JP2013049003A - Wet-type pollutant removal system - Google Patents

Wet-type pollutant removal system Download PDF

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JP2013049003A
JP2013049003A JP2011187527A JP2011187527A JP2013049003A JP 2013049003 A JP2013049003 A JP 2013049003A JP 2011187527 A JP2011187527 A JP 2011187527A JP 2011187527 A JP2011187527 A JP 2011187527A JP 2013049003 A JP2013049003 A JP 2013049003A
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purified water
water tank
drain
mat
circulating
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Hirohisa Uchiyama
博久 内山
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Shimizu Construction Co Ltd
Shimizu Corp
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Shimizu Corp
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PROBLEM TO BE SOLVED: To provide an effective and suitable pollutant removal system which can markedly reduce the consumption of pure water as cleaning water and can further improve cleaning performance.SOLUTION: Cleaning water is stored in a recirculation water tank 5 and is sprayed into air to be treated through spray nozzles 3 to remove a pollutant by absorption and dissolution. The cleaning water in which the pollutant is absorbed and dissolved is recovered as drain in the recirculation water tank and is used by recirculation. The wet-type pollutant removal system is provided with a cleaning water purification apparatus 10 which purifies the drain in the recirculation water tank by recirculating it through a reverse osmosis membrane. Spray nozzles and mats 4 are formed in multiple stages, and the drain from each mat is recovered in the recirculation water tank. The recirculation water tank is partitioned into the upstream part 5a and the downstream part 5c between which an overflow weir 5d is interposed, and the drain recovered in the upstream part is purified by the cleaning water purification apparatus 10 and is returned to the downstream part to thus accomplish recirculation.

Description

本発明は、クリーンルームを対象としてその室内空気中に含まれる汚染物質を浄化水との気液接触により除去するための湿式汚染物質除去システムに関する。   The present invention relates to a wet contaminant removal system for removing contaminants contained in indoor air of a clean room by gas-liquid contact with purified water.

この種のシステムとしては特許文献１に示される「クリーンルーム汚染物質除去システム」が公知である。これは除去装置内を通過する処理対象空気に対してその上流側や下流側から浄化水としての液体（通常は純水が使用される）を噴霧することにより、処理対象空気と浄化水とを気液接触させて汚染物質を浄化水に吸収し溶解させて除去するものである。   As this type of system, a “clean room contaminant removal system” disclosed in Patent Document 1 is known. This is achieved by spraying liquid as purified water (usually pure water is used) from the upstream side or downstream side of the processing target air that passes through the removal device, thereby reducing the processing target air and the purified water. It is made to contact with gas and liquid to absorb the pollutant in purified water, dissolve it and remove it.

この種の浄化システムの基本構成を図４に模式的に示す。
これは処理対象空気としてのクリーンルームからの還気ＲＡを送風機１によって除去装置本体２に供給して、還気ＲＡがその内部を通過する間に浄化水との気液接触により浄化し、浄化後の清浄空気を給気ＳＡとしてクリーンルームに戻すようにしたものである。 The basic configuration of this type of purification system is schematically shown in FIG.
This is because the return air RA from the clean room as the air to be treated is supplied to the removing device main body 2 by the blower 1 and purified by gas-liquid contact with the purified water while the return air RA passes through the inside, after the purification. The clean air is returned to the clean room as the supply air SA.

除去装置本体２の内部には、その内部を通過する還気ＲＡに対して下流側から上流側に向けて浄化水を噴霧するための噴霧ノズル３が多段（図示例では３段）に設けられているとともに、各噴霧ノズル３の上流側にはそれぞれ通気性を有するマット４が配置されていて、それらマット４に対して浄化水を噴霧ノズル３により噴霧してマット４を濡れ面とすることにより、還気ＲＡがマット４を通過する際にそこで気液接触が効率的に行われて汚染物質が十分に除去されるようになっている。この場合、噴霧ノズル３からの細かいつぶ状の水による気液接触により浄化がなされ、特にマット４が濡れ面となることで＋αの効果が得られる。   Inside the removing device main body 2, spray nozzles 3 for spraying purified water from the downstream side toward the upstream side with respect to the return air RA passing through the inside thereof are provided in multiple stages (three stages in the illustrated example). In addition, a mat 4 having air permeability is arranged on the upstream side of each spray nozzle 3, and purified water is sprayed to the mat 4 by the spray nozzle 3 to make the mat 4 a wet surface. Thus, when the return air RA passes through the mat 4, gas-liquid contact is efficiently performed there and the contaminants are sufficiently removed. In this case, purification is performed by gas-liquid contact with fine crushed water from the spray nozzle 3, and in particular, the effect of + α is obtained by the mat 4 becoming a wet surface.

