JP6720659B2 - Substrate drainer - Google Patents

Substrate drainer Download PDF

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JP6720659B2
JP6720659B2 JP2016079704A JP2016079704A JP6720659B2 JP 6720659 B2 JP6720659 B2 JP 6720659B2 JP 2016079704 A JP2016079704 A JP 2016079704A JP 2016079704 A JP2016079704 A JP 2016079704A JP 6720659 B2 JP6720659 B2 JP 6720659B2
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base material
substrate
gas
spraying
liquid
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JP2017190895A (en
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順士 堀
順士 堀
雄 宮島
雄 宮島
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AGC Inc
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Asahi Glass Co Ltd
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Description

本発明は、基材の液切り装置に関する。 The present invention relates to a substrate drainer.

ガラス材等からなる基材を、その表面にスクリーン印刷やパッド印刷等の各種の印刷方法により所望のパターンを印刷し、美観に優れた装飾用部品として使用することがある。基材表面を印刷する際、塵埃や微小な異物、或いは付着した油脂等を除去するため、予め洗浄液により基材表面を洗浄する必要がある。そして、基材表面の洗浄後は、圧縮空気を基材に吹き当てて基材表面に付着している処理液を除去する液切りが行われる。この液切り方法として、例えば特許文献1,2のような技術が知られている。 A base material made of a glass material or the like may be used as a decorative component having an excellent appearance by printing a desired pattern on its surface by various printing methods such as screen printing and pad printing. When printing the surface of the base material, it is necessary to wash the surface of the base material with a cleaning liquid in advance in order to remove dust, minute foreign matters, oils and fats attached to the surface. Then, after cleaning the surface of the base material, liquid draining is performed in which compressed air is blown onto the base material to remove the processing liquid adhering to the surface of the base material. As such a liquid draining method, for example, the techniques disclosed in Patent Documents 1 and 2 are known.

特許文献1の構成においては、処理液によって洗浄された基材を所定方向に搬送しながら、この基材の搬送方向と交差する方向に対して傾斜して配設されたエアーナイフから上記基材に気体を噴射することで、基材を乾燥させている。 In the configuration of Patent Document 1, the base material washed with the treatment liquid is conveyed in a predetermined direction, and the base material is removed from an air knife that is inclined with respect to a direction intersecting the conveyance direction of the base material. The substrate is dried by injecting a gas onto the substrate.

また、特許文献2の構成においては、基材の搬入方向に対し所定の角度で設置されたエアーナイフと、エアーナイフを上下動させる上下動手段と、を備え、基材の搬送位置を検出する位置検出センサの出力に応じてエアーナイフを上下させて、基材に対する気体の風圧を制御している。 Further, in the configuration of Patent Document 2, an air knife installed at a predetermined angle with respect to the carrying-in direction of the base material and a vertical movement means for moving the air knife up and down are provided, and the transport position of the base material is detected. The air knife is moved up and down according to the output of the position detection sensor to control the air pressure of the gas with respect to the base material.

特許第4718043号公報Japanese Patent No. 4718043 特開2009−204248号公報JP, 2009-204248, A

しかしながら、特許文献1の構成では、基材の被乾燥面が曲面形状、特に凹面形状であると、低い部分に処理液が溜まってしまい、気体の噴射量を増やしても処理液を除去しきれず、洗浄痕が残ってしまうおそれがある。また、特許文献2の構成も同様に、基材の乾燥面が曲面形状を有していると処理液を完全に除去できず、改善の余地があった。 However, in the configuration of Patent Document 1, when the surface to be dried of the base material has a curved surface shape, particularly a concave surface shape, the processing liquid accumulates in a low portion, and the processing liquid cannot be completely removed even if the gas injection amount is increased. There is a risk that cleaning marks will remain. Similarly, in the configuration of Patent Document 2, if the dry surface of the substrate has a curved surface shape, the treatment liquid cannot be completely removed, and there is room for improvement.

また、基材を保持具で保持して搬送する場合、基材と保持具との接触部に処理液が残り易く、残存する処理液によって洗浄痕が生じてしまうおそれがある。 Further, when the base material is held by the holder and conveyed, the treatment liquid is likely to remain at the contact portion between the base material and the holder, and the residual treatment liquid may cause cleaning marks.

本発明は、曲面形状を有する基材の洗浄後、確実に液切りして、洗浄痕の発生を防止できる基材の液切り装置を提供することを目的とする。 It is an object of the present invention to provide a substrate drainer capable of reliably draining a substrate having a curved surface shape after cleaning and preventing the generation of cleaning marks.

本発明は、下記構成からなる。
少なくとも一部に曲面形状を有する基材に気体を吹き付けて、前記基材に付着している処理液を除去する基材の液切り装置であって、
前記基材を支持する基材支持部と、
気体を噴射する気体噴射部と、
前記基材支持部と前記気体噴射部とを相対移動させ、前記基材の一端部から他端部までの基材表面に前記気体噴射部からの気体噴流を吹き当てる相対移動機構と、
を備え、
前記相対移動機構は、吹き当て角調整部により前記相対移動に伴う前記基材表面の吹き当て位置における法線方向の変化に応じて、前記気体噴射部からの気体噴射方向と前記法線方向とのなす吹き当て角を調整する機能を有する基材の液切り装置。
The present invention has the following configurations.
A device for draining a substrate, which comprises blowing a gas onto a substrate having a curved shape in at least a part thereof to remove a treatment liquid adhering to the substrate,
A base material support part for supporting the base material,
A gas injection unit for injecting gas,
A relative movement mechanism that relatively moves the base material support part and the gas injection part, and sprays a gas jet from the gas injection part onto the base material surface from one end to the other end of the base material,
Equipped with
The relative movement mechanism, in accordance with the change in the normal direction at the blowing position of the base material surface due to the relative movement by the blowing angle adjusting unit, the gas jet direction from the gas jet unit and the normal direction. A substrate drainer having a function of adjusting the spraying angle formed by.

本発明の基材の液切り装置によれば、曲面形状を有する基材の洗浄後、基材表面を確実に液切りでき、洗浄痕の発生を防止できる。 According to the substrate drainer of the present invention, it is possible to reliably drain the surface of the substrate after cleaning the substrate having a curved shape, and prevent the generation of cleaning marks.

基材の液切り装置が搭載された基材処理装置の模式図である。It is a schematic diagram of a base material processing device in which a liquid draining device for a base material is mounted. 基材の液切り装置の要部側面図である。It is a principal part side view of the liquid draining device of a base material. エアーナイフから基材に向けて気体を噴射する様子を示す気体噴射部の模式的な斜視図である。It is a typical perspective view of the gas injection part which shows a mode that gas is injected toward a base material from an air knife. 液切り装置の制御ブロック図である。It is a control block diagram of a liquid draining device. (A)〜(E)は基材支持部に支持される基材が、エアーナイフに対して相対移動しながら搬送されて基材表面に付着する処理液を液切りする工程を段階的に示す基材支持部の動作説明図である。(A) to (E) show stepwise a process in which a substrate supported by a substrate supporting part is conveyed while moving relative to an air knife to drain a treatment liquid adhering to the substrate surface. It is operation|movement explanatory drawing of a base material support part. 第2構成例の基材の液切り装置の要部側面図である。It is a principal part side view of the liquid draining apparatus of the base material of the 2nd structural example. (A)は第3構成例の基材支持部である第1支持具の斜視図、(B)は第3構成例の基材支持部である第2支持具の斜視図である。FIG. 9A is a perspective view of a first support tool that is a base material support portion of a third configuration example, and FIG. 9B is a perspective view of a second support tool that is a base material support portion of a third configuration example. (A)は第4構成例の基材支持部である第1支持具の斜視図、(B)は第4構成例の基材支持部である第2支持具の斜視図である。(A) is a perspective view of a first support tool which is a base material support portion of a fourth configuration example, and (B) is a perspective view of a second support tool which is a base material support portion of a fourth configuration example. 基材支持部に固定支持される基材に対して、エアーナイフが移動可能に配設された液切り装置の要部側面図である。It is a principal part side view of the liquid draining device in which the air knife is movably arranged with respect to the base material fixedly supported by the base material support portion.

以下、本発明の実施形態について、図面を参照して詳細に説明する。
図1は基材の液切り装置が搭載された基材処理装置の模式図である。
基材処理装置200は、基材Pを洗浄処理して、乾燥処理する装置である。この基材処理装置200は、洗浄装置300、基材の液切り装置100、及び第1搬送部11、第2搬送部13、第3搬送部15を備える。以降、基材の液切り装置100を、液切り装置100と略称する。ここで用いる基材Pは、少なくとも一部に曲面形状を有するガラス材として説明する。基材Pは、無機ガラス、有機ガラスの他、種々の素材であってもよい。
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 1 is a schematic view of a base material processing device equipped with a liquid draining device for a base material.
The base material processing device 200 is a device for cleaning and drying the base material P. The base material processing device 200 includes a cleaning device 300, a base material draining device 100, a first transfer unit 11, a second transfer unit 13, and a third transfer unit 15. Hereinafter, the liquid draining device 100 for the substrate will be abbreviated as the liquid draining device 100. The substrate P used here will be described as a glass material having a curved shape at least in part. The base material P may be various materials other than inorganic glass and organic glass.

第1搬送部11は、不図示の基材供給部から供給された基材Pを洗浄装置300に搬送する。第2搬送部13は、洗浄装置300から搬出された基材Pを液切り装置100に搬送する。第3搬送部15は、液切り装置100から搬出された基材Pを不図示の後段の処理部に向けて搬送する。 The 1st conveyance part 11 conveys the base material P supplied from the base material supply part which is not illustrated to the cleaning apparatus 300. The second transport unit 13 transports the substrate P carried out from the cleaning device 300 to the draining device 100. The 3rd conveyance part 15 conveys the base material P carried out from the liquid removal apparatus 100 toward the processing part of the latter stage not shown.

第1搬送部11、第2搬送部13、及び第3搬送部15は、搬送ベルト21が、駆動ローラ17及びガイドローラ19に巻き掛けられて走行するベルトコンベアとして構成される。この他にも、ローラコンベアによる搬送、ピッチ送り機構による搬送、カセット等の容器に基材Pを装填しての搬送等であってもよい。特に、ベルトコンベアやローラコンベアによれば、簡易で高効率に搬送できる。 The first transport unit 11, the second transport unit 13, and the third transport unit 15 are configured as belt conveyors in which the transport belt 21 is wound around the drive roller 17 and the guide roller 19 to travel. In addition to this, conveyance by a roller conveyor, conveyance by a pitch feed mechanism, conveyance with a substrate P loaded in a container such as a cassette, and the like may be performed. Particularly, a belt conveyor or a roller conveyor enables simple and highly efficient transportation.

