JP2008104919A - Wet air cleaner - Google Patents

Wet air cleaner Download PDF

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JP2008104919A
JP2008104919A JP2006288497A JP2006288497A JP2008104919A JP 2008104919 A JP2008104919 A JP 2008104919A JP 2006288497 A JP2006288497 A JP 2006288497A JP 2006288497 A JP2006288497 A JP 2006288497A JP 2008104919 A JP2008104919 A JP 2008104919A
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treated water
contact material
gas
upstream
water
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JP4915564B2 (en
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Rei Suzuki
令 鈴木
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Shimizu Construction Co Ltd
Shimizu Corp
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Shimizu Construction Co Ltd
Shimizu Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a wet air cleaner capable of enhancing an air cleaning capacity without increasing a running cost and capable of reducing its temporary stop number of times. <P>SOLUTION: The wet air cleaner 1 is constituted so as to clean a gas G by dissolving the pollutant component in the gas G in treated water W by passing the gas G through contact materials 2 and 3 impregnated with the treated water W in a flow process of the gas G to be treated containing the pollutant component, the plurality of contact materials 2 and 3 are arranged at a predetermined interval in the flow direction of the gas G and equipped with a water supply means 9 having the plurality of contact materials 2 and 3 arranged in the flow direction of the gas at a predetermined interval and supplying the treated water W allowed to newly flow in from the outside to the contact material 3 on the most downstream side in the gas flow direction, and a circulating means 8 for supplying the treated water W, which flows out from at least one of the other contact materials 2 provided on the upstream side of the contact material 3 provided on the most downstream side, to the contact material 2 to circulate the treated water W. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、濡面式の湿式空気清浄装置に関する。   The present invention relates to a wet-type wet air cleaning apparatus.

例えば半導体生産施設等では、生産過程で汚染ガス(有機ガス、酸性ガス、アルカリ性ガス、臭気ガス等)が発生するため、空気を清浄する空気清浄装置が工場内に設置される場合が多い。従来、この空気清浄装置として、汚染成分を含むガスを処理水(液体)に気液接触させ、ガス中の汚染成分を処理水に溶解させてガスを清浄(湿式処理)する湿式の空気清浄装置がある。   For example, in semiconductor production facilities and the like, pollutant gases (organic gas, acid gas, alkaline gas, odor gas, etc.) are generated in the production process, and therefore, an air purifier for cleaning air is often installed in a factory. Conventionally, as this air cleaning device, a wet air cleaning device that cleans gas (wet processing) by bringing gas containing liquids into contact with treated water (liquid) and dissolving the contaminating components in the gas in treated water. There is.

半導体生産施設等の精密環境施設では、処理水として、純水或いは純水に準じた水質の水が使用される場合が多い。また、汚染成分の処理水への溶解量は処理水の温度に依存するため、純水等を10℃程度に冷却することが好ましく、これによって、除去性能の効率を高めることができる。   In a precision environment facility such as a semiconductor production facility, pure water or water having a quality equivalent to that of pure water is often used as treated water. Further, since the amount of the contaminating component dissolved in the treated water depends on the temperature of the treated water, it is preferable to cool pure water or the like to about 10 ° C., thereby improving the efficiency of the removal performance.

従来、湿式空気清浄装置として、エアワッシャー式のものがある。このエアワッシャー式の湿式空気清浄装置は、処理対象のガスの流通経路に向けて処理水を噴霧させることで、処理対象のガスと処理水とを気液接触させ、ガス中の汚染成分を除去するものである。この方式の場合、処理水を循環利用する場合がある。つまり、噴霧した処理水を回収して再びガス流通経路に向けて噴霧する構成になっている場合がある。これによって、処理水の使用量を低減させることができる(例えば、特許文献1参照。)。   Conventionally, there is an air washer type as a wet air cleaning device. This air washer-type wet air cleaning device sprays treated water toward the flow path of the gas to be treated, thereby bringing the gas to be treated into contact with the treated water in a gas-liquid contact, thereby removing contaminant components in the gas. To do. In this method, treated water may be recycled. That is, the sprayed treated water may be collected and sprayed again toward the gas distribution path. Thereby, the usage-amount of treated water can be reduced (for example, refer patent document 1).

また、従来、湿式空気清浄装置として、濡面式(濡壁式)の湿式空気清浄装置がある。この濡面式の湿式空気清浄装置は、処理水で濡らした接触材(充填材、濾材)に処理対象のガスを通過させることで、処理対象のガスと処理水とを気液接触させ、ガス中の汚染成分を除去するものである。この方式の場合、処理対象のガス中のカビ胞子や浮遊細菌が接触材に捕捉され、この捕捉されたカビ胞子等によって接触材の表面にカビ等の微生物が繁殖するという問題がある。特に、処理水を循環利用すると、微生物の繁殖が誘引或いは促進される結果となる。したがって、濡面式の湿式空気清浄装置の場合、接触材に処理水が掛け流し式に供給する場合が多い。つまり、外部から新たに流入させた処理水を接触材に供給し、接触材から流出した処理水は循環利用せずに排出する構成になっている(例えば、特許文献2参照。)。
特開2004−223477号公報 特開2000−33221号公報
Conventionally, as a wet air cleaning device, there is a wet surface type (wet wall type) wet air cleaning device. This wet surface type wet air cleaning device makes the gas to be treated and the treated water come into gas-liquid contact by passing the gas to be treated through the contact material (filler, filter medium) wetted with the treated water. It removes contaminating components. In the case of this method, there is a problem that mold spores and suspended bacteria in the gas to be treated are captured by the contact material, and microorganisms such as mold propagate on the surface of the contact material by the captured mold spores and the like. In particular, when the treated water is recycled, the propagation of microorganisms is induced or promoted. Therefore, in the case of a wet surface type wet air cleaning device, treated water is often supplied in a flowing manner to the contact material. In other words, the configuration is such that treated water newly introduced from the outside is supplied to the contact material, and the treated water that has flowed out of the contact material is discharged without being recycled (for example, see Patent Document 2).
JP 2004-223477 A JP 2000-33221 A

上記した従来の濡面式の湿式空気清浄装置では、仮に、掛け流し式の接触材の数を増やしたり処理水の使用量を増加したりすることで、除去率を向上させることができる。しかしながら、接触材の増加により、そのまま増加分だけイニシャルコストが高くなるだけではなく、装置の大型化によってもイニシャルコストが高くなる。さらに、接触材の交換時には、交換する接触材が多い分だけそのコストが高くなる。また、処理水の増加により、ランニングコストが高くなるという問題がある。特に、処理水として使用される冷却された純水等が使用されている場合にはその処理水Wの単価が高いため、ランニングコストが著しく高くなる。   In the conventional wet surface type wet air cleaning device described above, it is possible to improve the removal rate by increasing the number of flow-through type contact materials or increasing the amount of treated water used. However, the increase in the contact material not only increases the initial cost as it is, but also increases the initial cost due to an increase in the size of the apparatus. Furthermore, when the contact material is exchanged, the cost increases by the amount of contact material to be exchanged. In addition, there is a problem that the running cost increases due to an increase in treated water. In particular, when cooled pure water or the like used as treated water is used, the unit cost of the treated water W is high, so that the running cost is remarkably increased.

また、上記した従来の濡面式の湿式空気清浄装置において、仮にエアワッシャー式の湿式空気清浄装置のように処理水を循環利用すると処理水の使用量を削減することができるが、接触材における微生物の繁殖が増大してメンテナンス作業(接触材の洗浄作業)が増加する。微生物が繁殖した接触材は、過酸化水素水やオゾン水、または洗浄剤等によって洗浄することができるが、装置を使用したまま洗浄剤等で接触材を洗浄すると、洗浄剤等の成分が装置から排気されるガスとともに外部に放出されることになるため、接触材の洗浄作業(メンテナンス作業)を行う時には当該装置の運転を一時的に停止しなければならない。つまり、仮に、従来の濡面式の湿式空気清浄装置において処理水を循環利用した場合、湿式空気清浄装置の一時停止の回数が増えるという問題がある。   In addition, in the conventional wet surface type wet air cleaning device described above, if the treated water is circulated and used as in the air washer type wet air cleaning device, the amount of treated water used can be reduced. The proliferation of microorganisms increases and maintenance work (contact material cleaning work) increases. The contact material on which microorganisms have propagated can be cleaned with hydrogen peroxide water, ozone water, or a cleaning agent. However, if the contact material is cleaned with the cleaning agent while using the device, the components such as the cleaning agent are removed from the device. Therefore, when the contact material cleaning operation (maintenance operation) is performed, the operation of the apparatus must be temporarily stopped. That is, if treated water is circulated and used in a conventional wet surface type wet air cleaning device, there is a problem that the number of times the wet air cleaning device is temporarily stopped increases.