除去装置本体２には浄化水を貯留し循環させるための循環水槽５が付設されていて、その循環水槽５からポンプ６によって各噴霧ノズル３に対して浄化水が加圧供給されることにより、浄化水が各マット４に対して噴霧され、かつマット４の表面において汚染物質を吸収し溶解させた浄化水はマット４の表面を流下してドレインとして循環水槽５に回収されるようになっている。   The removal device body 2 is provided with a circulating water tank 5 for storing and circulating purified water, and the purified water is pressurized and supplied from the circulating water tank 5 to each spray nozzle 3 by a pump 6. Purified water is sprayed on each mat 4, and purified water that has absorbed and dissolved contaminants on the surface of the mat 4 flows down the surface of the mat 4 and is collected in the circulating water tank 5 as a drain. Yes.

図示例の循環水槽５は、３段の噴霧ノズル３のうちの最上流の噴霧ノズル３に対して浄化水を供給しかつそのドレインを回収する上流部５ａと、その後段の噴霧ノズル３に対して浄化水を供給しかつそのドレインを回収する中流部５ｂと、さらにその後段の噴霧ノズル３に対して浄化水を供給しかつそのドレインを回収する下流部５ｃとに区画されていて、それらの間には浄化水を下流部５ｃから中流部５ｂへ、さらに中流部５ｂから上流部５ａに越流させるための越流堰５ｄがそれぞれ設けられている。
この場合、上流部５ａに回収されるドレインは中流部５ｂおよび下流部５ｃに回収されるドレインに比べて汚染物質濃度が自ずと高くなるので、高濃度の浄化水を上流部５ａから排水するとともに下流部５ｃに対して浄化水としての純水を補給することにより、循環水槽５内において清浄な浄化水を下流部５ｃから越流堰５ｄを超えて中流部５ｂへ、さらに中流部５ｂから越流堰５ｄを超えて上流部５ａに向けてほぼ一方向に流れるようにしたうえで、常に清浄な浄化水を各噴霧ノズル３に対して供給するようにしている。 The circulating water tank 5 in the illustrated example supplies the purified water to the uppermost spray nozzle 3 of the three-stage spray nozzles 3 and recovers the drain thereof, and the subsequent-stage spray nozzle 3. Are divided into a midstream portion 5b that supplies purified water and collects its drain, and a downstream portion 5c that supplies purified water to the subsequent spray nozzle 3 and collects its drain. Between them, there are provided overflow weirs 5d for allowing purified water to flow from the downstream portion 5c to the middle flow portion 5b and from the middle flow portion 5b to the upstream portion 5a.
In this case, the drain collected in the upstream portion 5a naturally has a higher pollutant concentration than the drain collected in the midstream portion 5b and the downstream portion 5c, so that high-concentration purified water is drained from the upstream portion 5a and downstream. By supplying pure water as purified water to the portion 5c, clean purified water in the circulating water tank 5 is passed from the downstream portion 5c to the midstream portion 5b over the overflow weir 5d, and further from the midstream portion 5b. After flowing over the weir 5d toward the upstream portion 5a in almost one direction, clean purified water is always supplied to each spray nozzle 3.

なお、除去装置本体２内にはＨＥＰＡフィルタ７やエリミネータ８が設けられ、必要に応じて冷却コイルないし冷却加熱コイル等が適宜設けられるようになっている。
また、浄化水を噴霧ノズル３に加圧供給するためのポンプ６の後段にはフィルタ９が設けられ、必要に応じて浄化水を冷却するための熱交換器（図４では図示略）も適宜設けられるようになっている。 In addition, the HEPA filter 7 and the eliminator 8 are provided in the removal apparatus main body 2, and a cooling coil, a cooling heating coil, etc. are suitably provided as needed.
Further, a filter 9 is provided in the subsequent stage of the pump 6 for supplying the purified water to the spray nozzle 3 under pressure, and a heat exchanger (not shown in FIG. 4) for cooling the purified water as needed is also provided. It is designed to be provided.