各搬送部11,13,15は、少なくとも一部に曲面形状を有する基材Pであっても安定して搬送できる。より具体的な搬送方式としては、例えば、Vベルト等の断面が比較的小さい概略紐状の搬送ベルトを有するベルトコンベアを2台平行に配置して、基材Pの対向する2辺の端部を保持して搬送する方式であってもよい。又は、一定ピッチでの移動が可能なウォーキングビームに、基材Pの形状に合致した保持台を設置して、基材Pを保持台に載せながら搬送するピッチ送り機構による方式であってもよい。その場合、曲面形状を有する基材Pを効率的に搬送するには、基材Pを少なくとも3点で保持するのが望ましい。そこで、ピッチ送り機構による搬送では、基材Pの支持点を少なくとも3点設ける。更に、カセット等の容器に基材Pを装填して搬送する方式であってもよい。何れの方式であっても、後段の洗浄工程では洗浄水(処理液)を使用するため、搬送部には耐水性が求められる。上記した搬送部の構成によれば、曲面形状を持つ基材Pを回転させずに安定して搬送できる。 Even if it is the base material P which has curved surface shape at least one part, each conveyance part 11,13,15 can convey stably. As a more specific transport method, for example, two belt conveyors having a substantially belt-shaped transport belt having a relatively small cross section such as a V-belt are arranged in parallel, and end portions of two opposite sides of the base material P are arranged. It may be a method of holding and transporting. Alternatively, a method using a pitch feed mechanism in which a holding table that matches the shape of the base material P is installed on a walking beam that can move at a constant pitch and the base material P is conveyed while being placed on the holding base may be used. .. In that case, in order to efficiently convey the base material P having a curved shape, it is desirable to hold the base material P at at least three points. Therefore, at least three supporting points of the base material P are provided in the conveyance by the pitch feed mechanism. Further, a method in which the substrate P is loaded in a container such as a cassette and then conveyed may be used. In either method, cleaning water (treatment liquid) is used in the subsequent cleaning step, so that the transport section is required to have water resistance. According to the above-described configuration of the transport unit, the substrate P having a curved shape can be stably transported without rotating.

洗浄装置300は、第1搬送部11と第2搬送部13との間に配置され、基材表面に洗浄液等の処理液を噴射供給して、回転ブラシ23を接触させて洗浄する。 The cleaning device 300 is disposed between the first transfer unit 11 and the second transfer unit 13, and sprays and supplies a processing liquid such as a cleaning liquid to the surface of the base material to bring the rotary brush 23 into contact with it for cleaning.

液切り装置100は、第2搬送部13と第3搬送部15との間に配置され、気体噴射部であるエアーナイフ33から噴出する圧縮空気等の気体噴流を基材Pに吹き当てて、洗浄装置300で使用された処理液の残存液を液切りする。気体噴射部としては、一方向に気体噴流を噴射できればよく、ブロワーや波動ノズル等を用いることもできる。 The liquid draining device 100 is disposed between the second transfer unit 13 and the third transfer unit 15, and sprays a gas jet of compressed air or the like ejected from the air knife 33, which is a gas ejecting unit, onto the base material P, The residual liquid of the processing liquid used in the cleaning device 300 is drained. As the gas injecting section, it is only necessary to inject a gas jet in one direction, and a blower, a wave nozzle, or the like can be used.

上記構成の基材処理装置200は、第1搬送部11に搬入された基材Pを、第1搬送部11により洗浄装置300に搬送し、基材表面に処理液を噴射供給し、回転駆動される回転ブラシ23を基材表面に接触させて洗浄する。洗浄後の基材Pは、第2搬送部13により液切り装置100に搬送される。液切り装置100は、搬入された基材Pを、エアーナイフ33から噴射される圧縮空気によって液切りした後、第3搬送部15により次工程へ搬出する。 In the base material processing device 200 having the above-described configuration, the base material P carried into the first transfer unit 11 is transferred to the cleaning device 300 by the first transfer unit 11, the processing liquid is jetted and supplied to the surface of the base material, and rotationally driven. The rotating brush 23 is brought into contact with the surface of the base material for cleaning. The substrate P after cleaning is transported to the drainer 100 by the second transport unit 13. The liquid draining device 100 drains the carried-in base material P with compressed air jetted from the air knife 33, and then carries it out to the next step by the third transport unit 15.

ここで、液切り装置100について、詳細に説明する。
<液切り装置の構成>
液切り装置100は、基材Pに圧縮空気等の気体噴流を吹き当て、基材Pに付着している処理液を除去する。一般に、気体噴流による液切りは、比較的平坦な広い面の乾燥に利用され、効率的に処理できる。しかし、曲率が比較的大きい曲面形状を有する基材に対しては、気体噴流の基材表面への吹き当て位置と吹き当て角によっては、処理液を基材表面に残存させる可能性がある。そこで、本構成の液切り装置100は、気体噴流の基材表面への吹き当てにより、確実に液切りができるように基材Pを最適な姿勢に調整可能な構成としている。
Here, the liquid draining device 100 will be described in detail.
<Structure of drainer>
The liquid removing device 100 blows a gas jet of compressed air or the like onto the base material P to remove the treatment liquid adhering to the base material P. Generally, drainage by a gas jet is used for drying a relatively flat and wide surface, and can be efficiently processed. However, for a base material having a curved surface with a relatively large curvature, the treatment liquid may remain on the surface of the base material depending on the position and angle of spraying of the gas jet onto the base material surface. Therefore, the liquid draining device 100 of this configuration is configured such that the base material P can be adjusted to an optimum posture so that the liquid can be surely drained by spraying the gas jet onto the surface of the base material.

図2は基材の液切り装置の要部側面図である。
本構成の液切り装置100は、基材Pを支持する基材支持部31と、気体を噴射して気体噴流を生成するエアーナイフ33と、基材支持部31を移動させる移動ステージ41と、を備える。エアーナイフ33には、図1に示す圧縮空気等の気体を供給するエア供給部39が接続される。
FIG. 2 is a side view of a main part of the substrate drainer.
The liquid draining device 100 having this configuration includes a base material support portion 31 that supports the base material P, an air knife 33 that injects a gas to generate a gas jet, and a moving stage 41 that moves the base material support portion 31. Equipped with. The air knife 33 is connected to an air supply unit 39 that supplies gas such as compressed air shown in FIG.

基材支持部31は、基材Pの形状に適合したフレーム部材を有する。このフレーム部材は、基材Pを傾斜状態で支持させた場合でも基材Pを落下させずに支持する。フレーム部材は、基材係止部31a、31bと、これら基材係止部31a、31bを連結する連結部31cと、を有する。基材係止部31aは、フレーム部材上に載置された基材Pの搬送方向上流端である気体噴流の吹き当て終了端Pbに当接して、搬送方向前後の位置決めを行う。基材係止部31bは、吹き当て終了端Pbよりも気体噴流の吹き当て開始端Pa側の位置で基材Pを支持し、搬送方向に直交するY方向に位置決めする。なお、基材係止部31aには、基材Pの吹き当て終了端Pbを係止する引っ掛け部32が設けられている。 The base material support portion 31 has a frame member that conforms to the shape of the base material P. The frame member supports the base material P without dropping it even when the base material P is supported in an inclined state. The frame member has base material locking portions 31a and 31b and a connecting portion 31c that connects these base material locking portions 31a and 31b. The base material locking portion 31a comes into contact with the blowing end end Pb of the gas jet, which is the upstream end in the transport direction of the base material P placed on the frame member, and positions the front and rear in the transport direction. The base material locking portion 31b supports the base material P at a position closer to the spraying start end Pa of the gas jet than the spraying end end Pb, and positions the base material P in the Y direction orthogonal to the transport direction. The base material locking portion 31a is provided with a hooking portion 32 for locking the spraying end end Pb of the base material P.

基材支持部31による基材Pの支持方式は、基材Pを自重による摩擦で支持する支持方式の他、基材支持部31に吸着部を設けて基材Pを真空吸着する支持方式であってもよい。 The support method of the base material P by the base material support portion 31 is a support method of supporting the base material P by friction due to its own weight, or a support method of vacuum-adsorbing the base material P by providing a suction portion on the base material support portion 31. It may be.

本構成の液切り装置100は、エアーナイフ33が液切り装置100の不図示の固定部に固定される。また、基材支持部31が、相対移動機構である移動ステージ41に搭載され、移動ステージ41と共にエアーナイフ33に向けて移動する。これにより、基材支持部31とエアーナイフ33とが相対移動可能となっている。 In the liquid draining device 100 having this configuration, the air knife 33 is fixed to a fixing portion (not shown) of the liquid draining device 100. Further, the base material support portion 31 is mounted on the moving stage 41 which is a relative moving mechanism, and moves together with the moving stage 41 toward the air knife 33. As a result, the base material support portion 31 and the air knife 33 can move relative to each other.

移動ステージ41は、基材支持部31を、搬送方向となるX軸方向、及び上下方向であるZ軸方向に移動自在に支持し、支持軸37の中心軸Oを中心とする回転方向φに回転自在に支持する。なお、移動ステージ41は、更にY軸方向に移動可能に構成されてもよい。その場合、より広いY方向幅の基材Pの液切りを実施できる。 The moving stage 41 movably supports the base material support portion 31 in the X-axis direction, which is the transport direction, and the Z-axis direction, which is the vertical direction, in the rotation direction φ about the center axis O of the support shaft 37. Support rotatably. The moving stage 41 may be further movable in the Y-axis direction. In that case, the drainage of the base material P having a wider Y-direction width can be performed.

上記構成の液切り装置100によれば、基材支持部31に支持される基材Pが、XZ面内の任意の位置へ移動可能となり、且つ、基材支持部31に支持された基材Pに対する気体噴流の吹き当て角θを、任意の角度に調整可能となる。 According to the liquid draining device 100 having the above configuration, the base material P supported by the base material support portion 31 can be moved to any position in the XZ plane, and the base material supported by the base material support portion 31. The spraying angle θ of the gas jet with respect to P can be adjusted to an arbitrary angle.

図3はエアーナイフ33から基材Pに向けて圧縮空気を噴射する様子を示すエアーナイフ33の模式的な斜視図である。
エアーナイフ33は、図1に示すエア供給部39に接続され、エア供給部39から供給される圧縮空気を気体噴射口33aから基材Pに向けて噴射する。気体噴射口33aは、エアーナイフ33の下部に設けられ、Y方向に沿った少なくとも一つのスリット状の開口を有する。また、気体噴射口33aの開口は、スリット状に限らず、複数の開口が均等ピッチで配置されたものであってもよい。
FIG. 3 is a schematic perspective view of the air knife 33 showing how compressed air is jetted from the air knife 33 toward the substrate P.
The air knife 33 is connected to the air supply unit 39 shown in FIG. 1 and injects the compressed air supplied from the air supply unit 39 toward the substrate P from the gas injection port 33a. The gas injection port 33a is provided below the air knife 33 and has at least one slit-shaped opening along the Y direction. Further, the opening of the gas injection port 33a is not limited to the slit shape, and a plurality of openings may be arranged at a uniform pitch.

上記構成のエアーナイフ33によれば、気体噴射口33aから噴出される圧縮空気が、図中矢印A方向で示す垂直下方に向けて吹き付けられる。よって、基材P上の吹き当て位置となる仮想線La上では、エアーナイフ33からの気体噴流が均等に吹き当てられる。 According to the air knife 33 having the above configuration, the compressed air ejected from the gas ejection port 33a is blown vertically downward as shown by the arrow A direction in the figure. Therefore, the gas jet from the air knife 33 is uniformly sprayed on the virtual line La which is the spraying position on the base material P.

図4に液切り装置100の制御ブロック図を示す。
移動ステージ41は、基材支持部31をX軸方向へ駆動するX軸方向駆動部43と、Z軸方向へ駆動するZ軸方向駆動部45と、回転方向φに駆動するφ方向駆動部47とを有する。X軸方向駆動部43とZ軸方向駆動部45は、基材Pとエアーナイフ33とを水平方向及び垂直方向に移動させる直動駆動部として機能する。また、φ方向駆動部47は、基材支持部31とエアーナイフ33の少なくとも一方を他方に対して回転させる回転駆動部として機能する。
FIG. 4 shows a control block diagram of the liquid draining device 100.
The moving stage 41 includes an X-axis direction driving unit 43 that drives the base material support unit 31 in the X-axis direction, a Z-axis direction driving unit 45 that drives the Z-axis direction, and a φ-direction driving unit 47 that drives in the rotation direction φ. Have and. The X-axis direction drive unit 43 and the Z-axis direction drive unit 45 function as a linear drive unit that moves the base material P and the air knife 33 in the horizontal direction and the vertical direction. Further, the φ-direction drive unit 47 functions as a rotation drive unit that rotates at least one of the base material support unit 31 and the air knife 33 with respect to the other.

