KR101586444B1 - Apparatus for washing substrate - Google Patents

Abstract

The present invention relates to an apparatus for washing a substrate which can effectively remove foreign substances existing on a surface of a substrate for display. According to one embodiment of the present invention, the apparatus for washing a substrate includes: a washing vessel having a washing space therein, connected to a washing solution supplying unit and a washing solution dispensing unit, and including a mounting unit made of a vacuum means for the substrate to be mounted therein; and a washing unit disposed on an upper part of the mounting unit to wash a front surface of the substrate.

Description

[0001] APPARATUS FOR WASHING SUBSTRATE [0002]

The present invention relates to a substrate cleaning apparatus, and more particularly, to a substrate cleaning apparatus for effectively removing foreign substances present on a surface of a display substrate.

In general, the substrate may be a flat panel display (FPD) such as a liquid crystal display (LCD), a plasma display panel (PDP) and an organic light emitting diode (OLED) A wafer for a photomask, and a glass for a photomask.

Although the substrate of the flat panel display element and the substrate of the semiconductor wafer differ in terms of the material surface and the purpose thereof, a series of processing steps such as exposure, development, etching, stripping, rinsing, And the substrate is produced by sequential progression of these processes.

The LCD substrate of the above-described substrate will be described as an example. The substrate is mainly manufactured through a TFT process, a cell process, and a module process.

A TFT (Thin Film Transistor) process is very similar to a semiconductor manufacturing process, and is a process of arranging thin film transistors on a glass substrate by repeating deposition, photolithography and etching.

In the cell process, an alignment film is formed on a top plate, which is a TFT bottom plate and a color filter (CF) manufactured by a TFT process, so that the liquid crystal can be well aligned, and the upper and lower plates are adhered by sealing printing after arranging the spacers .

The module process is a process of attaching a polarizing plate and an integrated circuit to a completed substrate, assembling the substrate with a printed circuit board (PCB), and then assembling the backlight unit and the apparatus with the back surface.

Meanwhile, in the module process, a process for cleaning the surface of the substrate before the polarizer is attached to the substrate is added. That is, the surface of the substrate is cleaned in order to remove foreign substances such as dust and debris remaining on the surface of the substrate as the linear processes proceed, thereby bringing the front surface of the substrate into a substantially complete mirror surface state.

At this time, the substrate cleaning equipment applied is cleaned the surface of the substrate in such a manner that the surface of the substrate is directly pressed and polished off from the work by simply spraying water.

Such a conventional substrate cleaning apparatus has been proposed a system using a belt and a system using a polishing cloth.

Particularly, since a substrate cleaning apparatus using a belt is capable of directly cleaning a surface of a substrate by forcing a belt directly against a surface of the substrate, the cleaning performance is substantially excellent. However, the apparatus for driving the belt to operate and the structure Further, fine particles and debris may be generated due to belt driving.

On the other hand, Korean Patent Registration No. 10-0685919 is conventionally known for effective cleaning of a substrate.

According to the above-mentioned conventional registered patent, bubbles are formed by using a roll brush having a pupil, so that the hairs on the brush surface do not clump with each other, and the contamination particles on the substrate can be removed while using the roll brush for a long time.

However, in the conventional registered patent, since the roll brush performs surface contact with the substrate while rotating around the central axis thereof, excessive driving pressure of the roll brush causes sucking on the entire surface of the substrate.

Further, there has been a problem that the portals are separated from the roll brush by the rotation driving of the roll brush, or the rinse water remains in a residue state around the pore after a certain period of time and interrupts the flow of the rinse water.

       SUMMARY OF THE INVENTION It is an object of the present invention to provide a substrate cleaning apparatus for effectively removing foreign substances present on a surface of a display substrate.

According to an aspect of the present invention, there is provided a substrate cleaning apparatus including a cleaning unit having a cleaning space therein, and a mounting unit connected to a cleaning liquid supply unit and a cleaning liquid discharge unit, And a cleaning unit disposed on the cleaning container and the seating part to clean the entire surface of the substrate.