本発明は、上記した従来の問題が考慮されたものであり、ランニングコストを上げずに空気清浄能力を向上させることができ、且つ、一時停止の回数を減らすことができる湿式空気清浄装置を提供することを目的としている。   The present invention has been made in consideration of the above-described conventional problems, and provides a wet air cleaning apparatus that can improve the air cleaning capability without increasing the running cost and can reduce the number of pauses. The purpose is to do.

本発明は、汚染成分を含む処理対象のガスの流通過程で、処理水が浸透した接触材にガスを通過させることで、ガス中の汚染成分を処理水に溶解させてガスを清浄する湿式空気清浄装置において、前記接触材が、ガスの流通方向に所定の間隔を置いて複数配設され、ガス流通方向の最下流側の接触材に対して、外部から新たに流入させた処理水を供給する給水手段と、前記最下流側の接触材よりも上流側にある他の接触材のうちの少なくとも1つから流出した処理水を当該接触材に供給して処理水を循環させる循環手段と、が備えられていることを特徴としている。   The present invention is a wet air that purifies a gas by dissolving the contaminating component in the gas into the treated water by passing the gas through the contact material into which the treated water has permeated in the flow of the gas to be treated containing the contaminated component. In the cleaning apparatus, a plurality of the contact materials are arranged at predetermined intervals in the gas flow direction, and the treated water newly introduced from the outside is supplied to the contact material on the most downstream side in the gas flow direction. Water supply means, and circulation means for supplying treated water flowing out from at least one of the other contact materials upstream from the most downstream contact material to circulate the treated water. It is characterized by being equipped.

このような特徴により、処理対象のガスは、上流側の接触材において、循環する処理水で処理された後、最下流側の接触材において、外部から新たに流入させた処理水で処理される。このように、処理対象のガスが先に接触する上流側の接触材には、処理水を循環利用して循環式に処理水が供給されるため、高い液ガス比(処理水の量が多い状態)による湿式処理を上流側の接触材で経済的に実現することができる。また、上流側の接触材を通過したガスが接触する最下流側の接触材には、きれいな処理水が掛け流し式に供給されるため、上流側の接触材で除去し切れなかった汚染成分が最下流側の接触材で除去される。   Due to such characteristics, the gas to be treated is treated with circulating treated water in the upstream contact material, and then treated with treated water newly introduced from the outside in the most downstream contact material. . In this way, the upstream contact material with which the gas to be treated first comes into contact is supplied with treated water in a circulating manner using the treated water in a circulating manner, so that a high liquid gas ratio (the amount of treated water is large). Can be economically realized with the upstream contact material. In addition, clean treated water is supplied in a flow-through manner to the most downstream contact material that comes into contact with the gas that has passed through the upstream contact material. It is removed by the contact material on the most downstream side.

さらに、処理対象のガス中に含まれるカビ胞子や浮遊細菌等が上流側の接触材に捕捉される。この接触材で微生物が繁殖しても、この接触材は常に濡れた状態にあって処理水で流されるため、カビ胞子等が気流に乗って次(下流側)の接触材に移行しにくい。また、装置の運転中に、微生物が繁殖した上流側の接触材を洗浄剤等で洗浄しても装置から排気される処理後のガス中に洗浄成分が含まれることがない。これは、洗浄剤の洗浄成分が上流側の接触材や液体表面から空気中に移行したりミストとして発生したりしても、下流側の接触材によって洗浄剤の洗浄成分が除去されるためである。   Furthermore, mold spores and suspended bacteria contained in the gas to be treated are captured by the upstream contact material. Even if microorganisms propagate on this contact material, this contact material is always wet and is washed away with treated water, so that mold spores or the like are not easily transferred to the next (downstream side) contact material on the airflow. Further, even when the upstream contact material on which the microorganisms are propagated is washed with a cleaning agent or the like during operation of the apparatus, the cleaning gas is not contained in the treated gas exhausted from the apparatus. This is because the cleaning component of the cleaning agent is removed by the contact material on the downstream side even if the cleaning component of the cleaning agent moves into the air from the upstream contact material or liquid surface or occurs as mist. is there.

また、本発明は、前記最下流側の接触材から流出した処理水が、前記循環手段により循環する処理水に加えられるとともに、循環する処理水の一部が排出されることが好ましい。   In the present invention, it is preferable that the treated water flowing out from the contact material on the most downstream side is added to the treated water circulated by the circulation means and a part of the circulated treated water is discharged.

これにより、ガス流通方向の最下流側の接触材から流出した処理水が上流側の循環する処理水として利用されることになる。このように、上流側の接触材において循環する処理水に、最下流側の接触材から流出した比較的きれいな処理水が足されることになるため、循環する処理水の汚染を低減させることができる。これにより、上流側の接触材に微生物が発生し難くなる。   Thereby, the treated water flowing out from the contact material on the most downstream side in the gas flow direction is used as the treated water circulating on the upstream side. In this way, since the treated water circulating in the upstream contact material is added with relatively clean treated water flowing out from the most downstream contact material, the contamination of the circulating treated water can be reduced. it can. This makes it difficult for microorganisms to be generated in the upstream contact material.

本発明に係る湿式空気清浄装置によれば、従来の濡面式の湿式空気清浄装置と比べて処理水の使用量を増加させずに高除去率が実現されるため、ランニングコストを上げずに空気清浄能力を向上させることができる。また、装置を一時停止させることなく、装置の運転中に上流側の接触材の洗浄作業を行うことができるため、装置停止の回数を減らすことができる。   According to the wet air cleaning apparatus according to the present invention, since a high removal rate is realized without increasing the amount of treated water used compared with the conventional wet surface type wet air cleaning apparatus, the running cost is not increased. The air cleaning ability can be improved. In addition, since the upstream contact material can be cleaned during operation of the apparatus without temporarily stopping the apparatus, the number of times the apparatus is stopped can be reduced.

以下、本発明に係る湿式空気清浄装置の第1,第2の実施の形態について、図面に基いて説明する。   Hereinafter, first and second embodiments of a wet air cleaning apparatus according to the present invention will be described with reference to the drawings.

[第1の実施の形態]
図1は本発明の第1の実施の形態に係る湿式空気清浄装置1の模式図である。なお、図1ではガスGが右から左に流通し、図1における右側がガス流通方向の上流側であり、図1における左側がガス流通方向の下流側である。
[First Embodiment]
FIG. 1 is a schematic view of a wet air cleaning apparatus 1 according to a first embodiment of the present invention. In FIG. 1, the gas G flows from right to left, the right side in FIG. 1 is the upstream side in the gas flow direction, and the left side in FIG. 1 is the downstream side in the gas flow direction.

図1に示す湿式空気清浄装置1は、横置き型の濡面式の湿式空気清浄装置であって、汚染成分を含む処理対象のガスGの流通過程で、処理水Wが浸透した接触材2,3にガスGを通過させることで、ガスG中の汚染成分を処理水Wに溶解させてガスGを清浄する装置である。   A wet air purifying apparatus 1 shown in FIG. 1 is a horizontal wet surface type wet air purifying apparatus, and is a contact material 2 into which treated water W has permeated in the process of circulation of a gas G to be treated containing contaminating components. , 3 is a device for purifying the gas G by dissolving the contaminating components in the gas G in the treated water W by passing the gas G through the gas G.

湿式空気清浄装置1は、中空の容器4と、整流板5と、処理水Wが浸透した接触材2,3と、エリミネータ6と、ガスGを送り出すファン7と、処理水Wを循環させる循環手段8と、新たな処理水Wを下流側の接触材3に供給する給水手段9とから構成されている。接触材2,3は、ポリエステル製の布、木綿の布、素焼の陶板等、水を保持し、内部から不純物を溶出しないものであれば、何でも良い。   The wet air cleaning apparatus 1 includes a hollow container 4, a current plate 5, contact materials 2 and 3 into which treated water W has permeated, an eliminator 6, a fan 7 that sends out gas G, and a circulation that circulates treated water W. It is comprised from the means 8 and the water supply means 9 which supplies the new treated water W to the contact material 3 of the downstream. The contact materials 2 and 3 may be anything as long as they hold water and do not elute impurities from the inside, such as polyester cloth, cotton cloth, and unglazed ceramic board.