特許第３９４１０２９号公報Japanese Patent No. 3941029

上記従来のシステムはクリーンルームに特有の汚染物質、特に各種のいわゆるケミカル物質を除去するためのシステムとして有効であり、液晶製造工場や半導体製造工場等において普及する気運にあるが、浄化水として多量の純水を消費する点が課題とされている。   The above-mentioned conventional system is effective as a system for removing pollutants peculiar to clean rooms, particularly various so-called chemical substances, and is widely used in liquid crystal manufacturing factories and semiconductor manufacturing factories. The point of consuming pure water is an issue.

すなわち、上記従来のシステムにおいては噴霧ノズル３により噴霧した浄化水（純水）をマット４からドレインとして循環水槽５に回収する構成であるので、回収した純水を循環使用することも可能ではあるが、回収した純水は汚染物質を高濃度に含むことからそれをそのまま循環使用することでは所望の浄化性能を維持することは困難であり、実際の運転では回収した純水の大半をそのまま排水する必要がある。
したがって上記従来のシステムでは排水量相当分の純水を補給水として常に補給する必要があり、結局は多量の純水を消費してしまうものである。 That is, in the above-described conventional system, the purified water (pure water) sprayed by the spray nozzle 3 is collected from the mat 4 as a drain into the circulating water tank 5, so that the collected pure water can be circulated and used. However, since the recovered pure water contains a high concentration of pollutants, it is difficult to maintain the desired purification performance by circulating it as it is. In actual operation, most of the recovered pure water is drained as it is. There is a need to.
Therefore, in the above conventional system, it is necessary to always replenish pure water corresponding to the amount of drainage as make-up water, and eventually consume a large amount of pure water.

そして、純水は非常に高価であるからそれを多量に使用することは液晶製造工場や半導体製造工場におけるランニングコストに大きく影響することはもとより、多量の純水を安定に供給するためには大規模な純水製造設備を設置する必要もあり、この種のシステムの採用に当たってはその点での改善が必要とされているのが実状である。   Since pure water is very expensive, using a large amount of it not only greatly affects the running cost of liquid crystal manufacturing plants and semiconductor manufacturing plants, but is also important for stably supplying a large amount of pure water. It is also necessary to install a large-scale pure water production facility, and it is actually necessary to improve this point when adopting this type of system.

上記事情に鑑み、本発明は上記従来の湿式汚染物質除去システムの基本構成を踏襲しながら浄化水としての純水の消費量を大幅に削減でき、かつ浄化性能をさらに向上させることも可能な有効適切なシステムを提供することを目的とする。   In view of the above circumstances, the present invention can effectively reduce the consumption of pure water as purified water while following the basic configuration of the conventional wet pollutant removal system, and can further improve the purification performance. The purpose is to provide an appropriate system.

請求項１記載の発明は、クリーンルームを対象としてその室内空気中に含まれる汚染物質を浄化水との気液接触により除去するための湿式汚染物質除去システムであって、前記浄化水を循環水槽に貯留して該循環水槽から浄化水を噴霧ノズルによって処理対象空気に対して噴霧することにより汚染物質を浄化水に吸収・溶解せしめて除去するとともに、汚染物質を吸収・溶解した浄化水をドレインとして前記循環水槽に回収して循環使用する構成とし、前記循環水槽には、該循環水槽内の浄化水を逆浸透膜に通しつつ循環させることによって該浄化水を前記循環水槽内において清浄化する浄化水清浄化装置を具備してなることを特徴とする。   The invention described in claim 1 is a wet contaminant removal system for removing contaminants contained in indoor air of a clean room by gas-liquid contact with purified water, and the purified water is supplied to a circulating water tank. By storing and spraying purified water from the circulating water tank to the air to be treated with a spray nozzle, the contaminants are absorbed and dissolved in the purified water and removed, and the purified water that has absorbed and dissolved the contaminants is used as a drain. Purifying the purified water in the circulating water tank by collecting the purified water in the circulating water tank and circulating the purified water in the circulating water tank through the reverse osmosis membrane. A water purification device is provided.

