KR101583610B1 - SMIF System - Google Patents

Abstract

Disclosed is an SMIF system. The SMIF system includes: a transfer/loading part (600) integrated with a process chamber (400), and transferring a reticle to the process chamber (400) after accepting the reticle stored in a pod (10); an area pod placing part (100) placed in a side of the transfer/loading part (600), and transferring the pod to the transfer/loading part (600) through a manipulator, provided from the outside, while removing a particle attached to the surface of the pod; and a particle absorbing part (500) absorbing the particle, generated in the pod placing part (100) and the transfer/loading part (600). The transfer/loading part (600) is separated into a loading part (200) and a transfer part (300) through a partition. The loading part (200) includes an SMIF loader (250). The transfer part (300) includes a transfer unit (350) transferring the reticle in the pod (10) to the process chamber.

Description

SMIF System {SMIF System}

The present invention relates to a semiconductor device, and more particularly, to an SMIF system capable of removing particles, which may be generated when a semiconductor material is transferred to a process chamber, in real time to provide a clean semiconductor material to the process chamber.

A general loader device is an automation equipment related to the transportation of materials such as wafers or reticles in the semiconductor manufacturing process. It is a SMIF (Standard of Standard) recommended by SEMI (Semiconductor Equipment and Meterials Interials International) Mechanical Interface) system.

SMIF is concerned with local cleaning. It is a closed storage container (reticle storage container) for blocking particles (fine dust particles) that are possible in the air during wafer fabrication process. It keeps only the local space clean It proposes a minimum common standard for devices for interface between process equipment.

Among the SMIF systems, the loader device of the present invention is an interface device for transferring semiconductor materials such as wafers, reticles, etc. housed in pads to the next process.

However, in the case of the conventional SIMF system, defects have been caused as particles generated due to the operator or mechanical binding in the process are floated on the reticle or wafer.

Accordingly, the present invention proposes a SMIF loader device capable of minimizing defects of a reticle by sucking particles generated during a process of transferring a semiconductor material to a next process.

Korean Patent Registration No. 10-0928479 (entitled SMIF Loader Apparatus)

SUMMARY OF THE INVENTION It is an object of the present invention to provide an SMIF system capable of minimizing defects of a semiconductor material by sucking particles that can be generated in a process of transferring a semiconductor material to a process chamber, .

A SMIF system according to an embodiment of the present invention for solving the above-mentioned problems is provided with a process chamber 400 integrally provided therein. The SMIF system accommodates a reticle accommodated in a pad 10 and transfers the reticle to the process chamber 400 A transfer / loading unit 600; The transfer unit 600 is provided at one side of the transfer / loading unit 600 and removes the particles attached to the surface of the pad 10 and transfers the pad 10 to the transfer / loading unit 600 through an external manipulator. A pad seating portion 100 which is an area for transporting the pad seating portion 100; And a particle suction unit 500 for sucking particles generated in the transfer / loading unit 600 and the pad seating unit 100. The transfer / loading unit 600 includes at least one partition The loading unit 200 is divided into a loading unit 200 and a transfer unit 300 through the first and second loading units P1, P2 and P3. The loading unit 200 includes a SMIF loader 250, And a transfer unit (350) for transferring the transfer chamber (350) to the process chamber.

The upper part of the pad seating part 100 is formed in the mesh net 110 so that the particles adhering to the surface of the pad 10 can easily fall down through the at least one suction fan 510 located at the lower part. .

The SMIF loader 250 is characterized in that the pad cover and the pad plate are removed in an up type or a down type manner.

The particle suction unit 500 includes a suction fan 510 for sucking particles that are drawn into the pad seating unit 100 and the loading unit 200 and a vacuum suction unit for sucking particles inhaled from a site connected to the suction pipe 511 And a vacuum pump (520).

The suction pipe 511 is connected to the particle cleaning module 330 and the SMIF loader 250 to vacuum-suck particles. Particularly, the suction pipe 511 is installed in the height adjusting member 220 of the SMIF loader 250, (Not shown) is formed in the SMIF to remove particles inside the SMIF.