容器4は、内部にガスGが流通する筒状の部材であり、横向きに配置されている。容器4の一端部には、処理対象のガスGを容器4内に流入させるための吸気口4aが設けられており、容器4の他端部には、湿式処理後のガスG’を排気するための排気口4bが設けられている。容器4の中には、整流板5、接触材2,3及びエリミネータ6が、上流側(図1における左側)から整流板5、上流側の接触材2、下流側の接触材3、エリミネータ6の順で横に並べて配設されている。また、容器4の底部には、処理水Wが溜められる容器4底を上流側と下流側とに区画する止水板4c…が立設されている。具体的には、整流板5の位置と、隣り合う接触材2,3の間の位置と、エリミネータ6より下流側の位置とに、止水板4c…がそれぞれ配設されている。   The container 4 is a cylindrical member through which the gas G flows, and is disposed sideways. An inlet 4a for allowing the gas G to be processed to flow into the container 4 is provided at one end of the container 4, and the gas G ′ after wet processing is exhausted at the other end of the container 4. An exhaust port 4b is provided. In the container 4, the rectifying plate 5, the contact materials 2, 3 and the eliminator 6 are arranged from the upstream side (left side in FIG. 1), the rectifying plate 5, the upstream contact material 2, the downstream contact material 3, and the eliminator 6. Are arranged side by side in this order. In addition, at the bottom of the container 4, water stop plates 4 c that divide the bottom of the container 4 in which the treated water W is stored into an upstream side and a downstream side are provided upright. Specifically, the water stop plates 4c are arranged at the position of the rectifying plate 5, the position between the adjacent contact members 2 and 3, and the position downstream of the eliminator 6, respectively.

整流板5は、容器4内に流入したガスGの流れる方向を一方向に整えるための部材であり、公知の整流板を使用することができる。整流板5は、接触材2の上流側の位置に、ガス流通方向に垂直な向きで配置され、接触材2に対向配置されている。   The rectifying plate 5 is a member for adjusting the flow direction of the gas G flowing into the container 4 in one direction, and a known rectifying plate can be used. The current plate 5 is disposed at a position upstream of the contact material 2 in a direction perpendicular to the gas flow direction, and is disposed opposite the contact material 2.

接触材2,3は、容器4内を流通するガスGを通過させる部材であり、公知の接触材(充填材、濾材ともいう。)を使用することができる。接触材2,3は、容器4の内部にガスの流通方向に所定の間隔を置いて複数配設されており、具体的には、上流側の接触材2と下流側の接触材3とがガス流通方向に間隔をあけて横並びに配置されている。各接触材2,3は、処理水Wがそれぞれ浸透されて処理水Wで濡れた状態になっている。また、接触材2,3内の処理水Wは、接触材2,3の内部を流れ落ちて接触材2,3の下端部から流出され、流出した処理水Wは、容器4底に溜められる。つまり、上流側の接触材2は、上流側の止水板4c,4c間に配置されており、上流側の接触材2から流出した処理水Wが止水板4c…で区画された上流側の容器4底に溜まる構成になっている。一方、下流側の接触材3は、下流側の止水板4c,4c間に配置されており、下流側の接触材3から流出した処理水Wが止水板4c…で区画された下流側の容器4底に溜まる構成になっている。   The contact materials 2 and 3 are members that allow the gas G flowing through the container 4 to pass therethrough, and known contact materials (also referred to as fillers and filter media) can be used. A plurality of the contact materials 2 and 3 are arranged in the container 4 at a predetermined interval in the gas flow direction. Specifically, the contact material 2 on the upstream side and the contact material 3 on the downstream side are arranged. They are arranged side by side at intervals in the gas flow direction. Each of the contact materials 2 and 3 is in a state in which the treated water W has permeated and is wet with the treated water W. Further, the treated water W in the contact materials 2, 3 flows down inside the contact materials 2, 3 and flows out from the lower ends of the contact materials 2, 3, and the discharged treated water W is stored at the bottom of the container 4. That is, the upstream contact material 2 is disposed between the upstream water stop plates 4c and 4c, and the upstream side where the treated water W flowing out from the upstream contact material 2 is partitioned by the water stop plates 4c. The container 4 is configured to accumulate at the bottom. On the other hand, the downstream contact material 3 is disposed between the downstream water stop plates 4c, 4c, and the downstream side where the treated water W flowing out from the downstream contact material 3 is partitioned by the water stop plates 4c. The container 4 is configured to accumulate at the bottom.

エリミネータ6は、ミストを除去するための水滴除去部であり、公知のエリミネータを使用することができる。エリミネータ6は、接触材3の下流側に位置に、ガス流通方向に垂直な向きで配置され、接触材3に対向配置されている。また、エリミネータ6は、下流側の止水板4c,4c間に配置されており、エリミネータ6によって除去された水滴が止水板4c…で区画された下流側の容器4底に溜まる構成になっている。   The eliminator 6 is a water drop removing unit for removing mist, and a known eliminator can be used. The eliminator 6 is disposed on the downstream side of the contact material 3 in a direction perpendicular to the gas flow direction, and is disposed opposite to the contact material 3. Further, the eliminator 6 is disposed between the downstream water stop plates 4c and 4c, and the water droplets removed by the eliminator 6 are accumulated at the bottom of the downstream container 4 partitioned by the water stop plates 4c. ing.

循環手段8は、各接触材2,3からそれぞれ流出した処理水Wを上流側の接触材2に供給して処理水Wを循環させる手段であり、例えば、各接触材2,3からそれぞれ流出した処理水Wを回収して水槽10に流入させ、水槽10内に貯留された処理水Wを圧送ポンプ11によって噴霧ノズル12に送り、噴霧ノズル12から上流側の接触材2に向けて処理水Wを噴霧するシステムになっている。具体的には、循環手段8には、上記した水槽10と圧送ポンプ11と噴霧ノズル12とのほかに、上流側の容器4底と水槽10とを連通させて上流側の容器4底に溜まった処理水Wを水槽10に送る上流側の連通管13と、下流側の容器4底と水槽10とを連通させて下流側の容器4底に溜まった処理水Wを水槽10に送る下流側の連通管14と、水槽10と圧送ポンプ11とを接続する第1の接続管15と、圧送ポンプ11と噴霧ノズル12とを接続する第2の接続管16と、水槽10内の処理水Wを外部に排水する排水管17とが備えられている。   The circulation means 8 is means for supplying the treated water W flowing out from the contact materials 2 and 3 to the upstream contact material 2 and circulating the treated water W, for example, flowing out from the contact materials 2 and 3, respectively. The treated water W is collected and allowed to flow into the water tank 10, and the treated water W stored in the water tank 10 is sent to the spray nozzle 12 by the pressure pump 11, and the treated water is directed from the spray nozzle 12 toward the upstream contact material 2. It is a system for spraying W. Specifically, in addition to the water tank 10, the pressure pump 11 and the spray nozzle 12, the circulation means 8 communicates the bottom of the upstream container 4 and the water tank 10 and accumulates at the bottom of the upstream container 4. The upstream communication pipe 13 that sends the treated water W to the water tank 10, the downstream container 4 bottom, and the water tank 10 communicate with each other, and the treated water W accumulated on the downstream container 4 bottom is sent to the water tank 10. , The first connection pipe 15 that connects the water tank 10 and the pressure pump 11, the second connection pipe 16 that connects the pressure pump 11 and the spray nozzle 12, and the treated water W in the water tank 10. And a drain pipe 17 for draining the water to the outside.

給水手段9は、外部から新たに流入させた処理水Wを下流側の接触材3に供給する手段であり、例えば、外部から流入させた新たな処理水Wを圧送ポンプ18によって噴霧ノズル19に送り、噴霧ノズル19から下流側の接触材3に向けて処理水Wを噴霧するシステムになっている。具体的には、給水手段9には、上記した圧送ポンプ18及び噴霧ノズル19の他に、処理水Wの図示せぬ供給源と圧送ポンプ18とを接続する第1の接続管20と、圧送ポンプ18と噴霧ノズル19とを接続する第2の接続管21とが備えられている。   The water supply means 9 is means for supplying the treated water W newly introduced from the outside to the contact material 3 on the downstream side. For example, the new treated water W introduced from the outside is supplied to the spray nozzle 19 by the pressure pump 18. This is a system for spraying the treated water W from the spray nozzle 19 toward the contact material 3 on the downstream side. Specifically, the water supply means 9 includes, in addition to the above-described pressure feed pump 18 and spray nozzle 19, a first connection pipe 20 that connects a supply source (not shown) of the treated water W and the pressure feed pump 18, and a pressure feed. A second connection pipe 21 that connects the pump 18 and the spray nozzle 19 is provided.

なお、上記した循環手段8は、上流側の接触材2に多量の処理水Wを供給できるシステムになっており、上流側の接触材2は液ガス比が高くなっている。具体的には、循環手段8に備えられた噴霧ノズル12,12の数(図1に示す例では2つ)は、給水手段9に備えられた噴霧ノズル19の数(図1に示す例では1つ)よりも多く、循環手段8による上流側の接触材2への処理水Wの供給量は、給水手段9による下流側の接触材3への処理水Wの供給量よりも多くなっている。   The circulating means 8 is a system that can supply a large amount of treated water W to the upstream contact material 2, and the upstream contact material 2 has a high liquid gas ratio. Specifically, the number of spray nozzles 12 and 12 provided in the circulation means 8 (two in the example shown in FIG. 1) is equal to the number of spray nozzles 19 provided in the water supply means 9 (in the example shown in FIG. 1). 1), the supply amount of the treated water W to the upstream contact material 2 by the circulation means 8 is larger than the supply amount of the treated water W to the downstream contact material 3 by the water supply means 9. Yes.