請求項２記載の発明は、請求項１記載の湿式汚染物質除去システムであって、前記噴霧ノズルおよび通気性を有するマットを処理対象空気の流通方向に多段に設置して、各噴霧ノズルから各マットに対して浄化水を噴霧するとともに、各マットから流下する浄化水をドレインとして前記循環水槽に回収し、前記循環水槽を、上流側のマットからのドレインを回収する上流部と、下流側のマットからのドレインを回収する下流部に区画して、それら上流部と下流部との間に下流部から上流部に対して浄化水を越流させる越流堰を設けるとともに、前記上流部からドレインを排水して前記下流部に浄化水を補給可能に構成し、かつ、前記上流部のドレインを前記浄化水清浄化装置によって清浄化して前記下流部に戻すように循環させる構成としたことを特徴とする。   Invention of Claim 2 is a wet pollutant removal system of Claim 1, Comprising: The said spray nozzle and the mat | matte which has air permeability are installed in multiple steps | streams in the distribution direction of process target air, and each spray nozzle is set to each. While spraying purified water on the mat, the purified water flowing down from each mat is collected in the circulating water tank as a drain, and the circulating water tank has an upstream portion for collecting the drain from the upstream mat, and a downstream side. The drain from the mat is partitioned into a downstream part, and an overflow weir is provided between the upstream part and the downstream part to allow purified water to overflow from the downstream part to the upstream part. The drain is drained and purified water can be replenished to the downstream part, and the upstream drain is cleaned by the purified water cleaning device and circulated back to the downstream part. And wherein the door.

本発明によれば、循環水槽に浄化水清浄化装置を付加して、除去装置本体からドレインとして回収した浄化水を浄化水清浄化装置により清浄化して循環使用することにより、浄化性能を低下させることなく、寧ろ浄化性能を向上させつつ、浄化水としての純粋の排水量と補給水量を必要最少限としてその消費量を大幅に削減することが可能であり、それにより浄化に要する運転費を大幅に削減することが可能である。   According to the present invention, the purified water cleaning device is added to the circulating water tank, and the purified water collected as the drain from the removing device main body is purified by the purified water cleaning device and circulated for use, thereby reducing the purification performance. Rather, while improving the purification performance, it is possible to reduce the consumption of pure water as the purified water and make-up water to the minimum necessary, thereby greatly reducing the operating cost required for purification. It is possible to reduce.

本発明の実施形態である湿式汚染物質除去システムの概略構成図である。It is a schematic block diagram of the wet contaminant removal system which is embodiment of this invention. 同、除去性能を示す図である。It is a figure which shows removal performance similarly. 同、他の実施形態を示す図である。It is a figure which shows other embodiment same as the above. 湿式汚染物質除去システムの基本構成を示す概略構成図である。It is a schematic block diagram which shows the basic composition of a wet contaminant removal system.

図１に本発明の実施形態である湿式汚染物質除去システムの概略構成を示す。
本実施形態のシステムは図４に示した従来のシステムを基本として浄化水としての純水の消費量を大幅に低減するための装置を付加したものであるので、両者に共通する構成要素については同一符号を付して詳細な説明は省略する。 FIG. 1 shows a schematic configuration of a wet contaminant removal system according to an embodiment of the present invention.
Since the system of the present embodiment is based on the conventional system shown in FIG. 4 and is added with a device for greatly reducing the consumption of pure water as purified water, The same reference numerals are assigned and detailed description is omitted.

上述したように従来の湿式汚染物質除去システムにおいては、循環水槽５に回収したドレインの大半をそのまま排水していたのであるが、本実施形態では従来システムにおける循環水槽５に対して浄化水清浄化装置１０を付設して、従来においては循環水槽５の上流部５ａからそのまま排水していた純水を排水することなくその浄化水清浄化装置１０に導入して清浄化したうえで下流部５ｃに戻すようにしており、それにより浄化性能を低下させることなく純水を繰り返し循環使用することが可能なものとなっている。   As described above, in the conventional wet pollutant removal system, most of the drain collected in the circulating water tank 5 is drained as it is, but in this embodiment, purified water is purified with respect to the circulating water tank 5 in the conventional system. The apparatus 10 is attached, and the pure water which has been drained as it is from the upstream part 5a of the circulating water tank 5 in the prior art is introduced into the purified water cleaning apparatus 10 without being drained and cleaned, and then the downstream part 5c. Thus, pure water can be repeatedly circulated and used without degrading the purification performance.