移動ステージ41は、吹き当て角調整部51から出力される駆動信号に基づいて駆動される。吹き当て角調整部51は、処理される基材Pの管理番号等を入力する入力部53と、複数の基材Pの大きさ、形状、素材等の基本情報を記憶する記憶部55と、演算部57と、を含んで構成される。演算部57は、エアーナイフ33と基材Pの目標位置に対応するX軸方向駆動信号、Z軸方向駆動信号、φ方向駆動信号を、それぞれX軸方向駆動部43、Z軸方向駆動部45、φ方向駆動部47に出力する。 The moving stage 41 is driven based on the drive signal output from the spraying angle adjusting unit 51. The spraying angle adjusting unit 51 includes an input unit 53 for inputting a management number and the like of the base material P to be processed, a storage unit 55 for storing basic information such as sizes, shapes and materials of the plurality of base materials P, The calculation unit 57 is included. The calculation unit 57 outputs the X-axis direction drive signal, the Z-axis direction drive signal, and the φ-direction drive signal corresponding to the target positions of the air knife 33 and the base material P, respectively, to the X-axis direction drive unit 43 and the Z-axis direction drive unit 45. , Φ direction drive section 47.

これにより、吹き当て角調整部51は、図2に示すようにエアーナイフ33と基材支持部31との相対移動に伴う基材表面の法線方向NLの変化に応じて、エアーナイフ33からの気体噴流の噴射方向VLと基材表面の法線方向NLとのなす吹き当て角θを調整する。 As a result, the spraying angle adjusting unit 51 moves from the air knife 33 according to the change in the normal direction NL of the substrate surface due to the relative movement between the air knife 33 and the substrate supporting unit 31, as shown in FIG. The spraying angle θ formed by the jetting direction VL of the gas jet and the normal direction NL of the substrate surface is adjusted.

本構成の場合、エアーナイフ33が固定側となり、移動ステージ41が可動側となる。そのため、移動ステージ41により基材Pの姿勢を、X軸方向、Z軸方向、φ方向に調整しながら、基材表面に吹き当てられる気体噴流の位置と吹き当て方向とを最適にしつつ、基材PをX方向に搬送する。 In the case of this configuration, the air knife 33 becomes the fixed side and the moving stage 41 becomes the movable side. Therefore, while adjusting the posture of the substrate P in the X-axis direction, the Z-axis direction, and the φ direction by the moving stage 41, while optimizing the position and the blowing direction of the gas jet blown on the substrate surface, The material P is conveyed in the X direction.

ここで、エアーナイフ33の気体噴射口33aから噴射される気体噴流の流速は、20m/s〜120m/sが好ましい。流速が20m/s以上であることにより、基材表面の処理液を吹き飛ばせる。また、流速が120m/s以下であることにより、基材Pが風圧により振動することなく、基材Pとエアーナイフ33との相対位置を一定の範囲に保ち、処理液を安定して吹き飛ばせる。 Here, the flow velocity of the gas jet flow jetted from the gas jet port 33a of the air knife 33 is preferably 20 m/s to 120 m/s. When the flow velocity is 20 m/s or more, the treatment liquid on the surface of the base material can be blown off. Further, since the flow velocity is 120 m/s or less, the base material P does not vibrate due to the wind pressure, the relative position of the base material P and the air knife 33 is kept within a certain range, and the treatment liquid can be stably blown off. ..

また、基材表面の法線方向NLとのなす角である気体噴流の吹き当て角θは、法線方向NLを0°とし、気体噴流吹き当て後の基材Pの吹き当て開始端Pa側を正の角度側、気体噴流吹き当て前の基材Pの配置側を負の角度側とすると、+30°〜+70°とすることが好ましい。吹き当て角θが上記範囲であると、エアーナイフ33の気体噴射口33aから噴射される気体噴流は、基材Pの吹き当て開始端Pa側から終了端Pbに向けて、残存する処理液を良好に除去できる。吹き当て角θが30°未満であると、基材表面の処理液が吹き当て開始端Pa側にも移動して、基材表面に残存させてしまうおそれがある。+70°を超えると、基材表面の処理液が終了端Pb側へ流れにくくなる。 Further, the spray angle θ of the gas jet, which is the angle formed by the normal direction NL of the substrate surface, is 0° in the normal direction NL, and the spray start end Pa side of the substrate P after spraying the gas jet Is +30° to +70°, where is the positive angle side and the side of the substrate P on which the gas jet flow is sprayed is the negative angle side. When the spraying angle θ is in the above range, the gas jet flow jetted from the gas spraying port 33a of the air knife 33 moves the remaining treatment liquid from the spraying start end Pa side of the base material P toward the end end Pb. Can be removed well. If the spraying angle θ is less than 30°, the treatment liquid on the surface of the base material may move to the spraying start end Pa side and remain on the surface of the base material. When it exceeds +70°, it becomes difficult for the treatment liquid on the surface of the base material to flow to the end end Pb side.

ここで、エアーナイフ33の気体噴射口33aから基材Pに向けて噴射される気体噴流の噴射方向VLの線上で、気体噴流が吹き当てられる基材Pの表面と交差する位置をPtとする。その場合、エアーナイフ33の気体噴射口33aの短辺中心Eから、基材Pの気体噴流の吹き当て位置Ptまでの距離Hは、基材P上の気体噴流の吹き当て位置によらず、常に設定した範囲に維持するのがよい。 Here, Pt is a position on the line of the jet direction VL of the gas jet jetted toward the base material P from the gas jet port 33a of the air knife 33, and intersecting the surface of the base material P on which the gas jet jet is sprayed. .. In that case, the distance H from the center E 1 of the short side of the gas injection port 33a of the air knife 33 to the spray position Pt of the gas jet on the base material P does not depend on the spray position of the gas jet on the base material P. , It is always good to keep it within the set range.

距離Hは、上記した流速の範囲では、50〜200mmの範囲とすることが気体噴流の均一性が高められるため好ましい。距離Hが50mm未満であると、気体噴射口33a近傍の局所的に不均一となる流量の影響を受けムラが生じ、距離Hが200mmを超えると、十分な気体噴流の吹き当て強さが得にくくなる。 It is preferable that the distance H is in the range of 50 to 200 mm in the above range of the flow velocity because the uniformity of the gas jet flow is enhanced. If the distance H is less than 50 mm, unevenness occurs due to the locally non-uniform flow rate in the vicinity of the gas injection port 33a, and if the distance H exceeds 200 mm, sufficient spray strength of the gas jet is obtained. It gets harder.

また、エアーナイフ33は、図示例のように単独で使用してもよく、複数個をY方向やX方向に並べて使用しても良い。例えば、一対のエアーナイフ33を、噴射方向VLが基材Pの搬送方向に関して互いに逆向きになるように、ハの字状に配置してもよい。これにより基材Pの中心から基材Pの端面方向に処理液を流せ、効率的に乾燥できる。また、エアーナイフ33の気体噴射口33aが上面視においてY軸とは平行とならないように配置してもよい。更に、供給する圧縮空気を温風としても良い。 The air knives 33 may be used alone as in the illustrated example, or a plurality of air knives 33 may be used side by side in the Y direction or the X direction. For example, the pair of air knives 33 may be arranged in a V shape so that the ejection directions VL are opposite to each other with respect to the conveyance direction of the substrate P. As a result, the treatment liquid can flow from the center of the base material P toward the end surface of the base material P and can be efficiently dried. Further, the gas injection port 33a of the air knife 33 may be arranged so as not to be parallel to the Y axis in a top view. Furthermore, the compressed air supplied may be warm air.

上記構成の液切り装置100によれば、吹き当て角調整部51の演算部57が、入力部53から入力された基材Pの管理番号に対応して記憶部55に記憶されている基本情報を参照し、X軸方向駆動部43を駆動する。また、演算部57は、Z軸方向駆動部45をZ方向に移動させて、エアーナイフ33の気体噴射口33aと基材Pとの距離を予め定めた設定した範囲の距離Hに維持する。更に、演算部57は、φ方向駆動部47を駆動して、基材支持部31を支持軸37の中心軸Oを中心に回転させて、気体噴流の噴射方向VLと、気体噴流の基材Pへの吹き当て位置における基材表面の法線方向NLとのなす吹き当て角θを、前述の角度範囲に維持する。 According to the liquid draining device 100 having the above configuration, the calculation unit 57 of the spraying angle adjustment unit 51 stores the basic information stored in the storage unit 55 in association with the management number of the base material P input from the input unit 53. Referring to, the X-axis direction drive unit 43 is driven. Further, the calculation unit 57 moves the Z-axis direction drive unit 45 in the Z direction to maintain the distance between the gas injection port 33a of the air knife 33 and the base material P at a distance H within a preset range. Further, the calculation unit 57 drives the φ-direction drive unit 47 to rotate the base material support portion 31 about the central axis O of the support shaft 37, and the injection direction VL of the gas jet flow and the base material of the gas jet flow. The spraying angle θ formed by the spraying position on P and the normal direction NL of the substrate surface is maintained within the above-described angle range.

次に、本構成の基材の液切り装置100の液切り工程の手順を説明する。
図5(A)〜(E)は基材支持部に支持される基材が、エアーナイフ33に対して相対移動しながら搬送されて基材表面に付着する処理液を液切りする工程を段階的に示す基材支持部の動作説明図である。
Next, the procedure of the liquid draining process of the substrate liquid draining apparatus 100 of this configuration will be described.
5(A) to 5(E) show a step of draining the processing liquid, which is conveyed while the base material supported by the base material supporting portion is moved relative to the air knife 33 and adheres to the surface of the base material. It is an explanatory view of the operation of the base material support portion shown schematically.

まず、図5(A)に示すように、基材支持部31に支持された基材Pは、移動ステージ41によってエアーナイフ33の直下に向けて搬送される。 First, as shown in FIG. 5(A), the base material P supported by the base material support portion 31 is conveyed by the moving stage 41 to directly below the air knife 33.

そして、図5(B)に示すように、基材Pの吹き当て開始端Paを、エアーナイフ33直下における、気体噴射口33aと吹き当て開始端Paとの距離Hを設定した範囲の高さに配置する。また、エアーナイフ33からの気体噴流の噴射方向VLと、基材P上の気体噴流の吹き当て位置における法線方向NLと、のなす吹き当て角θを、前述した角度範囲にする。これにより、エアーナイフ33からの気体噴流に対する基材Pの吹き当て姿勢が調整される。 Then, as shown in FIG. 5B, the blowing start end Pa of the base material P is set to a height within a range in which the distance H between the gas injection port 33a and the blowing start end Pa is set immediately below the air knife 33. To place. Further, the spraying angle θ formed by the spraying direction VL of the gas jet from the air knife 33 and the normal direction NL at the spraying position of the gas jet on the substrate P is set to the above-mentioned angle range. As a result, the spraying posture of the base material P against the gas jet from the air knife 33 is adjusted.

