 KR 101600128B1
- Authority
- KR
- South Korea
- Prior art keywords
- image
- critical dimension
- substrate
- subsequent
- defects
- Prior art date
Links
- 230000010287 polarization Effects 0.000 title claims abstract description 35
- 238000003384 imaging method Methods 0.000 title description 6
- 238000000034 method Methods 0.000 claims abstract description 40
- 239000004065 semiconductor Substances 0.000 claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 claims abstract description 7
- 238000012544 monitoring process Methods 0.000 claims abstract 2
- 239000000758 substrate Substances 0.000 claims description 126
- 230000003287 optical effect Effects 0.000 claims description 63
- 238000007689 inspection Methods 0.000 claims description 62
- 230000008569 process Effects 0.000 claims description 14
- 238000012935 Averaging Methods 0.000 claims description 4
- 230000000694 effects Effects 0.000 abstract description 4
- 230000002596 correlated effect Effects 0.000 abstract description 3
- 230000007547 defect Effects 0.000 description 88
- 238000012360 testing method Methods 0.000 description 20
- 235000012431 wafers Nutrition 0.000 description 20
- 230000008859 change Effects 0.000 description 12
- 239000002245 particle Substances 0.000 description 7
- 230000001419 dependent effect Effects 0.000 description 6
- 238000005286 illumination Methods 0.000 description 5
- 230000002950 deficient Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 230000000737 periodic effect Effects 0.000 description 4
- 239000002131 composite material Substances 0.000 description 3
- 230000000875 corresponding effect Effects 0.000 description 3
- 230000006978 adaptation Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001424 field-emission electron microscopy Methods 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 238000003909 pattern recognition Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 235000012773 waffles Nutrition 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J4/00—Measuring polarisation of light
- G01J4/04—Polarimeters using electric detection means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15359409P | 2009-02-18 | 2009-02-18 | |
| US61/153,594 | 2009-02-18 | ||
| US12/551,702 US20090324056A1 (en) | 2006-04-21 | 2009-09-01 | Polarization imaging |
| US12/551,702 | 2009-09-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20110118820A KR20110118820A (ko) | 2011-11-01 |
| KR101600128B1 true KR101600128B1 (ko) | 2016-03-04 |
Family
ID=42634187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020117021587A KR101600128B1 (ko) | 2009-02-18 | 2010-02-17 | 편광 이미징 |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR101600128B1 (fr) |
| SG (1) | SG173755A1 (fr) |
| TW (1) | TWI521624B (fr) |
| WO (1) | WO2010096407A1 (fr) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9885671B2 (en) | 2014-06-09 | 2018-02-06 | Kla-Tencor Corporation | Miniaturized imaging apparatus for wafer edge |
| US9645097B2 (en) | 2014-06-20 | 2017-05-09 | Kla-Tencor Corporation | In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning |
| KR102606308B1 (ko) | 2016-06-28 | 2023-11-24 | 삼성전자주식회사 | 포토 마스크의 제조 방법, 패턴 형성 방법 및 반도체 장치의 제조 방법 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL130874A (en) * | 1999-07-09 | 2002-12-01 | Nova Measuring Instr Ltd | System and method for measuring pattern structures |
| JP3990981B2 (ja) * | 2000-12-15 | 2007-10-17 | ケイエルエイ−テンコー コーポレイション | 基板を検査するための方法及び装置 |
| US6561706B2 (en) * | 2001-06-28 | 2003-05-13 | Advanced Micro Devices, Inc. | Critical dimension monitoring from latent image |
-
2010
- 2010-02-12 TW TW099104791A patent/TWI521624B/zh active
- 2010-02-17 WO PCT/US2010/024358 patent/WO2010096407A1/fr active Application Filing
- 2010-02-17 KR KR1020117021587A patent/KR101600128B1/ko active IP Right Grant
- 2010-02-17 SG SG2011059540A patent/SG173755A1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20110118820A (ko) | 2011-11-01 |
| TWI521624B (zh) | 2016-02-11 |
| SG173755A1 (en) | 2011-09-29 |
| TW201101400A (en) | 2011-01-01 |
| WO2010096407A1 (fr) | 2010-08-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| E701 | Decision to grant or registration |