本発明における浄化水清浄化装置１０は周知の逆浸透膜（ＲＯ膜）を利用したもので、循環水槽５の上流部５ａの純水をポンプ１１により浄化水清浄化装置１０に対して加圧供給することのみで、汚染物質を高濃度に含むドレインを十分に清浄化したうえで循環水槽５の下流部５ｃに送水して循環させることが可能なものである。
なお、逆浸透膜を利用した水質浄化装置は多くの実績があり、クリーンルームでの使用に供し得る市販品もあるので、本発明における浄化水清浄化装置１０としてはそのような市販品のなかから適宜のものを選択して用いれば良く、それにより浄化水清浄化装置１０を付加するために要するコストは些少で済むし、またその種の市販品はほぼメンテナンスフリーであってさしたる保守費も必要としない。通常、ＲＯ膜を使用するとケミカル物質の詰まり、溶解により洗浄メンテナンス、交換頻度によりランニングコストが多くかかると想定されるが、２年間の実験によりケミカル物質の除去に有効でメンテナンスも必要ないことが実証された。 The purified water cleaning device 10 in the present invention uses a known reverse osmosis membrane (RO membrane), and the purified water in the upstream portion 5 a of the circulating water tank 5 is pressurized against the purified water cleaning device 10 by the pump 11. By only supplying the water, the drain containing the pollutant at a high concentration can be sufficiently cleaned and then sent to the downstream portion 5c of the circulating water tank 5 to be circulated.
In addition, since the water quality purification apparatus using a reverse osmosis membrane has many achievements and there is also a commercially available product that can be used in a clean room, the purified water cleaning apparatus 10 in the present invention is such a commercially available product. What is necessary is just to select and use an appropriate thing, and the cost required to add the purified water purification apparatus 10 can be insignificant, and such a commercial product is almost maintenance-free and also requires a maintenance cost. And not. Normally, using RO membranes is expected to increase the maintenance cost due to clogging and dissolution of chemical substances and cleaning, and the frequency of replacement, but it has been proved that two years of experiments are effective in removing chemical substances and do not require maintenance. It was done.

上記のように、循環水槽５に浄化水清浄化装置１０を付加して、除去装置本体２からドレインとして循環水槽５に回収したドレインを浄化水清浄化装置１０により清浄化して浄化水として循環使用することにより、浄化性能を低下させることなく純水の消費量（すなわち排水量とそれに見合う補給水量）を大幅に削減して必要最小限とすることが可能であり、それにより本発明のシステムの運転費を大幅に軽減することが可能である。
本発明のシステムを通常規模の液晶工場に対して従来システムに代えて適用する場合についての一試算によれば、純水消費量を従来システムに比べて10%程度にまで大幅に削減することが可能であり、それにより従来においては必要であった大規模な純水製造設備を不要ないし大幅に簡略化することも可能であることから、浄化水清浄化装置１０を付加するために要する初期投資費用を運転費の削減によりわずか２年程度で回収できるという試算結果が得られた。 As described above, the purified water cleaning device 10 is added to the circulating water tank 5, and the drain collected in the circulating water tank 5 as a drain from the removing device main body 2 is purified by the purified water cleaning device 10 and used as purified water for circulation. By doing so, it is possible to significantly reduce the consumption of pure water (ie, the amount of drainage and the amount of makeup water commensurate with it) without degrading the purification performance, thereby operating the system of the present invention. Costs can be greatly reduced.
According to a trial calculation of the case where the system of the present invention is applied to a liquid crystal factory of a normal scale instead of the conventional system, the pure water consumption can be significantly reduced to about 10% compared to the conventional system. It is possible, and thus it is possible to eliminate or greatly simplify the large-scale pure water production facility that has been necessary in the prior art. Therefore, the initial investment required for adding the purified water cleaning device 10 is possible. The trial calculation result that the cost can be recovered in only about two years by reducing the operating cost was obtained.