また、ファン7は、ガスGを吸引して送り出す公知の送風機である。このファン7は、容器4の吸気口4aに取り付けられており、このファン7によって、汚染成分を有するガスGは、吸気口4aから容器4内に送り込まれ、容器4内を流通して容器4内で湿式処理された後、排気口4bから排出される。なお、排気口4bから送り出された浄化後のガスG’は、屋外に排出されたり、他の処理装置や生産エリアに供給されたり、元の場所に戻されたりする。   The fan 7 is a known blower that sucks and sends out the gas G. The fan 7 is attached to the intake port 4a of the container 4. By this fan 7, the gas G having a pollutant component is sent into the container 4 from the intake port 4a, and flows through the container 4 and flows into the container 4. After being wet-treated inside, it is discharged from the exhaust port 4b. The purified gas G ′ sent out from the exhaust port 4b is discharged to the outside, supplied to another processing apparatus or production area, or returned to its original location.

次に、上記した構成からなる湿式空気清浄装置1の使用方法について説明する。   Next, the usage method of the wet air cleaning apparatus 1 which consists of an above-described structure is demonstrated.

まず、給水手段9により、外部から純水等からなる新たな処理水Wを下流側の接触材3に供給し、下流側の接触材3に処理水Wを浸透させる。具体的には、新たな処理水Wが、第1の接続管20を通って圧送ポンプ18に送られる。そして、圧送ポンプ18により、新たな処理水Wが第2の接続管21を通って噴霧ノズル19に圧送されて当該噴霧ノズル19から下流側の接触材3に向けて噴霧される。噴霧ノズル19から噴霧された処理水Wは下流側の接触材3に浸透し、当該接触材3は処理水Wで濡れた状態となる。下流側の接触材3に浸透した処理水Wは、当該接触材3の下部から流出して下流側の容器4底に溜まる。この容器4底に溜まった処理水Wは、連通管14を通って水槽10に流入し、循環手段8により循環する処理水Wに加えられる。   First, new treated water W made of pure water or the like is supplied from the outside to the downstream contact material 3 by the water supply means 9, and the treated water W is infiltrated into the downstream contact material 3. Specifically, new treated water W is sent to the pressure pump 18 through the first connection pipe 20. Then, the new treated water W is pumped to the spray nozzle 19 through the second connection pipe 21 by the pumping pump 18 and sprayed from the spray nozzle 19 toward the contact material 3 on the downstream side. The treated water W sprayed from the spray nozzle 19 penetrates into the contact material 3 on the downstream side, and the contact material 3 becomes wet with the treated water W. The treated water W that has permeated the downstream contact material 3 flows out from the lower portion of the contact material 3 and accumulates at the bottom of the downstream container 4. The treated water W collected at the bottom of the container 4 flows into the water tank 10 through the communication pipe 14 and is added to the treated water W circulated by the circulation means 8.

また、循環手段8により、各接触材2,3から流出した処理水Wを循環利用して上流側の接触材2に供給し、上流側の接触材2に処理水Wを浸透させる。具体的には、水槽10内に貯留された処理水Wが第1の接続管15を通って圧送ポンプ11に送られる。そして、圧送ポンプ11により、処理水Wが第2の接続管16を通って噴霧ノズル12に圧送されて当該噴霧ノズル12から上流側の接触材2に向けて噴霧される。噴霧ノズル12から噴霧された処理水Wは上流側の接触材2に浸透し、当該接触材2は処理水Wで濡れた状態となる。上流側の接触材2に浸透した処理水Wは、当該接触材2の下部から流出して上流側の容器4底に溜まる。この容器4底に溜まった処理水Wは、連通管13を通って水槽10に流入する。また、水槽10内の処理水Wの一部は、排水管17から適宜排水される。   Further, the treated water W flowing out from the contact materials 2 and 3 is circulated and supplied to the upstream contact material 2 by the circulation means 8, and the treated water W is infiltrated into the upstream contact material 2. Specifically, the treated water W stored in the water tank 10 is sent to the pressure feed pump 11 through the first connection pipe 15. Then, the treated water W is pumped to the spray nozzle 12 through the second connection pipe 16 and sprayed from the spray nozzle 12 toward the upstream contact material 2 by the pressure pump 11. The treated water W sprayed from the spray nozzle 12 penetrates into the upstream contact material 2, and the contact material 2 becomes wet with the treated water W. The treated water W that has permeated the upstream contact material 2 flows out from the lower portion of the contact material 2 and accumulates at the bottom of the upstream container 4. The treated water W collected at the bottom of the container 4 flows into the water tank 10 through the communication pipe 13. A part of the treated water W in the water tank 10 is appropriately drained from the drain pipe 17.

次に、処理対象のガスGを流通させて、接触材2,3に当該ガスGを通過させることで、ガスG中の汚染成分を除去して汚染されたガスGを清浄する。具体的には、ファン7を稼動させることで、汚染されたガスGが吸気口4aから容器4内に送り込まれる。吸気口4aから容器4内に流入したガスGは、整流板5を通過して上流側の接触材2に流れ込む。そして、このガスGが上流側の接触材2を通過する際、通過するガスGが当該接触材2に浸透した処理水Wに気液接触し、ガスG中の汚染成分の大部分が処理水Wに溶解される。続いて、上流側の接触材2を通過したガスGは、下流側の接触材3に流れ込む。そして、このガスGが下流側の接触材3を通過する際、通過するガスGが当該接触材3に浸透した新しい処理水Wに気液接触し、ガスG中に残留した汚染成分が処理水Wに溶解される。その後、下流側の接触材3を通過してクリーンになったガスG’は、エリミネータ6を通過してミスト除去された後、排気口4bから湿式空気清浄装置1外に排気される。   Next, the gas G to be treated is circulated and the gas G is passed through the contact materials 2 and 3 to remove the contaminating components in the gas G and clean the contaminated gas G. Specifically, by operating the fan 7, the contaminated gas G is sent into the container 4 from the intake port 4a. The gas G flowing into the container 4 from the intake port 4a passes through the rectifying plate 5 and flows into the contact material 2 on the upstream side. When the gas G passes through the upstream contact material 2, the gas G passing through the gas G comes into gas-liquid contact with the treated water W that has permeated the contact material 2, and most of the contaminating components in the gas G are treated water. Dissolved in W. Subsequently, the gas G that has passed through the upstream contact material 2 flows into the downstream contact material 3. When the gas G passes through the contact material 3 on the downstream side, the passing gas G comes into gas-liquid contact with the new treated water W that has permeated the contact material 3, and contaminated components remaining in the gas G are treated with the treated water. Dissolved in W. Thereafter, the clean gas G ′ that has passed through the contact material 3 on the downstream side passes through the eliminator 6 and is removed from the mist, and is then exhausted out of the wet air cleaning device 1 through the exhaust port 4 b.

また、上流側の接触材2には処理対象のガスGが先に接触するため、処理対象のガスG中に含まれるカビ胞子や浮遊細菌等が上流側の接触材2に捕捉される。このため、上流側の接触材2には、カビや微生物等が繁殖する場合がある。特に、上流側の接触材2には、循環している処理水Wを供給しているため、当該接触材2に微生物等の繁殖が促進される。このように上流側の接触材2に微生物等が繁殖した場合、当該接触材2を過酸化水素水、オゾン水やその他の洗浄剤等(以下、洗浄剤と記す。)で洗浄して繁殖した微生物等を除去することが望ましい。具体的には、水槽10の中に洗浄剤を適量添加するなどして、循環している処理水Wの中に洗浄剤を添加し、その後、循環手段8を上記した通常運転で稼動させて洗浄剤が添加された処理水Wを循環させる。これによって、洗浄剤が添加された処理水Wが、微生物等が繁殖した上流側の接触材2に供給され、当該接触材2に繁殖した微生物等が洗浄剤の洗浄力によって洗浄・除去される。   Further, since the gas G to be treated comes into contact with the upstream contact material 2 first, mold spores, suspended bacteria, etc. contained in the gas G to be treated are captured by the upstream contact material 2. For this reason, mold, microorganisms, etc. may breed on the upstream contact material 2. In particular, since the upstream contact material 2 is supplied with the circulated treated water W, propagation of microorganisms and the like is promoted on the contact material 2. Thus, when microorganisms etc. propagated in the upstream contact material 2, the said contact material 2 was propagated by washing | cleaning with hydrogen peroxide water, ozone water, other cleaning agents, etc. (henceforth a cleaning agent). It is desirable to remove microorganisms and the like. Specifically, the cleaning agent is added to the circulating treated water W by adding an appropriate amount of the cleaning agent into the water tank 10, and then the circulating means 8 is operated in the normal operation described above. The treated water W to which the cleaning agent has been added is circulated. As a result, the treated water W to which the cleaning agent is added is supplied to the upstream contact material 2 on which microorganisms and the like have propagated, and the microorganisms and the like that have propagated on the contact material 2 are cleaned and removed by the cleaning power of the cleaning agent. .