In one example of the present invention, there is provided a washing machine comprising: first driving means for feeding at least one of the cleaning container and the cleaning unit in a first direction parallel to the paper; and a second driving unit for rotating the cleaning unit about the second And driving means and third driving means for feeding the cleaning portion in the vertical direction on the paper.

According to an embodiment of the present invention, the cleaning section includes a cleaning means provided with a support shaft passing through the center thereof, support means connected to both ends of the support shaft in the longitudinal direction through a guider bar, And the support means may be rotatably coupled to the rotary shaft.

According to another aspect of the present invention, there is provided a cleaning apparatus comprising cleaning means including cleaning means provided through a center of a support shaft, a rotation plate rotatably coupled to a rotation shaft and connected to both ends in the longitudinal direction of the support shaft via the guider bar, And an elastic body coupled to the guider bar so as to generate an elastic repulsive force at both ends in the longitudinal direction of the support shaft.

In one embodiment of the present invention, the cleaning means is provided with a cylindrical roller portion having elasticity, and a polishing sheet surrounding the outer peripheral surface of the roller portion may further be provided.

In one embodiment of the present invention, the abrasive sheet is provided with an abutting portion, and the abutting portion may be disposed apart from the front surface of the substrate.

According to an embodiment of the present invention, at least one through hole is formed to penetrate the inside of the roller portion, and a through-hole for inserting into the through-hole to adjust a region where a part of an outer circumferential surface of the roller portion and a front surface of the substrate are in contact with each other. Can be provided.

In an exemplary embodiment of the present invention, a guide hole may be formed, the guide hole having a path of a radius of rotation corresponding to an outer circumferential surface of the roller portion, the guide hole being penetrated through the inside of the roller portion, A guide pin for adjusting the mutual contact area can be provided.

According to an embodiment of the present invention, when the roller is relatively smaller than the front surface of the substrate, fourth driving means for transferring at least one of the cleaning container and the cleaner in a direction crossing the first direction is further provided .

In one example of the present invention, the apparatus may further include a control unit for controlling the cleaning container and the cleaning unit.

In one embodiment of the present invention, the cleaning liquid supply unit further includes a plurality of injection nozzles for discharging the cleaning liquid on the entire surface of the substrate, and the discharge pressure of the spray nozzles can be controlled through the control of the controller.

In one embodiment of the present invention, the cleaning container is provided in a box shape having an opening at an upper portion, and blocking means for preventing the outside of the cleaning liquid from being sprayed out may be further provided on all sides of the cleaning container.

According to the present invention as described above, the substrate is placed on the cleaning container having the cleaning space, the cleaning operation is performed by the front surface polishing method using the transfer force of the cleaning container and the cleaning part, Foreign matter can be easily removed.

In other words, since the polishing section is provided on the outer circumferential surface of the roller section of the cleaning section, the cleaning operation is carried out by replacing the used polishing sheet, so that the service life of the roller section is increased and handling and management of the apparatus is facilitated.

By including means for generating an elastic repulsive force, for example, a guider bar and an elastic member at both ends of the roller portion, a proper pressing force is transmitted to the entire surface of the substrate and the left and right balances of the roller portion are maintained constant. The front surface of the substrate can be cleaned smoothly in a state of stably adhering.

A first driving means for feeding at least one of the cleaning container and the cleaner in a direction intersecting the paper surface; a second driving means for transporting the cleaner in the vertical direction from the paper; By providing the third driving means for rotating around the center, it is possible to quickly and effectively clean the entire surface of the substrate in various directions.

Further, since the fourth driving means for feeding at least one of the cleaning container and the cleaner in a direction parallel to the paper surface is further provided, the cleaning operation corresponding to the flexible front surface is performed You can proceed.

It should be understood that the effects of the present invention are not limited to the above effects and include all effects that can be deduced from the detailed description of the present invention or the configuration of the invention described in the claims.

1 is a perspective view showing a substrate cleaning window according to the present invention.
2 is a view showing a cleaning container to which the first driving means according to the present invention is applied.
3 is a view showing a cleaning container to which the fourth driving means according to the present invention is applied.
4 is a view showing the cleaning section of the substrate cleaning apparatus according to the present invention.
5 and 6 are views showing a cleaning unit according to the present invention cleaning a front surface of a substrate.
7 is a view showing another example of the roller portion according to the present invention.