The transfer / loading unit 600 includes a first partition P1 for separating the pad seating unit 100 from the loading unit 200; A second partition P2 for separating the loading unit 200 from the transfer unit 300; And a third partition P3 separating the transfer chamber 300 from the process chamber 400. Each of the second partition P2 and the third partition P3 includes a plurality of particles P3 attached to the surface of the reticle, And a particle cleaning module 330 for sucking the particles.

The particle cleaning module 330 provided in the second partition P2 removes particles attached to the surface of the reticle conveyed from the loading unit 200 to the transfer unit 300.

The particle cleaning module 330 provided in the third partition P3 is configured to suck particles attached to the surface of the reticle conveyed from the transfer unit 300 to the process chamber 400. [

The particle cleaning module (330) includes a first particle removing module (310) coupled to an upper side of the bracket and sucking particles positioned on the upper surface of the reticle received in the vacuum suction pressure provided from the outside, And a second particle removing module (320) coupled to a lower side of the bracket and sucking particles located on a lower surface of the reticle in response to a vacuum suction pressure provided from the outside, wherein the first particle removing module 310 and the second particle removing module 320 inject a floating gas N ₂ onto the surface of the reticle, vacuum-suck the suspended particles, and discharge the particles to the outside.

The transfer unit 350 includes a moving unit 351 moving left and right; And a cantilever 352 provided on the moving part 351 and whose length is adjusted in the horizontal direction and the cantilever 352 is mounted on the second partition P2 The particle cleaning module 330 and the particle cleaning module 330 provided in the third partition P3 to the inside of the process chamber.

Accordingly, the SMIF system according to the embodiment of the present invention has an advantage that the particles that can be generated in the process of being transferred to the process chamber can be efficiently and originally removed.

1 is an exemplary diagram illustrating an SMIF system according to an embodiment of the present invention.
Figs. 2 to 7 are flowcharts showing the process of transferring the reticle in the pads to the process chamber.
8 shows an example in which the SMIF loader in the loading section is driven up.
9 is an exemplary view showing an operation process of the transfer unit in the transfer unit.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a detailed description of preferred embodiments of the present invention will be given with reference to the accompanying drawings. In the following description of the present invention, detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

Embodiments in accordance with the concepts of the present invention can make various changes and have various forms, so that specific embodiments are illustrated in the drawings and described in detail in this specification or application. It is to be understood, however, that it is not intended to limit the embodiments according to the concepts of the present invention to the particular forms of disclosure, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention.

It is to be understood that when an element is referred to as being "connected" or "connected" to another element, it may be directly connected or connected to the other element, . On the other hand, when an element is referred to as being "directly connected" or "directly connected" to another element, it should be understood that there are no other elements in between. Other expressions that describe the relationship between components, such as "between" and "between" or "neighboring to" and "directly adjacent to" should be interpreted as well.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In this specification, the terms "comprises ",or" having ", or the like, specify that there is a stated feature, number, step, operation, , Steps, operations, components, parts, or combinations thereof, as a matter of principle.

Hereinafter, the SMIF system according to an embodiment of the present invention will be described in detail with reference to the drawings.

1 is an exemplary diagram illustrating an SMIF system according to an embodiment of the present invention.

Figs. 2 to 7 are flowcharts showing the process of transferring the reticle in the pads to the process chamber.

8 shows an example in which the SMIF loader in the loading section is driven up.

9 is an exemplary view showing an operation process of the transfer unit in the transfer unit.

Referring to FIG. 1, an SMIF system 1000 according to an embodiment of the present invention includes a pad seating part 100, a transfer / loading part 600, and a particle suction part 500.

The transfer / loading unit 600 is integrally provided with the process chamber 400, and functions to transfer the reticle received in the fade 10 to the process chamber 400 after being received therein.

2, the pad seating part 100 is provided at one side of the feeding / loading part 600 and removes particles adhering to the surface of the pad 10, and at the same time, Loading unit 600 to the transporting / loading unit 600, as shown in FIG.

The particle suction unit 500 functions to suck particles floating in the space generated in the transfer / loading unit 600 and the pad seating unit 100.

The loading / unloading unit 600 is divided into a loading unit 200 and a loading unit 300 through a plurality of partitions. The loading unit 200 is driven in an up type or a down type The transfer unit 300 is provided with a transfer unit 350 for transferring the reticle in the pad 10 to the process chamber 400.