上記した構成からなる湿式空気清浄装置1によれば、接触材2,3が、ガスGの流通方向に所定の間隔を置いて2つ配設されており、ガス流通方向の最下流側の接触材3に対して、外部から新たに流入させた処理水Wを供給する給水手段9と、最下流側の接触材3よりも上流側にある他の接触材2から流出した処理水Wを当該接触材2に供給して処理水Wを循環させる循環手段8とが備えられた構成からなることにより、処理対象のガスGは、上流側の接触材2において、循環する処理水Wで処理された後、最下流側の接触材3において、外部から新たに流入させた処理水Wで処理される。このように、処理対象のガスGが先に接触する上流側の接触材2には、処理水Wを循環利用して循環式に処理水Wが供給される。このため、高い液ガス比(処理水の量が多い状態)による湿式処理を上流側の接触材2で経済的に実現することができ、また、高い液ガス比で湿式処理されることで、ガスG中の汚染成分が効率良く除去される。また、上流側の接触材2を通過したガスGが接触する最下流側の接触材3には、きれいな処理水Wが掛け流し式に供給される。このため、上流側の接触材2で除去し切れなかったガスG中の汚染成分が最下流側の接触材3で除去される。これによって、従来の濡面式の湿式空気清浄装置と比べて処理水Wの使用量を増加させずに高除去率を実現することができ、湿式空気清浄装置1のランニングコストを上げずに空気清浄能力を向上させることができる。   According to the wet air cleaning apparatus 1 having the above-described configuration, the two contact materials 2 and 3 are disposed at a predetermined interval in the gas G flow direction, and the most downstream contact in the gas flow direction. The water supply means 9 for supplying the treated water W newly introduced from the outside to the material 3 and the treated water W flowing out from the other contact material 2 on the upstream side of the contact material 3 on the most downstream side The gas G to be treated is treated with the circulated treated water W in the upstream contact material 2 by comprising the circulation means 8 for supplying the contact material 2 to circulate the treated water W. After that, the most downstream contact material 3 is treated with the treated water W newly introduced from the outside. Thus, the treated water W is circulated and supplied to the upstream contact material 2 where the gas G to be treated first comes into contact with the upstream side. For this reason, wet processing with a high liquid gas ratio (a large amount of treated water) can be economically realized with the upstream contact material 2, and by wet processing with a high liquid gas ratio, Contaminating components in the gas G are efficiently removed. Further, clean treated water W is supplied in a flowing manner to the most downstream contact material 3 with which the gas G that has passed through the upstream contact material 2 contacts. For this reason, the contaminating component in the gas G that could not be completely removed by the upstream contact material 2 is removed by the most downstream contact material 3. As a result, it is possible to achieve a high removal rate without increasing the amount of the treated water W used compared to the conventional wet surface type wet air purifier, and the air without increasing the running cost of the wet air purifier 1. The cleaning ability can be improved.

また、上記した構成からなる湿式空気清浄装置1によれば、上流側の接触材2で微生物が繁殖しても、この接触材2が常に濡れた状態にあって処理水Wで流されるため、カビ胞子等が気流(接触材2を通過するガスG)に乗って下流側の接触材3に移行しにくい。また、湿式空気清浄装置1の運転中に、微生物等を洗浄・除去する洗浄剤等を循環する処理水Wに添加しても、湿式空気清浄装置1から排気されるG’に洗浄剤の洗浄成分が含まれない。これは、例えば、洗浄剤の洗浄成分が上流側の接触材2や液体表面から空気中に移行したりミストとして発生したりしても、下流側の接触材3によって洗浄剤の洗浄成分が除去されるためである。したがって、上流側の接触材2の洗浄作業を行う際に、湿式空気清浄装置1の運転を一時停止させる必要がなく、湿式空気清浄装置1の一時停止の回数を減らすことができ、湿式空気清浄装置1を長期間、連続運転させることができる。   Moreover, according to the wet air purification apparatus 1 which consists of an above-described structure, even if a microorganism propagates in the upstream contact material 2, since this contact material 2 is always in a wet state and is flushed with the treated water W, Mold spores and the like are not easily transferred to the downstream contact material 3 by riding on the airflow (gas G passing through the contact material 2). Further, even when a cleaning agent for cleaning / removing microorganisms or the like is added to the circulating treated water W during operation of the wet air cleaning device 1, the cleaning agent is washed into G ′ exhausted from the wet air cleaning device 1. Contains no ingredients. This is because, for example, the cleaning component of the cleaning agent is removed by the downstream contact material 3 even if the cleaning component of the cleaning agent moves from the upstream contact material 2 or the liquid surface into the air or occurs as mist. It is to be done. Therefore, when the upstream contact material 2 is cleaned, there is no need to temporarily stop the operation of the wet air cleaning device 1, and the number of times the wet air cleaning device 1 is temporarily stopped can be reduced. The apparatus 1 can be continuously operated for a long time.

また、上記した構成からなる湿式空気清浄装置1によれば、最下流側の接触材3から流出した処理水Wが、循環手段8により循環する処理水Wに加えられるとともに、循環する処理水Wの一部が排出されるため、ガス流通方向の最下流側の接触材3から流出した処理水Wが上流側の循環する処理水Wとして利用されることになる。このように、上流側の接触材2において循環する処理水Wに、最下流側の接触材3から流出した比較的きれいな処理水Wが足されることになるため、循環手段8により循環する処理水Wに新たな処理水Wを加えることなく、循環する処理水Wの汚染を低減させることができる。これにより、上流側の接触材Wに微生物が発生し難くなり、上流側の接触材2の洗浄作業を不要、或いはその頻度(回数)を減らすことができる。   Further, according to the wet air cleaning apparatus 1 having the above-described configuration, the treated water W flowing out from the contact material 3 on the most downstream side is added to the treated water W circulated by the circulation means 8 and also circulated treated water W. Therefore, the treated water W flowing out from the contact material 3 on the most downstream side in the gas flow direction is used as the treated water W circulating on the upstream side. Thus, since the relatively clean treated water W that has flowed out from the most downstream contact material 3 is added to the treated water W that circulates in the upstream contact material 2, the treatment that is circulated by the circulation means 8. The contamination of the circulating treated water W can be reduced without adding new treated water W to the water W. This makes it difficult for microorganisms to be generated in the upstream contact material W, so that the cleaning operation of the upstream contact material 2 is unnecessary or the frequency (number of times) can be reduced.

[第2の実施の形態]
図2は本発明の第2の実施の形態に係る湿式空気清浄装置101の模式図である。なお、図2ではガスGが下から上に流通し、図2における下側がガス流通方向の上流側であり、図2における上側がガス流通方向の下流側である。また、以下に説明する第2の実施の形態では、上記した第1の実施の形態と同様の構成については同一の符号を付すことでその説明を省略する。
[Second Embodiment]
FIG. 2 is a schematic diagram of a wet air cleaning apparatus 101 according to the second embodiment of the present invention. In FIG. 2, the gas G flows from the bottom to the top, the lower side in FIG. 2 is the upstream side in the gas flow direction, and the upper side in FIG. 2 is the downstream side in the gas flow direction. In the second embodiment described below, the same components as those in the first embodiment described above are denoted by the same reference numerals, and the description thereof is omitted.

図2に示す湿式空気清浄装置101は、縦置き型の濡面式の湿式空気清浄装置であり、中空の容器104と、整流板5と、処理水Wが浸透した接触材2,3と、第1、第2のエリミネータ6,106と、ガスGを送り出すファン7と、処理水Wを循環させる循環手段108と、新たな処理水Wを下流側の接触材3に供給する給水手段9とから構成されている。   A wet air cleaning apparatus 101 shown in FIG. 2 is a vertical wet surface type wet air cleaning apparatus, and includes a hollow container 104, a rectifying plate 5, contact materials 2 and 3 into which treated water W has penetrated, First and second eliminators 6, 106, a fan 7 that sends out gas G, a circulation means 108 that circulates the treated water W, and a water supply means 9 that supplies new treated water W to the downstream contact material 3; It is composed of

容器104は、内部にガスGが流通する筒状の部材であり、縦向きに配置されている。容器104の下部には、処理対象のガスGを容器104内に流入させるための吸気口104aが設けられており、容器104の上部には、湿式処理後のガスG’を排気するための排気口104bが設けられている。また、容器104の中には、整流板5、接触材2,3及び第1、第2のエリミネータ6,106が、上流側(図2における下側)から整流板5、上流側の接触材2、第2のエリミネータ106、下流側の接触材3、第1のエリミネータ6の順で縦に並べて配設されている。また、容器104の底部(下端部)は、処理水Wが溜められる水槽部104cとなっており、吸気口104aは水槽部104cの上方に設けられている。   The container 104 is a cylindrical member in which the gas G circulates, and is arranged vertically. An intake port 104 a for allowing the gas G to be processed to flow into the container 104 is provided in the lower part of the container 104, and an exhaust for exhausting the gas G ′ after wet processing is provided in the upper part of the container 104. A mouth 104b is provided. Further, in the container 104, the rectifying plate 5, the contact materials 2 and 3, and the first and second eliminators 6 and 106 are connected to the rectifying plate 5 and the upstream contact material from the upstream side (lower side in FIG. 2). 2, the second eliminator 106, the contact material 3 on the downstream side, and the first eliminator 6 are arranged vertically in this order. Moreover, the bottom part (lower end part) of the container 104 becomes the water tank part 104c in which the treated water W is stored, and the inlet port 104a is provided above the water tank part 104c.