Hereinafter, a substrate cleaning apparatus according to the present invention will be described in detail with reference to the accompanying drawings.

In describing the present invention, the sizes and shapes of the components shown in the drawings may be exaggerated or simplified for clarity and convenience of explanation. In addition, terms defined in consideration of the configuration and operation of the present invention may vary depending on the intention or relationship of the user and the operator. These terms are to be construed in accordance with the meaning and concept consistent with the technical idea of the present invention based on the contents throughout the present specification.

Throughout the specification, when a part is referred to as being "connected" to another part, it includes not only "directly connected" but also "indirectly connected" . Also, when a part is referred to as "comprising ", it means that it can include other components as well, without excluding other components unless specifically stated otherwise.

Hereinafter, a substrate cleaning apparatus for cleaning a front surface of a substrate will be described with reference to the accompanying drawings.

The substrate may be a flat panel display (FPD) such as a liquid crystal display (LCD), a plasma display panel (PDP), or an organic light emitting diode (OLED) And can be replaced with various kinds of substrate materials for displays.

FIG. 1 is a perspective view showing a substrate cleaning window according to the present invention, and FIGS. 2 and 3 are views showing a cleaning container to which a first driving means and a fourth driving means according to the present invention are applied.

1, a substrate cleaning apparatus 100 (hereinafter, referred to as a cleaning apparatus) according to the present embodiment includes a cleaning vessel 110 and a cleaning unit 140, and includes a cleaning vessel 110 and a cleaner 140, and a control unit 180 for controlling the posture change and the like.

The cleaning vessel 110 is provided in the shape of a box having an open upper side and has a cleaning space therein and is connected to the cleaning liquid supply unit 111 and the cleaning liquid discharge unit 112, (113).

The seating portion 113 has a seating surface and a vacuum means for seating and fixing the substrate 10, for example, a plurality of seating holes 114, is provided on the seating surface.

The air hole 114 is connected to a vacuum pressure generating apparatus (not shown), and the substrate 10 is seated and fixed to the seating surface by an attraction force generated from the vacuum pressure generating apparatus.

The air hole 114 may be formed in a predetermined pattern having a predetermined distance from each other so that the lattice or each of the apertures 114 may be spaced apart from each other so as to prevent the separation and separation phenomenon during the process of seating and fixing the substrate 10 on the seating portion 113. [ . ≪ / RTI >

If the separation and separation of the substrate 10 can be prevented during the course of the cleaning operation in the mutual seating and fixing relationship between the substrate 10 and the seating part 113, It is possible to change the structure of various vacuum means such as clamps other than the structure.

The cleaning liquid supply unit 111 is provided with a plurality of spray nozzles 111a for discharging the cleaning liquid on the entire surface of the substrate 10. The discharge pressure of the spray nozzles 111a is controlled through the control of the controller 180. [

In addition, blocking means 115 are provided on all sides of the cleaning container 110 to prevent the cleaning liquid from being sprayed from the outside and restrict the cleaning liquid to flow only inside the cleaning container 110.

At this time, it is preferable that the blocking means 115 is provided with a transparent material such as glass and plastic so that the cleaning operation can be easily observed from the outside of the cleaning container 110.

When the cleaning liquid supply portion 111 is disposed on one side of the blocking means 115, a plurality of ejection holes (not shown) corresponding to the ejection nozzles 111a of the cleaning liquid supply portion 111 are provided at one end of the blocking means 115 And the cleaning liquid discharged from the cleaning liquid supply unit 111 through the injection holes can be sprayed toward the front surface of the substrate 10 under a predetermined pressure.

The cleaning liquid supply unit 111 may be disposed on one side of the blocking unit 115 but the present invention is not limited thereto and may be configured to supply the cleaning liquid to the inside of the cleaning container 110, If the structure is capable of injecting under a certain pressure, various implementations can be made.