吹き当て姿勢を調整する際、φ方向駆動部47の駆動による基材Pの回転によって、基材Pの吹き当て開始端PaのXZ面内における位置が変化する。この基材Pの回転によるX軸方向、及びZ軸方向のずれは、演算部57により予め求められる。演算部57は、回転によるX軸方向、Z軸方向のずれ量を加味して、移動ステージ41にX方向、Z方向、φ方向の目標座標を求め、この目標座標へ移動させる駆動信号を生成する。 When adjusting the spraying posture, the position of the spraying start end Pa of the base material P in the XZ plane changes due to the rotation of the base material P by the drive of the φ-direction drive unit 47. The deviation in the X-axis direction and the Z-axis direction due to the rotation of the base material P is obtained in advance by the calculation unit 57. The calculation unit 57 determines target coordinates in the X-direction, Z-direction, and φ-direction on the moving stage 41 in consideration of the amounts of displacement in the X-axis direction and the Z-axis direction due to rotation, and generates a drive signal for moving to the target coordinates. To do.

図5(B)に示すように、エアーナイフ33からの気体噴流が、基材Pの吹き当て開始端Paに吹き当てられ、洗浄工程で基材表面に付着した洗浄水等の処理液が基材Pの吹き当て終了端Pbに向けて吹き飛ばされる。 As shown in FIG. 5(B), a gas jet from the air knife 33 is sprayed onto the spraying start end Pa of the base material P, and the treatment liquid such as cleaning water adhered to the surface of the base material in the cleaning step is used as a base. The material P is blown off toward the spraying end Pb.

そして、図5(C)、(D)、(E)に示すように、移動ステージ41は、演算部57からの駆動信号に基づいて、エアーナイフ33の気体噴射口から基材Pの噴射気体の吹き当て位置までの距離Hを設定した範囲に維持したまま、且つ気体噴流の吹き当て角θを前述した角度範囲に設定しながら、基材PをX方向に搬送する。 Then, as shown in FIGS. 5(C), (D), and (E), the moving stage 41 jets gas from the gas jet port of the air knife 33 onto the substrate P based on the drive signal from the calculation unit 57. The substrate P is transported in the X direction while maintaining the distance H to the spraying position of No. 2 in the set range and setting the spraying angle θ of the gas jet in the above-described angular range.

上記の気体噴流の吹き当てによって、基材表面に残存する処理液が吹き飛ばされ、液切りされる。エアーナイフ33の気体噴射口33aから噴射される気体噴流は、常に基材Pの吹き当て開始端Pa側から終了端Pb側に向けて吹き当てられるので、処理液が確実に吹き飛ばされ、曲面形状を有する基材Pの凹部に溜まることがない。また、エアーナイフ33の気体噴射口33aと基材Pとの距離Hが設定した範囲に維持されるので、基材Pの全面に亘って均等に気体噴流が吹き当てられ、ムラなく液切りできる。なお、上記所定の範囲とは、設定した距離Hから±20mmの範囲を意味する。上記の液切り工程は1回に限らず、複数回実施してもよい。また、気体噴射口33aは、長方形状である他、正面視で曲線形状であってもよい。 The treatment liquid remaining on the surface of the base material is blown off and drained by spraying the gas jet flow. The gas jet jetted from the gas jet port 33a of the air knife 33 is constantly sprayed from the spray start end Pa side to the end end Pb side of the substrate P, so that the treatment liquid is surely blown off and the curved surface shape is obtained. Does not accumulate in the concave portion of the base material P having. Further, since the distance H between the gas injection port 33a of the air knife 33 and the base material P is maintained within the set range, the gas jet flow is evenly sprayed over the entire surface of the base material P, and the liquid can be drained evenly. .. The above-mentioned predetermined range means a range of ±20 mm from the set distance H. The above-mentioned liquid draining step is not limited to once, but may be performed a plurality of times. The gas injection port 33a may have a rectangular shape or a curved shape when viewed from the front.

液切り工程が完了した基材Pは、第3搬送部15へ移載されて次工程へ運搬される。液切り後の基材Pを運搬する第3搬送部15は、乾燥状態である必要があるため、搬送方向上流側の第2搬送部13とは分離されているのが望ましい。 The base material P for which the liquid draining process has been completed is transferred to the third transport unit 15 and transported to the next process. Since the third transport unit 15 that transports the substrate P after draining needs to be in a dry state, it is desirable to be separated from the second transport unit 13 on the upstream side in the transport direction.

以上説明した本構成の基材の液切り装置100は、少なくとも一部に曲面形状を有する基材Pを支持する基材支持部31と、気体を噴射するエアーナイフ33と、基材支持部31とエアーナイフ33とを相対移動させ、基材Pの一端部から他端部までの基材表面にエアーナイフ33からの気体噴流を吹き当てる移動ステージ41とを備える。移動ステージ41は、基材Pとエアーナイフ33とを水平方向及び垂直方向に相対移動させる直動駆動部と、基材支持部31とエアーナイフ33の少なくとも一方を他方に対して回転させる回転駆動部を有して構成される。そして、相対移動に伴う基材表面の法線方向の変化に応じて、エアーナイフ33からの気体噴射方向と基材表面の法線方向とのなす吹き当て角を調整する吹き当て角調整部51を備える。 The substrate drainer 100 having the above-described configuration of the present invention has a substrate support part 31 that supports a substrate P having a curved shape at least in part, an air knife 33 that injects a gas, and a substrate support part 31. And a moving stage 41 that relatively moves the air knife 33 and blows the gas jet from the air knife 33 onto the surface of the base material P from one end to the other end. The moving stage 41 includes a linear drive unit that relatively moves the substrate P and the air knife 33 in the horizontal and vertical directions, and a rotational drive that rotates at least one of the substrate support unit 31 and the air knife 33 with respect to the other. It is configured to have a section. Then, according to a change in the normal direction of the base material surface due to the relative movement, a spraying angle adjusting section 51 that adjusts the spraying angle formed by the gas jet direction from the air knife 33 and the normal direction of the base material surface. Equipped with.

この液切り装置100によれば、曲面形状を有する基材Pであっても、洗浄後の基材Pを、吹き当て姿勢を随時調整しながら搬送するので、基材Pの凹部等に処理液を残さず、確実に液切りでき、洗浄痕を残さずに乾燥できる。なお、基材Pの曲率は、曲率半径で50〜10000mmであり、100〜5000mmが好ましく、1000〜3000mmがより好ましい。 According to the liquid draining apparatus 100, even if the substrate P has a curved surface, the substrate P after cleaning is conveyed while adjusting the spraying posture as needed, so that the treatment liquid is placed in the concave portion of the substrate P or the like. It can be drained without leaving any residue, and can be dried without leaving a cleaning mark. The curvature of the substrate P is 50 to 10000 mm in radius of curvature, preferably 100 to 5000 mm, more preferably 1000 to 3000 mm.

移動ステージ41は、固定されたエアーナイフ33に対して基材支持部31を移動させる構成であるため、エアーナイフ33と比較して軽量な基材支持部31の姿勢を変更する機構で済み、液切り装置100の機構を簡素化でき、基材Pの姿勢変更の自由度を高められる。また、エアーナイフ33を基材Pの形状にしたがって移動させる際に、エアーナイフ33と搬送部等の周辺の設備との干渉による制約を少なくできる。 Since the moving stage 41 is configured to move the base material support portion 31 with respect to the fixed air knife 33, a mechanism for changing the posture of the base material support portion 31 which is lighter than the air knife 33 is sufficient. The mechanism of the liquid draining device 100 can be simplified, and the degree of freedom in changing the posture of the base material P can be increased. Further, when the air knife 33 is moved according to the shape of the base material P, restrictions due to interference between the air knife 33 and peripheral equipment such as the transport unit can be reduced.

また、吹き当て角調整部51は、エアーナイフ33からの気体噴流を、基材Pの吹き当て開始端Paから終了端Pbに向けて吹き当てるので、吹き当て後の基材表面の液残りを確実に防止できる。 Further, since the spraying angle adjusting unit 51 sprays the gas jet from the air knife 33 from the spraying start end Pa to the end end Pb of the base material P, the liquid residue on the base material surface after the spraying is applied. It can be surely prevented.

更に、吹き当て角調整部51は、エアーナイフ33の気体噴射口33aから基材Pの気体噴流の吹き当て位置までの距離を設定した範囲になるよう調整するので、気体噴射口33aからの気体噴流を基材Pへ均等に吹き当て可能となり、基材Pの全面に亘ってムラなく液切りできる。 Further, since the spraying angle adjusting unit 51 adjusts the distance from the gas spraying port 33a of the air knife 33 to the spraying position of the gas jet of the base material P within a set range, the gas from the gas spraying port 33a is adjusted. The jet stream can be uniformly sprayed onto the base material P, and the entire surface of the base material P can be drained evenly.

そして、表面が滑らかで洗浄痕が目立つガラス材であっても、確実な液切りが実施でき、良好な乾燥表面が得られる And, even if the glass material has a smooth surface and marked cleaning marks, reliable draining can be performed and a good dry surface can be obtained.

<第2構成例>
次に、基材の液切り装置の第2構成例を説明する。
図6は第2構成例の液切り装置の要部側面図である。本構成の液切り装置100Aは、エアーナイフ33A、33Bが基材Pの上面側と下面側とに合計一対設けられている。その他は、図2に示す液切り装置100と同様である。以降の説明では、同一の部材や部分に対しては同一の符号を付与して、その説明を簡略化又は省略する。
<Second configuration example>
Next, a second configuration example of the substrate drainer will be described.
FIG. 6 is a side view of a main part of the liquid draining device of the second configuration example. In the liquid draining device 100A of this configuration, a pair of air knives 33A and 33B are provided on the upper surface side and the lower surface side of the base material P in total. Others are the same as those of the liquid draining device 100 shown in FIG. In the following description, the same reference numerals are given to the same members and portions, and the description thereof will be simplified or omitted.

本構成の液切り装置100Aは、基材支持部31の上面側にエアーナイフ33Aが配置され、下面側にエアーナイフ33Bが配置される。各エアーナイフ33A,33Bの気体噴流の吹き当て条件は、表裏面で基本的には同一にし、前述した通りの流速で、距離Hや吹き当て角θを所定の範囲に設定する。なお、表裏面における気体噴流の吹き当て条件は、表裏面のそれぞれで液切りが達成できればよく、互いに異なっていてもよい。 In the liquid draining device 100A of this configuration, the air knife 33A is arranged on the upper surface side of the base material support portion 31, and the air knife 33B is arranged on the lower surface side. The blowing conditions of the gas jets of the air knives 33A and 33B are basically the same on the front and back sides, and the distance H and the blowing angle θ are set within a predetermined range at the flow velocity as described above. The conditions for spraying the gas jets on the front and back surfaces may be different from each other as long as drainage can be achieved on each of the front and back surfaces.

この液切り装置100Aによれば、基材支持部31の上方及び下方にそれぞれエアーナイフ33A,33Bが配置されるので、基材Pの表裏両面に気体噴流が同時に吹き当てられ、基材Pの各表面に付着する処理液が同時に吹き飛ばされる。これにより、基材Pの表裏面の液切りが一度にでき、生産効率が向上する。 According to the liquid draining device 100A, the air knives 33A and 33B are arranged above and below the base material support portion 31, respectively, so that the gas jets are simultaneously sprayed on both the front and back surfaces of the base material P, and The treatment liquid adhering to each surface is blown off at the same time. As a result, the front and back surfaces of the substrate P can be drained at once, and the production efficiency is improved.