接触材2,3は、上記した第1の実施の形態と同様の部材からなるものであり、具体的には、上流側の接触材2と下流側の接触材3とがガス流通方向に間隔をあけて上下に配置されている。   The contact materials 2 and 3 are made of the same members as those in the first embodiment, and specifically, the upstream contact material 2 and the downstream contact material 3 are spaced in the gas flow direction. Opened up and down.

第1のエリミネータ6は、上記した第1の実施の形態におけるエリミネータ6と同様の水滴除去部材であり、接触材3の下流側に位置に配設され、接触材3に対向配置されている。
本実施の形態では、上流側の接触材2へ処理水Wを供給する後述する噴射ノズル112が上流側の接触材2と下流側の接触材3との間にあるため、噴射ノズル112から噴射された霧状の処理水WがガスGの気流に乗って下流側の接触材3に捕集される可能性がある。そこで、本実施の形態では、噴射ノズル112と下流側の接触材3との間に第2のエリミネータ106が配設されている。つまり、第2のエリミネータ106は、第1のエリミネータ6の反対側に配設されて接触材3に対向配置されている。なお、この第2のエリミネータ106は、噴射ノズル112から噴霧された処理水Wの飛沫が下流側の接触材3の方へ行かないように遮断するが、上方から滴下された処理水Wを下方側に通過させることができるものである。したがって、上方に配置された下流側の接触材3から滴下された処理水Wは、第2のエリミネータ106を通過し、下方に配置された上流側の接触材2へ滴下される。
The first eliminator 6 is a water droplet removing member similar to the eliminator 6 in the first embodiment described above, is disposed at a position downstream of the contact material 3, and is disposed opposite the contact material 3.
In the present embodiment, since a later-described injection nozzle 112 that supplies treated water W to the upstream contact material 2 is located between the upstream contact material 2 and the downstream contact material 3, the injection is performed from the injection nozzle 112. There is a possibility that the mist-like treated water W that has been put on the gas G stream is collected by the contact material 3 on the downstream side. Therefore, in the present embodiment, the second eliminator 106 is disposed between the injection nozzle 112 and the downstream contact material 3. That is, the second eliminator 106 is disposed on the opposite side of the first eliminator 6 and is disposed opposite to the contact material 3. The second eliminator 106 blocks the splash of the treated water W sprayed from the spray nozzle 112 from going toward the downstream contact material 3, but the treated water W dropped from above is lowered. It can be passed to the side. Therefore, the treated water W dropped from the downstream contact material 3 disposed above passes through the second eliminator 106 and is dropped onto the upstream contact material 2 disposed below.

循環手段108は、各接触材2,3からそれぞれ流出した処理水Wを上流側の接触材2に供給して処理水Wを循環させる手段であり、例えば、各接触材2,3からそれぞれ流出して水槽部104cに落ちて溜まった処理水Wを圧送ポンプ111によって噴霧ノズル112に送り、噴霧ノズル112から上流側の接触材2に向けて処理水Wを噴霧するシステムになっている。具体的には、循環手段108には、上記した圧送ポンプ111と噴霧ノズル112とのほかに、水槽部104cと圧送ポンプ111とを接続する第1の接続管115と、圧送ポンプ111と噴霧ノズル112とを接続する第2の接続管116と、水槽部104c内の処理水Wを外部に排水する排水管117とが備えられている。   The circulation means 108 is a means for supplying the treated water W flowing out from the contact materials 2 and 3 to the upstream contact material 2 and circulating the treated water W. For example, the circulating water 108 flows out from the contact materials 2 and 3 respectively. Then, the treated water W that has fallen and accumulated in the water tank section 104 c is sent to the spray nozzle 112 by the pressure feed pump 111, and the treated water W is sprayed from the spray nozzle 112 toward the upstream contact material 2. Specifically, in addition to the above-described pressure feed pump 111 and spray nozzle 112, the circulation means 108 includes a first connection pipe 115 that connects the water tank portion 104c and the pressure feed pump 111, a pressure feed pump 111, and a spray nozzle. 112 and a drain pipe 117 for draining the treated water W in the water tank section 104c to the outside.

次に、上記した構成からなる湿式空気清浄装置101の使用方法について説明する。   Next, the usage method of the wet air cleaning apparatus 101 which consists of an above-described structure is demonstrated.

まず、給水手段9により、外部から純水等からなる新たな処理水Wを下流側の接触材3に供給し、下流側の接触材3に処理水Wを浸透させる。具体的には、上記した第1の実施の形態と同様にして、噴霧ノズル19から新しい処理水Wを噴霧して下流側の接触材3に処理水Wを浸透させる。   First, new treated water W made of pure water or the like is supplied from the outside to the downstream contact material 3 by the water supply means 9, and the treated water W is infiltrated into the downstream contact material 3. Specifically, in the same manner as in the first embodiment described above, new treated water W is sprayed from the spray nozzle 19 to infiltrate the treated water W into the downstream contact material 3.

また、下流側の接触材3から上流側の接触材2に処理水Wが直接滴下されることで、下流側の接触材3から流出した処理水Wを上流側の接触材2に供給するとともに、循環手段108により上流側の接触材2から流出した処理水Wを循環利用して上流側の接触材2に供給することで、上流側の接触材2に処理水Wを浸透させる。具体的には、下流側の接触材3に浸透した処理水Wは、当該接触材3の下部から流出して上流側の接触材2の上に落ち、循環手段108により循環する処理水Wに加えられる。一方、水槽部104c内に貯留された処理水Wが第1の接続管115を通って圧送ポンプ111に送られる。そして、圧送ポンプ111により、処理水Wが第2の接続管116を通って噴霧ノズル112に圧送されて当該噴霧ノズル112から上流側の接触材2に向けて噴霧される。このように、下流側の接触材3から処理水Wが直接滴下されるとともに、噴霧ノズル112から処理水Wが噴霧されることで、上流側の接触材2に処理水Wが浸透し、当該接触材2は処理水Wで濡れた状態となる。上流側の接触材2に浸透した処理水Wは、当該接触材2の下部から流れ落ちて容器104の水槽部104c内に溜まる。また、水槽部104c内の処理水Wの一部は、排水管117から適宜排水される。   In addition, when the treated water W is directly dropped from the downstream contact material 3 to the upstream contact material 2, the treated water W flowing out from the downstream contact material 3 is supplied to the upstream contact material 2. The treated water W flowing out from the upstream contact material 2 is circulated and supplied to the upstream contact material 2 by the circulation means 108, so that the upstream contact material 2 is permeated into the treated water W. Specifically, the treated water W that has permeated the downstream contact material 3 flows out from the lower portion of the contact material 3, falls on the upstream contact material 2, and becomes treated water W circulated by the circulation means 108. Added. On the other hand, the treated water W stored in the water tank portion 104 c is sent to the pressure feed pump 111 through the first connection pipe 115. Then, the treated water W is pumped to the spray nozzle 112 through the second connecting pipe 116 and sprayed from the spray nozzle 112 toward the upstream contact material 2 by the pumping pump 111. In this manner, the treated water W is directly dropped from the downstream contact material 3 and the treated water W is sprayed from the spray nozzle 112, so that the treated water W penetrates into the upstream contact material 2, The contact material 2 becomes wet with the treated water W. The treated water W that has permeated the upstream contact material 2 flows down from the lower portion of the contact material 2 and accumulates in the water tank portion 104 c of the container 104. A part of the treated water W in the water tank portion 104c is appropriately drained from the drain pipe 117.