The cleaning part 140 is disposed on the upper part of the seating part 113 to linearly move through the first driving means 120 and 170 as a means for cleaning the front surface of the substrate 10, 150 and the third driving means 160. The detailed description will be given later.

1, the support frame 20 is provided so that the cleaning part 140 is smoothly driven at the upper part of the cleaning container 110 so that the cleaning container is linearly transferred into the support frame 20 But the present invention is not limited thereto and can be variously implemented as long as the constituent means of the cleaning vessel 110 and the constituent means of the cleaning portion 140 do not interfere with each other on the cleaning operation.

Hereinafter, the first to fourth driving means for changing the attitude of the cleaning container or the cleaning unit will be described with reference to an example applied to the cleaning container. For the sake of convenience, the first direction is referred to as an X-axis direction, the second direction is referred to as a Z-axis direction, and the third direction is referred to as a third direction. Y axis direction.

As shown in FIGS. 1 and 2, a first driving means 120 for conveying in a first direction is disposed below the cleaning vessel 110.

The first driving unit 120 includes a first conveying actuator 121, a first guide rail 123, and a first plate 125.

The first guide rail 123 is disposed below the cleaning vessel 110 and feeds the cleaning vessel 110 through a first slider 124 provided at one end.

The first driving means 120 includes a first slider 124 slidably coupled to the first guide rail 123 and a second slider 124 coupled to a lower surface of the cleaning container 110, And a first feed actuator 121 for rotating the first feed screw 122.

Accordingly, when the first driving means 120 operates, the cleaning vessel 110 moves linearly in the first direction.

3, the fourth driving unit 130 may further be provided under the first driving unit 120. When the front surface of a substrate (not shown) having a relatively large area is to be cleaned Applicable.

A fourth driving means 130 is provided below the first driving means 120 to transfer the cleaning container 110 in a third direction crossing the first direction. A second guide rail 133, and a second plate 135. The second guide rail 131 is provided with a first guide rail 131, a second guide rail 133,

The second guide rail 133 is disposed below the first plate 125 and feeds the first plate 125 through a second slider 134 provided at one end.

Specifically, the fourth driving means 130 includes a second conveying screw 132, a second conveying actuator 131 for rotating the second conveying screw 132, and a second conveying screw 132 that are screwed to the second conveying screw 132 And a second sub-transport portion 131a.

The second sub-feed portion 131a is coupled to the lower surface of the first plate 125 and is operated together with the first plate 125. [

One end of the second conveyance screw 132 is rotatably supported on a screw support portion 132a coupled to the second plate 135. [

When the second conveying screw 132 rotates due to the operation of the second conveying actuator 131, the first plate 125 is moved along the second guide rail 133 together with the second sub conveying portion 131a in the third direction .

Accordingly, when the fourth driving means 130 is operated, the cleaning container 110 moves linearly in the third direction.

The structures of the first driving means 120 and the fourth driving means 130 are not limited to those shown in the drawings, but may be modified into various structures capable of transporting the cleaning container 110.

The arrangement order of the first driving means 120 and the fourth driving means 130 may be changed under a condition that the first driving means 120 and the fourth driving means 130 are coupled to the lower portion of the cleaning container 110 in a line, .

The first driving means 120 and the fourth driving means 130 are so arranged that the cleaning portion 140 is transferred in the first direction and the third direction in the same manner as the coupling condition of the cleaning container 110, 20).

Hereinafter, one configuration and operation of the second driving means 150 and the third driving means 160 will be described.

A second driving means 150 and a cleaning portion 140 for rotating the cleaning portion 140 about a second vertical direction on the surface of the cleaning portion 140 are transported in a second direction perpendicular to the surface of the cleaning portion 140 A third driving means 160 is provided.

The second driving unit 150 is for rotating the cleaning unit 140 via a rotation shaft (not shown) disposed in the upper part of the cleaner unit 140, And a rotary actuator 151 provided at one end of the lifting frame 152 to be coupled.

The rotary actuator 151 rotates a rotary shaft disposed in an upper direction on the rotary plate 147, and the rotary shaft is rotatably coupled to the rotary plate 147.

