KR101561414B1 - Wet scrubber - Google Patents

Wet scrubber Download PDF

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Publication number
KR101561414B1
KR101561414B1 KR1020150102401A KR20150102401A KR101561414B1 KR 101561414 B1 KR101561414 B1 KR 101561414B1 KR 1020150102401 A KR1020150102401 A KR 1020150102401A KR 20150102401 A KR20150102401 A KR 20150102401A KR 101561414 B1 KR101561414 B1 KR 101561414B1
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KR
South Korea
Prior art keywords
gas
cleaning
guiding
filter module
unit
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KR1020150102401A
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Korean (ko)
Inventor
박홍구
박보근
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박홍구
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Priority to KR1020150102401A priority Critical patent/KR101561414B1/en
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Publication of KR101561414B1 publication Critical patent/KR101561414B1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041Cleaning
    • H01L21/02043Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052Wet cleaning only
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D46/00Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D47/00Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06Spray cleaning
    • B01D50/006
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treating Waste Gases (AREA)

Abstract

The present invention relates to a wet scrubber, and more particularly, to a wet scrubber that includes a gas guiding and cleaning unit for guiding a noxious gas into the interior thereof, And a filtering unit detachably connected to the upper portion of the gas induction and scrubbing unit, for filtering the residual gas that is remained in the gas induction and scrubbing unit and moving upward to perform a second purification treatment.

Description

Wet scrubber {Wet scrubber}

The present invention relates to a wet scrubber, and more particularly, to a wet scrubber capable of purifying noxious gas with a new concept structure and capable of improving purification treatment efficiency as compared with existing scrubbers, The present invention relates to a scrubber.

The scrubber, which is one of the machinery for treating harmful gas, is divided into Burn-Wet, Burn-Filter, Dry and Wet according to the treatment method. .

Of these types, a wet scrubber, that is, a wet scrubber, is provided on a facility for semiconductor production, etc., and treats harmful gases generated during the process and purifies it.

The wet scrubber includes a scrubber body that forms an appearance, and water jet nozzles, poles, and demisters provided in the scrubber body for purifying operations.

The operation of such a conventional wet scrubber will be described below.

The noxious gas flowing into the scrubber body of the wet scrubber is directed upward in the scrubber body, at which time the water jet nozzle injects water towards the noxious gas.

The adsorbed material adsorbed from the noxious gas due to the injection of water is collected in the polling in the scrubber body, and the moisture can be removed toward the demister.

With this operation, the process gas having been subjected to the purification process of the noxious gas can be exhausted through the exhaust unit as the blower unit provided in the upper region of the scrubber body operates.

On the other hand, as described above, it is common that the wet scrubber is provided with a configuration such as polling and demister, but the efficiency of purifying the noxious gas is somewhat lowered, and the maintenance cost is high Considering this point, it is necessary to develop a new concept of wet scrubber.

Korea Patent Office Application No. 10-2005-0131286

It is an object of the present invention to provide a wet scrubber which can purify noxious gas with a new concept structure and thus can improve cleaning treatment efficiency and reduce maintenance cost as compared with existing scrubbers.

The object of the present invention is achieved by a gas guiding and cleaning unit for guiding a noxious gas into the inside thereof, washing it, and performing a primary purification treatment; And a filtering unit detachably connected to the upper portion of the gas guiding and cleaning unit and filtering the residual gas that is remained in the gas guiding and cleaning unit and moved upward to perform a secondary purification treatment. Lt; / RTI >

The gas guiding and cleaning unit includes a cleaning main body portion to which a first flange is coupled at an end portion, a cleaning neck portion having a narrower sectional area than that of the cleaning main body portion, and a cleaning inclined portion that connects the cleaning main body portion and the cleaning neck portion in an inclined manner, A cleaning unit casing having a connection portion; A lower duct provided in the cleaning unit casing for guiding a flow of a noxious gas between the cleaning unit casing and the cleaning unit casing; And a lower end portion disposed in the gas induction lower duct and an upper end portion contacting the first flange and guiding the noxious gas flowing into the gas induction lower duct toward the filtering unit, . ≪ / RTI >

Wherein the gas guiding lower duct has a lower inclined portion and a lower vertical portion vertically arranged at an upper end of the lower inclined portion, the sectional area being narrower toward the lower portion, and the gas guiding upper duct is disposed in the lower vertical portion And an upper inclined portion disposed obliquely at an end of the upper vertical portion. The upper inclined portion may have a larger cross sectional area toward the upper portion.