勿論、本発明のシステムによれば、純水を循環使用してその使用量を削減しても、従来システムに比べて浄化性能が低下することはないし、寧ろ浄化性能を向上させることも可能である。
たとえば、従来システムにおいて処理風量30000m3/H、処理対象空気中の汚染物質の除去率を50〜60％程度とする場合、純水の補給水量を40L/min程度（液ガス比0.08L/m3程度）としてその補給水量のほぼ全量をドレインとしてそのまま排水する必要があるが、本発明のシステムによればドレインを浄化水清浄化装置１０により清浄化しつつ循環使用することで、上記のように純水の補給水量を10%程度まで削減し得るにも拘わらず、噴霧水量（純水10％＋浄化水90％）は従来と同等の40L/min程度としたままでも従来システムと同等ないしそれ以上の浄化性能を支障なく維持できるものである。 Of course, according to the system of the present invention, even if pure water is circulated and used in a reduced amount, the purification performance does not deteriorate as compared with the conventional system, and the purification performance can be improved. is there.
For example, in a conventional system, if the processing air volume is 30000m 3 / H and the removal rate of pollutants in the processing target air is about 50 to 60%, the amount of pure water supply is about 40L / min (liquid-gas ratio 0.08L / m Although it is necessary to drain the drain almost all of the replenishing water as about 3), by recycling while cleaning the drain according to the system of the present invention by purifying water cleaning apparatus 10, as described above Even though the amount of pure water replenishment can be reduced to about 10%, the amount of sprayed water (pure water 10% + purified water 90%) is equivalent to that of the conventional system even if it is about 40 L / min, which is the same as the conventional system. The above purification performance can be maintained without hindrance.

しかも、本発明のシステムによれば噴霧量を増大させることで浄化性能をさらに向上させることができる。
すなわち、本発明のシステムでは、図２（ａ）に示すように噴霧量を多くすれば純水消費量もやや増大はするものの除去率を大きく向上させることができる。たとえば、噴霧量を110L/min（純水50％＋浄化水50%）とすれば除去率を90％程度にまで高めることができ、この場合には純水の消費量は従来システムの場合と同等程度となって純水消費量の削減効果は望めないが、その分、汚染物質の除去性能を大きく向上させることができることになる。
また、噴霧量（純水＋浄化水）を多くして除去率を向上させることにより、図２（ｂ）に示すように排水中のＴＯＣ濃度も低減させることができ、たとえば噴霧量を110L/minとすればTOC60程度にまで低減させることが可能である。勿論、浄化水清浄化装置１０をさらに多量の浄化水を処理可能な設備とすれば、純水の消費量を削減しつつ噴霧量をさらに多くしてさらなる効率向上を実現することができる。 Moreover, according to the system of the present invention, the purification performance can be further improved by increasing the spray amount.
That is, in the system of the present invention, if the spray amount is increased as shown in FIG. 2 (a), the removal rate can be greatly improved although the pure water consumption is slightly increased. For example, if the spray rate is 110 L / min (50% pure water + 50% purified water), the removal rate can be increased to about 90%. In this case, the consumption of pure water is the same as that of the conventional system. Although it is about the same level and the effect of reducing the amount of pure water consumption cannot be expected, the contaminant removal performance can be greatly improved accordingly.
Further, by increasing the spray amount (pure water + purified water) to improve the removal rate, the TOC concentration in the waste water can be reduced as shown in FIG. If it is set to min, it can be reduced to about TOC60. Of course, if the purified water cleaning apparatus 10 is a facility capable of processing a larger amount of purified water, it is possible to further increase the efficiency by increasing the spray amount while reducing the consumption of pure water.

