SG173755A1 - Polarization imaging - Google Patents

Polarization imaging Download PDF

Info

Publication number
SG173755A1
SG173755A1 SG2011059540A SG2011059540A SG173755A1 SG 173755 A1 SG173755 A1 SG 173755A1 SG 2011059540 A SG2011059540 A SG 2011059540A SG 2011059540 A SG2011059540 A SG 2011059540A SG 173755 A1 SG173755 A1 SG 173755A1
Authority
SG
Singapore
Prior art keywords
polarization imaging
polarization
imaging
Prior art date
Application number
SG2011059540A
Inventor
Scott A Balak
Gang Sun
Original Assignee
Rudolph Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/551,702 external-priority patent/US20090324056A1/en
Application filed by Rudolph Technologies Inc filed Critical Rudolph Technologies Inc
Publication of SG173755A1 publication Critical patent/SG173755A1/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G01J4/04—Polarimeters using electric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
SG2011059540A 2009-02-18 2010-02-17 Polarization imaging SG173755A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15359409P 2009-02-18 2009-02-18
US12/551,702 US20090324056A1 (en) 2006-04-21 2009-09-01 Polarization imaging
PCT/US2010/024358 WO2010096407A1 (en) 2009-02-18 2010-02-17 Polarization imaging

Publications (1)

Publication Number Publication Date
SG173755A1 true SG173755A1 (en) 2011-09-29

Family

ID=42634187

Family Applications (1)

Application Number Title Priority Date Filing Date
SG2011059540A SG173755A1 (en) 2009-02-18 2010-02-17 Polarization imaging

Country Status (4)

Country Link
KR (1) KR101600128B1 (en)
SG (1) SG173755A1 (en)
TW (1) TWI521624B (en)
WO (1) WO2010096407A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9885671B2 (en) 2014-06-09 2018-02-06 Kla-Tencor Corporation Miniaturized imaging apparatus for wafer edge
US9645097B2 (en) 2014-06-20 2017-05-09 Kla-Tencor Corporation In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning
KR102606308B1 (en) 2016-06-28 2023-11-24 삼성전자주식회사 Method of manufacturing photomasks, method of forming patterns and method of manufacturing semiconductor devices

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL130874A (en) * 1999-07-09 2002-12-01 Nova Measuring Instr Ltd System and method for measuring patterned structures
US7171038B2 (en) * 2000-12-15 2007-01-30 Kla-Tencor Technologies Corporation Method and apparatus for inspecting a substrate
US6561706B2 (en) * 2001-06-28 2003-05-13 Advanced Micro Devices, Inc. Critical dimension monitoring from latent image

Also Published As

Publication number Publication date
KR20110118820A (en) 2011-11-01
TW201101400A (en) 2011-01-01
TWI521624B (en) 2016-02-11
WO2010096407A1 (en) 2010-08-26
KR101600128B1 (en) 2016-03-04

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