<第3構成例>
次に、基材の液切り装置の第3構成例を説明する。
基材の液切り後に処理液が基材表面に残存すると、最終的に処理液が残存した基材表面に汚れが形成される。この処理液の残存は、乾燥中の基材Pの保持方法に起因して発生することがある。例えば、気体噴流による液切りの場合、コンベア等の搬送装置と接触している部分には処理液が残り、これが汚れの原因となる場合がある。搬送方法としてローラコンベアを使用する場合は、ローラの配置間隔を拡げ、基材Pと搬送装置との接触を避けて処理液が残る問題を解決できるが、この方法では、概略平坦な基材Pに限定される。曲率の大きな曲面を有する基材Pには、搬送装置から基材Pを安定して保持可能な支持具へ基材Pを移載して乾燥し、乾燥完了後に搬送装置へ再度移載するのがよい。
<Third configuration example>
Next, a third configuration example of the substrate drainer will be described.
When the treatment liquid remains on the surface of the substrate after draining the base material, stains are finally formed on the surface of the substrate on which the treatment liquid remains. This residual treatment liquid may occur due to the method of holding the substrate P during drying. For example, in the case of liquid draining by a gas jet, the treatment liquid may remain in a portion in contact with a conveyor or other conveyance device, which may cause contamination. When a roller conveyor is used as the transportation method, the arrangement interval of the rollers can be increased to avoid the contact between the substrate P and the transportation device, and the problem that the processing liquid remains can be solved. Limited to On the base material P having a curved surface with a large curvature, the base material P is transferred from the transfer device to a support that can stably hold the base material P and dried, and after the drying is completed, it is transferred to the transfer device again. Is good.

上記のような支持具への移載を行う具体的な基材支持部の構成例を以下に説明する。
図7(A)は第3構成例の基材支持部である第1支持具の斜視図、(B)は第3構成例の基材支持部である第2支持具の斜視図である。
第1支持具61は、図7(A)に示すように、基材Pの搬送方向上流側に設けられる第1ロッド63と、第1ロッド63の基端とは反対の先端から二股に分岐して搬送方向下流側に向けて延設された一対の第2ロッド65A,65Bとを有する。一対の第2ロッド65A,65Bは、基材Pの搬送方向上流側の端部に当接する一対の基材係止部67A,67Bと、基材Pの搬送方向に直交する端部に当接する一対の基材係止部69A,69Bと、を有する。
A specific example of the configuration of the base material supporting portion that is transferred to the above-described supporting tool will be described below.
FIG. 7(A) is a perspective view of a first support tool which is a base material support portion of a third configuration example, and (B) is a perspective view of a second support tool which is a base material support portion of a third configuration example.
As shown in FIG. 7A, the first support tool 61 is bifurcated from a first rod 63 provided on the upstream side of the base material P in the transport direction and a tip opposite to the base end of the first rod 63. And has a pair of second rods 65A and 65B extending toward the downstream side in the transport direction. The pair of second rods 65A and 65B abut on the pair of base material locking portions 67A and 67B that abut on the upstream end of the base material P in the transport direction and the end portions that are orthogonal to the transport direction of the base material P. It has a pair of base material locking portions 69A and 69B.

基材係止部69Aは第2ロッド65Aの先端部に上方に突出して設けられ、基材係止部69Bは第2ロッド65Bの先端部に上方に突出して設けられる。基材係止部67A,67Bは、第2ロッド65A、65Bの第1ロッド63との接続部側にそれぞれ上方に突出して設けられる。 The base material locking portion 69A is provided at the tip portion of the second rod 65A so as to project upward, and the base material locking portion 69B is provided at the tip portion of the second rod 65B so as to project upward. The base material locking portions 67A and 67B are provided so as to project upward on the connection portion side of the second rods 65A and 65B with the first rod 63, respectively.

第2支持具71は、図7(B)に示すように、搬送方向下流側から上流側に向けて延びる第1ロッド73と、第1ロッド73の長手方向の途中で、十字に交差して接続される第2ロッド75とを有する。 As shown in FIG. 7B, the second support tool 71 crosses a first rod 73 extending from the downstream side in the transport direction toward the upstream side and a cross in the middle of the first rod 73 in the longitudinal direction. And a second rod 75 connected thereto.

第1ロッド73は、搬送方向上流側の先端部に、基材Pの搬送方向上流側の端部に当接する基材係止部77を有する。また、第2ロッド75は、それぞれの先端部に、基材Pの搬送方向に直交する端部に当接する基材係止部79A,79Bを有する。 The first rod 73 has a base material locking portion 77, which is in contact with an end portion of the base material P on the upstream side in the transport direction, at a front end portion on the upstream side in the transport direction. In addition, the second rod 75 has base material locking portions 79A and 79B that are in contact with the end portions of the second rod 75 that are orthogonal to the transport direction of the base material P at the respective tip portions.

第1支持具61の基材係止部67A,67B,69A,69Bと、第2支持具71の基材係止部77,79A,79Bは、基材Pに対してそれぞれ異なる位置に配置される。また、基材Pの第1支持具61の第1ロッド63及び一対の第2ロッド65A,65Bと、第2支持具71の第1ロッド73及び第2ロッド75とは、上下方向に重ねた場合に、相互に干渉しないようになっている。 The base material locking portions 67A, 67B, 69A, 69B of the first support tool 61 and the base material locking portions 77, 79A, 79B of the second support tool 71 are arranged at different positions with respect to the base material P, respectively. It Further, the first rod 63 of the first support tool 61 and the pair of second rods 65A and 65B of the base material P, and the first rod 73 and the second rod 75 of the second support tool 71 are vertically stacked. In that case, they do not interfere with each other.

上記構成の支持具によれば、第1支持具61により支持された基材Pは、第2支持具71が第1支持具61の下方から上昇して基材係止部77が基材係止部67A,67Bとの間に挿入される。また、基材係止部79A,79Bが基材Pの端部を挟み込む。次いで、第1支持具61を下降させると、第1支持具61の基材係止部67A,67B,69A,69Bの基材Pとの係合が外れ、基材Pが第2支持具71のみに支持される。 According to the support tool having the above-described configuration, in the base material P supported by the first support tool 61, the second support tool 71 rises from below the first support tool 61 and the base material locking portion 77 causes the base material engaging section 77 to operate. It is inserted between the stoppers 67A and 67B. Further, the base material locking portions 79A and 79B sandwich the end portion of the base material P. Next, when the first support tool 61 is lowered, the base material locking portions 67A, 67B, 69A, 69B of the first support tool 61 are disengaged from the base material P, and the base material P is moved to the second support tool 71. Only supported.

つまり、第1支持具61と第2支持具71とを昇降駆動する図示しない持ち替え機構を駆動することにより、第1支持具61により支持された基材Pを、第1支持具61から第2支持具71に持ち替えできる。 That is, the base material P supported by the first support tool 61 is moved from the first support tool 61 to the second support tool 61 by driving the holding mechanism (not shown) that drives the first support tool 61 and the second support tool 71 up and down. The holder 71 can be replaced.

基材支持部を、上記の第1支持具61、第2支持具71、及び持ち替え機構を用いて構成することで、液切り効果を更に高められる。即ち、洗浄装置から搬送されてきた基材Pを最初に第1支持具61により支持させる。そして、第1支持具61により支持された基材Pを前述した気体噴流を吹き当てることで処理液を除去する。しかし、このときの第1支持具61の基材係止部67A,67B,69A,69Bと基材Pとの接触部分には、気体噴流が到達し難く、処理液が残ることがある。そこで、第1支持具61に支持された基材Pを第2支持具71に持ち替え、前述した気体噴流を吹き当てる。第2支持具71は、待機時においても処理液と触れておらず、常に乾燥した状態に保持されている。そのため、処理液を除去した後の第1支持具61から基材Pを持ち替えることにより、第1支持具61の各基材係止部67A,67B,69A,69Bに残存していた処理液は除去され、基材Pの全面を確実に液切りできる。また、上記の残存していた処理液は、各基材係止部67A,67B,69A,69Bの吹き当て方向下流側で堰き止められることがなく、基材P上に残存することがない。 By constructing the base material support portion using the first support tool 61, the second support tool 71, and the holding mechanism, the drainage effect can be further enhanced. That is, the base material P conveyed from the cleaning device is first supported by the first support tool 61. Then, the substrate P supported by the first support tool 61 is sprayed with the above-mentioned gas jet to remove the processing liquid. However, at this time, the gas jet flow is difficult to reach the contact portion between the base material locking portions 67A, 67B, 69A, 69B of the first support tool 61 and the base material P, and the treatment liquid may remain. Therefore, the base material P supported by the first support tool 61 is replaced with the second support tool 71, and the above-described gas jet is sprayed. The second support tool 71 does not come into contact with the processing liquid even during standby, and is always kept in a dry state. Therefore, by replacing the substrate P from the first support tool 61 after removing the processing solution, the processing solution remaining on each of the base material locking portions 67A, 67B, 69A, 69B of the first support tool 61 is removed. As a result, the entire surface of the base material P can be drained without fail. Further, the remaining processing liquid is not blocked on the downstream side of the base material locking portions 67A, 67B, 69A, 69B in the spraying direction, and does not remain on the base material P.

上記のように、気体噴流の吹き当てが、基材Pの搬送方向下流側から上流側に向けた一方向に行う場合、第2支持具71の基材係止部79A,79Bは、第1支持具の基材係止部69A,69Bよりも搬送方向下流側、即ち、噴流の上流側に配置されることが望ましい。これによれば、基材係止部69A,69Bに残存した処理液が、持ち替え後に基材係止部79A,79Bに流れ着くことなく、処理液の液残りを確実に防止できる。 As described above, when the gas jet is sprayed in one direction from the downstream side to the upstream side in the transport direction of the base material P, the base material locking portions 79A, 79B of the second support tool 71 are It is desirable that the support is disposed downstream of the base material locking portions 69A and 69B in the transport direction, that is, upstream of the jet flow. According to this, the processing liquid remaining in the base material locking portions 69A and 69B does not flow to the base material locking portions 79A and 79B after the holding, and the residual liquid of the processing liquid can be reliably prevented.

<第4構成例>
次に、基材の液切り装置の第4構成例を説明する。
図8(A)は第4構成例の基材支持部である第1支持具の斜視図、(B)は第4構成例の基材支持部である第2支持具の斜視図である。本構成の基材支持部は、基材を吸着支持する吸着部を備え、第1支持具と第2支持具とが上下方向に重なることなく配置される点で前述の第3構成例の基材支持部とは異なっている。
<Fourth configuration example>
Next, a fourth configuration example of the substrate drainer will be described.
FIG. 8A is a perspective view of a first support tool that is a base material support section of a fourth configuration example, and FIG. 8B is a perspective view of a second support tool that is a base material support section of a fourth configuration example. The base material support part of this configuration includes a suction part that supports the base material by suction, and the first support tool and the second support tool are arranged without overlapping in the vertical direction. It is different from the material support.

第1支持具81は、図8(A)に示すように、基端側となる基材Pの搬送方向上流側から下流側に向けて延びる第1ロッド83と、搬送方向と直交する方向に延びる第2ロッド85とが、第1ロッド83の基端とは反対の先端にT字型に接続される。 As shown in FIG. 8(A), the first support 81 has a first rod 83 extending from the upstream side to the downstream side of the base material P, which is the base end side, in a direction orthogonal to the transport direction. The extending second rod 85 is connected in a T-shape to the tip opposite to the base end of the first rod 83.