以上で本発明の一実施形態について説明したが、上記実施形態はあくまで好適な一例であって本発明は上記実施形態に限定されるものでは勿論なく、本発明の要旨を逸脱しない範囲内で、すなわち浄化水を貯留し循環させるための循環水槽に逆浸透膜による浄化水清浄化装置を設置して循環水槽に回収したドレインを清浄化して循環使用するように構成する限りにおいて、各部の具体的な構成や仕様は処理対象の汚染物質の種類や濃度、要求される浄化性能その他の諸条件を考慮して適宜の設計的変更や応用が可能である。   Although one embodiment of the present invention has been described above, the above embodiment is merely a preferred example, and the present invention is not limited to the above embodiment, and within the scope not departing from the gist of the present invention, In other words, as long as it is configured to use a reverse osmosis membrane purified water purifier in the circulating water tank for storing and circulating the purified water and purify the drain collected in the circulating water tank, Various configurations and specifications can be appropriately changed in design and applied in consideration of the types and concentrations of contaminants to be treated, required purification performance, and other conditions.

たとえば、上記実施形態では除去装置本体２内に３段の噴霧ノズル３を設け、それに対応して循環水槽５を上流部５ａ、中流部５ｂ、下流部５ｃに区画するようにしたが、それに限るものではなく、たとえば図３に示すように噴霧ノズル３は２段として循環水槽５を上流部５ａと下流部５ｃとに区画する（中流部５ｂを省略する）ことでも良いし、噴霧ノズル３を１段あるいは４段以上の多段として循環水槽５もそれに対応させたものとすることでも勿論良い。
また、上記実施形態では各噴霧ノズル３の上流側にマット４を設けたが、浄化水を下流側に向けて噴霧するようにしてマット４を噴霧ノズル３の下流側に設置しても良いし、浄化水と処理対象空気との気液接触が十分に行われて所望の浄化効率が得られる場合にはマット４は省略することも可能である。
さらに、同じく図３に示すように、噴霧ノズル３に供給する浄化水を冷却用の熱交換器１２に通して所定温度に冷却してから噴霧するように構成することも好ましい。 For example, in the above embodiment, the three-stage spray nozzle 3 is provided in the removing device main body 2, and the circulating water tank 5 is partitioned into the upstream portion 5a, the midstream portion 5b, and the downstream portion 5c correspondingly. For example, as shown in FIG. 3, the spray nozzle 3 may be divided into two stages to partition the circulating water tank 5 into an upstream portion 5a and a downstream portion 5c (the middle flow portion 5b is omitted). Of course, the circulating water tank 5 may be made to correspond to one stage or four stages or more.
In the above embodiment, the mat 4 is provided on the upstream side of each spray nozzle 3. However, the mat 4 may be installed on the downstream side of the spray nozzle 3 so that the purified water is sprayed toward the downstream side. The mat 4 may be omitted when the gas-liquid contact between the purified water and the air to be treated is sufficiently performed to obtain a desired purification efficiency.
Further, as shown in FIG. 3, it is also preferable that the purified water supplied to the spray nozzle 3 is sprayed after being cooled to a predetermined temperature through the cooling heat exchanger 12.

また、循環水槽５は上記実施形態のように上流部５ａと中流部５ｂと下流部５ｃ（あるいは上流部５ａと下流部５ｃ）に区画してそれらの間に越流堰５ｄを設け、上流部５ａのドレインを浄化水清浄化装置１０により清浄化して下流部５ｃに戻すように循環させる構成とすることが好ましいが、要は循環水槽５内の高濃度のドレインを逆浸透膜により清浄化しつつ循環させるように構成すれば良いのであって、その限りにおいて浄化水清浄化装置１０の具体的な構成はもとより、浄化水槽５内における浄化水の循環経路や循環水量は適切に設定すれば良い。   Further, the circulating water tank 5 is divided into an upstream portion 5a, a midstream portion 5b, and a downstream portion 5c (or an upstream portion 5a and a downstream portion 5c) as in the above embodiment, and an overflow weir 5d is provided between them. The drain of 5a is preferably circulated so as to be cleaned by the purified water cleaning device 10 and returned to the downstream portion 5c, but in essence, the high-concentration drain in the circulating water tank 5 is cleaned by the reverse osmosis membrane. As long as it is configured to circulate, in addition to the specific configuration of the purified water cleaning device 10, the circulating path and the amount of the circulating water in the purified water tank 5 may be set appropriately.

