KR101560648B1 - 구리를 포함하는 패턴화된 웨이퍼의 연마 - Google Patents

구리를 포함하는 패턴화된 웨이퍼의 연마 Download PDF

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Publication number
KR101560648B1
KR101560648B1 KR1020090014260A KR20090014260A KR101560648B1 KR 101560648 B1 KR101560648 B1 KR 101560648B1 KR 1020090014260 A KR1020090014260 A KR 1020090014260A KR 20090014260 A KR20090014260 A KR 20090014260A KR 101560648 B1 KR101560648 B1 KR 101560648B1
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KR
South Korea
Prior art keywords
polishing
bta
acid
copper
percent
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Expired - Fee Related
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KR1020090014260A
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English (en)
Korean (ko)
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KR20090091056A (ko
Inventor
테렌스 엠. 토마스
왕훙위
Original Assignee
롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스 인코포레이티드
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Publication of KR20090091056A publication Critical patent/KR20090091056A/ko
Application granted granted Critical
Publication of KR101560648B1 publication Critical patent/KR101560648B1/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/32115—Planarisation
    • H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/04—Aqueous dispersions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Dispersion Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
KR1020090014260A 2008-02-22 2009-02-20 구리를 포함하는 패턴화된 웨이퍼의 연마 Expired - Fee Related KR101560648B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/072,015 2008-02-22
US12/072,015 US20090215266A1 (en) 2008-02-22 2008-02-22 Polishing Copper-Containing patterned wafers

Publications (2)

Publication Number Publication Date
KR20090091056A KR20090091056A (ko) 2009-08-26
KR101560648B1 true KR101560648B1 (ko) 2015-10-16

Family

ID=40521506

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020090014260A Expired - Fee Related KR101560648B1 (ko) 2008-02-22 2009-02-20 구리를 포함하는 패턴화된 웨이퍼의 연마

Country Status (6)

Country Link
US (1) US20090215266A1 (enExample)
EP (1) EP2093789A3 (enExample)
JP (1) JP5514449B2 (enExample)
KR (1) KR101560648B1 (enExample)
CN (1) CN101515546B (enExample)
TW (1) TWI487760B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102121127A (zh) * 2011-01-04 2011-07-13 安徽工业大学 一种集成电路铜互连结构中铜的电化学机械抛光液
KR101907229B1 (ko) 2011-02-03 2018-10-11 니타 하스 인코포레이티드 연마용 조성물 및 그것을 이용한 연마 방법
US8435896B2 (en) 2011-03-03 2013-05-07 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Stable, concentratable chemical mechanical polishing composition and methods relating thereto
US8440097B2 (en) 2011-03-03 2013-05-14 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Stable, concentratable, water soluble cellulose free chemical mechanical polishing composition
CN104131289B (zh) * 2014-07-01 2015-09-23 安徽拓普森电池有限责任公司 一种具有杀菌效果的抛光液及其制备方法
JP6837958B2 (ja) 2017-12-28 2021-03-03 花王株式会社 酸化珪素膜用研磨液組成物
CN116438267A (zh) * 2020-10-29 2023-07-14 富士胶片电子材料美国有限公司 研磨组成物及其使用方法
CN114561187B (zh) * 2022-03-07 2022-10-21 山东麦丰新材料科技股份有限公司 一种环保型乳化精磨液及其制备方法
EP4643371A1 (en) * 2022-12-29 2025-11-05 Basf Se Composition for selectively removing oxide compounds and etching residues of one or both of co and cu

Citations (3)

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Publication number Priority date Publication date Assignee Title
WO2001060940A1 (en) 2000-02-16 2001-08-23 Rodel Inc Biocides for polishing slurries
US20030079416A1 (en) 2001-08-14 2003-05-01 Ying Ma Chemical mechanical polishing compositions for metal and associated materials and method of using same
JP2005150306A (ja) * 2003-11-13 2005-06-09 Asahi Glass Co Ltd 銅配線研磨用組成物、半導体集積回路表面の研磨方法および半導体集積回路用銅配線の作製方法