第1ロッド83は、上方に突出して頂部が基材Pに当接する突起部87を有し、第2ロッド85は、その両端部に突起部87と同様の一対の突起部89A,89Bを有する。また、第1ロッド83には、突起部91が立設され、その頂部には、基材Pを吸着保持する吸着部93が設けられている。この吸着部93は、基材Pの吸着状態で各突起部87,89A,89Bと基材Pとの間に垂直抗力を発生させて、基材Pを第1支持具81に着脱自在に固定させる。この吸着部93は、例えば、真空ポンプ等の吸引機構と、大気圧開放用のバルブとを備え、基材Pを着脱自在に支持する。また、吸着部93の吸着方式はこれに限らない。 The first rod 83 has a protrusion 87 that protrudes upward and has a top abutting against the substrate P, and the second rod 85 has a pair of protrusions 89A and 89B similar to the protrusion 87 at both ends thereof. .. Further, the first rod 83 is provided with a protruding portion 91, and a suction portion 93 for sucking and holding the base material P is provided on the top portion thereof. The suction portion 93 generates a vertical reaction force between each of the protrusions 87, 89A, 89B and the base material P in the suctioned state of the base material P, and detachably fixes the base material P to the first support 81. Let The suction unit 93 includes, for example, a suction mechanism such as a vacuum pump and a valve for opening the atmospheric pressure, and supports the base material P detachably. Further, the suction method of the suction unit 93 is not limited to this.

第2支持具101は、図8(B)に示すように、図8(A)に示す第1支持具81とほぼ同一形状の部材であり、180°旋回した状態で使用される。第1支持具81は基材Pの搬送方向上流側を支持し、第2支持具101は基材Pの搬送方向下流側を支持する。なお、第1支持具81と第2支持具101の各突起部87,89A,89Bの先端は、ゴム等の柔軟な部材により覆われていてもよい。 As shown in FIG. 8(B), the second support tool 101 is a member having substantially the same shape as the first support tool 81 shown in FIG. 8(A), and is used in a state of being rotated by 180°. The first support tool 81 supports the upstream side of the substrate P in the transport direction, and the second support tool 101 supports the downstream side of the substrate P in the transport direction. The tips of the protrusions 87, 89A, 89B of the first support 81 and the second support 101 may be covered with a flexible member such as rubber.

第1支持具81と第2支持具101は、それぞれ基材Pの異なる位置を支持するため、液残りの発生を防止できる。また、第1支持具81、第2支持具101は、基材Pを吸着支持する構成であるので、必要に応じて基材Pを裏返すことも可能となり、基材Pの姿勢変更を容易に実施できる。 Since the first support tool 81 and the second support tool 101 respectively support different positions of the base material P, it is possible to prevent the liquid residue from occurring. Further, since the first support tool 81 and the second support tool 101 are configured to adsorb and support the base material P, the base material P can be turned upside down as necessary, and the posture of the base material P can be easily changed. Can be implemented.

<相対移動機構の他の例>
以上説明した各構成の液切り装置は、相対移動機構として移動ステージ41を備え、固定されたエアーナイフ33に向けて移動ステージ41が移動する構成であるが、これに限らない。
<Other examples of relative movement mechanism>
The liquid draining device of each configuration described above is configured to include the moving stage 41 as a relative moving mechanism and move the moving stage 41 toward the fixed air knife 33, but the present invention is not limited to this.

図9は、基材支持部31に固定支持される基材Pに対して、エアーナイフ33が移動可能に配設された液切り装置100Bの要部側面図である。本構成の液切り装置100Bは、基材支持部31が固定され、この基材支持部31に支持される基材Pに対してエアーナイフ33がY軸と平行な線を中心に回転しつつX、Z方向に移動する。このとき、エアーナイフ33は、基材Pの吹き当て位置からの距離Hを、設定した範囲に維持しながら移動する。また、エアーナイフ33は、気体噴流の噴射方向VLと、基材P上の吹き当て位置における法線方向NLと、の吹き当て角θを、前述した所定範囲に維持しながら気体噴流を基材Pに向けて噴射する。 FIG. 9 is a side view of essential parts of the liquid draining device 100B in which the air knife 33 is movably arranged with respect to the base material P fixedly supported by the base material support portion 31. In the liquid draining device 100B of this configuration, the base material support portion 31 is fixed, and the air knife 33 rotates about a line parallel to the Y axis with respect to the base material P supported by the base material support portion 31. Move in X and Z directions. At this time, the air knife 33 moves while maintaining the distance H from the blowing position of the base material P within the set range. Further, the air knife 33 maintains the spraying angle VL of the spraying direction VL of the gas jet and the normal direction NL at the spraying position on the base material P within the above-mentioned predetermined range, while maintaining the spraying gas base material. Inject toward P.

また、基材支持部31をX軸方向とZ軸方向に移動させ、エアーナイフ33を前述のφ方向に回転させる構成にしてもよい。 Alternatively, the base material support portion 31 may be moved in the X-axis direction and the Z-axis direction, and the air knife 33 may be rotated in the φ direction.

本構成の液切り装置100Bによれば、エアーナイフ33を固定せず、移動可能、回転可動に支持することで、基材支持部31の動作を単純にでき、基材支持部31を駆動する移動ステージの構造を簡素化できる。 According to the liquid draining device 100B having this configuration, the operation of the base material support portion 31 can be simplified and the base material support portion 31 can be driven by supporting the air knife 33 so as to be movable and rotatably movable without being fixed. The structure of the moving stage can be simplified.

<乾燥処理の他の例>
上記説明では、気体噴射部からの気体噴流による基材Pの液切りについて説明したが、液切りによる乾燥処理は、これに限らない。例えば、水分が気化するのに充分な温度に加温した空気を基材Pに当てて、基材P表面の水分の蒸発を促進する温風乾燥や、表面の水分を揮発性の高い液体に置換して蒸発を促進する置換乾燥等も適用でき、基材Pの形状や表面の性状によって適宜、選択される。
<Other example of drying treatment>
In the above description, the draining of the base material P by the gas jet from the gas jetting section has been described, but the drying process by the draining is not limited to this. For example, air heated to a temperature sufficient to vaporize water is applied to the base material P to dry hot air that promotes evaporation of water on the surface of the base material P, or water on the surface is made into a highly volatile liquid. Substitution drying or the like in which substitution is performed to accelerate evaporation can also be applied, and is appropriately selected depending on the shape of the substrate P and the surface properties.

温風乾燥では、例えば、基材支持部の上に置いた基材Pの周囲に、30〜100℃に加熱した空気流を定常的に流して、水分の蒸発を促進しながら乾燥処理を実施する。空気流を加温すれば、水分の乾燥がより促進される。更に、気体噴射部からの噴流を加温した温風とすることで、更に効率的な乾燥を実現できる。 In the warm air drying, for example, the air flow heated to 30 to 100° C. is constantly flowed around the base material P placed on the base material support portion to perform the drying treatment while promoting the evaporation of water. To do. By heating the air stream, the drying of water is further promoted. Further, by using the heated hot air as the jet from the gas jetting section, more efficient drying can be realized.

<基材処理装置の洗浄工程の詳細>
次に、図1に示す基材処理装置200で実施する洗浄工程について説明する。
(洗浄工程)
図1に示すように、基材Pの洗浄工程は、基材Pを搬送手段の上で位置決めした後、基材Pの形状に合致した保持台に移載して、基材Pを保持台上で固定した状態で実施する。基材Pの搬送手段への投入作業は、搬送手段を停止させ、基材Pを1枚ずつ主要な洗浄面を上にして搬送手段の上に載置する。
<Details of cleaning process of substrate processing equipment>
Next, a cleaning process performed by the substrate processing apparatus 200 shown in FIG. 1 will be described.
(Washing process)
As shown in FIG. 1, in the step of cleaning the base material P, after the base material P is positioned on the transporting means, it is transferred to a holding base that matches the shape of the base material P, and the base material P is held. Perform with the above fixed. To insert the base material P into the transfer means, the transfer means is stopped and the base materials P are placed on the transfer means one by one with the main cleaning surface facing upward.

基材Pの洗浄方法としては、基材Pの洗浄面に平行な軸を持つ回転ブラシ23によるブラシ洗浄や、基材Pの洗浄面に概略垂直な回転軸を持つ回転パッドによるパッド洗浄、噴射水による噴水洗浄、超音波を利用した超音波洗浄等がある。これら各種の洗浄方法は、基材Pの形状や洗浄すべき汚れの種類によって適宜選択される。 As the method for cleaning the base material P, brush cleaning by a rotating brush 23 having an axis parallel to the cleaning surface of the base material P, pad cleaning by a rotary pad having a rotary axis substantially perpendicular to the cleaning surface of the base material P, and spraying There are fountain cleaning with water and ultrasonic cleaning using ultrasonic waves. These various cleaning methods are appropriately selected depending on the shape of the substrate P and the type of dirt to be cleaned.

ブラシ洗浄は、比較的平坦な広い面の洗浄に適し、また、比較的厚い汚れの除去に適する。パッド洗浄は、比較的急な面(曲率が大きい面)の洗浄まで適用でき、比較的厚い汚れの除去に適する。噴水洗浄は、曲率が大きい面の洗浄までできるが、固着力の弱い水溶性の汚れの除去に適する。超音波洗浄は、曲率が大きい面の洗浄まで適用できるが、非常に薄い汚れ層の除去に適する。 Brush cleaning is suitable for cleaning a relatively flat and wide surface, and is also suitable for removing relatively thick dirt. The pad cleaning can be applied to cleaning a relatively steep surface (a surface having a large curvature), and is suitable for removing a relatively thick dirt. Fountain cleaning can clean even surfaces with a large curvature, but is suitable for removing water-soluble stains with weak adhesion. Ultrasonic cleaning is applicable to cleaning a surface having a large curvature, but is suitable for removing a very thin dirt layer.

ブラシ洗浄やパッド洗浄では、保持台に固定された基材Pに洗浄水が供給され、洗浄水を供給しながらブラシやパッドを回転させて基材Pに接触させる。この動作により、基材P表面のキズの発生を抑制すると共に除去した汚れを連続して排出できる。また、洗浄水には、必要に応じて洗浄剤や研磨材を加えてもよい。その場合、洗浄後に洗浄剤や研磨剤を除去するためのリンス処理を実施する。 In the brush cleaning and the pad cleaning, the cleaning water is supplied to the base material P fixed to the holding table, and the brushes and the pads are rotated and brought into contact with the base material P while supplying the cleaning water. By this operation, it is possible to suppress the occurrence of scratches on the surface of the base material P and continuously discharge the removed dirt. In addition, a cleaning agent or an abrasive may be added to the cleaning water as needed. In that case, a rinse treatment for removing the cleaning agent and the polishing agent is performed after the cleaning.

洗浄で使用する洗浄水としては、精密フィルタでろ過処理を施した純水や、イオン交換膜で処理を施したRO水が使用される。洗浄水は、達成すべき洗浄度に応じて選択され、例えば、より高い洗浄度が求められる場合には純水を使用する。また、洗浄水を30℃〜70℃に加温すれば洗浄能力がより高められる。 As the washing water used for washing, pure water filtered by a precision filter or RO water treated by an ion exchange membrane is used. The cleaning water is selected according to the cleaning degree to be achieved, and for example, pure water is used when a higher cleaning degree is required. Further, if the washing water is heated to 30°C to 70°C, the washing ability can be further enhanced.

また、洗浄で使用される洗浄剤としては、アニオン系界面活性剤などの中性洗剤が使用される。なお、これらは例として挙げたものであり、その他、種々の洗浄材を使用できる。また、洗浄で使用される研磨剤としては、酸化セリウムや重炭酸ナトリウム等が一般的に使用される。なお、これらは例として挙げたものであり、その他、種々の研磨材を使用できる。 Further, as the cleaning agent used for cleaning, a neutral detergent such as an anionic surfactant is used. In addition, these are given as examples, and various other cleaning materials can be used. Cerium oxide, sodium bicarbonate and the like are generally used as the polishing agent used for cleaning. Note that these are given as examples, and various other abrasives can be used.