Accordingly, when the second driving means 150 is operated, the rotation plate 147 rotates about the rotation axis, and the support means 144, which is coupled at one end with the rotation plate 147, And simultaneously rotated.

The rotation force is transmitted to the rotation plate 147 of the cleaner 140 and the support means 144 coupled to the rotation plate 147 is rotated in the same manner as the rotation plate 147. However, The cleaning unit 140 may be rotated or the rotation plate 147 connected to the rotation axis may be connected to the cleaning unit and rotated.

The third driving means 160 is provided with a guide groove of a frame (not shown) for guiding the movement of the above-described lifting frame 152 and a guide groove formed on one side of the lifting frame 152, And the guide protrusion may be combined with a conveying screw provided inside the frame body so as to have a conveying force of the ascending and descending steel.

Accordingly, when the third driving means 160 is operated, the lifting frame 152 is lifted and lowered along the guide grooves, and the lifting frame 152 and the driving means 150 140 move up and down simultaneously with the lifting frame 152.

As described above, due to the above-described operation relationship between the second driving means 150 and the third driving means 160, the cleaning portion 140 can realize the attitude change of the rotation and the ascending / It is possible to clean the front surface finely and rapidly.

The structure of the second driving means 150 and the third driving means 160 is not limited to that shown in FIG. 1, and can be changed into various structures that can rotate and move the cleaning portion 140 .

The arrangement order of the second driving means 150 and the third driving means 160 under the condition that the second driving means 150 and the third driving means 160 are coupled to the upper portion of the cleaning portion 140 may be changed, have.

4 to 7 are views for explaining the cleaning operation of the substrate cleaning apparatus according to the present invention through the cleaning and cleaning unit. Hereinafter, the description will be made based on the case where the rollers of the cleaning unit are equal to or larger than the front surface size of the substrate, and the rollers are larger than the front surface of the substrate.

As shown in Figure 4, the cleaning section 140 comprises cleaning means, support means 144 and an elastic body 146.

The cleaning means is provided with a roller portion 141 having a cylindrical shape with elasticity through which the support shaft 142 passes, and is provided with a polishing portion 143a surrounding the outer peripheral surface of the roller portion 141, A joining portion 143a formed by contacting both ends of the polishing sheet 143 may be positioned on the outer peripheral surface of the roller portion 141. In this case,

The supporting means 144 is provided with a stopper (not shown) for defining a buffer region of the guide bar 145 on its upper portion and a pair of guider bars 145 And the elastic body 146 is connected to the guider bar 145 such that an elastic repulsive force is generated at both ends of the support shaft 142 in the longitudinal direction.

4, cleaning section 140 may also include cleaning means, rotating plate 147, and elastic body 146. In this embodiment,

That is, the cleaning section 140 includes cleaning means provided through the center of the support shaft 142, and cleaning means connected to both ends of the support shaft 142 in the longitudinal direction via the guider bar 145 And an elastic body 146 coupled to the guider bar 145 so as to generate an elastic repulsive force at both ends of the rotation plate 147 and the support shaft 142 in the longitudinal direction.

Therefore, the cleaning section 140 is provided with the pair of guider bars 145, so that the pressing force transmitted to the roller section 141 can be kept constant, 141 in the longitudinal direction can be properly maintained.

In addition, since the roller portion 141 of the cleaning portion 140 is made of an elastic material, a more stable cleaning operation can be performed while a pressing force transmitted to the entire surface of the substrate 10 is maintained at a constant pressure.

5 and 6, the cleaner 140 described above is disposed on the upper portion of the substrate 10 which is seated and fixed via the air hole 114 of the seating portion 113, The cleaning operation is performed.

That is, the front surface of the substrate 10 requiring a cleaning operation is fixed toward the second direction so as to face the outer peripheral surface of the roller portion 141 wrapped with the polishing sheet 143, and on the front surface of the substrate 10, There is a cleaning liquid which is discharged from the spraying nozzle 111a.