次に、処理対象のガスGを流通させて、接触材2,3に当該ガスGを通過させることで、ガスG中の汚染成分を除去して汚染されたガスGを清浄する。具体的には、ファン7を稼動させることで、汚染されたガスGが吸気口104aから容器104内に送り込まれる。吸気口104aから容器104内に流入したガスGは、整流板5を通過して上流側の接触材2に流れ込む。そして、このガスGが上流側の接触材2を通過する際、通過するガスGが当該接触材2に浸透した処理水Wに気液接触し、ガスG中の汚染成分の大部分が処理水Wに溶解される。続いて、上流側の接触材2を通過したガスGは、第2のエリミネータ106を通過して下流側の接触材3に流れ込む。そして、このガスGが下流側の接触材3を通過する際、通過するガスGが当該接触材3に浸透した新しい処理水Wに気液接触し、ガスG中に残留した汚染成分が処理水Wに溶解される。その後、下流側の接触材3を通過してクリーンになったガスG’は、第1のエリミネータ6を通過してミスト除去された後、排気口104bから湿式空気清浄装置1外に排気される。   Next, the gas G to be treated is circulated and the gas G is passed through the contact materials 2 and 3 to remove the contaminating components in the gas G and clean the contaminated gas G. Specifically, by operating the fan 7, the contaminated gas G is sent into the container 104 from the intake port 104a. The gas G flowing into the container 104 from the intake port 104a passes through the rectifying plate 5 and flows into the contact material 2 on the upstream side. When the gas G passes through the upstream contact material 2, the gas G passing through the gas G comes into gas-liquid contact with the treated water W that has permeated the contact material 2, and most of the contaminating components in the gas G are treated water. Dissolved in W. Subsequently, the gas G that has passed through the upstream contact material 2 passes through the second eliminator 106 and flows into the downstream contact material 3. When the gas G passes through the contact material 3 on the downstream side, the passing gas G comes into gas-liquid contact with the new treated water W that has permeated the contact material 3, and contaminated components remaining in the gas G are treated with the treated water. Dissolved in W. Thereafter, the gas G ′ that has been cleaned by passing through the contact material 3 on the downstream side passes through the first eliminator 6 and is removed from the mist, and is then exhausted from the exhaust port 104b to the outside of the wet air cleaning device 1. .

上記した構成からなる湿式空気清浄装置101によれば、上記した第1の実施の形態と同様の作用効果を奏することができる。つまり、処理水Wの使用量を増加させずに高除去率を実現することができ、湿式空気清浄装置101のランニングコストを上げずに空気清浄能力を向上させることができる。また、上流側の接触材2の洗浄作業を行う際に、湿式空気清浄装置101の運転を一時停止させる必要がなく、湿式空気清浄装置101の一時停止の回数を減らすことができ、湿式空気清浄装置101を長期間、連続運転させることができる。   According to the wet air cleaning apparatus 101 having the above-described configuration, the same operational effects as those of the above-described first embodiment can be obtained. That is, a high removal rate can be realized without increasing the amount of treated water W used, and the air cleaning capability can be improved without increasing the running cost of the wet air cleaning device 101. Further, when the upstream contact member 2 is cleaned, it is not necessary to temporarily stop the operation of the wet air cleaning device 101, and the number of times the wet air cleaning device 101 is temporarily stopped can be reduced. The apparatus 101 can be operated continuously for a long time.

以上、本発明に係る湿式空気清浄装置の実施の形態について説明したが、本発明は上記した実施の形態に限定されるものではなく、その趣旨を逸脱しない範囲で適宜変更可能である。例えば、上記した第1の実施の形態では、処理対象のガスGを水平に流通させる横置き型の湿式空気清浄装置1について説明しており、また、第2の実施の形態では、処理対象のガスGを上向きに上昇させる縦置き型の湿式空気清浄装置101について説明しているが、本発明は、例えば、処理対象のガスを下向きに下降させる湿式空気清浄装置であってもよく、或いは、処理対象のガスを、くの字状、コの字状、U字状等に屈曲させて流通させる湿式空気清浄装置であってもよい。   As mentioned above, although embodiment of the wet air cleaning apparatus which concerns on this invention was described, this invention is not limited to above-described embodiment, In the range which does not deviate from the meaning, it can change suitably. For example, in the first embodiment described above, the horizontal wet air cleaning device 1 that distributes the gas G to be processed horizontally is described, and in the second embodiment, the processing target gas G is processed. Although the vertical-type wet air cleaning apparatus 101 that raises the gas G upward has been described, the present invention may be, for example, a wet air cleaning apparatus that lowers the gas to be processed downward, or It may be a wet air cleaning device that circulates the gas to be treated by bending it into a U shape, a U shape, a U shape, or the like.

上記した第1、第2の実施の形態では、最下流側の接触材3から流出した処理水Wを上流側で循環手段8,108によって循環している処理水Wに加えており、循環している処理水Wの一部を排出しているが、本発明は、最下流側の接触材から流出した処理水を上流側で循環する処理水に加えずに排出する構成であってもよい。また、本発明は、循環手段によって循環している処理水に外部から新たな処理水を加えるとともに、循環している処理水の一部を排出する構成であってもよい。さらに、上記した第1、第2の実施の形態では、上述したように循環手段8,108によって循環している処理水Wの一部が入れ替えられる構成になっているが、本発明は、循環手段によって循環している処理水に他から処理水を加えたり循環する処理水の一部を排出したりせず、同じの処理水を入れ替えることなく循環させる構成であってもよい。   In the first and second embodiments described above, the treated water W that has flowed out of the contact material 3 on the most downstream side is added to the treated water W circulated by the circulation means 8 and 108 on the upstream side, and is circulated. However, the present invention may be configured such that the treated water flowing out from the contact material on the most downstream side is discharged without being added to the treated water circulating on the upstream side. . Further, the present invention may be configured such that new treated water is added from the outside to the treated water circulated by the circulation means and a part of the circulated treated water is discharged. Furthermore, in the first and second embodiments described above, a part of the treated water W circulated by the circulation means 8 and 108 is replaced as described above. A configuration may be adopted in which the treated water is not added to the treated water circulated by the means or a part of the circulated treated water is discharged, and the same treated water is circulated without being replaced.

また、上記した第1の実施の形態では、循環手段8による上流側の接触材2への処理水Wの供給量を給水手段9による下流側の接触材3への処理水Wの供給量よりも多くするべく、循環手段8に備えられた上流側の噴霧ノズル12の数を給水手段9に備えられた下流側の噴霧ノズル19の数よりも多くしているが、本発明は、上流側の噴霧ノズル12の数量が下流側の噴霧ノズル19の数量よりも多くなくても良い。例えば、上流側の噴射ノズル12のサイズを下流側の噴射ノズル19よりも大きくすることで、数量を増やすことなく、上流側の接触材2へ供給する処理水Wの量を下流側の接触材3へ供給する処理水Wの量よりも増やすことができる。   In the first embodiment described above, the supply amount of the treated water W to the upstream contact material 2 by the circulation means 8 is more than the supply amount of the treated water W to the downstream contact material 3 by the water supply means 9. In order to increase the number of spray nozzles 12 on the upstream side provided in the circulation means 8, the number of spray nozzles 19 on the downstream side provided in the water supply means 9 is increased. The number of the spray nozzles 12 may not be larger than the number of the spray nozzles 19 on the downstream side. For example, the size of the upstream injection nozzle 12 is made larger than that of the downstream injection nozzle 19 so that the amount of treated water W supplied to the upstream contact material 2 can be reduced without increasing the quantity. The amount of treated water W supplied to 3 can be increased.

また、上記した第1,第2の実施の形態では、ガスGを吸引して送り出すファン7が容器4,104の吸気口4a,104aに取り付けられ、容器4,104の中にガスGを押し込むような構成になっているが、本発明は、必ずしもファン7が装置の吸気側(ガスGの流れの上流側)に設けられている必要はない。例えば、ファン7が装置の排気側(ガスGの流れの下流側)に設けられていてもよく、具体的には、湿式処理後のガスG’を排気するための容器4,104の排気口4b,104bにファン7を取り付けて、容器4,104内のガスG’を吸引するようにしてもよい。   In the first and second embodiments described above, the fan 7 that sucks and sends out the gas G is attached to the intake ports 4a and 104a of the containers 4 and 104, and pushes the gas G into the containers 4 and 104. In the present invention, the fan 7 is not necessarily provided on the intake side (upstream side of the gas G flow) of the apparatus. For example, the fan 7 may be provided on the exhaust side of the apparatus (downstream side of the flow of the gas G). Specifically, the exhaust ports of the containers 4 and 104 for exhausting the gas G ′ after the wet treatment A fan 7 may be attached to 4b and 104b to suck the gas G ′ in the containers 4 and 104.