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US4642221A (en) * 1983-07-05 1987-02-10 Atlantic Richfield Company Method and composition for inhibiting corrosion in aqueous heat transfer systems
JPH0982668A (ja) * 1995-09-20 1997-03-28 Sony Corp 研磨用スラリー及びこの研磨用スラリーを用いる研磨方法
JP2000160139A (ja) * 1998-12-01 2000-06-13 Fujimi Inc 研磨用組成物およびそれを用いた研磨方法
US6238592B1 (en) * 1999-03-10 2001-05-29 3M Innovative Properties Company Working liquids and methods for modifying structured wafers suited for semiconductor fabrication
JP3941284B2 (ja) * 1999-04-13 2007-07-04 株式会社日立製作所 研磨方法
US6234875B1 (en) * 1999-06-09 2001-05-22 3M Innovative Properties Company Method of modifying a surface
AU6632100A (en) * 1999-08-13 2001-03-13 Cabot Microelectronics Corporation Polishing system and method of its use
US7041599B1 (en) * 1999-12-21 2006-05-09 Applied Materials Inc. High through-put Cu CMP with significantly reduced erosion and dishing
US6451697B1 (en) * 2000-04-06 2002-09-17 Applied Materials, Inc. Method for abrasive-free metal CMP in passivation domain
US6409781B1 (en) * 2000-05-01 2002-06-25 Advanced Technology Materials, Inc. Polishing slurries for copper and associated materials
US20020068454A1 (en) * 2000-12-01 2002-06-06 Applied Materials, Inc. Method and composition for the removal of residual materials during substrate planarization
US6632259B2 (en) * 2001-05-18 2003-10-14 Rodel Holdings, Inc. Chemical mechanical polishing compositions and methods relating thereto
US7029373B2 (en) * 2001-08-14 2006-04-18 Advanced Technology Materials, Inc. Chemical mechanical polishing compositions for metal and associated materials and method of using same
US6805812B2 (en) * 2001-10-11 2004-10-19 Cabot Microelectronics Corporation Phosphono compound-containing polishing composition and method of using same
US20030119692A1 (en) * 2001-12-07 2003-06-26 So Joseph K. Copper polishing cleaning solution
US20040077295A1 (en) * 2002-08-05 2004-04-22 Hellring Stuart D. Process for reducing dishing and erosion during chemical mechanical planarization
JP2005142516A (ja) * 2003-06-11 2005-06-02 Toshiro Doi 化学機械研磨用スラリー組成物及び化学機械研磨方法
US7384871B2 (en) * 2004-07-01 2008-06-10 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing compositions and methods relating thereto
US7086935B2 (en) * 2004-11-24 2006-08-08 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Cellulose-containing polishing compositions and methods relating thereto
US7435356B2 (en) * 2004-11-24 2008-10-14 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Abrasive-free chemical mechanical polishing compositions and methods relating thereto
WO2007019342A2 (en) * 2005-08-05 2007-02-15 Advanced Technology Materials, Inc. High throughput chemical mechanical polishing composition for metal film planarization

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001060940A1 (en) 2000-02-16 2001-08-23 Rodel Inc Biocides for polishing slurries
US20030079416A1 (en) 2001-08-14 2003-05-01 Ying Ma Chemical mechanical polishing compositions for metal and associated materials and method of using same
JP2005150306A (ja) * 2003-11-13 2005-06-09 Asahi Glass Co Ltd 銅配線研磨用組成物、半導体集積回路表面の研磨方法および半導体集積回路用銅配線の作製方法

Also Published As

Publication number Publication date
CN101515546B (zh) 2012-06-27
KR20090091056A (ko) 2009-08-26
US20090215266A1 (en) 2009-08-27
TW200946619A (en) 2009-11-16
JP2009200496A (ja) 2009-09-03
TWI487760B (zh) 2015-06-11
CN101515546A (zh) 2009-08-26
EP2093789A2 (en) 2009-08-26
JP5514449B2 (ja) 2014-06-04
EP2093789A3 (en) 2010-01-27

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