The gas guiding and cleaning unit includes a plurality of water jet nozzles for jetting water for cleaning toward the noxious gas introduced between the gas induction lower duct and the gas induction upper duct; And one end is connected to the lower end of the gas guiding lower duct and the other end is exposed to the outside of the cleaning unit casing, and the lower part of the lower part, on which the drain water drained firstly by the action of the water spray nozzle, Drain line.

The filtering unit includes a second flange formed at a lower end of the gas introducing and cleaning unit so as to be detachably and flangeably engaged with the first flange of the gas introducing and cleaning unit, A filtering unit casing forming the filtering unit casing; And a filter module provided in the filtering unit casing to filter the residual gas.

The filter module may be a helical filter module in which the inside of the filter module can be cleaned as a whole, or a stacked filter module in which individual layers can be separated and cleaned.

The helical filter module comprising: a first module housing disposed within the filtering unit casing; And a helical filter plate arranged in a spiral manner in the first module housing and having a plurality of tubes formed on the plate surface.

The stacked filter module includes: a second module housing disposed in the filtering unit casing; A plurality of stacked filter plates arranged independently in an inclined manner in the second module housing and having a plurality of tubes formed on the plate surface; And a plate fixing portion for individually fixing the plurality of stacked filter plates in a central region of the second module housing.

And a discharge unit detachably coupled to an upper portion of the filtering unit, through which the process gas having been subjected to the purge process is discharged.

According to the present invention, it is possible to purify noxious gas with a new concept structure, which can improve cleaning treatment efficiency and reduce maintenance cost compared with existing scrubbers.

1 is a structural view of a wet scrubber according to an embodiment of the present invention;
Figure 2 shows a flow diagram of the gas in Figure 1,
Fig. 3 shows a three-dimensional image of a helical filter module,
Figure 4 is a cutaway image of Figure 3,
Figure 5 shows a schematic internal structure of a helical filter module,
Figure 6 is a top view of the helical filter plate,
7 is a schematic internal structure of a stacked filter module applied to a wet scrubber according to another embodiment of the present invention.

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

Fig. 1 is a structural view of a wet scrubber according to an embodiment of the present invention, Fig. 2 is a flow chart of gas in Fig. 1, Fig. 3 is a stereoscopic image of a spiral filter module, Fig. 5 is a schematic internal structure of a helical filter module, and Fig. 6 is a plan view of a helical filter plate.

1 and 2, the wet scrubber according to the present embodiment can purify noxious gas with a new concept structure, thereby improving purification treatment efficiency compared to conventional scrubbers, And may also include a gas induction and scrubbing unit 110, a filtering unit 160, and an exhaust unit 190 so as to reduce the maintenance cost.

The gas induction and cleaning unit 110, the filtering unit 160, and the exhaust unit 190 may be detachably and flanably coupled to each other.

The gas induction and cleaning unit 110 and the filtering unit 160 are arranged such that the first flange 122 on the gas induction and cleaning unit 110 side and the second flange 171 on the filtration unit 160 side face each other, By coupling the bolts to the first and second flanges 122 and 171, the gas introducing and cleaning unit 110 and the filtering unit 160 can be combined and vice versa.

The filtering unit 160 and the discharging unit 190 are also arranged so that the third flange 172 on the side of the filtering unit 160 and the fourth flange 191 on the side of the discharging unit 190 face each other, By fastening the bolts to the fourth flanges 172 and 191, the filtering unit 160 and the discharge unit 190 can be engaged and vice versa.

When the gas induction and washing unit 110, the filtering unit 160, and the discharge unit 190 are detachably coupled to each other, the units 110, 160, and 190 can be easily transported or maintained. Particularly, there is an advantage that the cleaning operation or the replacement operation of the filter module 180 provided in the filtering unit 160 can be greatly facilitated.

The structure of the wet scrubber will be described in detail. First, the gas introducing and cleaning unit 110 induces the noxious gas into the inside, cleans the first scrubbing process, and discharges the discharged gas.

The gas induction and cleaning unit 110 may include a cleaning unit casing 120, a gas induction lower duct 130, a gas induction upper duct 140, and a lower drain line 152.

The cleaning unit casing 120 forms the appearance of the gas guiding and cleaning unit 110, and has a structure such that the bottle is turned upside down from a simple cylindrical structure.