Thereafter, the cleaning part 140 has a posture change toward the front surface of the substrate 10 requiring a cleaning operation. At this time, the cleaning liquid supply part 111 continuously discharges the cleaning liquid toward the front surface of the substrate 10.

The cleaner 140 rotates about the second direction through the second drive means 150 and implements a linear motion in the first direction through the first drive means 120 and 170 So that the entire surface of the substrate 10 is cleaned.

At this time, since the cleaning liquid is discharged under a constant pressure, the foreign substances separated from the front surface of the substrate 10 during the cleaning operation flow together with the cleaning liquid, so that the substrate 10 can be separated from the substrate 10 and discharged easily.

The joining portion 143a of the polishing sheet 143 is preferably disposed on a part of the outer circumferential surface of the roller portion 141 that is spaced apart from the front surface of the substrate 10. [

This is because when the front surface of the substrate 10 and the joining portion 143a of the polishing sheet 143 are directly faced with each other during the cleaning operation, due to the repeated polishing of the joining portion 143a formed by abutting both ends of the polishing sheet 143 This is because surface defects may occur on the entire surface of the substrate 10.

The roller portions 241 and 341 according to the present embodiment are provided with the through pins 30 of FIG. 7A or the guide pins 40 of FIG. The cleaning life of the polishing sheets 243 and 343 can be increased while more effectively cleaning the entire surface.

7A, at least one through hole 241a penetrating the inside of the roller portion 241 is formed, and a part of the outer peripheral surface of the roller portion 241 is inserted into the through hole 241a, And a through-hole 30 for adjusting an area where the front surface of the substrate 10 is in contact with each other.

That is, the contact area of the polishing sheet 243 contacting the front surface of the substrate 10 can be varied through the through-hole pin 30 that is selectively coupled with one through hole 241a or another through hole 241a The material life of the polishing sheet 243 can be maintained for a long time.

7 (b), a guide hole 341a having a path of a radius of rotation corresponding to the outer circumferential surface of the roller portion 341 is formed through the inside of the roller portion 341, and a guide hole 341a A guide pin 40 may be provided for adjusting an area where a portion of the outer circumferential surface of the roller portion 341 and a front surface of the substrate 10 are in contact with each other.

That is, the guide pin 40 is guided through the guide hole 341a formed in the path of the turning radius through the guide pin 40, which is coupled with the guide hole 341a, The contact area of the sheet 343 is easily adjustable.

Although not specifically shown, the through-pin 30 and the guide pin 40 are disposed so that both ends of the through-pin 30 and the guide pin 40 protrude from both sides in the longitudinal direction of the roller portions 241 and 341, Can be fixed through a structure associated with the means.

As a result, as shown in Figs. 1 to 7, the following effects can be expected through the cleaning apparatus 100 according to the present embodiment.

The cleaning apparatus 100 according to the present embodiment is a cleaning apparatus having a cleaning chamber 110 having a cleaning space and a substrate 10 having the cleaning chamber 110 and the cleaning portion 140, The cleaning operation is performed by the front polishing method, and various foreign substances sticking to the substrate 10 side can be easily removed.

That is, the roller portion 141 of the cleaning portion 140 is provided with the polishing sheet 143 on its outer circumferential surface to advance the cleaning work by replacing the used polishing sheet 143, As lifetime increases, it is easy to handle and manage the equipment in operation.

The roller unit 141 includes means for generating an elastic repulsive force such as a guider bar 145 and an elastic body 146 so that an appropriate pressing force is transmitted to the entire surface of the substrate 10, The entire surface of the substrate 10 can be smoothly cleaned in a state in which the cleaning portion 140 is stably stuck on the substrate 10 since the left and right balances of the cleaning portion 141 are kept constant.

A first driving unit 120 for transferring at least one of the cleaning container 110 and the cleaning unit 140 in a direction intersecting the paper surface; And the third driving means 160 for vertically moving the cleaning unit 140 and the cleaning unit 140 in the vertical direction can be used to quickly and effectively clean the front surface of the substrate 10 in various directions have.