１ 送風機
２ 除去装置本体
３ 噴霧ノズル
４ マット
５ 循環水槽
５ａ 上流部
５ｂ 中流部
５ｃ 下流部
５ｄ 越流堰
６ ポンプ
７ ＨＥＰＡフィルタ
８ エリミネータ
９ フィルタ
１０ 浄化水清浄化装置
１１ ポンプ
１２ 熱交換器 DESCRIPTION OF SYMBOLS 1 Blower 2 Removal apparatus main body 3 Spray nozzle 4 Mat 5 Circulating water tank 5a Upstream part 5b Middle stream part 5c Downstream part 5d Overflow weir 6 Pump 7 HEPA filter 8 Eliminator 9 Filter 10 Purified water cleaning apparatus 11 Pump 12 Heat exchanger

Claims (2)

クリーンルームを対象としてその室内空気中に含まれる汚染物質を浄化水との気液接触により除去するための湿式汚染物質除去システムであって、
前記浄化水を循環水槽に貯留して該循環水槽から浄化水を噴霧ノズルによって処理対象空気に対して噴霧することにより汚染物質を浄化水に吸収・溶解せしめて除去するとともに、汚染物質を吸収・溶解した浄化水をドレインとして前記循環水槽に回収して循環使用する構成とし、
前記循環水槽には、該循環水槽内の浄化水を逆浸透膜に通しつつ循環させることによって該浄化水を前記循環水槽内において清浄化する浄化水清浄化装置を具備してなることを特徴とする湿式汚染物質除去システム。 A wet pollutant removal system for removing pollutants contained in indoor air for clean rooms by gas-liquid contact with purified water,
The purified water is stored in the circulating water tank, and the purified water is sprayed from the circulating water tank to the air to be treated by the spray nozzle to absorb and dissolve the pollutant in the purified water and remove the pollutant. The dissolved purified water is used as a drain to collect in the circulating water tank and circulate for use.
The circulating water tank comprises a purified water purifier for purifying the purified water in the circulating water tank by circulating the purified water in the circulating water tank through a reverse osmosis membrane. Wet pollutant removal system. 請求項１記載の湿式汚染物質除去システムであって、
前記噴霧ノズルおよび通気性を有するマットを処理対象空気の流通方向に多段に設置して、各噴霧ノズルから各マットに対して浄化水を噴霧するとともに、各マットから流下する浄化水をドレインとして前記循環水槽に回収し、
前記循環水槽を、上流側のマットからのドレインを回収する上流部と、下流側のマットからのドレインを回収する下流部に区画して、それら上流部と下流部との間に下流部から上流部に対して浄化水を越流させる越流堰を設けるとともに、前記上流部からドレインを排水して前記下流部に浄化水を補給可能に構成し、
かつ、前記上流部のドレインを前記浄化水清浄化装置によって清浄化して前記下流部に戻すように循環させる構成としたことを特徴とする湿式汚染物質除去システム。 The wet contaminant removal system according to claim 1,
The spray nozzle and the mat having air permeability are installed in multiple stages in the flow direction of the air to be treated, and the purified water is sprayed from each spray nozzle to each mat, and the purified water flowing down from each mat is used as a drain. Collected in a circulating water tank,
The circulating water tank is divided into an upstream part that collects drains from the upstream mat and a downstream part that collects drains from the downstream mat, and upstream from the downstream part between the upstream part and the downstream part. Providing an overflow weir for allowing purified water to flow over the part, draining the drain from the upstream part, and supplying the downstream part with purified water,
In addition, the wet pollutant removing system is characterized in that the upstream drain is circulated so as to be cleaned by the purified water cleaning device and returned to the downstream portion.
JP2011187527A 2011-08-30 2011-08-30 Wet-type pollutant removal system Pending JP2013049003A (en)

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US10323361B1 (en) * 2011-06-12 2019-06-18 Dale Karmie Synthetic turf system made with antistatic yarns and method of making

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JP2000042341A (en) * 1998-08-03 2000-02-15 Nomura Micro Sci Co Ltd Air purifying system
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JP2000042341A (en) * 1998-08-03 2000-02-15 Nomura Micro Sci Co Ltd Air purifying system
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US10323361B1 (en) * 2011-06-12 2019-06-18 Dale Karmie Synthetic turf system made with antistatic yarns and method of making
KR101917673B1 (en) 2018-05-31 2018-11-13 한국산업기술시험원 Exhaust gas treatment apparatus capable of reusing washing water

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