That is, in this embodiment, the cleaning unit casing 120 includes a cleaning main body 121 to which the first flange 122 is coupled, a cleaning neck portion 123 having a narrower sectional area than the cleaning main body 121, And a cleansing slant connection 124 slantably connecting the cleansing main body 121 and the cleansing neck 123.

When the cleaning unit casing 120 has the structure of the cleaning main body portion 121, the cleaning neck portion 123 and the cleaning slant connection portion 124, there is an advantage that the gas flow can be made smooth as compared with the cylindrical structure.

The gas guiding lower duct 130 and the gas guiding upper duct 140 are disposed in the cleaning unit casing 120 and serve to guide the flow of the harmful gas as shown by arrows in Fig.

The gas induction lower duct 130 is provided in the cleaning unit casing 120 and serves to guide the flow of the noxious gas between the cleaning duct unit casing 120 and the cleaning duct unit casing 120.

The gas induction lower duct 130 may have a lower inclined portion 131 and a lower vertical portion 132 vertically disposed at an upper end of the lower inclined portion 131. [ Particularly, the gas-guiding lower duct 130 is formed to have a smaller cross-sectional area as it goes downward, thereby facilitating the discharge of drain water.

The lower end of the gas induction use duct 140 is disposed inside the gas induction lower duct 130 and the upper end of the gas induction use duct 140 is in contact with the first flange 122, And directs it toward the filtering unit 160.

The gas guiding upper duct 140 may have an upper vertical portion 141 disposed in the lower vertical portion 132 and an upper inclined portion 142 disposed obliquely at the end portion of the upper vertical portion 141. In particular, unlike the gas-guiding lower duct 130, the gas-guiding upper duct 140 is formed with a larger cross-sectional area so that noxious gas can be guided well toward the filtering unit 160.

A plurality of water injection nozzles 151 are provided between the gas induction lower duct 130 and the gas induction upper duct 140.

The plurality of water injection nozzles 151 are disposed between the gas induction lower duct 130 and the gas induction upper duct 140 to spray the water toward the noxious gas flowing therethrough thereby to clean the noxious gas first .

One end of the lower drain line 152 is connected to the lower end of the gas induction lower duct 130 and the other end of the lower drain line 152 is exposed to the outside of the cleaning unit casing 120. By the action of the water injection nozzle 151 So that the first purified water drain water can be drained.

Next, the filtering unit 160 is detachably coupled to the upper portion of the gas induction and cleaning unit 110, and the residual gas that is remained in the gas induction and cleaning unit 110 and is moved upward is filtered to perform secondary purification treatment It plays a role.

This filtering unit 160 may include a filtering unit casing 170 and a filter module 180 provided in the filtering unit casing 170 to filter the residual gas.

The filtering unit casing 170 forms an appearance of the filtering unit 160 and forms a place for filtering residual gas that remains and is moved upward in the gas introducing and cleaning unit 110.

The second and third flanges 171 and 172 are provided at the lower end and the upper end of the filtering unit casing 170 so as to be attached to and detached from the gas induction and washing unit 110 and the discharge unit 190, respectively.

A lug (173) for handling the filtering unit casing (170) is coupled to the side of the filtering unit casing (170).

An upper drain line 175 is further provided on the side of the filtering unit casing 170. One end of the upper drain line 175 is connected to the filtering unit casing 170 and the other end of the upper drain line 175 is exposed to the outside of the filtering unit casing 170, drain water or a line through which the wash water of the filter module 180 is drained.

The filter module 180, on the other hand, is provided in the filtering unit casing 170 and serves to substantially filter the residual gas that remains and is moved up in the gas induction and cleaning unit 110.

The process gas that has been secondarily purified through the filter module 180 can be discharged through the discharge unit 190.

In this embodiment, the filter module 180 is applied as a helical filter module 180 in which the inside of the filter module 180 is integrated so that the entire filter module can be detached and cleaned.

3 to 6, the helical filter module 180 includes a first module housing 181 disposed within the filtering unit casing 170 and a second module housing 182 disposed within the first module housing 181, And a helical filter plate 182 on which a plurality of tubes 183 are formed.

At this time, the helical filter plate 182 may have an entirely connected structure, and the residual gas may be contacted and subjected to secondary purification treatment while passing through the plurality of tubes 183 through the helical filter module 180. As a result, the number of the tubes 183 increases the contact area of the residual gas so that as much harmful substances as possible can be adsorbed, thereby enhancing the purification efficiency.