Further, the fourth driving means 130 for transferring the cleaning container 110 and the cleaning portion 140 in the third direction intersecting the first direction is further provided, so that the front surface of the substrate 10 is supported by the roller portion 141 It is possible to carry out a cleaning operation corresponding to a relatively large case.

It will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the present invention as defined by the following claims . It is therefore to be understood that the above-described embodiments are illustrative in all aspects and not restrictive. For example, each component described as a single entity may be distributed and implemented, and components described as being distributed may also be implemented in a combined form.

The scope of the present invention is defined by the appended claims, and all changes or modifications derived from the meaning and scope of the claims and their equivalents should be construed as being included within the scope of the present invention.

10: substrate 20: support frame
30: through pin 40: guide pin
100: substrate cleaning apparatus 110: cleaning vessel
111: cleaning liquid supply unit 111a: injection nozzle
112: Cleaning liquid discharging portion 113:
114: opening and closing 115: blocking means
120, 170: first drive means 121: first transfer actuator
121a: first sub-feeder 122: first feed screw
123: first guide rail 124: first slider
125: first plate 130: fourth driving means
131: second feed actuator 131a: second sub-
132: second conveyance screw 132a: screw support
133: second guide rail 134: second slider
135: second plate 140:
141, 241, 341: roller portions 143, 243, 343: polishing sheet
142: Support shaft 143a, 243a, 343a: (Polishing sheet)
144: support means 145: buffer guider
146: elastic body 150: second driving means
160: third driving means 241a: through hole
341a: Guide hole

Claims (12)

A cleaning container having a cleaning space therein, the cleaning container being connected to the cleaning liquid supply portion and the cleaning liquid discharge portion, and having a seating portion provided as a vacuum means for seating the substrate therein; And
And a cleaning part disposed on the seating part to clean the entire surface of the substrate,
The cleaning section includes: cleaning means provided with a support shaft passing through the center; A rotating plate rotatably coupled to both ends of the support shaft in the longitudinal direction and connected to the support means or the rotation shaft via the guide bar and connected to both ends of the support shaft in the longitudinal direction via the guide bar; And an elastic body coupled to the guider bar so as to generate an elastic repulsive force at both ends in the longitudinal direction of the support shaft.
The method according to claim 1,
A first driving means for transferring at least one of the cleaning container and the cleaning means in a first direction parallel to the paper surface, a second driving means for rotating the cleaning means about a vertical direction on the ground, And a third driving means for moving the substrate in a direction perpendicular to the surface of the substrate.
delete delete The method according to claim 1,
Wherein the cleaning means is provided with a cylindrical roller portion having elasticity and further comprises a polishing sheet surrounding the outer peripheral surface of the roller portion.
6. The method of claim 5,
Wherein the polishing sheet is provided with a bonding portion, wherein the bonding portion is disposed to be spaced apart from a front surface of the substrate.
6. The method of claim 5,
Wherein at least one through hole is formed to penetrate the inside of the roller portion and a through pin is inserted into the through hole to adjust a region where a part of an outer circumferential surface of the roller portion and a surface of the substrate are in contact with each other. Substrate cleaning apparatus.
6. The method of claim 5,
A guide hole passing through the inside of the roller portion and having a path of a radius of rotation corresponding to the outer circumferential surface of the roller portion is formed, and a region of the outer circumferential surface of the roller portion, which is inserted into the guide hole, Wherein a guide pin is provided for the substrate cleaning apparatus.
6. The method of claim 5,
Further comprising fourth drive means for transferring at least one of the cleaning container and the cleaning section in a direction crossing the first direction when the roller portion is relatively smaller than the front surface of the substrate.
The method according to claim 1,
And a controller for controlling the cleaning vessel and the cleaning unit.
11. The method of claim 10,
Wherein the cleaning liquid supply unit is further provided with a plurality of spray nozzles for spraying a cleaning liquid on the front surface of the substrate, and the discharge pressure of the spray nozzles is controlled through the control of the controller.
The method according to claim 1,
Wherein the cleaning container is provided in a box shape having an opening at an upper portion thereof, and further includes a blocking means for preventing the cleaning liquid from being blown out from the outside of the cleaning container.

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