ブラシ洗浄やパッド洗浄においては、回転するブラシやパッドの位置を、基材Pの形状に応じて移動させる。ブラシの材質はMCナイロン(登録商標)等のポリアミド樹脂等が一般的に用いられ、汚れの種類によって材質、太さ、長さが選定される。パッドの材質は、ウレタン等の柔軟性のある樹脂が一般的であり、汚れの種類によって材質、硬度が選定される。基材Pの形状や大きさによっては、ブラシやパッドは複数本を同時に使用しても良く、また、組み合わせて使用しても良い。 In brush cleaning and pad cleaning, the positions of the rotating brush and pad are moved according to the shape of the base material P. As the material of the brush, a polyamide resin such as MC nylon (registered trademark) is generally used, and the material, thickness and length are selected depending on the type of stain. The material of the pad is generally a flexible resin such as urethane, and the material and hardness are selected according to the type of dirt. Depending on the shape and size of the base material P, a plurality of brushes and pads may be used at the same time, or a combination thereof may be used.

噴水洗浄は、単体或いは面状のノズルから洗浄水を噴射して、洗浄体表面に衝突させて汚れを除去する。ノズルは固定でも可動式でも良く、可動式であれば、より広い面積の洗浄が可能である。汚れの種類によっては、中性洗剤等の洗浄剤を併用しても良く、洗浄後に洗浄剤を除去するためのリンス処理を実施する。また、洗浄水を30℃〜70℃に加温すれば、洗浄能力をより高められる。 In the fountain cleaning, cleaning water is sprayed from a single or planar nozzle to collide with the surface of the cleaning body to remove dirt. The nozzle may be fixed or movable, and if it is movable, it is possible to wash a wider area. Depending on the type of dirt, a cleaning agent such as a neutral detergent may be used together, and a rinsing process for removing the cleaning agent is performed after cleaning. Further, if the washing water is heated to 30°C to 70°C, the washing ability can be further enhanced.

超音波洗浄は、洗浄液中に浸漬された基材Pに対して超音波加振子を振動させて洗浄液に圧力振動を発生させて、圧力波の作用で基材P表面の汚れを除去する。超音波加振子の振動数は、一般的に30〜60kHzであり、更には40〜50kHzが望ましい。汚れの種類によっては、アルカリ洗剤等の洗浄剤を併用しても良く、洗浄後に洗浄剤を除去するためのリンス処理を実施する。また、洗浄水を30℃〜70℃に加温すれば洗浄能力をより高められる。 In the ultrasonic cleaning, the ultrasonic vibrator is vibrated with respect to the base material P immersed in the cleaning liquid to generate pressure vibration in the cleaning liquid, and stains on the surface of the base material P are removed by the action of the pressure wave. The frequency of the ultrasonic exciter is generally 30 to 60 kHz, and more preferably 40 to 50 kHz. Depending on the type of dirt, a cleaning agent such as an alkaline detergent may be used in combination, and a rinsing process for removing the cleaning agent is performed after cleaning. Further, if the washing water is heated to 30°C to 70°C, the washing ability can be further enhanced.

一般に、洗浄中の基材Pは、搬送手段によって保持されるので、適用可能な搬送方法は、使用する洗浄方法によっても決まる。例えば、ブラシ洗浄やパッド洗浄を使用する場合、概略平坦な基材Pであればローラコンベアを選択できるが、曲率が大きな曲面を持つ基材Pでは、洗浄時の姿勢が安定せず、均一な洗浄が実現できないおそれがある。そのため、曲率が大きな曲面形状を持つ基材Pでは、搬送手段から基材Pを安定して保持できる保持台等の保持手段へ基材Pを移載して、洗浄完了後に搬送手段へ再度移載するのが好ましい。基材Pの保持手段としては、例えば、基材Pの形状に合わせた真空吸着型等の保持手段が適用できる。 In general, the substrate P that is being cleaned is held by the transfer means, and therefore the applicable transfer method also depends on the cleaning method used. For example, when brush cleaning or pad cleaning is used, a roller conveyor can be selected as long as the substrate P has a substantially flat surface. However, with the substrate P having a curved surface with a large curvature, the posture during cleaning is not stable and uniform. Cleaning may not be possible. Therefore, in the case of a base material P having a curved surface with a large curvature, the base material P is transferred from the transfer means to a holding means such as a holding table capable of stably holding the base material P, and after the cleaning is completed, it is transferred to the transfer means again. It is preferable to list them. As the holding means for the base material P, for example, a holding means such as a vacuum suction type matching the shape of the base material P can be applied.

基材Pの保持手段が、基材Pの反転が可能である場合、基材Pの表裏面の洗浄が可能となる。基材Pを反転させるには、例えば、基材Pを支持する保持台の回転により行える。すなわち、搬送面上に停止している基材Pを、保持台により下面から吸着固定し、吸着固定された基材Pを保持台の回転により反転させる。 When the holding means for the base material P is capable of reversing the base material P, the front and back surfaces of the base material P can be washed. Inversion of the base material P can be performed, for example, by rotating a holding table that supports the base material P. That is, the base material P stopped on the transport surface is suction-fixed from the lower surface by the holding base, and the suction-fixed base material P is inverted by rotation of the holding base.

このように保持台を回転させる設備の具体例としては、例えば、搬送方向に概略垂直、且つ概略水平な回転軸に固定された少なくとも2本の棒状の保持台と、この保持台の上面に設けられた吸着装置を備えた反転装置が挙げられる。この反転装置は、搬送装置の下部に格納され、保持台は搬送装置と干渉しない位置に配置される。回転軸は、モータ、シリンダによるリンク機構等により回転駆動される。モータを使用する場合には、安定した反転動作が可能になるため好ましい。吸着装置は、吸着パッドと真空制御装置で構成される。吸着パッドは、例えばウレタンゴム等のゴムが使用できる。 As a specific example of the equipment for rotating the holding table in this manner, for example, at least two rod-shaped holding tables fixed to a rotation shaft that is substantially vertical and substantially horizontal to the transport direction, and provided on the upper surface of the holding table. An inversion device including the adsorbing device described above is included. The reversing device is stored under the transport device, and the holding table is arranged at a position where it does not interfere with the transport device. The rotary shaft is rotationally driven by a motor, a link mechanism including a cylinder, and the like. When a motor is used, a stable reversing operation is possible, which is preferable. The suction device is composed of a suction pad and a vacuum controller. For the suction pad, rubber such as urethane rubber can be used.

洗浄工程が完了した基材Pは、搬送手段へ移載されて前述した乾燥工程へ運搬される。乾燥工程への運搬は、コンベア等の搬送手段でも良く、或いは、基材支持部31へ直接移載する方法でもよい。洗浄後の乾燥までの運搬過程では、イソプロピルアルコール等の置換液中に浸して置換処理を行っても良い。 The base material P for which the cleaning process has been completed is transferred to the transport means and transported to the above-described drying process. The transportation to the drying step may be carried out by a conveyer such as a conveyor, or may be carried out by directly transferring the material to the base material supporting portion 31. In the transporting process after washing and before drying, the replacement treatment may be performed by immersing it in a replacement liquid such as isopropyl alcohol.

本発明は上記の実施形態に限定されるものではなく、実施形態の各構成を相互に組み合わせることや、明細書の記載、並びに周知の技術に基づいて、当業者が変更、応用することも本発明の予定するところであり、保護を求める範囲に含まれる。 The present invention is not limited to the above-described embodiments, and the configurations of the embodiments may be combined with each other, or may be modified and applied by those skilled in the art based on the description of the specification and well-known techniques. The invention is planned and is included in the scope of protection required.

例えば、基材Pの液切り工程を含む乾燥工程、洗浄工程では、様々な方式から任意に選択可能であるが、その方式によっては、基材Pの位置決めが必要なこともある。このため、任意の位置で基材Pの水平方向の位置決めを実施する位置決め機能があれば更に良い。位置決め方法としては、例えば、シリンダ等を用いて基材Pの側面を押して基準位置に当接して位置決めする方式や、カメラを使って基材Pが基準位置に到達すると同時にコンベアの走行を停止する方法等がある。より良い精度での位置決めを実現するには、基材Pの側面を押す方式が望ましい。 For example, in the drying process and the cleaning process including the draining process of the base material P, various methods can be arbitrarily selected, but the positioning of the base material P may be necessary depending on the method. Therefore, it is more preferable to have a positioning function for positioning the substrate P in the horizontal direction at an arbitrary position. As a positioning method, for example, a method of pushing the side surface of the base material P by using a cylinder or the like to bring it into contact with a reference position and positioning, or using a camera to stop the traveling of the conveyor at the same time when the base material P reaches the reference position. There are ways. In order to achieve positioning with better accuracy, a method of pushing the side surface of the base material P is desirable.

以上の通り、本明細書には次の事項が開示されている。
(1) 少なくとも一部に曲面形状を有する基材に気体を吹き付けて、前記基材に付着している処理液を除去する基材の液切り装置であって、
前記基材を支持する基材支持部と、
気体を噴射する気体噴射部と、
前記基材支持部と前記気体噴射部とを相対移動させ、前記基材の一端部から他端部までの基材表面に前記気体噴射部からの気体噴流を吹き当てる相対移動機構と、
を備え、
前記相対移動機構は、吹き当て角調整部により前記相対移動に伴う前記基材表面の吹き当て位置における法線方向の変化に応じて、前記気体噴射部からの気体噴射方向と前記法線方向とのなす吹き当て角を調整する機能を有する基材の液切り装置。
この基材の液切り装置によれば、曲面形状を有する基材であっても、基材の凹部等に処理液を残さずに確実に液切りでき、洗浄痕を残さずに乾燥できる。
As described above, the following items are disclosed in this specification.
(1) A device for draining a base material, which sprays a gas onto a base material having a curved surface at least in part to remove the treatment liquid adhering to the base material,
A base material support part for supporting the base material,
A gas injection unit for injecting gas,
A relative movement mechanism that relatively moves the base material support part and the gas injection part, and sprays a gas jet from the gas injection part onto the base material surface from one end to the other end of the base material,
Equipped with
The relative movement mechanism, in accordance with the change in the normal direction at the blowing position of the base material surface due to the relative movement by the blowing angle adjusting unit, the gas jet direction from the gas jet unit and the normal direction. A substrate drainer having a function of adjusting the spraying angle formed by.
According to this substrate draining device, even a substrate having a curved surface can be drained reliably without leaving the treatment liquid in the recesses or the like of the substrate, and can be dried without leaving cleaning marks.

(2) 前記吹き当て角調整部は、前記気体噴射方向を前記基材の吹き当て開始端から吹き当て終了端に向ける機能を有する(1)の基材の液切り装置。
この基材の液切り装置によれば、気体噴射部からの気体噴流を、吹き当て方向の先方に向けて吹き当て位置を移動させるため、簡単に基材表面の液残りを生じにくくできる。
(2) The liquid draining device according to (1), wherein the spraying angle adjusting unit has a function of directing the gas jetting direction from a spraying start end of the base material to a spraying end end.
According to this liquid draining device for the base material, the gas jet from the gas jetting part is moved toward the tip in the spraying direction, so that the liquid residue on the surface of the base material can be easily prevented.

(3) 前記相対移動機構は、前記気体噴射部の気体噴射口から前記基材の前記気体噴流の吹き当て位置までの距離を設定した範囲に維持する(1)又は(2)の基材の液切り装置。
この基材の液切り装置によれば、気体噴射口から基材の吹き当て位置までの距離を設定した範囲に維持するため、基材表面へ気体噴流を吹き当てる圧力が吹き当て位置において均等になり、基材の全面に亘ってムラなく液切りができる。
(3) The relative movement mechanism maintains the distance from the gas injection port of the gas injection unit to the spraying position of the gas jet of the base material within a set range of the base material of (1) or (2). Drainer.
According to this liquid draining device for the base material, in order to maintain the distance from the gas injection port to the spraying position of the base material within a set range, the pressure for spraying the gas jet flow onto the base material surface is even at the spraying position. Therefore, it is possible to drain the liquid evenly over the entire surface of the base material.