A housing flange 181a is formed on the upper portion of the first module housing 181 and is coupled with the third flange 172 and the fourth flange 191. A plurality of through holes 181b are formed on the side surface of the first module housing 181, 180 are washed, the washing water may be discharged to the outside of the first module housing 181 and drained.

The plurality of tubes 183 are arranged to be spaced apart from each other by vertically adjacent tubes so that the upward residual gas does not directly rise vertically but extends a longer time between the upper and lower filter plates 182, Thereby increasing the probability of the harmful substances being adsorbed on the surface of the substrate. Preferably, the plurality of tubes 183 are installed to be exposed to the upper and lower portions of the filter plate 182, but it is more advantageous to increase the purification efficiency by forming the longer exposure length at the upper portion.

When the spiral filter module 180 is cleaned, the washing water is sprayed from the upper part after detaching the discharge unit 190, so that the washing water passes through the plurality of tubes 183 and passes through the plurality of through holes 181 on the side of the first module housing 181 The spiral filter module 180 can be used semi-permanently, and the maintenance cost can be reduced. [0156] In addition, since the first module housing 181 is connected to the first module housing 181 through the upper drain line 175, Can be significantly reduced.

Finally, the discharge unit 190 is detachably coupled to the upper portion of the filtering unit 160, and serves as a place where the purge-processed process gas is discharged.

As described above, in the case of the present embodiment, the filter unit 180 having the filter module 180 is subjected to the first purification treatment by the gas induction and cleaning unit 110 without the polling, demister, And then discharged to the discharge unit 190, whereby the purification treatment efficiency can be improved as compared with the conventional scrubber.

In particular, when such a method is applied, it is advantageous in reducing harmful gases such as Sox and Co, is excellent in odor treatment, and is easy to maintain.

Since the structure is formed in the height direction, the installation area can be reduced.

According to this embodiment having the structure and function as described above, it is possible to purify noxious gas with a new concept structure, and it is possible to improve purification treatment efficiency as compared with the conventional scrubber.

7 is a schematic internal structure of a stacked filter module applied to a wet scrubber according to another embodiment of the present invention.

Referring to this drawing, in the case of this embodiment, a filter module 270 is applied as a filter module 270 in which individual layers can be separated and cleaned.

The stacked filter module 270 includes a second module housing 271 disposed in the filtering unit casing 170 and a plurality of tubes 273 arranged on the plate surface in an independent slanting manner in the second module housing 271. [ And a plate fixing portion 274 for individually fixing a plurality of stacked filter plates 272 in a central region of the second module housing 271. The plate fixing portion 272 may be formed of a plurality of laminated filter plates 272,

In the meantime, since the spiral filter module 180 of the previous embodiment applies the spiral filter plate 182, which is formed as a whole, it is difficult to separate and clean the filter plate 182, but the filter module 182 of the stacked filter module 270 It is possible to separate and clean the stacked filter plate 272 as an individual layer, and it can be convenient if necessary, since a plurality of stacked filter plates 272 are applied. Although the upward flow of the gas may be lower than that of the helical filter module 180, the cleaning treatment efficiency can be improved as compared with the conventional scrubber, and the maintenance cost can be reduced.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention. It is therefore intended that such modifications or alterations be within the scope of the claims appended hereto.

110: gas induction and cleaning unit 120: cleaning unit casing
121: Cleaning body portion 122: First flange
123: cleansing neck portion 124: cleansing slope connection portion
130: lower duct for gas induction 131: lower inclined portion
132: lower vertical portion 140: upper duct for gas induction
141: upper vertical portion 142: upper inclined portion
151: Water spray nozzle 152: Lower drain line
160: Filtering unit 170: Filtering unit casing
171: second flange 172: third flange
175: upper drain line 180: filter module
181: first module housing 181a: housing flange
181b: through hole 182: helical filter plate
183: tube 190: exhaust unit
191: Fourth flange

Claims (9)