More specifically, the pad seating portion 100 includes a manipulator for transferring an external provided pad to a transfer portion in the transfer / loading portion 600, and a manipulator for transferring the pad 10 to the transfer portion in the transfer / / Loading portion 600. In this case, the particles may be removed from the surface of the pad 10 before the particles are introduced into the loading portion 600.

The feeding / loading unit 600 includes a first partition P1 for separating the pad seating unit 100 from the loading unit 200 and a second partition P1 for separating the loading unit 200 and the feeding unit 300 from each other And a third partition P3 that separates the transfer chamber 300 from the process chamber 400. The second partition P2 and the third partition P3 are each provided with a first partition P2, And a particle cleaning module 330 for sucking particles attached to the reticle surface.

The first partition P1 is provided with a door member D and functions to open the manipulator when the manipulator is retracted into the loading unit 200.

4 is a view showing the direction of movement of the pad from the pad seating part 100 to the loading part 200 through the manipulator. The pad seating part 100 and the loading part 200 are spaced apart from each other, The position of the SMIF system and the process chamber can be changed according to the size of the space, so that the loading position can be changed according to the positional change, And to make use of the limited space by varying the movement pattern of the paddles.

3 and 5, the loading unit 200 is coupled to an upper portion of the SMIF loader 250 having a pad that is conveyed through the manipulator, and then the pad cover 11 ) And the pad plate (12) of the pad (10) and sucking the particles generated during the removal.

Here, the SMIF loader 250 provided in the loading unit 200 can be separated into an up-type and a down-type according to a method of removing the pad cover 11 and the pad plate 12.

For example, FIG. 5 shows an example of the down type of the SMIF loader 250, and FIG. 8 shows an up type example of the SMIF loader 250. FIG. Here, in the case of the up type, when the fad cover and the fad plate are detached, the fad cover can be transported upward by using a lifting device.

In the present invention, the SMIF loader will be described as a down-type SMIF loader.

Thereafter, the FAD plate 12 separated from the FOLD cover 11 as a down type is transported downward by a predetermined distance through the height adjusting member 220 in the SMIF loader 250. Here, the predetermined distance may be a distance to the position of the particle cleaning module 330 provided in the second partition P2.

Next, the transfer unit 300 may be a space for transferring the reticle placed on the transfer plate 350 to the process chamber 400.

The transfer unit 350 includes a moving unit 351 that moves left and right and a cantilever 352 that is provided on the moving unit 351 and whose length is adjusted in the horizontal direction, 352 are introduced into the space in the particle cleaning module 330 provided in the second partition P2 to receive the reticle from the SMIF loader 250 and then transfer the reticle to the particles in the third partition P3 To move into the space in the cleaning module 330 and transfer it to the process chamber 300.

The particle cleaning module 330 includes a first particle removing module 310 for receiving particles from the upper surface of the reticle which is received in the vacuum suction pressure provided from the outside, And a second particle removing module 320 for receiving the particles located on the lower surface of the reticle by receiving the first particle removing module 310 and the second particle removing module 320. The first particle removing module 310 and the second particle removing module 320 are connected to each other through a bracket Respectively.

The first particle removing module 310 and the second particle removing module 320 inject the floating gas N ₂ to the surface of the wafer or the reticle, do.

Here, the bracket (not shown) is provided in the second partition P2 and the third partition P3.

The particle suction unit 500 includes a suction fan 510 for sucking particles that are drawn into the pad seating unit 100 and the loading unit 200 and a suction unit And a vacuum pump 520 for vacuum suction.

The particle cleaning module 330 provided in the second partition P2 sucks and removes particles attached to the surface of the reticle transferred from the loading unit 200 to the transfer unit 300, The particle cleaning module 330 provided in the processing chamber 400 performs a function of sucking and removing the particles attached to the surface of the reticle conveyed from the transfer unit 300 to the process chamber 400. [

Accordingly, the SMIF system according to the embodiment of the present invention efficiently and intrinsically removes particles that may occur during the process of transferring the reticle provided in the pads into the process chamber, thereby minimizing the pattern defects of the reticle .