(4) 前記相対移動機構は、前記気体噴射部の気体噴射口から前記基材の前記気体噴流の吹き当て位置までの距離を設定し、前記設定した距離に対して±20mmとなる範囲に維持する(1)又は(2)に記載の基材の液切り装置。
この基材の液切り装置によれば、気体噴射口から基材の吹き当て位置までの距離を設定しこれに対して±20mmとなる範囲に維持するため、基材表面へ気体噴流を吹き当てる圧力が吹き当て位置において均等になり、基材の全面に亘ってムラなく液切りができる。
(4) The relative movement mechanism sets a distance from a gas injection port of the gas injection unit to a blowing position of the gas jet of the base material, and maintains the distance within ±20 mm with respect to the set distance. The liquid draining device for a substrate according to (1) or (2).
According to this substrate drainer, the gas jet is blown to the surface of the base material in order to set the distance from the gas injection port to the blowing position of the base material and maintain the distance within ±20 mm. The pressure becomes uniform at the spraying position, and the liquid can be drained uniformly over the entire surface of the base material.

(5) 前記相対移動機構は、固定された前記気体噴射部に対して前記基材支持部を移動させる(1)〜(4)のいずれか一つの基材の液切り装置。
この基材の液切り装置によれば、固定された気体噴射部に対して基材支持部を移動させるので、気体噴射部と比較して軽量な基材支持部の姿勢を変更する機構で済み、液切り装置の機構を簡素化でき、基材Pの姿勢変更の自由度を高められる。
(5) The liquid draining device for a base material according to any one of (1) to (4), wherein the relative movement mechanism moves the base material support part with respect to the fixed gas injection part.
According to this base material draining device, since the base material support portion is moved with respect to the fixed gas ejection portion, a mechanism for changing the posture of the base material support portion which is lighter than the gas ejection portion is sufficient. The mechanism of the liquid draining device can be simplified, and the degree of freedom in changing the posture of the base material P can be increased.

(6) 前記気体噴射部は、前記基材支持部の上方及び下方にそれぞれ配置された(1)〜(5)のいずれか一つの基材の液切り装置。
この基材の液切り装置によれば、基材支持部の上方及び下方にそれぞれ気体噴射部が配置されるので、基材の両面を一度に液切りでき、タクトアップが図れ、生産効率が向上する。
(6) The liquid ejecting device for a substrate according to any one of (1) to (5), wherein the gas ejecting unit is arranged above and below the substrate supporting unit, respectively.
According to this liquid draining device for the base material, the gas injection parts are arranged above and below the base material supporting part, respectively, so that both surfaces of the base material can be drained at one time, the tact time can be improved, and the production efficiency is improved. To do.

(7) 前記基材支持部は、前記基材を吸着保持する吸着部を有する(1)〜(6)のいずれか一つの基材の液切り装置。
この基材の液切り装置によれば、吸着により基材が確実に保持され、基材を反転する等の姿勢変更が容易に可能となる。
(7) The substrate draining device according to any one of (1) to (6), wherein the substrate supporting unit includes an adsorption unit that adsorbs and holds the substrate.
According to this liquid draining device for a base material, the base material is securely held by adsorption, and it is possible to easily change the posture such as turning over the base material.

(8) 前記基材支持部は、前記基材の端部を支持する複数の基材係止部を有する(1)〜(7)のいずれか一つの基材の液切り装置。
この基材の液切り装置によれば、基材係止部で基材を支持することで、基材との接触点が少なくなり、液残りが生じにくくなる。
(8) The drainage device for a substrate according to any one of (1) to (7), wherein the substrate support part has a plurality of substrate locking parts that support the ends of the substrate.
According to this liquid draining device for a base material, by supporting the base material at the base material locking portion, the number of contact points with the base material is reduced, and the liquid remains less likely to occur.

(9) 前記基材支持部は、
前記基材の互いに異なる位置を支持する第1支持具及び第2支持具と、
前記第1支持具と前記第2支持具のうち一方に支持された前記基材を他方に持ち替えさせる持ち替え機構と、
を備える(1)〜(8)のいずれか一つの基材の液切り装置。
この基材の液切り装置によれば、第1支持具及び第2支持具が、基材の互いに異なる位置を支持するため、基材支持具と基材との接触部に液残りが生じても、持ち替えさせることにより、生じた液残りを除去できる。
(9) The base material supporting portion is
A first support tool and a second support tool that support different positions of the base material;
A holding mechanism for holding the base material supported by one of the first support tool and the second support tool to the other,
A liquid draining device for a substrate according to any one of (1) to (8).
According to this drainage device for a base material, since the first support tool and the second support tool support different positions of the base material, liquid remains at the contact portion between the base material support tool and the base material. Also, the generated liquid residue can be removed by changing the holding.

(10) 前記基材は、ガラス材である(1)〜(9)のいずれか一つの基材の液切り装置。
この基材の液切り装置によれば、表面が滑らかで洗浄痕が目立つガラス材であっても、確実な液切りが実施でき、良好な乾燥表面が得られる。
(10) The said base material is a glass material, The drainage apparatus of any one base material of (1)-(9).
According to this liquid draining device for a base material, even if the glass material has a smooth surface and marked cleaning marks, reliable liquid draining can be performed and a good dry surface can be obtained.

31 基材支持部
33 エアーナイフ(気体噴射部)
33a 気体噴射口
41 移動ステージ(相対移動機構)
43 X軸方向駆動部
45 Z軸方向駆動部
47 φ方向駆動部
51 吹き当て角調整部
61,81 第1支持具
67A,67B,69A,69B,77,79A,79B 基材係止部
71,101 第2支持具
87,89A,89B 突起部
93 吸着部
100,100A,100B 基材の液切り装置
P 基材
31 Base Material Support Section 33 Air Knife (Gas Injection Section)
33a Gas injection port 41 Moving stage (relative moving mechanism)
43 X-axis direction drive section 45 Z-axis direction drive section 47 φ-direction drive section 51 Spray angle adjusting section 61, 81 First support 67A, 67B, 69A, 69B, 77, 79A, 79B Base material locking section 71, 101 2nd support tool 87,89A,89B protrusion part 93 adsorption|suction part 100,100A,100B liquid removal apparatus of a base material P base material

Claims (11)

少なくとも一部に曲面形状を有する基材の凹部上方から気体を吹き付けて、前記基材に付着している処理液を除去する基材の液切り装置であって、
前記基材を支持する基材支持部と、
気体を噴射する気体噴射部と、
前記基材支持部と前記気体噴射部とを相対移動させ、前記基材の一端部から他端部までの基材表面に前記気体噴射部からの気体噴流を吹き当てる相対移動機構と、
を備え、
前記相対移動機構は、前記気体噴射部に対して前記基材支持部を移動させる機構であって、吹き当て角調整部により前記相対移動に伴う前記基材表面の吹き当て位置における法線方向の変化に応じて、前記気体噴射部からの気体噴射方向と前記法線方向とのなす吹き当て角を調整する機能を有する基材の液切り装置。
A liquid draining device for a base material, which blows gas from above into a concave portion of a base material having a curved shape at least in part, and removes a processing liquid adhering to the base material,
A base material support part for supporting the base material,
A gas injection unit for injecting gas,
A relative movement mechanism that relatively moves the base material support part and the gas injection part, and sprays a gas jet from the gas injection part onto the base material surface from one end to the other end of the base material,
Equipped with
The relative movement mechanism is a mechanism for moving the base material support portion with respect to the gas ejecting portion, in the normal direction at the spraying position of the base material surface due to the relative movement by the spraying angle adjusting portion. A substrate drainer having a function of adjusting a spraying angle formed by a gas jetting direction from the gas jetting unit and the normal direction according to a change.
前記相対移動機構は、前記基材支持部を水平方向及び垂直方向に移動させ、前記基材の一端部から他端部までの基材表面に前記気体噴射部からの気体噴流を吹き当てる直動駆動部と、The relative movement mechanism moves the base material support portion in a horizontal direction and a vertical direction, and directly moves a gas jet from the gas injection portion onto the surface of the base material from one end to the other end of the base material. Drive unit,
前記基材を前記気体噴射部に対して回転させる回転駆動部と、A rotation drive unit that rotates the base material with respect to the gas injection unit,
を有する請求項1に記載の基材の液切り装置。The liquid draining device for a base material according to claim 1, further comprising:
前記吹き当て角調整部は、前記気体噴射方向を前記基材の吹き当て開始端から吹き当て終了端に向ける機能を有する請求項1又は請求項2に記載の基材の液切り装置。 The substrate spraying device according to claim 1 or 2 , wherein the spraying angle adjusting unit has a function of directing the gas jetting direction from a spraying start end of the base material to a spraying end end. 前記相対移動機構は、前記気体噴射部の気体噴射口から前記基材の前記気体噴流の吹き当て位置までの距離を設定した範囲に維持する請求項1請求項3のいずれか一項に記載の基材の液切り装置。 The relative movement mechanism, according to any one of claims 1 to 3 to maintain the range set the distance from the gas injection port of the gas injection section to blow against the position of the gas jet of the substrate Draining device for base materials. 前記相対移動機構は、前記気体噴射部の気体噴射口から前記基材の前記気体噴流の吹き当て位置までの距離を設定し、前記設定した距離に対して±20mmとなる範囲に維持する請求項1〜請求項3のいずれか一項に記載の基材の液切り装置。 The said relative movement mechanism sets the distance from the gas injection port of the said gas injection part to the spraying position of the said gas jet of the said base material, and maintains it in the range used as ±20 mm with respect to the said set distance. The liquid draining device for a substrate according to any one of claims 1 to 3 . 前記気体噴射部は、固定されている請求項1〜請求項のいずれか一項に記載の基材の液切り装置。 The gas injection section, the substrate of the liquid removal device according to any one of Tei Ru claims 1 to 5 is fixed. 前記気体噴射部は、前記基材支持部の上方及び下方にそれぞれ配置された請求項1〜請求項のいずれか一項に記載の基材の液切り装置。 The gas injection section, the substrate of the liquid removal device according to any one of claims 1 to 6 arranged respectively above and below the substrate supporting unit. 前記基材支持部は、前記基材を吸着保持する吸着部を有する請求項1〜請求項のいずれか一項に記載の基材の液切り装置。 The substrate supporting section, the substrate of the liquid removal device according to any one of claims 1 to 7 having a suction unit for attracting and holding the substrate. 前記基材支持部は、前記基材の端部を支持する複数の基材係止部を有する請求項1〜請求項のいずれか一項に記載の基材の液切り装置。 The said base material support part is a liquid draining apparatus of the base material as described in any one of Claims 1-8 which has a some base material locking part which supports the edge part of the said base material. 前記基材支持部は、
前記基材の互いに異なる位置を支持する第1支持具及び第2支持具と、
前記第1支持具と前記第2支持具のうち一方に支持された前記基材を他方に持ち替えさせる持ち替え機構と、
を備える請求項1〜請求項のいずれか一項に記載の基材の液切り装置。
The base material support portion,
A first support tool and a second support tool that support different positions of the base material;
A holding mechanism for holding the base material supported by one of the first support tool and the second support tool to the other,
The liquid draining device for a base material according to any one of claims 1 to 9 , further comprising:
前記基材は、ガラス材である請求項1〜請求項10のいずれか一項に記載の基材の液切り装置。
The said base material is a glass material, The liquid draining apparatus of the base material as described in any one of Claims 1-10 .
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