A gas guiding and cleaning unit for guiding the noxious gas to the inside and then cleaning and performing a primary purification treatment; And
And a filtering unit detachably connected to the upper portion of the gas induction and scrubbing unit, for filtering the residual gas remaining in the gas induction and scrubbing unit and moving upward,
The gas-guiding and cleaning unit comprises:
A cleaning main body portion having a first flange coupled to an end of the cleaning main body portion; a cleaning neck portion having a narrower sectional area than the cleaning main body portion; and a cleaning slant connection portion having a slant connection portion slantingly connecting the cleaning main body portion and the cleaning main body portion.
A lower duct provided in the cleaning unit casing for guiding a flow of a noxious gas between the cleaning unit casing and the cleaning unit casing; And
And a lower end portion disposed in the gas induction lower duct and an upper end portion contacting the first flange and guiding the noxious gas flowing into the gas induction lower duct toward the filtering unit, ≪ / RTI &
The gas-guiding and cleaning unit comprises:
A plurality of water injection nozzles for spraying water for cleaning toward the noxious gas introduced between the gas induction lower duct and the gas induction upper duct; And
And the other end is exposed to the outside of the cleaning unit casing, and the lower drain of the drain water, which is subjected to the first purification treatment by the action of the water injection nozzle, Wherein the wet scrubber further comprises a line.
delete The method according to claim 1,
Wherein the gas guiding lower duct includes a lower inclined portion and a lower vertical portion vertically disposed at an upper end of the lower inclined portion,
Wherein the gas guiding upper duct includes an upper vertical portion disposed in the lower vertical portion and an upper inclined portion disposed obliquely at an end of the upper vertical portion, and having a larger cross sectional area toward the upper portion.
delete The method according to claim 1,
Wherein the filtering unit comprises:
And a second flange detachably engaged with the first flange of the gas introducing and cleaning unit is formed at a lower end of the filtering unit casing to form a place for filtering residual gas that remains in the gas introducing and cleaning unit, ; And
And a filter module provided in the filtering unit casing to filter the residual gas.
6. The method of claim 5,
Wherein the filter module is a spiral filter module in which the inside of the filter module is cleaned so that the entire filter module can be cleaned or a stacked filter module in which each individual layer is separated and cleaned.
The method according to claim 6,
The helical filter module comprises:
A first module housing disposed within the filtering unit casing; And
And a helical filter plate arranged spirally connected to each other in the first module housing and having a plurality of tubes formed on the plate surface.
The method according to claim 6,
The stacked filter module includes:
A second module housing disposed within the filtering unit casing;
A plurality of stacked filter plates arranged independently in an inclined manner in the second module housing and having a plurality of tubes formed on the plate surface; And
And a plate fixing portion for individually fixing the plurality of stacked filter plates in a central region of the second module housing.
The method according to claim 1,
Further comprising a discharge unit detachably coupled to an upper portion of the filtering unit and discharging the process gas that has been subjected to the purification process.
KR1020150102401A 2015-07-20 2015-07-20 Wet scrubber KR101561414B1 (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101685874B1 (en) * 2016-03-11 2016-12-13 엔텍이앤씨 주식회사 Wet scrubber porous filter and the filter case using the same
KR200483413Y1 (en) * 2016-11-11 2017-05-24 김용석 Dust removal equipment
KR101895192B1 (en) * 2018-05-23 2018-09-04 서민수 Scrubber equipment with inside venturi
KR101977983B1 (en) * 2018-10-15 2019-05-13 박홍구 Wet scrubber including cyclone rotatory part
KR102131658B1 (en) * 2020-01-13 2020-07-08 제이에스엔지니어링 The wet and dry type deodorizing apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005131509A (en) * 2003-10-29 2005-05-26 Unisem Co Ltd Waste gas treatment and waste gas treatment method
JP2014163344A (en) * 2013-02-27 2014-09-08 Mitsubishi Heavy Ind Ltd Mist elimination device for ship

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005131509A (en) * 2003-10-29 2005-05-26 Unisem Co Ltd Waste gas treatment and waste gas treatment method
JP2014163344A (en) * 2013-02-27 2014-09-08 Mitsubishi Heavy Ind Ltd Mist elimination device for ship

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101685874B1 (en) * 2016-03-11 2016-12-13 엔텍이앤씨 주식회사 Wet scrubber porous filter and the filter case using the same
KR200483413Y1 (en) * 2016-11-11 2017-05-24 김용석 Dust removal equipment
KR101895192B1 (en) * 2018-05-23 2018-09-04 서민수 Scrubber equipment with inside venturi
WO2019225811A1 (en) * 2018-05-23 2019-11-28 Seo Min Su Scrubber apparatus having integrated venturi
KR101977983B1 (en) * 2018-10-15 2019-05-13 박홍구 Wet scrubber including cyclone rotatory part
KR102131658B1 (en) * 2020-01-13 2020-07-08 제이에스엔지니어링 The wet and dry type deodorizing apparatus

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