The foregoing detailed description is illustrative of the present invention. It is also to be understood that the foregoing is illustrative and explanatory of preferred embodiments of the invention only, and that the invention may be used in various other combinations, modifications and environments. It is to be understood that changes and variations may be made without departing from the scope of the inventive concept disclosed herein, the disclosure of which is equally applicable to the disclosure, and / or the skill or knowledge of the art.

The foregoing embodiments are intended to illustrate the best mode contemplated for carrying out the invention and are not intended to limit the scope of the invention to those skilled in the art that are intended to encompass other embodiments of the invention, Various changes are possible.

Accordingly, the foregoing description of the invention is not intended to limit the invention to the precise embodiments disclosed. It is also to be understood that the appended claims are intended to cover further embodiments.

1000: SIMF loader device 100: Pad seating part
200: loading section 300:
310: first particle removal module 320: second particle removal module
330: Particle Cleaning Module
350: transfer unit 400: process chamber
600: transfer / loading part 500: particle suction part
510: Suction fan 520: Vacuum pump
P1: first partition P2: second partition
P3: second partition T: lifting device

Claims (10)

A transfer / loading unit 600 which is integrally provided with the process chamber 400 and accommodates the reticle received in the fade 10 and transfers the reticle to the process chamber 400;
The transfer unit 600 is provided at one side of the transfer / loading unit 600 and removes particles attached to the surface of the pad 10 and transfers the pad 10 to the transfer / loading unit through an external manipulator A pad seating part 100 as an area; And
And a particle suction unit (500) for sucking particles generated in the transfer / loading unit (600) and the pad seating unit (100)
The transporting / loading unit 600 may include,
The loading unit 200 is separated into a loading unit 200 and a transfer unit 300 through at least one of the partitions P1, P2 and P3. The loading unit 200 is provided with an SMIF loader 250, ) Is provided with a transfer unit (350) for transferring the reticle in the pad to the process chamber,
The pad seating part (100)
Wherein the upper surface is formed as a mesh net (110) so that the particles attached to the surface of the pad (10) can easily fall down through at least one suction fan (510) positioned at the lower part.
delete The method according to claim 1,
The SMIF loader 250,
Wherein the pad cover and the pad plate are detached in an up-type or down-type manner.
The method according to claim 1,
The particle suction part (500)
A suction fan 510 positioned at the lower end of the loading unit 200 and sucking the particles introduced into the pad seating unit 100 and the loading unit 200,
And a vacuum pump (520) for discharging the particles to the outside by vacuum suction.
5. The method of claim 4,
The transporting / loading unit 600 may include,
A first partition P1 for separating the pad seating part 100 from the loading part 200;
A second partition P2 for separating the loading unit 200 from the transfer unit 300; And
A third partition P3 separating the transfer chamber 300 from the process chamber 400,
Each of the second partition (P2) and the third partition (P3)
And a particle cleaning module (330) for sucking particles attached to the reticle surface.
6. The method of claim 5,
The particle cleaning module 330 provided in the second partition P2 may be provided with:
And removing particles attached to the surface of the reticle conveyed from the loading unit (200) to the transfer unit (300).
6. The method of claim 5,
The particle cleaning module 330 provided in the third partition P3 may be provided,
And suck particles attached to a surface of a reticle conveyed from the transfer unit (300) to the process chamber (400).
8. The method according to claim 6 or 7,
The particle cleaning module (330)
A first particle removing module (310) coupled to an upper side of the bracket and sucking particles located on an upper surface of the reticle received in the vacuum suction pressure provided from the outside; And
And a second particle removing module (320) coupled to a lower side of the bracket and sucking particles located on a lower surface of the reticle in response to an externally provided vacuum suction pressure,
The first particle removal module 310 and the second particle removal module 320 may be configured to remove,
(N ₂ ) is sprayed onto the surface of the reticle, and the suspended particles are vacuum-sucked and discharged to the outside.
delete 6. The method of claim 5,
The transfer unit (350)
A moving unit 351 moving left and right; And
And a cantilever 352 which is provided on the moving part 351 and whose length is adjusted in the horizontal direction,
The cantilevers 352,
The reticle in the fade 10 is transferred into the process chamber through the particle cleaning module 330 provided in the second partition P2 and the particle cleaning module 330 provided in the third partition P3 Wherein the SMIF system comprises:

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