SG173755A1 - Polarization imaging - Google Patents
Polarization imaging Download PDFInfo
- Publication number
- SG173755A1 SG173755A1 SG2011059540A SG2011059540A SG173755A1 SG 173755 A1 SG173755 A1 SG 173755A1 SG 2011059540 A SG2011059540 A SG 2011059540A SG 2011059540 A SG2011059540 A SG 2011059540A SG 173755 A1 SG173755 A1 SG 173755A1
- Authority
- SG
- Singapore
- Prior art keywords
- polarization imaging
- polarization
- imaging
- Prior art date
Links
- 238000003384 imaging method Methods 0.000 title 1
- 230000010287 polarization Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J4/00—Measuring polarisation of light
- G01J4/04—Polarimeters using electric detection means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15359409P | 2009-02-18 | 2009-02-18 | |
US12/551,702 US20090324056A1 (en) | 2006-04-21 | 2009-09-01 | Polarization imaging |
PCT/US2010/024358 WO2010096407A1 (fr) | 2009-02-18 | 2010-02-17 | Imagerie par polarisation |
Publications (1)
Publication Number | Publication Date |
---|---|
SG173755A1 true SG173755A1 (en) | 2011-09-29 |
Family
ID=42634187
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2011059540A SG173755A1 (en) | 2009-02-18 | 2010-02-17 | Polarization imaging |
Country Status (4)
Country | Link |
---|---|
KR (1) | KR101600128B1 (fr) |
SG (1) | SG173755A1 (fr) |
TW (1) | TWI521624B (fr) |
WO (1) | WO2010096407A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9885671B2 (en) | 2014-06-09 | 2018-02-06 | Kla-Tencor Corporation | Miniaturized imaging apparatus for wafer edge |
US9645097B2 (en) | 2014-06-20 | 2017-05-09 | Kla-Tencor Corporation | In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning |
KR102606308B1 (ko) | 2016-06-28 | 2023-11-24 | 삼성전자주식회사 | 포토 마스크의 제조 방법, 패턴 형성 방법 및 반도체 장치의 제조 방법 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IL130874A (en) * | 1999-07-09 | 2002-12-01 | Nova Measuring Instr Ltd | System and method for measuring pattern structures |
JP3990981B2 (ja) * | 2000-12-15 | 2007-10-17 | ケイエルエイ−テンコー コーポレイション | 基板を検査するための方法及び装置 |
US6561706B2 (en) * | 2001-06-28 | 2003-05-13 | Advanced Micro Devices, Inc. | Critical dimension monitoring from latent image |
-
2010
- 2010-02-12 TW TW099104791A patent/TWI521624B/zh active
- 2010-02-17 WO PCT/US2010/024358 patent/WO2010096407A1/fr active Application Filing
- 2010-02-17 KR KR1020117021587A patent/KR101600128B1/ko active IP Right Grant
- 2010-02-17 SG SG2011059540A patent/SG173755A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
KR20110118820A (ko) | 2011-11-01 |
TWI521624B (zh) | 2016-02-11 |
KR101600128B1 (ko) | 2016-03-04 |
TW201101400A (en) | 2011-01-01 |
WO2010096407A1 (fr) | 2010-08-26 |
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