また、上記した第1の実施の形態では、容器4の中に上流側の接触材2と下流側の接触材3とが横並びに配設されており、また、第2の実施の形態では、容器104の中に上流側の接触材2と下流側の接触材3とが上下に配設されているが、本発明は、接触材が複数配設されていればよく、3つ以上の接触材がガス流通方向に配設されていてもよい。また、3つ以上の接触材が配設された場合、上流側に配置された複数の接触材に対して循環式(循環手段8,108)で処理水を供給してもよく、また、下流側に配置された複数の接触材に対して掛け流し式(給水手段9)で処理水を供給してもよい。例えば、3つの接触材が並べられた構成の場合、上流側の2つの接触材に対して循環式で処理水を供給して下流側の1つの接触材に対して掛け流し式で新たな処理水を供給する構成にしてもよく、或いは、上流側の1つの接触材に対して循環式で処理水を供給して下流側の2つの接触材に対して掛け流し式で新たな処理水を供給する構成でもよい。   In the first embodiment described above, the upstream contact material 2 and the downstream contact material 3 are arranged side by side in the container 4, and in the second embodiment, In the container 104, the upstream contact material 2 and the downstream contact material 3 are arranged up and down. However, in the present invention, a plurality of contact materials may be provided, and three or more contacts may be provided. The material may be disposed in the gas flow direction. Further, when three or more contact materials are disposed, the treated water may be supplied to the plurality of contact materials arranged on the upstream side in a circulating manner (circulation means 8, 108), or downstream. The treated water may be supplied to the plurality of contact members arranged on the side by a flow-through method (water supply means 9). For example, in the case of a configuration in which three contact materials are arranged, treatment water is supplied to the two upstream contact materials in a circulating manner, and a new treatment is carried out in a flowing manner to one downstream contact material. You may make it the structure which supplies water, or it supplies a treated water with a circulation type with respect to one contact material of an upstream side, and a new type of treated water is poured with respect to two downstream contact materials. The structure which supplies may be sufficient.

また、上記した第1,第2の実施の形態では、処理水Wが噴霧ノズル12,19,112から噴霧され、霧状の処理水Wが接触材2,3に吹き付けられる構成になっているが、本発明は、接触材に吹き付けられる処理水が霧状以外であってもよく、例えば、ノズルから処理水が滴下され、大きな液滴で接触材に処理水が供給される構成であってもよい。   In the first and second embodiments described above, the treated water W is sprayed from the spray nozzles 12, 19, and 112, and the mist-like treated water W is sprayed onto the contact materials 2 and 3. However, in the present invention, the treated water sprayed on the contact material may be other than mist, for example, the treated water is dripped from the nozzle, and the treated water is supplied to the contact material with large droplets. Also good.

また、上記した第1の実施の形態では、水槽10、圧送ポンプ11、噴霧ノズル12、連通管13,14、第1,第2の接続管15,16及び排水管17からなる循環手段8によって処理水Wを循環させ、循環する処理水Wを上流側の接触材2に供給しており、また、第2の実施の形態では、圧送ポンプ111、噴霧ノズル112、第1,第2の接続管115,116及び排水管117からなる循環手段108によって処理水Wを循環させ、循環する処理水Wを上流側の接触材2に供給しているが、本発明は、上記した構成からなる循環手段8,108以外の循環手段によって処理水を循環させて、循環する処理水を上流側の接触材に供給してもよく、循環手段の構成は適宜変更可能である。   In the first embodiment described above, the circulation means 8 including the water tank 10, the pressure feed pump 11, the spray nozzle 12, the communication pipes 13 and 14, the first and second connection pipes 15 and 16, and the drain pipe 17 is used. The treated water W is circulated and the circulated treated water W is supplied to the contact material 2 on the upstream side. In the second embodiment, the pumping pump 111, the spray nozzle 112, the first and second connections are provided. The treated water W is circulated by the circulation means 108 including the pipes 115 and 116 and the drain pipe 117, and the circulated treated water W is supplied to the upstream contact material 2. The present invention is a circulation having the above-described configuration. The treated water may be circulated by circulation means other than the means 8 and 108 and the circulated treated water may be supplied to the upstream contact material, and the configuration of the circulation means can be changed as appropriate.

また、上記した第1,第2の実施の形態では、複数の接触材2,3が容器4,104の中に配設されているが、本発明は、接触材が容器の中に配設されていなくてもよく、例えば、ガスが流通するダクト内に接触材が配設されていてもよい。つまり、本発明に係る湿式空気清浄装置は、ガスの流通過程でガスが接触材を通過する構成になっていればよい。   In the first and second embodiments described above, the plurality of contact members 2 and 3 are disposed in the containers 4 and 104. However, in the present invention, the contact members are disposed in the containers. For example, the contact material may be disposed in a duct through which gas flows. That is, the wet air cleaning apparatus according to the present invention only needs to be configured such that the gas passes through the contact material during the gas flow process.

また、上記した第1,第2の実施の形態では、圧送ポンプ18,19及び第1,第2の接続管20,21からなる給水手段9によって外部から新たな処理水Wを流入させて下流側の接触材3に供給しているが、本発明は、上記した構成からなる給水手段9以外の給水手段によって下流側の接触材に新しい処理水を供給してもよく、給水手段の構成は適宜変更可能である。   Further, in the first and second embodiments described above, new treated water W is introduced from the outside by the water supply means 9 including the pressure pumps 18 and 19 and the first and second connection pipes 20 and 21, and is downstream. However, the present invention may supply new treated water to the downstream contact material by a water supply means other than the water supply means 9 having the above-described configuration. It can be changed as appropriate.

また、上記した第1,第2の実施の形態では、湿式空気清浄装置1,101には、整流板5、エリミネータ6(第1、第2のエリミネータ6,106)およびファン7が備えられているが、本発明は、整流板が備えられていない湿式空気清浄装置であってもよく、或いは、エリミネータが備えられていない湿式空気清浄装置であってもよく、或いは、ファンが備えられていない湿式空気清浄装置であってもよい。   In the first and second embodiments described above, the wet air cleaning apparatuses 1 and 101 are provided with the rectifying plate 5, the eliminator 6 (first and second eliminators 6 and 106), and the fan 7. However, the present invention may be a wet air cleaning device that is not provided with a current plate, or may be a wet air cleaning device that is not provided with an eliminator, or is not provided with a fan. It may be a wet air cleaning device.

その他、本発明の主旨を逸脱しない範囲で、上記した実施の形態における構成要素を周知の構成要素に置き換えることは適宜可能であり、また、上記した変形例を適宜組み合わせてもよい。   In addition, in the range which does not deviate from the main point of this invention, it is possible to replace suitably the component in above-mentioned embodiment with a well-known component, and you may combine the above-mentioned modification suitably.

本発明の第1の実施の形態を説明するための湿式空気清浄装置を表す模式図である。It is a schematic diagram showing the wet air cleaning apparatus for demonstrating the 1st Embodiment of this invention. 本発明の第2の実施の形態を説明するための湿式空気清浄装置を表す模式図である。It is a schematic diagram showing the wet air cleaning apparatus for demonstrating the 2nd Embodiment of this invention.

符号の説明Explanation of symbols

1,101 湿式空気清浄装置
2,3 接触材
8,108 循環手段
9 給水手段
G,G’ ガス
W 処理水
DESCRIPTION OF SYMBOLS 1,101 Wet air cleaning apparatus 2,3 Contact material 8,108 Circulation means 9 Water supply means G, G 'Gas W Treated water

Claims (2)

汚染成分を含む処理対象のガスの流通過程で、処理水が浸透した接触材にガスを通過させることで、ガス中の汚染成分を処理水に溶解させてガスを清浄する湿式空気清浄装置において、
前記接触材が、ガスの流通方向に所定の間隔を置いて複数配設され、
ガス流通方向の最下流側の接触材に対して、外部から新たに流入させた処理水を供給する給水手段と、前記最下流側の接触材よりも上流側にある他の接触材のうちの少なくとも1つから流出した処理水を当該接触材に供給して処理水を循環させる循環手段と、が備えられていることを特徴とする湿式空気清浄装置。
In the wet air cleaning device that purifies the gas by dissolving the contaminating components in the gas by passing the gas through the contact material into which the treated water has permeated in the distribution process of the gas to be treated containing the contaminating components,
A plurality of the contact materials are disposed at predetermined intervals in the gas flow direction,
Among the contact materials on the most downstream side in the gas flow direction, water supply means for supplying treated water newly introduced from the outside, and other contact materials on the upstream side of the most downstream contact material Circulating means for supplying treated water flowing out from at least one to the contact material and circulating the treated water is provided.
請求項1記載の湿式空気清浄装置において、
前記最下流側の接触材から流出した処理水が、前記循環手段により循環する処理水に加えられるとともに、循環する処理水の一部が排出されることを特徴とする湿式空気清浄装置。
The wet air cleaning apparatus according to claim 1, wherein
The wet air cleaning apparatus is characterized in that the treated water flowing out of the contact material on the most downstream side is added to the treated water circulated by the circulation means, and a part of the circulated treated water is discharged.
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